JPS58177106A - Multi-stage type high flow speed gas-liquid contact apparatus - Google Patents

Multi-stage type high flow speed gas-liquid contact apparatus

Info

Publication number
JPS58177106A
JPS58177106A JP57061400A JP6140082A JPS58177106A JP S58177106 A JPS58177106 A JP S58177106A JP 57061400 A JP57061400 A JP 57061400A JP 6140082 A JP6140082 A JP 6140082A JP S58177106 A JPS58177106 A JP S58177106A
Authority
JP
Japan
Prior art keywords
gas
liquid
liquid contact
tower
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57061400A
Other languages
Japanese (ja)
Other versions
JPS6354403B2 (en
Inventor
Toshihiro Ueno
上野 敏博
Masahisa Ishida
政久 石田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JGC Corp
Original Assignee
JGC Corp
Japan Gasoline Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JGC Corp, Japan Gasoline Co Ltd filed Critical JGC Corp
Priority to JP57061400A priority Critical patent/JPS58177106A/en
Publication of JPS58177106A publication Critical patent/JPS58177106A/en
Publication of JPS6354403B2 publication Critical patent/JPS6354403B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

PURPOSE:To enhance gas-liquid contact efficiency, by a method wherein plural upright pipes are arranged in a tower so as to be separated to each other in an upper and a lower directions to narrow a gas-liquid flow passage and a gas- liquid contact means consisting of a gas-liquid contact part and a gas-liquid separation part is provided in a multi-stage fashion. CONSTITUTION:When a gas is sent from a gas supply pipe 2 while a liquid is supplied from a liquid supply nozzle 8, the gas and the liquid are violently and sufficiently contacted mainly in an upright pipe 5. After gas-liquid contact, a gas-liquid mixture reaches the upper space of the upright pipe 5 while liquid droplets are scattered to the direction of a tower inner wall by the abrupt reduction in a gas speed and the variation of a gas flow speed to carry out gas- liquid separation. Subsequently, the gas accompanying a slight amount of mist reaches the lower end of the next upright pipe in the next stage and raised therethrough to again carry out gas-liquid contact with the liquid supplied and sprayed by the liquid supply nozzle 8 in the lower and the upper spaces thereof. As the result, gas-liquid contact efficiency is extremely increased.

Description

【発明の詳細な説明】 本発明は気液接触部及び気液分#1llsからなる気液
接触段を多段に設けることにより一場で烏吸収率が得ら
れる多段式高流速気准接触鉄嵐に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multistage high flow rate gas quasi-contact iron storm that can obtain the absorption rate in one place by providing multiple gas-liquid contact stages consisting of gas-liquid contact portions and gas-liquid components #1lls. .

従来の気液接触装置としては棚段塔あるいは充填塔等が
一般4C用いられているが、これらはいずれも液体の飛
沫同伴や圧力損失の菖少対策を賛し、特にカスもしくは
液中に1合物、スラリー等がある場合には目詰りを起し
、トラブルの原因となるものであった。また、この他に
気庖塔も用いられるが、液中VCガスを分散させるため
の分散板の工夫が必賛であり、さらにこの場合はカス空
筒速度が著しく小さく、大容量のカスや流体の処理には
適さない。
As a conventional gas-liquid contact device, plate towers or packed towers are generally used, but these all take measures to reduce entrainment of liquid and pressure loss. If there is a compound, slurry, etc., clogging occurs and causes trouble. In addition, a gas tower is also used, but it is essential to use a dispersion plate to disperse the VC gas in the liquid.In addition, in this case, the waste cylinder velocity is extremely low, and a large volume of waste and fluid It is not suitable for processing.

大容量のカスや流体を処理すべく、カス空筒速度を大き
くし友ものとして高流速型気液接触装置m(以後、尚流
速鉄筒という)があり、特公昭5B−3365″〇−号
、特公昭55−32411号、特開昭55−13117
号として公知である。これら烏流速装瀘では場内にイン
ターナルがなく、供給ガスを高流速で液と向流または並
流接触させることにより吸収寺の操作を行うものである
In order to process a large volume of waste and fluid, there is a high flow rate type gas-liquid contact device m (hereinafter referred to as a flow rate iron tube) that increases the speed of the waste cylinder. , JP 55-32411, JP 55-13117
It is known as No. These flow rate systems do not have internals in the chamber, and the absorption chamber is operated by bringing the supply gas into countercurrent or cocurrent contact with the liquid at a high flow rate.

