JPS58177490A - Production of tin-free steel plate - Google Patents

Production of tin-free steel plate

Info

Publication number
JPS58177490A
JPS58177490A JP6154782A JP6154782A JPS58177490A JP S58177490 A JPS58177490 A JP S58177490A JP 6154782 A JP6154782 A JP 6154782A JP 6154782 A JP6154782 A JP 6154782A JP S58177490 A JPS58177490 A JP S58177490A
Authority
JP
Japan
Prior art keywords
chromic acid
bath
steel plate
treatment
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6154782A
Other languages
Japanese (ja)
Other versions
JPS6123280B2 (en
Inventor
Hideo Kobayashi
秀夫 小林
Hajime Ogata
緒方 一
Shunichi Tsugawa
津川 俊一
Toshiro Ichida
市田 敏郎
Shunichi Harada
俊一 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP6154782A priority Critical patent/JPS58177490A/en
Publication of JPS58177490A publication Critical patent/JPS58177490A/en
Publication of JPS6123280B2 publication Critical patent/JPS6123280B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a Cr<ox> film which has a uniform film construction and good resistance to a retort treatment in the stage of applying an electrolytic chromic acid treatment on a steel plate by using an aq. chromic acid soln. which contains no assistant except unavoidable impurities and applying the electrolytic chromic acid treatment dividedly in two stages on the steel plate. CONSTITUTION:Cr plating is applied on a steel plate in a Cr plating bath, whereafter the steel plate is reverse electrolyzed in the Cr plating bath to elute a part of the hydrated oxide film of Cr formed in the stage of the Cr plating and the anion of the assistant codeposited on the hydrated oxide film of Cr. The steel plate is then thoroughly washed in an aqueous washing bath. Further the steel plate is subjected to the 1st electrolytic chromic acid treatment in a Cr acid treatment bath contg. chromic anhydride and a compd. of >=1 kind of chromate and dichromate as a base component, contg anions of the unavoidable impurity anions occuring in the base component and being not added with any assistant, at the low current density of 0.1-10A/dm<2> and 0.1-10coulomb/dm<2> quantity of electricity. The treated steel plate is subjected to the 2nd electrolytic chromic acid treatment by using another electrode at current density of >=10A/ dm<2>.

Description

【発明の詳細な説明】 本発明は金属クロム被膜とクロム水利酸化物被膜との密
着性およびクロム水和酸化物被膜とm科との密着性(優
れたレトルト処理用ディンフリー鋼板の製造方法に関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the adhesion between a metallic chromium coating and a chromium hydrated oxide coating, and the adhesion between a chromium hydrated oxide coating and a chromium hydrated oxide coating (a method for manufacturing a din-free steel sheet for retort treatment). It is something.

従来の二液方式は、金属クロムとクロム水利酸化物被膜
とを別々lこ析u3させるので、それぞれの析出量を容
易にコントロールすることができる利点があるが、二液
方式においては両液の液組成が異なるため、クロムめっ
き後の鋼板をそのまま電解クロム酸処理浴に移すと、ク
ロムめっき時に生成したクロム水和酸化物中に共析した
めっき助剤アニオンが最終製品の複膜中に残存したり、
#III!IN+に付着したクロムめっき敵が電解クロ
ム酸処理浴中に持ち込まれ、クロム水利酸化物被膜の析
出量が変動したり、部分的に溶出した助剤アニオンが再
析出したりするなどの不都合が生ずる。従って、クロム
めつき發電解クロム酸処理浴に至るまでの間に水洗を十
分に行なってこれを防止する必要があるが、クロムめっ
き後の水洗だけではクロムめっき時に生成「るクロム水
和酸化物中のクロムめつき助剤アニオンの除去が困難で
あり。特番こ、硫酸やその化合物を助剤とするクロムめ
っきにおいては、その後OJクロム酸酊液による電解り
し」ム酸処理を行なっても、At終的に生成したクロム
水和酸化物中に硫酸根が共析してm!膜との″#;省柱
番こ不都合を生じている。
In the conventional two-part system, the metal chromium and the chromium water-conserving oxide film are precipitated separately, so it has the advantage of being able to easily control the amount of each precipitation. Because the liquid composition is different, if the steel plate after chromium plating is directly transferred to the electrolytic chromic acid treatment bath, the plating aid anions eutectoided in the chromium hydrated oxide generated during chromium plating will remain in the final product composite film. or
#III! Chromium plating particles adhering to IN+ are brought into the electrolytic chromic acid treatment bath, causing problems such as fluctuations in the amount of chromium water-retaining oxide film deposited and re-precipitation of partially eluted auxiliary anions. . Therefore, it is necessary to thoroughly wash with water before chromium plating and electrolytic chromic acid treatment bath to prevent this, but washing with water after chromium plating alone will not remove the chromium hydrated oxide produced during chromium plating. It is difficult to remove the chromium plating auxiliary anions in the chromium plating solution.In chromium plating using sulfuric acid or its compounds as an auxiliary agent, it is difficult to remove the chromium plating auxiliary anions. , At, sulfate radicals are eutectoid in the finally formed chromium hydrated oxide, resulting in m! This is causing some inconvenience due to the lack of space between the membrane and the column.

