JPS58175632U - Resist coating equipment - Google Patents
Resist coating equipmentInfo
- Publication number
- JPS58175632U JPS58175632U JP7335382U JP7335382U JPS58175632U JP S58175632 U JPS58175632 U JP S58175632U JP 7335382 U JP7335382 U JP 7335382U JP 7335382 U JP7335382 U JP 7335382U JP S58175632 U JPS58175632 U JP S58175632U
- Authority
- JP
- Japan
- Prior art keywords
- resist coating
- rotary table
- suction plate
- coating equipment
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来のレジスト塗布装置の平面図、第２図以下
の図面はこの考案のレジスト塗布装置の ゛１実
施例を示し、第２図は平面図、第３図は正面図、第４図
および第５図は要部の側面図および斜視図である。
７・・・・・・回転台、１０・・・・・・半導体ウェハ
、１５・・・・・・吸着板、１７・・・・・・調節機構
。Figure 1 is a plan view of a conventional resist coating device, Figure 2 and the following drawings show the first embodiment of the resist coating device of this invention, Figure 2 is a plan view, Figure 3 is a front view, and This figure and FIG. 5 are a side view and a perspective view of the main parts. 7... Turntable, 10... Semiconductor wafer, 15... Adsorption plate, 17... Adjustment mechanism.
Claims (1)
に設けられレジスト塗布時に前記半導体ウェハより飛散
するレジストを吸着する吸着板と、前記吸着板を着脱自
在に支持するとともに該吸着板の前記回転台に対する角
度および間隔を調節自在とする調節機構とを備えたレジ
スト塗布装置。a rotary table on which a semiconductor wafer is placed; a suction plate provided on the outer periphery of the rotary table to adsorb resist scattered from the semiconductor wafer during resist coating; and a suction plate that removably supports the suction plate and A resist coating device comprising: an adjustment mechanism that freely adjusts the angle and distance with respect to the rotary table.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7335382U JPS58175632U (en) | 1982-05-18 | 1982-05-18 | Resist coating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7335382U JPS58175632U (en) | 1982-05-18 | 1982-05-18 | Resist coating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58175632U true JPS58175632U (en) | 1983-11-24 |
Family
ID=30082863
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7335382U Pending JPS58175632U (en) | 1982-05-18 | 1982-05-18 | Resist coating equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58175632U (en) |
-
1982
- 1982-05-18 JP JP7335382U patent/JPS58175632U/en active Pending
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