しかしながら、従来の尚流迷鋏直、例えば特公昭55−
32411号公報に記載されるような装置vcあっては
後述するように場内の圧力損失は故供給部付近で大きく
接触率も^いものの、それ以上の塔高部分では気1&接
触は、必ずしもm効に行われているとは菖えなかった。
However, the conventional Shoryu Meisashi Nao, for example, Tokuko Sho 55-
In the case of a vc device such as that described in Publication No. 32411, as will be described later, the pressure loss in the field is large near the feed section and the contact rate is low, but in the higher part of the column, the gas 1 & contact is not necessarily m. I couldn't see that it was being carried out effectively.

やLつて会費な接触効率を得るには直列に複a塔設ける
こ・とが不可欠となり、コスト及び紋ti1園棟が大に
なる等の欠点をMするものであっに0 本発明者等は高流速装置Vcおける前述の欠点を改嵜す
べく、研死を重ねた結果、塔頂付近の敵の流動状態が濡
れ壁状となっていることを突きとめ、本発明をなすに至
った。即ち、本発明は塔内vC俵数個の立管を上下方向
に離隔して配設し気液流路を狭くし、気液接触部及び気
液分離部からなる気液接触段を多段に設けることによ、
り接触効率を同上させたものである。
In order to obtain high contact efficiency, it is essential to install multiple A towers in series, which eliminates disadvantages such as increased cost and large size. As a result of repeated efforts to improve the above-mentioned drawbacks of the high flow rate device Vc, it was discovered that the flow state near the top of the tower was like a wet wall, leading to the present invention. That is, the present invention arranges several standpipes of vC bales in the column vertically apart from each other to narrow the gas-liquid flow path, and multi-stages the gas-liquid contact stage consisting of the gas-liquid contact section and the gas-liquid separation section. By establishing
The contact efficiency is the same as above.

以下に本発明を6付図面t−#照して説明する。The present invention will be explained below with reference to the attached drawings t-#.

第1図は本発明の一実施例を示すもので、梧lにはその
下側方にガス供給口2が、上部にはデミスタ−3が、そ
して上端部にはカス排出口4が設けられている。塔l内
には立t5が上下方向に所定の間隔をもって複数個配設
されている。これら立管5はその外縁下箋と塔lの内壁
との間隙を閉塞する底板6により塔内に固着され、塔内
壁、立管外壁及び底板により液受は部7が構成される。
FIG. 1 shows an embodiment of the present invention, in which a gas supply port 2 is provided at the bottom side of the goki l, a demister 3 is provided at the top, and a waste discharge port 4 is provided at the top end. ing. A plurality of standers t5 are arranged in the tower 1 at predetermined intervals in the vertical direction. These standpipes 5 are fixed in the tower by a bottom plate 6 which closes the gap between the lower edge of the outer edge and the inner wall of the tower 1, and a liquid receiver section 7 is constituted by the inner wall of the tower, the outer wall of the standpipe, and the bottom plate.

各立管5の略中央下端部付近Vc鉱液供給ノズル8がそ
の噴勝ノズルロが上向に開口するように設けられている
。各段の液供給ノズル8は立管5の内径に応じて複数個
設けられてもよい。また各液受けs7及び塔底端部lC
r1液を場外に排出する排出119が設けられている。
A Vc mineral liquid supply nozzle 8 is provided near the lower end of the substantially center of each standpipe 5 so that its jetting nozzle opening opens upward. A plurality of liquid supply nozzles 8 at each stage may be provided depending on the inner diameter of the standpipe 5. In addition, each liquid receiver s7 and the tower bottom end 1C
A discharge 119 is provided to discharge the r1 liquid out of the field.