この欠点を解消する方法として、クロムめっき後に該液
中で逆電解を施すことlこよってクロムめっき時に生成
したクロム水和酸化物やこの中の助剤アニオンを少なく
することができ、その後に電解クロム醸処理浴に至るま
での間に水洗を七分に行なって引続くクロム酸水溶液中
で電解りUム酸を施すことが耐レトルト処理性の改善に
極めて有効であることを見い出し、既に特願昭56−6
2766号(以後、原発間と称する)として提案しとこ
ろが、その後研究を重ねたところ、原発間は耐レトルト
処理性の改善に極めて有効であるが、クロム水和酸化物
被膜が不均−tこなる場合のあることが判明し、この欠
点を解決すべく研究を重ねた結果均一なりロム水1ee
化物被膜を得ることができ、レトルト処理性がざら番こ
改善されて本発明に至った・ 本発明は冷砥鋼板に片動20〜200q/−の金属クロ
ムめっきを施し、この金属クロム層表向に5〜50q/
dのクロム水和酸化物被膜を形成したティンフリー鋼I
Nに関するものである。金属クロム層は20q/wl以
下であるとマイクロクラック、ピンホールなどが多くな
って耐食性が劣り、また200岬/dより多くても耐食
洩の向上が望めないので、通常のクロムめっき鋼板は2
0〜200wv/−の金属クロム層を有している。
A method to overcome this drawback is to perform reverse electrolysis in the solution after chromium plating.Thus, it is possible to reduce the amount of chromium hydrated oxide produced during chromium plating and the auxiliary anions contained therein. We have found that washing with water for 7 minutes before entering the chromium brewing bath, followed by applying electrolytic chromic acid in an aqueous solution of chromic acid, is extremely effective in improving retort resistance, and we have already developed a special method. Gansho 56-6
No. 2766 (hereinafter referred to as "nuclear"), but after repeated research, it was found that "nuclear" was extremely effective in improving retort resistance, but that the chromium hydrated oxide film was uneven. As a result of repeated research to solve this drawback, it was found that uniform ROM water 1ee
A chemical compound film can be obtained, and the retort processability has been greatly improved, leading to the present invention. The present invention involves applying metallic chromium plating of 20 to 200q/- on one side to a cold-sharpened steel plate, and removing the surface of this metallic chromium layer. 5-50q/
Tin-free steel I with chromium hydrated oxide film formed
This is related to N. If the metal chromium layer is less than 20q/wl, there will be many microcracks and pinholes, resulting in poor corrosion resistance, and if it is more than 200q/wl, no improvement in corrosion resistance can be expected.
It has a metal chromium layer of 0 to 200 wv/-.

−力、水和クロ″天酸化物皮膜(以下、crOX 皮膜
という)が5雫/d以下であると所望の塗料密着性が望
めず、また50q/−より多いと外観が悪くなったり、
加工時にCrOx皮膜にクラックが入ったりして実用的
でない。さらにいえば、CrOx皮膜量は10〜3o雫
/dが実用範囲であり、最も望ましい。
-If the amount of hydrated chromium natural oxide film (hereinafter referred to as crOX film) is less than 5 drops/d, the desired paint adhesion cannot be expected, and if it is more than 50q/-, the appearance may deteriorate,
It is not practical because the CrOx film may crack during processing. Furthermore, the amount of CrOx coating is within the practical range of 10 to 30 drops/d, and is most desirable.

ティンフリー鋼板は塗装してはじめて食缶材料となるも
のであり、食缶として用いる場合には塗膜との密着性が
特に重畳である。この1711Mとの密着性および内容
物充填後の耐レトルト処理性に優れたティンフリー鋼板
を得るために、amまたはその化合物などのアニオンを
含む助剤を用いる汎用クロムめっき浴によるクロムめっ
き後、この浴中で0.1〜15クーロン/ddの逆電解
を施し、次いで水洗槽を介してクロム酸水#!淑中で電
解クロム酸処理を行う方法を原発間において提案してい
る0この方法により得られるティンフリー銅板は耐レト
ルト処理性の改善に極めて有効であるが、この処理だけ
ではCrOx皮膜が不均一になる場合があるのは前述の
通りである。
Tin-free steel sheets are used as food can materials only after being painted, and when used as food cans, the adhesion with the coating film is particularly important. In order to obtain a tin-free steel sheet with excellent adhesion to 1711M and excellent retort resistance after filling, this steel plate was plated with chromium in a general-purpose chromium plating bath using an auxiliary agent containing an anion such as am or its compound. Reverse electrolysis of 0.1 to 15 coulombs/dd is performed in the bath, and then chromic acid water #! is passed through the washing tank. We are proposing a method of electrolytic chromic acid treatment in the water between nuclear power plants.The tin-free copper plates obtained by this method are extremely effective in improving retort treatment resistance, but this treatment alone will cause the CrOx film to become uneven. As mentioned above, this may occur.

