JPS58176195A - 浮遊帯域溶融法による結晶製造方法 - Google Patents
浮遊帯域溶融法による結晶製造方法Info
- Publication number
- JPS58176195A JPS58176195A JP57057028A JP5702882A JPS58176195A JP S58176195 A JPS58176195 A JP S58176195A JP 57057028 A JP57057028 A JP 57057028A JP 5702882 A JP5702882 A JP 5702882A JP S58176195 A JPS58176195 A JP S58176195A
- Authority
- JP
- Japan
- Prior art keywords
- crystal rod
- concentrator
- crystal
- induction heating
- melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Induction Heating (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57057028A JPS58176195A (ja) | 1982-04-06 | 1982-04-06 | 浮遊帯域溶融法による結晶製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57057028A JPS58176195A (ja) | 1982-04-06 | 1982-04-06 | 浮遊帯域溶融法による結晶製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58176195A true JPS58176195A (ja) | 1983-10-15 |
| JPS6362480B2 JPS6362480B2 (enExample) | 1988-12-02 |
Family
ID=13043973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57057028A Granted JPS58176195A (ja) | 1982-04-06 | 1982-04-06 | 浮遊帯域溶融法による結晶製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58176195A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006169060A (ja) * | 2004-12-17 | 2006-06-29 | Shin Etsu Handotai Co Ltd | 単結晶製造装置及び単結晶製造方法 |
| JP2012126593A (ja) * | 2010-12-14 | 2012-07-05 | Shin Etsu Handotai Co Ltd | 半導体単結晶製造装置及び半導体単結晶の製造方法 |
-
1982
- 1982-04-06 JP JP57057028A patent/JPS58176195A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006169060A (ja) * | 2004-12-17 | 2006-06-29 | Shin Etsu Handotai Co Ltd | 単結晶製造装置及び単結晶製造方法 |
| JP2012126593A (ja) * | 2010-12-14 | 2012-07-05 | Shin Etsu Handotai Co Ltd | 半導体単結晶製造装置及び半導体単結晶の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6362480B2 (enExample) | 1988-12-02 |
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