縞2図祉本発明の他の央′hfllを示すもので、底板
6を上方、すなわち立t5の途中部分ec設けた場合を
示し、このようにすれば後述する気液分aSS域が拡大
することになる。
Stripe 2 Figure 2 shows another center 'hflll of the present invention, and shows the case where the bottom plate 6 is provided above, that is, in the middle of the vertical position t5, and in this way, the gas-liquid aSS area described later is expanded. It turns out.

tた、第3図は本発明のさらに他の実施例を示すもので
、第1図及び第2図に示し次装置では立管5を場内の略
中央部に各立管の中心軸線がほぼ一致するように配設さ
れるのに対し、この第3図に示す装置では各立管の中心
軸線が不一致になるように配設されてなる。
In addition, FIG. 3 shows still another embodiment of the present invention, in which the apparatus shown in FIGS. In contrast, in the apparatus shown in FIG. 3, the standpipes are arranged so that their central axes do not match.

このように本発明では場内に立wsを多段に配設し、こ
の立v5と塔内壁との間隙を底板6により閉塞すること
により、気液流路を狭くし次ととvc41徴を有するも
のである。このような本発明装置において、ガス供給口
2からガスを送気し、液供給ノズル8から液を供給する
と王として立管5内で気液が激しくしかも光分に砿触゛
シ次後ガス中の被吸収成分が液に吸収され、又は准中の
揮発性戚分岬がガス中に放散されて除去されることにな
る。かくして接触後、気液混合体は文官上方の空間に至
り、該空間が急減に拡大していることがら液滴はガス速
度の急減な減少と同時にカス流速の方向変換により塔内
壁方向に飛ばされ気液分離が行われる。次いで、若干の
ミストを同伴するガスは次段の立管下端に至り、そこで
丹び液供給ノズル8から猷が供給噴霧されて気液接触が
行われ、次いで立管5の上方空間で気液分離が行われる
ことになる。
In this way, in the present invention, the vertical v5 is arranged in multiple stages in the field, and the gap between the vertical v5 and the inner wall of the column is closed with the bottom plate 6, thereby narrowing the gas-liquid flow path and having the following and vc41 characteristics. It is. In such an apparatus of the present invention, when gas is supplied from the gas supply port 2 and liquid is supplied from the liquid supply nozzle 8, the gas and liquid are generated violently in the vertical pipe 5, and the gas comes into contact with light. The absorbed components in the gas are absorbed into the liquid, or the volatile components in the gas are dissipated into the gas and removed. After contact, the gas-liquid mixture reaches the space above the civil servant, and as this space rapidly decreases and expands, the droplets are blown toward the inner wall of the tower due to the sudden decrease in gas velocity and the change in direction of the waste flow velocity. Gas-liquid separation takes place. Next, the gas accompanied by a small amount of mist reaches the lower end of the next stage standpipe, where the gas is supplied and sprayed from the liquid supply nozzle 8 to cause gas-liquid contact, and then the gas and liquid are mixed in the space above the standpipe 5. A separation will take place.

分離された液は液受は部tVc導かれ、排出w9によ、
り塔底に溜った液とともに場外に排出される。図示して
ないが、ガスと接触後、分離された液は再生等の処理を
施された恢、再度、接触液として使用しても良いし、上
べの液受は部に溜まつ次液をそれより下段の液供給ノズ
ル8に液のヘッド差をオU用して送給しても良い。
The separated liquid is led to the liquid receiver part tVc and discharged through w9.
It is discharged outside the site along with the liquid that has accumulated at the bottom of the tower. Although not shown, the separated liquid after contact with the gas can be regenerated and used again as a contact liquid. The liquid may be fed to the liquid supply nozzle 8 at a lower stage by using the difference in liquid head.

このように、本発明装置にあっては主として立管内部及
びその立管上端の延長縁以内が気液接触部(〜とな、す
、また立管上方空間の王と′して立管上端の延長線と塔
内壁とで@l糾される置載が気液分m部(B)となって
いる。これら気液接触1!tl(A)及び気液分離部(
B)からなる気液接触段が複数段設けられ、従って本発
明鉄tjjLにあっては塔内の中央主峻部を構成する多
段の気液接触段、基底部領域及び塔頂S領域に大別され
る。
As described above, in the device of the present invention, the inside of the standpipe and the extended edge of the upper end of the standpipe are mainly the gas-liquid contact area (~), and the upper end of the standpipe is the main part of the space above the standpipe. The mounting line that is separated by the extension line and the inner wall of the column is the gas-liquid part m part (B).
B) A plurality of gas-liquid contact stages consisting of Separated.