そこで、本発明においては、従来の如く脱脂酸洗した鋼
板番こ、硫酸やその化合物を助剤として含むクロムめっ
舎浴にてクロムめっきした後、この浴中て逆電解を施し
、クロムめっき時に生成したCF”**中に共析した8
04”−などの助剤アニオンを低減させた後に、電解ク
ロム酸処理を行うのであるが、この処理を以下に述べる
ような条件下で行うことを特長とする。   ゛ すなわち、電解クロム酸@珊を施すに際して、電解析出
する皮膜構造が均一でかつ耐レトルト処理性が良好なc
r” i膜を得るために、不可避的に不純物アニオンを
含有する以外は助剤を意図的に添加しないクロム酸水S
液の処理浴を用い、逆電解で荒れたCrOx皮膜を均一
に改質するために施す電解クロム酸III感m詔よびC
rOx皮膜量を確保するために施す電解クロム酸[24
6珊の2段#に分けて岡−処理浴あるいは別個の処理浴
中で電解クロム酸旭運を施す・ 本弛明で用いるクロム酸処理水溶液の主剤は、無水クロ
ム酸、クロム酸塩および重クロム酸塩から選択された少
なくとも1種の化合物で構成され、主剤に由来する可避
的不純物アニオンは含むものの助剤は意図的に添加され
ない0重クロム酸塩としては重クロム酸のアルカリ金属
塩、アルカリ土類金属塩、アンモニウム塩などが、また
クロム酸塩としてはクロム酸のアルカリ金属塩、アルカ
リ土類金1II4塩、アンモニウム塩などが適当である
が、特に化合物の¥!ii類は限足されることはない。
Therefore, in the present invention, after degreasing and pickling steel sheets as in the past, chromium plating is performed in a chromium plating bath containing sulfuric acid or its compounds as an auxiliary agent, and then reverse electrolysis is performed in this bath to complete the chromium plating. 8 co-deposited into the CF”** produced at the time.
After reducing the auxiliary anions such as 04"-, electrolytic chromic acid treatment is performed, and the feature is that this treatment is performed under the conditions described below. In other words, electrolytic chromic acid @ coral When applying c
In order to obtain the r''i film, chromic acid water S without intentionally adding any auxiliary agent other than unavoidably containing impurity anions.
Electrolytic chromic acid III sensitizer and C are applied to uniformly modify the CrOx film roughened by reverse electrolysis using a liquid treatment bath.
Electrolytic chromic acid applied to ensure the amount of rOx film [24
Electrolytic chromic acid treatment is applied in two stages of 6 corals in an Oka treatment bath or a separate treatment bath.The main ingredients of the chromic acid treatment aqueous solution used in this treatment are chromic anhydride, chromate, and heavy It is composed of at least one compound selected from chromates, and contains inevitable impurity anions derived from the main ingredient, but no auxiliary agents are intentionally added. 0 Dichromates include alkali metal salts of dichromic acid. , alkaline earth metal salts, ammonium salts, etc., and as chromates, alkali metal salts of chromic acid, alkaline earth gold 1II4 salts, ammonium salts, etc. are suitable, but in particular, compounds such as ¥! Class ii is not limited.

電解クロム酸水溶液浴のクロム酸と他の塩との組成は第
1処理と第2処理lこおいて同一でも良いし、電解条件
叫4こ応して異ならせても良い。
The composition of chromic acid and other salts in the electrolytic chromic acid aqueous solution bath may be the same in the first treatment and the second treatment, or may be different depending on the electrolytic conditions.

不可避的に不純物を含むクロム酸水溶液の#に度は特に
限定される必要はないがCrへ換算で10〜200 ?
/lの範囲が適当である。製置が10f/を未満では浴
の電気抵抗が増大し、整置器の電圧がオーバーしたり鋼
板が熱をもつなどの不都合を生じるので好ましくない。
The degree of # of the chromic acid aqueous solution that inevitably contains impurities does not need to be particularly limited, but it is 10 to 200 in terms of Cr.
A range of /l is appropriate. If the setting is less than 10 f/, the electrical resistance of the bath will increase, causing problems such as overvoltage of the setting device and heating of the steel plate, which is not preferable.