ここで、立管5を2段に設けた第1図に示すような高流
速装置を用いた場合及び特公昭55−32411号公報
に示畜れるような従来の高流速装置を用−次場合につい
て、原カスとして濃度340〜380ppmの炭酸ガス
(ガス空筒速度711L/ s@e ) s一方眼収液
として濃I!t2.5 vt%の苛性ソーダ浴液(液温
度28℃、液vL量400G00KP/j@HR)を用
い、気液接触を行って苛性ソーダによる炭酸カスの吸収
を実施し、その時の吸収塔の高さ方向における圧力損失
分布並びにCO,−NaOH系吸収率を示せばそれぞれ
#!4図及びm5図の如くになる。なお、第4図及び菖
5図において、P、Qはそれぞれ液供給口の位置tボし
、本発明較蝋ではP及びQ12J肉敵県縮重1から液供
給を行い、従来装置ではPからのみ液供給を行った。さ
らに本発明装置における立管位置をS−T、U−Vとし
て示す。図中の丸印は本発明装置を用いfc場合の結果
及び三角印は従来装置を用いた場合の結果を示す。
Here, a case where a high flow rate device as shown in Fig. 1 in which standpipes 5 are provided in two stages is used, and a case where a conventional high flow rate device as shown in Japanese Patent Publication No. 55-32411 is used. Regarding the raw waste, carbon dioxide gas with a concentration of 340 to 380 ppm (gas cylinder velocity 711 L/s@e) is used, while the ocular fluid is concentrated I! Using a t2.5 vt% caustic soda bath liquid (liquid temperature 28°C, liquid vL amount 400G00KP/j@HR), gas-liquid contact was carried out to absorb carbonate scum by caustic soda, and the height of the absorption tower at that time was If the pressure loss distribution in the direction and the absorption rate of CO and -NaOH are shown, they are #! It will look like Figure 4 and Figure m5. In Fig. 4 and Fig. 5, P and Q respectively indicate the positions of the liquid supply ports, and in the comparative wax of the present invention, the liquid is supplied from P and Q12J, and from P in the conventional device. Only liquid was supplied. Further, the standpipe positions in the apparatus of the present invention are shown as ST and UV. The circles in the figure indicate the results obtained using the device of the present invention in fc, and the triangles indicate the results obtained using the conventional device.

これら第4図及び第5図より従来の高流速装置にあって
#′i准供給部から2富〜311程度まで有効な気液接
触が行われるが、それを越えると圧力損失が急激に小さ
くなり、吸収効率もほぼ一定に近い値をとり、それ以後
の部位では気液接触による吸収が夾質的に生じていない
ことがわかる。液供給部から2m〜B+a以後の部分の
液の状態を観察したところ液は滴れ壁状に流れ2相流体
となっていた。これに対し、本発明装置KめってFi簡
れ壁状の2相流体が生じないように構成され、さらに液
供給を行って気液接触を行わしめるため吸収効率が向上
するものである。
From these figures 4 and 5, in the conventional high-flow rate equipment, effective gas-liquid contact is carried out from the #'i semi-supply section to about 2 to 311 degrees, but beyond that point, the pressure loss decreases rapidly. It can be seen that the absorption efficiency also takes a nearly constant value, and absorption due to gas-liquid contact does not substantially occur in the subsequent parts. When the state of the liquid was observed in the area from 2 m to B+a from the liquid supply part, the liquid flowed like a dripping wall and became a two-phase fluid. On the other hand, the device K of the present invention is constructed so that a two-phase fluid with a flat wall does not occur, and furthermore, the absorption efficiency is improved because the liquid is supplied to bring about gas-liquid contact.