lた、200 f/lを超しても繻期の効果の向上をさ
ほど期待できず、浴の持出しによる経済的損失が大きい
ので望ましくない。このようなりロム酸処理浴の浴温は
35〜60℃が適当である035℃より低いと夏場の冷
却水温の上昇により温度管理が難しくなり、60cより
高いとクロム破水atに耐える電解槽の材質が限足され
る。 、 クロムめっき後同液中で逆電解を施すと、クロムめっき
時に形成されたCr0K皮膜が溶解され、この時同時に
あるいは終了後に従前の陰極Cr  皮膜と異質な陽極
Cr  皮膜が金属クロム層上に形成される。この皮膜
形成により金属クロムの露出が従前の簾極皮膜に比べて
少ないことが明らかになっているが、クロムめっきに用
いる助剤のat類および浴ra度ならびに逆電解条件に
よっては陽極的に形成されたCrOx皮膜の一部に異常
析出がみられる場合がある。この皮膜の上に従来より行
われている二液方式における電解クロム酸処理を施すと
、耐レトルト処瑞性は良好だがCrOx皮膜の異常析出
か認められることがあった〇 これを回避する方法について助剤を意図的に添加せず、
不可避的不純物アニオンを含むクロム酸水#l淑につき
種々の検討を行ったところ、まず最初番こクロム酸水溶
液中で低電流密度および低電気量で電解クロム1l11
1処理を施すことが効果的であることがわかつ1こ0 電解クロム酸処塩時には、陰極において水の電気分解に
より塩ガスが発生し、陰極近傍の−は上昇するQこれ壷
こ伴って低原子価のクロムイオンに水酸基や水分子が配
位した1合度の高いオール化合物が形成される。本発明
では低電RvB度かつ低電気蓋でクロムt11第1処壌
を施すことによってCr0X皮展をできるだけ生成しな
いようにし、かつ電j!ll終了Iji後のクロム酸水
浴液への溶解を促進させるのでCr  皮膜は薄く均一
に形成され60本@明による電解クロム酸第1処理後理
電解で金属クロム上に形成されたli!極CrOx皮膜
が荒れた場合にCr  皮膜を改質して均一にならしめ
るために施すものであり、CrOx皮膜飯の増大を目的
とするものではない0電解時の陰極近傍の戸は重クロム
酸塩やクロム酸塩の組成が高まる程上井し、無水クロム
酸のみの浴ではその反対であるO従って、両者では電解
時に形成されるCrOx皮膜のオール結合の割合も異な
り、電解時のCr  皮膜の溶解生成の繰り返しと電解
終了ik後の溶解挙動も異なるが、いずれにおいても電
解クロム酸第1処暑後形成されたCr0xFILjI!
は均一になっているO 本斃@における電解クロムl12第1処理の電解条件は
、α1−1OA/&の低電fifM度で、0−1〜10
クーロン/6dの低電気量とするのが良い〇電流密度が
0.1ム/−未満では所期の目的が達せられず、10ム
/Mを超えるとCr0X量の析出異常が生じ不都合を生
じることがある。また、電気量がα1ク一ロン/6d未
満では所期の目的が達せられず、10クーロン/υを超
えるとCrOx量が過多となり、析出異常を生じ不都合
を生じることがある。
Furthermore, even if it exceeds 200 f/l, it is not desirable to expect much improvement in the effect of the coagulation period, and the economic loss due to taking out the bath will be large. Therefore, the appropriate bath temperature for the romic acid treatment bath is 35 to 60°C. If it is lower than 0.35°C, temperature control will become difficult due to the increase in cooling water temperature in summer, and if it is higher than 60°C, the material of the electrolytic cell can withstand chromium water rupture. is limited. When reverse electrolysis is performed in the same solution after chromium plating, the Cr0K film formed during chromium plating is dissolved, and at the same time or after completion of the process, an anode Cr film different from the previous cathode Cr film is formed on the metallic chromium layer. be done. It has been revealed that due to the formation of this film, the exposure of metallic chromium is less than that of the conventional blind electrode film, but depending on the at type of auxiliary agent used for chromium plating, the bath Ra degree, and the reverse electrolytic conditions, the metal chromium may be formed anodically. Abnormal precipitation may be observed in a part of the CrOx film. When electrolytic chromic acid treatment using the conventional two-component method is applied to this film, the retort treatment resistance is good, but abnormal precipitation of the CrOx film is sometimes observed. How to avoid this. Without intentionally adding auxiliary agents,
After conducting various studies on chromic acid solution #1 containing unavoidable impurity anions, we first found that electrolytic chromium 1l11 was produced at low current density and low electrical quantity in chromic acid aqueous solution.
1 treatment was found to be effective and 1-0. During electrolytic chromic acid treatment, salt gas is generated by electrolysis of water at the cathode, and - near the cathode rises. An all compound with a high degree of integration is formed in which a hydroxyl group or a water molecule is coordinated with a valent chromium ion. In the present invention, the first treatment of chromium t11 is performed with a low electric RvB degree and a low electric lid, thereby minimizing the generation of Cr0X skin, and in addition, electric j! After the first treatment with electrolytic chromic acid, the Cr film is formed thin and uniformly because it accelerates its dissolution in the chromic acid water bath after the completion of Iji. This is applied to modify the Cr film to make it uniform when the polar CrOx film becomes rough, and is not intended to increase the CrOx film thickness.The area near the cathode during zero electrolysis is treated with dichromic acid. The higher the composition of salts and chromates, the opposite is the case in a bath containing only chromic anhydride. Therefore, the ratio of all bonds in the CrOx film formed during electrolysis is also different between the two, and the CrOx film during electrolysis is The repetition of dissolution and formation and the dissolution behavior after the end of electrolysis are also different, but in both cases, Cr0xFILjI! formed after the first treatment with electrolytic chromic acid!
The electrolytic conditions for the first electrolytic chromium l12 treatment in this study are at a low electric fifM degree of α1-1OA/&, and from 0-1 to 10
It is better to use a low electrical quantity of coulomb/6d. If the current density is less than 0.1 μm/-, the intended purpose cannot be achieved, and if it exceeds 10 μm/M, abnormal precipitation of Cr0X amount will occur, causing inconvenience. Sometimes. Further, if the amount of electricity is less than α1 coulombs/6d, the intended purpose cannot be achieved, and if it exceeds 10 coulombs/υ, the amount of CrOx becomes excessive, which may cause abnormal precipitation and cause problems.

以上述べたように、電解クロム酸#11処理により逆電
解で荒れたCrOx皮膜が改質される0さらに、本発明
においては、クロム酸第1処理後に、謳1処環で用いた
のと同組成または異組成の浴を用いて以下に述べるよう
な電解条件で電解クロム駿s2処理を施すのが効果的で
ある。
As described above, the CrOx film roughened by reverse electrolysis is modified by the electrolytic chromic acid #11 treatment.Furthermore, in the present invention, after the first chromic acid treatment, the same It is effective to carry out the electrolytic chromium s2 treatment using a bath with a different composition or a different composition under the electrolytic conditions described below.

電層条件はcr  sL重量を確保するために必簀な電
気量を与えるものであって特に限定はないが、電解クロ
ム酸第2処理の電流密度は10〜80A/−の範囲が良
い。電流密度がIOA/dm’未満であると所望のCr
Ox皮膜量を確保するのに電解時間が長すぎて実用的で
なく、80ム/ddを超えるとC,OX FjLBの異
常析出が生ずる場合があるからである0また、電解クロ
ム酸wI2処理の浴組成は電解クロム酸第1処理液と同
じでも良いが、仮に第1処理浴がクロム酸塩や電クロム
酸塩の組成が大部分を占める場合には電解量が多il#
こ必要となるので、この場合番こは無水クロム酸の組成
の多い俗にする刀が経済的に望ましい。
The conditions for the electrolytic layer are those that provide the necessary amount of electricity to ensure the CR sL weight, and are not particularly limited, but the current density for the second electrolytic chromic acid treatment is preferably in the range of 10 to 80 A/-. When the current density is less than IOA/dm', the desired Cr
This is because the electrolysis time is too long to ensure the amount of Ox film, making it impractical, and if the electrolysis time exceeds 80 μm/dd, abnormal precipitation of C, OX FjLB may occur. The bath composition may be the same as the electrolytic chromic acid first treatment solution, but if the first treatment bath is composed mostly of chromate or electrochromate, the amount of electrolysis may be large.
In this case, it is economically desirable to use a sword with a high composition of chromic anhydride.

次に本発明による処理につき具体的に脱明する。Next, the processing according to the present invention will be explained in detail.

板厚0.22mの冷延鋼板を常法による脱脂、酸洗の前
処理を施した後に、Cros250 f/l 。
A cold-rolled steel plate with a thickness of 0.22 m was subjected to pretreatment of degreasing and pickling using conventional methods, and then subjected to Cros250 f/l.

H,80,2,5f/lを含有するクロムめっき浴で、
浴温55℃、電流密度60ム、7th+/で1.0秒の
電解を行った。この時のCrOx皮膜のEPMAによる
ラインアナリシスを1tl1図に示す。クロムめっき後
直ちに同液中で15A/ds/の電1!it密度で02
秒間の逆電解を施した。この時のCrOx皮膜のEPM
Aによるラインアナリシスを[2図に示す〇このクロム
めっき鋼板を十分に水洗した後、Cry、 50 t/
l % Na、Cr、Q、  10 f/lなる組成で
、不可避的な不純物アニオンを含む浴1!40℃のクロ
ム酸水1ml!液中で5ム/ddの電RWj度テ0.2
秒の電解クロム酸第1処理ヲ施した0この時のCr0X
皮膜のEPMA[よるラインアナリシスを第3図に小す
0この第1処理後、無水クロム酸60t/lを含み、浴
温40℃のクロム酸水浴液中で15A/Mの電流密度で
10秒の電解クロム酸第2処理を施した0この時のCr
  皮膜のEPMAによるラインアナリシスを第4図に
示す。また、400倍の光学顕微鏡写真を第6図に示−
f0比較として、クロムめっき後同淑中で5秒浸漬後無
水クロム酸601/lを含み40℃のクロム酸浴中で1
5A/ 4d X 1.9秒の電解クロム酸処理を施し
た時のCr”BLllN)EPMAによるラインアナリ
シスを第5図に、400倍光学顕微鏡写真を第7図に示
すO ラインアナリシスの結果をみると、本発明の処理を施し
た第3図および第4図に示すものは、クロムめっき後の
もの(第1図)、逆電解後のもの(第2図ン、従来の電
解クロム酸処理抜のもの(第5図)に比べて、CrOx
の異常析出が少なく、皮膜が均一であることがわかる。
A chromium plating bath containing H, 80, 2, 5 f/l,
Electrolysis was performed for 1.0 seconds at a bath temperature of 55° C., a current density of 60 μm, and 7th+/. Line analysis of the CrOx film at this time by EPMA is shown in Figure 1tl1. Immediately after chromium plating, a current of 15 A/ds/ was applied in the same solution! 02 in it density
Reverse electrolysis for seconds was applied. EPM of the CrOx film at this time
Line analysis by A [shown in Figure 2] After thoroughly washing this chromium-plated steel plate with water, cry, 50 t/
Bath 1 with a composition of 1% Na, Cr, Q, 10 f/l and containing unavoidable impurity anions! 1ml of chromic acid water at 40°C! Electricity RWj degree Te 0.2 of 5 m/dd in liquid
The Cr0X at this time was subjected to the first electrolytic chromic acid treatment for seconds.
Figure 3 shows a line analysis of the film using EPMA. After this first treatment, it was heated for 10 seconds at a current density of 15 A/M in a chromic acid water bath containing 60 t/l of chromic anhydride and at a bath temperature of 40°C. The Cr at this time was subjected to the second electrolytic chromic acid treatment.
Figure 4 shows line analysis of the film by EPMA. In addition, an optical micrograph at 400x is shown in Figure 6.
As a f0 comparison, after chromium plating, it was immersed in the same vinegar for 5 seconds and then immersed in a chromic acid bath containing 601/l of chromic anhydride at 40°C.
Figure 5 shows line analysis using Cr"BLllN) EPMA when electrolytic chromic acid treatment was applied for 5A/4d x 1.9 seconds, and Figure 7 shows a 400x optical micrograph. See the results of O line analysis. The products shown in Figures 3 and 4 that have undergone the treatment of the present invention are those after chromium plating (Figure 1) and those after reverse electrolysis (Figure 2) without conventional electrolytic chromic acid treatment. CrOx (Fig. 5)
It can be seen that there is little abnormal precipitation and the film is uniform.

また、顕am写真をみると、本発明によるもの(第6図
)にはCrOx皮膜が均質でむらがないのが明瞭である
が、従来の電解クロム酸処理によるもの(第7図)−こ
はCrO3皮換の不均一なむら(黒い斑点状Iこ見える
)が多数生成しているのがわかる。
Furthermore, looking at the X-ray micrograph, it is clear that the CrOx film formed by the present invention (Fig. 6) is homogeneous and even, but the CrOx film formed by the conventional electrolytic chromic acid treatment (Fig. 7) is clear. It can be seen that a large number of uneven CrO3 skin changes (black spots visible) are generated.

上記の本発明例および比較例につき、Cr  皮膜のむ
らの判定および後述するようなT型剥離試験結果を下表
1に示す。
Table 1 below shows the determination of unevenness of the Cr film and the results of the T-peel test as described below for the above-mentioned inventive examples and comparative examples.

表1 (Cr”量の測足) 作成したに科を100℃、5oot7tのカ性ソーダ#
!敵4こ10分関浸漬したwIJ後のCr量測定値の差
より検量線を用いて足置した0crOX量の測足は螢光
Xll法(Xray 40 KV6Gmム、モニター6
0秒〕によった。
Table 1 (Measurement of amount of Cr) Prepared caustic soda #100℃, 5oot7t
! The amount of 0crOX was measured using the calibration curve based on the difference in the measured Cr amount after 10 minutes of wIJ immersion in the water.
0 seconds].