従って、本発明装置の気液接触部((転)を構成する立
管5の管高はカス空塔速度および液供給量にもよるが、
一般には約2〜3諷@度とすることが好ましい。ここで
本発明装置の実施例について各寸法の関係を概略的に例
示すれば次のようになる。今、立管5の内径をDとする
と塔1の内径は約2Dとすることが好ましく、従ってこ
の場合立管5を塔l内の略中央部付近に配設し友ものに
あっては液受けs7の@は3ADとなる。tた立管5の
上端からその上方に設置される立管5の下端までの距離
はほぼ3ADとすることが好ましい。本発明実施例に2
ける好ましい態様では上述の各寸法関係において立管5
の管11i1it−20とする。これにより、立管5の
管^が2〜3舅とすることから各寸法の一例が明らかと
なろう。しかしながらこれら各寸法はもちろん本発明を
何ら限定するものではなく塔内に配設する立管の個数、
換言すれば気液接触段を細膜設けるか、あるいは第3図
の如く各立管の中心軸線を不一致にするかは、処理する
ガス及び/又は液によって決定されるものである。 な
お、望ましくは液受は部の幅は最少でもSOO簡とする
Therefore, although the height of the standpipe 5 constituting the gas-liquid contact section ((transfer) of the device of the present invention depends on the superficial velocity of the waste and the amount of liquid supplied,
Generally, it is preferable to set it to about 2 to 3 degrees. Here, the relationships among the dimensions of the embodiments of the apparatus of the present invention will be schematically illustrated as follows. Now, if the inner diameter of the standpipe 5 is D, it is preferable that the inner diameter of the column 1 is approximately 2D. Therefore, in this case, the standpipe 5 is arranged near the center of the column 1, and if the @ of receiver s7 becomes 3AD. It is preferable that the distance from the upper end of the standpipe 5 to the lower end of the standpipe 5 installed above it be approximately 3AD. Example 2 of the present invention
In a preferred embodiment, the standpipe 5 has the above-mentioned dimensional relationships.
The tube 11i1it-20. As a result, an example of each dimension will become clear since the pipe ^ of the standpipe 5 has 2 to 3 legs. However, these dimensions do not limit the present invention in any way, and the number of standpipes installed in the tower,
In other words, whether the gas-liquid contact stage is provided with a thin film or whether the central axes of the standpipes are made to be mismatched as shown in FIG. 3 is determined by the gas and/or liquid to be treated. Note that preferably the width of the liquid receiver is at least SOO simple.

各気液接触段における液供給ノズル8の設置個数は立管
5の内径に応じて決定されるが、例えば立管内径が50
0φでは1gA所、フ50φでは3個i、1000φで
は4個所とすることが好ましい。
The number of liquid supply nozzles 8 installed in each gas-liquid contact stage is determined according to the inner diameter of the standpipe 5. For example, if the inner diameter of the standpipe is 50.
It is preferable to use 1 gA location for 0φ, 3 locations for 50φ, and 4 locations for 1000φ.

このような本発明装置において、塔内にカス及び液を供
給すると充分な気液接触及び気液分離が行われ、液が誦
れ壁状に流れて2相流体となることが防止される。そし
て気液接触効率がほとんど無くなる部位に次の気液接触
段が設置δれて一ムため気液接触効率が着しく増大する
In such an apparatus of the present invention, when the scum and liquid are supplied into the column, sufficient gas-liquid contact and gas-liquid separation are performed, and the liquid is prevented from flowing along the walls and becoming a two-phase fluid. Since the next gas-liquid contact stage is installed at a position where the gas-liquid contact efficiency almost disappears, the gas-liquid contact efficiency increases steadily.

以上のような本発明によれば、塔内に上下方向に離隔し
て配設した複数個の立管により気液流路を狭くし、気液
接触部(^)及び気液分離部(B)からなる気液接触段
を多段に設けているため、気液接触効率が飛躍的に増大
し、従って従来は複数基の高速装置を設けるところが1
塔で足りることになり、コスト面及び設を面積等におい
て組着な効果を具有する装置が得られる。このような本
発明は供給ガスにもと圧がある場合、液中に重合物やス
ラリー尋が含まれる場合勢に特に好適である。
According to the present invention as described above, the gas-liquid flow path is narrowed by a plurality of vertically spaced vertical pipes arranged in the column, and the gas-liquid contact part (^) and the gas-liquid separation part (B ), the gas-liquid contact efficiency is dramatically increased.
This means that a tower is sufficient, and a device that is advantageous in terms of cost and installation area can be obtained. The present invention is particularly suitable when the supply gas has an original pressure and when the liquid contains a polymer or a slurry.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図〜第3図はそれぞれ本発明の実施例を示す概略説
明図、第4図は塔の高さ方向におけるガス上昇部の圧力
損失分布図、第5図は塔の^さ方向におけるCo1− 
NaOH系吸収¥の分布図を示す。 l・・・塔       2・・・ガス供給口3・・・
デミスタ−4・・・ガス排出口5・・・立 W    
 6・・・底 板7・・・液受は部    8・・・液
供給ノズル9・・・排出管 隼4図 CO2aFLA’l’f”e′llJ
Figures 1 to 3 are schematic explanatory diagrams showing embodiments of the present invention, Figure 4 is a pressure loss distribution diagram of the gas ascending section in the height direction of the tower, and Figure 5 is a Co1 distribution diagram in the vertical direction of the tower. −
A distribution map of NaOH-based absorption is shown. l...Tower 2...Gas supply port 3...
Demister 4...Gas discharge port 5...Vertical W
6... Bottom plate 7... Liquid receiver is part 8... Liquid supply nozzle 9... Discharge pipe Hayabusa 4 Figure CO2aFLA'l'f"e'llJ