(KPMAの測足〕 Cr0X皮膜をカーボン膜で固定し、次いで素地鎖側か
ら金塊クロムをナイタールで溶解した後、清浄な白金箔
上にのせ、EPMAでラインアナリシスを行った。
(KPMA foot measurement) The Cr0X film was fixed with a carbon film, and then the gold ingot chromium was dissolved with nital from the base chain side, and then placed on a clean platinum foil, and line analysis was performed using EPMA.

加速電圧 20KV 電子ビーム強度  0.02μ人 ビ  −  ム  径   2P 次に本発明を実施例につき具体的に説明する〇〔実施例
1〕 板厚022層の冷延鋼板を5%ホメサゾン溶液中で80
℃、15ム/d、/の電流密度で10秒間の電解脱脂を
行った後に水洗し、常温10X′の硫酸中に5秒間浸漬
して水洗した後下記の条件で本処理を行った。
Accelerating voltage: 20KV Electron beam intensity: 0.02μ Human beam diameter: 2P Next, the present invention will be explained in detail with reference to examples.〇 [Example 1] A cold-rolled steel plate with a thickness of 022 was soaked in a 5% homethazone solution at 80KV.
After electrolytic degreasing for 10 seconds at a current density of 15 μm/d, /, the sample was washed with water, immersed in 10X' sulfuric acid at room temperature for 5 seconds, washed with water, and then subjected to the main treatment under the following conditions.

クロムめっき処理 浴組成 cro、  250 f/l H,So、    2.5 t/を 浴    温   55℃ 電解条件 s o VdylIx i、 s秒上記クロ
ムめっき後同液中で次の条件で逆電解処理を施した〇 逆電解条件  15 A/dd x 0.2秒この後水
洗し、直ちに以下の条件で電解クロム醒処理を施した0 電解クロム酸第1処理 浴鳳成 Cry、  50 t / LNa、Crρ、
   10f/を 浴    温   40℃ 電解条件 5V讐X0.2秒 電解クロム酸11r2処理 浴組成 Cry、  50 y / を幽、crzOt
   i Of / I−浴    温   40℃ 電解条件 I S A/dj x 1.0秒電解クロム
1lilI[2処waitちに水洗してさらに湯洗価乾
燥して試料を作成した〇 〔実施例2〕 下記の条件で電解クロム酸処理を行った以外は実施例1
と同様の処理を行つ7L 。
Chromium plating treatment bath composition Cro, 250 f/l H, So, 2.5 t/ bath Temperature 55°C Electrolytic conditions s o VdylIx i, s seconds After the above chromium plating, reverse electrolytic treatment was carried out in the same solution under the following conditions. Reverse electrolysis conditions: 15 A/dd x 0.2 seconds After that, it was washed with water and immediately subjected to electrolytic chromium cleaning treatment under the following conditions. ,
10 f/ bath temperature 40°C Electrolysis conditions 5 V × 0.2 seconds Electrolytic chromic acid 11r2 treatment bath composition Cry, 50 y/g, crzOt
i Of / I-bath Temperature 40℃ Electrolytic conditions I S A / dj x 1.0 seconds Electrolytic chromium 1 lil I [2 samples were prepared by washing with water and then washing with hot water and drying [Example 2] Example 1 except that electrolytic chromic acid treatment was performed under the following conditions.
7L performs the same process as .

電解クロム酸第1処理 浴組成 C鶴 50 tit ”f”Oa   10 f / を 浴    温   40℃ 電解条件 10 Vds/ x O,2秒電解クロム酸
第2処理 浴組成 crOJ601/を 浴    !    40℃ 電解条件 10 iv’d、d x 1.0抄〔実施例
3〕 下記の条件で電解クロム酸処理を行った以外は実施例1
と同様の処理を行った。
Electrolytic chromic acid 1st treatment bath composition C Tsuru 50 tit "f" Oa 10 f/ bath Temperature 40℃ Electrolytic conditions 10 Vds/ x O, 2 seconds Electrolytic chromic acid 2nd treatment bath composition crOJ601/! 40℃ Electrolytic conditions 10 iv'd, d x 1.0 [Example 3] Example 1 except that electrolytic chromic acid treatment was performed under the following conditions.
The same process was performed.

電解クロム!I2第1処理 浴組成 Na、Cr、0. 60 y / を浴   
 温   40℃ 電解条件 5 A /dpd x O,2秒電解りロム
!l第2処理 浴組成 Cryj60 t / を 浴    温   40℃ 電解条件 10 A/ds/ x 1.0秒〔比較例1
〕 前記のクロムめっき後同液中で5秒間浸漬し、下記の条
件で電解クロム酸処理を打った以外は実施例1と同様の
処理を行った。
Electrolytic chrome! I2 First treatment bath composition Na, Cr, 0. 60 y / bath
Temperature: 40℃ Electrolysis conditions: 5 A/dpd x O, 2 seconds electrolysis ROM! Second treatment bath composition Cryj60 t / bath Temperature 40°C Electrolysis conditions 10 A/ds/ x 1.0 seconds [Comparative Example 1
] After the chromium plating, the same treatment as in Example 1 was performed, except that the sample was immersed in the same solution for 5 seconds and subjected to electrolytic chromic acid treatment under the following conditions.

電解クロム酸処理 浴組成 Cry、   601/L 潜    温   40C 電解条件 15 Vd+st’ X 1.0秒〔比較例
2〕 前述のクロムめっき後同液中で5秒間浸漬し、下記の条
件で電解クロム酸処理を行った以外は実1a例1とIW
J様の処理を行った。
Electrolytic chromic acid treatment bath composition: Cry, 601/L Latent temperature: 40C Electrolytic conditions: 15 Vd+st' Actual 1a Example 1 and IW except for the treatment
I did the processing for Mr. J.

電解クロム#第1処理 浴組成 Cry、  50 f / jNa、CrA1
0 t / l− 浴    温   40℃ 電解条件 5ム/dd x O,2秒 電解りロム駿第2拓珊 浴組成 Cr0,50f/l Na、Cr、CI、   10 t / を浴    
温   40℃ 電解条件 15 A/4111′X 1.0秒以上のよ
うにして得られたティンフリー鋼板に対してT璽剥離試
験を行った・ 上記各ティンフリー鋼板の片面を50±lv/υでサイ
ジング塗装し、190℃で10分焼付した後、残った反
対面に同量のゴールド塗装を施し、21O℃で10分の
焼付を行った。この後、サイジング塗装した面とゴール
ド皺襞した面との間にナイロン系の接着用合成樹脂7−
−プ(厚み100 pwa 、幅5 M )を挟み、ホ
ットプレスにより190℃、1−/−で30秒間の圧着
を竹って接着させ、複数個のテストピースを作成した。
Electrolytic chromium #1 treatment bath composition Cry, 50 f/jNa, CrA1
0 t/l- Bath temperature 40°C Electrolysis conditions 5mm/dd x O, 2 seconds electrolytic Rom Shun 2nd tank composition Cr0,50f/l Na, Cr, CI, 10 t/l
Temperature: 40°C Electrolytic conditions: 15 A/4111' After applying sizing coating and baking at 190°C for 10 minutes, the same amount of gold coating was applied to the remaining opposite side and baking was performed at 21°C for 10 minutes. After this, a nylon-based adhesive synthetic resin 7-
A plurality of test pieces were prepared by sandwiching a strip (thickness: 100 pwa, width: 5 M) and bonding by hot pressing at 190 DEG C. and 1-/- for 30 seconds.

これらの接着直後のテストピースについて、インストロ
ン引張り試験機を用いて200 w / mの一定引張
速度でT型剥離試験を行い、剥m強iを測定した〇 さらに、別のテストピースを用いて蔗糖15f/lを含
み、くえん酸でpH3,3に調整した糖酸液に70℃で
7日間浸漬した後の剥離強度を前記と同じ条件で測定し
た。
For these test pieces immediately after adhesion, a T-peel test was conducted using an Instron tensile tester at a constant tensile speed of 200 w/m to measure the peel strength i.Furthermore, using another test piece, The peel strength was measured under the same conditions as above after being immersed in a sugar acid solution containing 15 f/l of sucrose and adjusted to pH 3.3 with citric acid at 70°C for 7 days.

いずれの試験も各テストピースを5個づつ用いて行った
。試験結果を下表2に示すが、結果はその平均値で示−
(。接着直後のT型剥離試験値は塗装後の塗膜の密着性
を判定するものである1、また高温殺菌などのレトルト
処理を行う場合に、塗膜を透過して侵入してきた水に溶
解するCrOxの成分が多いと、塗膜とCr  との間
の接着力が低下し、耐レトルト処理性が悪くなる。70
℃、7日間浸漬後のT層剥離試験値はこの評価を行うも
のである。
All tests were conducted using five test pieces of each test piece. The test results are shown in Table 2 below, and the results are shown as the average value.
(The T-peel test value immediately after adhesion is used to judge the adhesion of the paint film after painting1. Also, when performing retort treatment such as high temperature sterilization, water that has penetrated through the paint film If there is a large amount of dissolved CrOx, the adhesive force between the coating film and Cr will decrease, and retort treatment resistance will deteriorate.70
The T layer peeling test value after 7 days of immersion at ℃ is used for this evaluation.

また、表2の試験結果から、本発明iこよるティンフリ
ー鋼板(実施例1〜3)においてはCrOx皮膜にむら
の発生もなく、耐レトルト処理性も優れているが、従来
例1および2においてはCrOX皮膜にむらが発生し、
耐レトルト処理性も劣っていることが明らかである。
In addition, from the test results in Table 2, the tin-free steel sheets according to the present invention (Examples 1 to 3) have no unevenness in the CrOx film and have excellent retort treatment resistance, but the conventional examples 1 and 2 In this case, unevenness occurs in the CrOX film,
It is clear that the retort resistance is also poor.

以上説明した処から明らかなように、本発明によれば塗
料との密着性や耐レトルト処理性の良好なCrOx皮膜
の均質なティンフリー鋼板が得られ、これはレトルト処
理用コーヒー缶や食缶の他、接着缶であればがロン缶や
雑缶にも利用できる0また、塗装に用いる塗料はサイジ
ングまたはゴールドと称される塗料に限らず、有機溶剤
による塗料であれば良く、また接着剤もナイロン系のみ
#c[足されることはない。
As is clear from the above explanation, according to the present invention, a homogeneous tin-free steel sheet with a CrOx film having good adhesion with paint and retort treatment resistance can be obtained, and this can be used for coffee cans and food cans for retort treatment. In addition, adhesive cans can also be used for long cans and miscellaneous cans.In addition, the paint used for painting is not limited to paints called sizing or gold, but any paint made with an organic solvent may be used. Also, only nylon type #c [will not be added.