Claims (1)

【特許請求の範囲】[Claims] 1、 下側にカス供給口を、止痛にガス排出口を有する
塔内に、複数個の立管を上下方向に障隔して塔内壁と立
管外壁との間隙を封ぜしめる底板により多段に1i8i
1潰し、底板、塔内壁及び立管外壁により液受は部を構
成し、各立管下端付近に液供給ノズルを設けるとともに
欣受は部及び塔下端に集まるat−塔外に排出する排出
管を設けてなる多段式高fL連気液接触装置。
1. Inside the tower, which has a waste supply port at the bottom and a gas discharge port for pain relief, multiple standpipes are installed in a multi-tiered system with a bottom plate that vertically blocks and seals the gap between the inner wall of the tower and the outer wall of the standpipe. ni1i8i
1. The liquid receiver is made up of the bottom plate, the inner wall of the column, and the outer wall of the tower, and a liquid supply nozzle is provided near the lower end of each standpipe, and the receiver is the part and the at-discharge pipe that discharges to the outside of the tower. A multi-stage high fL continuous gas-liquid contact device.
JP57061400A 1982-04-13 1982-04-13 Multi-stage type high flow speed gas-liquid contact apparatus Granted JPS58177106A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57061400A JPS58177106A (en) 1982-04-13 1982-04-13 Multi-stage type high flow speed gas-liquid contact apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57061400A JPS58177106A (en) 1982-04-13 1982-04-13 Multi-stage type high flow speed gas-liquid contact apparatus

Publications (2)

Publication Number Publication Date
JPS58177106A true JPS58177106A (en) 1983-10-17
JPS6354403B2 JPS6354403B2 (en) 1988-10-27

Family

ID=13170054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57061400A Granted JPS58177106A (en) 1982-04-13 1982-04-13 Multi-stage type high flow speed gas-liquid contact apparatus

Country Status (1)

Country Link
JP (1) JPS58177106A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61192304A (en) * 1985-01-18 1986-08-26 インペリアル・ケミカル・インダストリ−ズ・ピ−エルシ− Method and device for directly bringing gas and liquid into contact
EP0738178A1 (en) 1994-11-08 1996-10-23 General Electric Company Flue gas scrubbing apparatus
US6090357A (en) * 1999-05-03 2000-07-18 Marsulex Environmental Technologies, Llc Flue gas scrubbing method
JP2014156848A (en) * 2013-02-18 2014-08-28 Denso Corp Gas-liquid separation device for engine wet type aftertreatment device
US9478785B2 (en) 2007-04-27 2016-10-25 Microsoft Technology Licensing, Llc Polarity protection for multiple batteries