表2Table 2

【図面の簡単な説明】[Brief explanation of drawings]

wi1図はクロムめっき後のCrOx皮膜のEPMムラ
インアナリシス図、第2図は逆電解後のCrO3皮績の
EPMAラインアナリシス図、第3図は電解クロム酸a
11処理彼のC,OX皮膜のEPMムラインアナリシス
図、第4図は電解クロム酸jI2処理後のCrOx皮膜
のEPMムラインアナリシス図、薦5図は従来の電解ク
ロム酸処理後のCrOx皮膜のEPMAラインアナリシ
ス図、第6図および第7図は金属の表面組織の400倍
尤学顕黴鏡写真であり、96図は第4図と同一試料の顕
微鏡写真、117図は纂5図と同一試料の顕黴傭写真で
ある。 特許出願人  川崎製鉄株式会社 鼠1図 6 ¥2図 城3図 城4図 8A 臓50 48声
Figure wi1 is an EPM mu line analysis diagram of CrOx film after chromium plating, Figure 2 is an EPMA line analysis diagram of CrO3 film after reverse electrolysis, and Figure 3 is an electrolytic chromic acid a
Fig. 4 is an EPM mullline analysis diagram of the CrOx film after treatment with electrolytic chromic acid, and Figure 5 is the EPMA line of the CrOx film after conventional electrolytic chromic acid treatment. Analysis diagrams, Figures 6 and 7 are 400x magnification microscope photographs of the surface structure of metals, Figure 96 is a microscope photograph of the same sample as Figure 4, and Figure 117 is a microscope photograph of the same sample as Figure 5. This is a photo taken by Kenko. Patent Applicant: Kawasaki Steel Co., Ltd. Mouse 1 Figure 6 ¥2 Figure Castle 3 Figure Castle 4 Figure 8A Internal organs 50 48 voices

Claims (1)

【特許請求の範囲】[Claims] クロムめっき浴とこれに対して水洗浴を隔てて分離され
た電解クロム酸処理浴とを用い、鋼板上に金属クロム被
膜とこれに重ねて被成したクロム水利酸化物主体の被膜
とを有するティンフリー鋼板を製造するに当り、クロム
めっき浴にて鋼板にクロムめっきを施した優クロムめっ
き浴中で逆電解を施し、クロムめっき時に生成したクロ
ム水利酸化物被膜の一部ならびにクロム水利酸化物被膜
中に共析した助剤アニオンを溶出せしめ、この後番こ水
洗浴にて十分な水洗を行い、次いで主剤として無水クロ
ム酸、クロム酸塩および重クロムal塩から選択された
少なくとも1種の化合物を含有し、主剤に由来する不可
避的不純物アニオンを含み助剤を意図的に添加しないク
ロム酸処理浴で0.1〜10んへ−の低電流密度、0.
1〜10クーロン/υの低電気量で電解クロム酸亀1処
理を行い、引會絖会10ム/−以上の電流密度で前記第
1処理とは別個の電極を用いて電解クロム酸II2処運
を行うことを特徴とするティンフリー鋼板の製造方法C
Using a chromium plating bath and an electrolytic chromic acid treatment bath separated from the bath by a water washing bath, the steel plate has a metallic chromium coating and a coating mainly composed of chromium water-conserving oxide formed on the steel plate. In manufacturing free steel sheets, reverse electrolysis is performed in a chromium plating bath in which the steel sheet is plated with chromium, and a part of the chromium water-retention oxide film generated during chromium plating and the chromium water-retention oxide film are removed. The auxiliary anion eutectoided in the mixture is eluted, and then thoroughly washed with water in a washing bath, and then at least one compound selected from chromic anhydride, chromate, and dichromium Al salt is added as the main ingredient. A low current density of 0.1 to 10 mph in a chromic acid treatment bath containing unavoidable impurity anions originating from the base agent and without intentional addition of auxiliary agents;
Electrolytic chromic acid 1 treatment is carried out with a low electricity amount of 1 to 10 coulombs/υ, and electrolytic chromic acid II 2 treatment is carried out using a separate electrode from the first treatment at a current density of 10 μm/- or more. Manufacturing method C of tin-free steel plate characterized by performing luck
JP6154782A 1982-04-13 1982-04-13 Production of tin-free steel plate Granted JPS58177490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6154782A JPS58177490A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6154782A JPS58177490A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Publications (2)

Publication Number Publication Date
JPS58177490A true JPS58177490A (en) 1983-10-18
JPS6123280B2 JPS6123280B2 (en) 1986-06-05

Family

ID=13174252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6154782A Granted JPS58177490A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Country Status (1)

Country Link
JP (1) JPS58177490A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103200A (en) * 1983-11-10 1985-06-07 Kawasaki Steel Corp Tin-free steel having excellent adhesive properties
JPS60114595A (en) * 1983-11-25 1985-06-21 Kawasaki Steel Corp Tin-free steel having superior adhesive property

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1187785A (en) * 1966-03-26 1970-04-15 Fuji Iron & Steel Co Ltd Chromate-Coated Chromium Plated Steels and Two-Step processes for the preparation thereof by Electrolytic Treatment
JPS5425894A (en) * 1977-07-29 1979-02-27 Vysoka Skola Chem Tech Method and apparatus for recycling liquid
JPS5610996A (en) * 1979-07-06 1981-02-03 Tanaka Precious Metal Ind Repairing material for disconnected circuit foil on printed circuit board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1187785A (en) * 1966-03-26 1970-04-15 Fuji Iron & Steel Co Ltd Chromate-Coated Chromium Plated Steels and Two-Step processes for the preparation thereof by Electrolytic Treatment
JPS5425894A (en) * 1977-07-29 1979-02-27 Vysoka Skola Chem Tech Method and apparatus for recycling liquid
JPS5610996A (en) * 1979-07-06 1981-02-03 Tanaka Precious Metal Ind Repairing material for disconnected circuit foil on printed circuit board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60103200A (en) * 1983-11-10 1985-06-07 Kawasaki Steel Corp Tin-free steel having excellent adhesive properties
JPS6234838B2 (en) * 1983-11-10 1987-07-29 Kawasaki Steel Co
JPS60114595A (en) * 1983-11-25 1985-06-21 Kawasaki Steel Corp Tin-free steel having superior adhesive property
JPS6234839B2 (en) * 1983-11-25 1987-07-29 Kawasaki Steel Co

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JPS6123280B2 (en) 1986-06-05

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