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7504535B2 (en) * 2004-09-02 2009-03-17 Eastman Chemical Company Optimized liquid-phase oxidation
KR101363824B1 (en) * 2004-09-02 2014-02-17 그루포 페트로테멕스 에스.에이. 데 씨.브이. A bubble column reactor for optimized liquid-phase oxidation
US7399882B2 (en) * 2004-09-02 2008-07-15 Eastman Chemical Company Optimized liquid-phase oxidation
US7495125B2 (en) * 2004-09-02 2009-02-24 Eastman Chemical Company Optimized liquid-phase oxidation
CN102671502B (en) * 2012-05-18 2014-08-13 华东理工大学 Gas-liquid inertia separation and distribution coupling unit and separator adopting same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108677A (en) * 1975-03-20 1976-09-27 Babuhitachi Enjiniaringu Saabi ISHUEKIOSHOSURUTANIKIEKISETSUSHOKUBAKOSHUGOSOCHI
JPS53113771A (en) * 1977-03-17 1978-10-04 Hisashi Imai Wet gas treatment apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51108677A (en) * 1975-03-20 1976-09-27 Babuhitachi Enjiniaringu Saabi ISHUEKIOSHOSURUTANIKIEKISETSUSHOKUBAKOSHUGOSOCHI
JPS53113771A (en) * 1977-03-17 1978-10-04 Hisashi Imai Wet gas treatment apparatus

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61192304A (en) * 1985-01-18 1986-08-26 インペリアル・ケミカル・インダストリ−ズ・ピ−エルシ− Method and device for directly bringing gas and liquid into contact
JP2537487B2 (en) * 1985-01-18 1996-09-25 インペリアル・ケミカル・インダストリーズ・ピーエルシー Method and device for direct contact between gas and liquid
EP0738178A1 (en) 1994-11-08 1996-10-23 General Electric Company Flue gas scrubbing apparatus
US6214097B1 (en) 1994-11-08 2001-04-10 Marsulex Environmental Technologies, Llc Flue gas scrubbing apparatus
EP0738178B1 (en) * 1994-11-08 2002-04-24 Marsulex Environmental Technologies, LLC Flue gas scrubbing apparatus
CN1089265C (en) * 1994-11-08 2002-08-21 马苏里克斯环境技术公司 Flue gas scrubbing apparatus
KR100382444B1 (en) * 1994-11-08 2003-07-07 마르설렉스 인바이런멘탈 테크놀로지스 엘엘씨 Flue gas cleaning device
US6090357A (en) * 1999-05-03 2000-07-18 Marsulex Environmental Technologies, Llc Flue gas scrubbing method
US9478785B2 (en) 2007-04-27 2016-10-25 Microsoft Technology Licensing, Llc Polarity protection for multiple batteries
JP2014156848A (en) * 2013-02-18 2014-08-28 Denso Corp Gas-liquid separation device for engine wet type aftertreatment device

Also Published As

Publication number Publication date
JPS6354403B2 (en) 1988-10-27

Similar Documents

Publication Publication Date Title
US2787453A (en) Fractionating tower utilizing directional upflow means in conjunction with slanted trays
US5364604A (en) Solute gas-absorbing procedure
EP0510275B1 (en) Gas-liquid contactor and method for gas-liquid contacting
RU2247595C2 (en) Method of commixing of fluid mediums
US4374813A (en) Reverse-jet scrubber apparatus and method
EP0324763B1 (en) A method for cleansing gases and apparatus herefor
US4421725A (en) Process for purifying a gas containing hydrogen sulfide and carbon dioxide and apparatus therefor
EP0738178B1 (en) Flue gas scrubbing apparatus
RU2295382C2 (en) Method of removal of acid gas and device for realization of this method
JPS58177106A (en) Multi-stage type high flow speed gas-liquid contact apparatus
US9993743B2 (en) Distributor tray for gas/liquid contact column with secondary distribution system
US3941572A (en) Process for gas-absorption and dust-removal
US2560226A (en) Heating, deaerating, and purifying water
CN205517211U (en) Waste gas treatment system who contains acid gas
CN106669405A (en) Wet desulphurization flue gas purification system
US2568875A (en) Spray-type absorption tower
CN101765454B (en) Fluid distribution system
US2804935A (en) Vapor-liquid contacting apparatus
KR0142997B1 (en) Method and apparatus incorporation progressively increased gas velocity
CN105080225A (en) Gas demister
JP2007260487A (en) Nozzle device
CN206642511U (en) Differential submersible gas wash tower
SU856501A1 (en) Gas-liquid separator
CN219072437U (en) Double-layer separator with low-temperature liquid separation and normal-temperature gas mixing functions
CN214635223U (en) Ammonia washing, purifying and recycling device