JPS58170520A - Gas pufirication apparatus - Google Patents

Gas pufirication apparatus

Info

Publication number
JPS58170520A
JPS58170520A JP57051891A JP5189182A JPS58170520A JP S58170520 A JPS58170520 A JP S58170520A JP 57051891 A JP57051891 A JP 57051891A JP 5189182 A JP5189182 A JP 5189182A JP S58170520 A JPS58170520 A JP S58170520A
Authority
JP
Japan
Prior art keywords
gas
tank
cleaning
liquid
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57051891A
Other languages
Japanese (ja)
Inventor
Shinobu Sato
忍 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP57051891A priority Critical patent/JPS58170520A/en
Publication of JPS58170520A publication Critical patent/JPS58170520A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To pufiry an exhaust gas having a bad odor simply to a degree free from danger of environmental pollution even if said exhaust gas after treatment is directly discharged to the atmosphere. CONSTITUTION:The gas (a) enters a washing tank 1 from a gas inlet port 6 and is purified through contact with a washing liquid atomized and fallen in said tank 1. The purified gas subsequently enters a second washing apparatus and further purified by contacting the same with the similarily stomized and fallen washing liquid. The purified gas is drawn out from the top part of the washing tank 3 to be introduced into an exhaust tower and discharged to the atmosphere. The washing liquid contacted with the gas is accumulated in a washing liquid tank 10 through drain pipes 4, 4', 4'' and a collecting pipe 5 and precipitative separation of impurities is carried out in this tank. The supernatant liquid is supplied to a spray apparatus 8 from the washing liquid tank 10 through a supply pipe 9 by a pump P and recirculated to be reused in gas purification.

Description

【発明の詳細な説明】 本発明はガス、とくに化学工場、塵芥処還工場、屠殺場
、食品加工工場等から出る特有の悪臭を有するガスを浄
化するためのガス浄化装置に関する。これら臭気はアン
モニア、トリメチルアミン、硫化水素、硫化メチル等で
あって、これら臭気成分が混合して特有の臭気を発して
いる。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas purification device for purifying gas, particularly gas having a characteristic odor emitted from chemical factories, garbage disposal factories, slaughterhouses, food processing factories, etc. These odors are ammonia, trimethylamine, hydrogen sulfide, methyl sulfide, etc., and these odorous components are mixed to produce a unique odor.

これらの臭気成分を除去してガスを浄化するためには、
従来水洗浄法、酸またはアルカリ等の薬品を用いる洗浄
法が行なわれているが、十分な脱臭効果は期待できず、
しかも水洗浄法を実施する場合には使用ずみの洗浄水が
それに溶解している急臭成分、殊にアンモニアのため河
川や地下水が汚染されて二次公害を惹起する。
In order to remove these odor components and purify the gas,
Conventionally, water cleaning methods and cleaning methods using chemicals such as acids or alkalis have been used, but sufficient deodorizing effects cannot be expected.
Moreover, when the water washing method is carried out, the used washing water contaminates rivers and underground water due to the strong odor components dissolved therein, especially ammonia, causing secondary pollution.

また、酸またはアルカリ勢の薬品を用いる洗浄法は費用
がか\る上に、中和ないし化学反応による生成物を含む
洗浄液が同様に二次公害発生源となる。さらに、ゼオラ
イトなどの吸着能を有する物質に通過させて脱臭する方
法も行なわれているが、この方法ではすべての悪臭成分
を除去することは不可能であ如、吸着削離比較的短時間
の使用後に再生しなければならない。上記方法を組合せ
て、たとえば水洗浄前処理を一施したガスを吸着物質に
通す方法もあるが、この方法によっても十分な脱臭は達
成されない。
Further, cleaning methods using acidic or alkaline chemicals are expensive, and cleaning solutions containing products of neutralization or chemical reactions are also a source of secondary pollution. In addition, deodorizing methods have been carried out by passing it through a substance with adsorption ability such as zeolite, but it is impossible to remove all malodorous components with this method. Must be regenerated after use. Although there is a method in which the above-mentioned methods are combined, for example, the gas is passed through an adsorbent material after being pretreated with water, sufficient deodorization cannot be achieved even with this method.

本発明によるガス浄化装置を用いると、上述したような
悪臭を有するガスを簡単に、しかも処理後の排出ガスを
そのマま大気中へ放出しても環境汚染の處れのない程度
に浄化することができる。
By using the gas purification device according to the present invention, gases having the above-mentioned bad odor can be easily purified to the extent that there is no risk of environmental pollution even if the exhaust gas after treatment is released directly into the atmosphere. be able to.

本発明は、ガス、とくに化学工場、塵芥処理工場、−屠
殺場、食品加工工場等から出る、%有の悪臭を有するガ
スを浄化するためのガス浄化装置に関し、訳装置はガス
の出口と入口を有し、底部に排水管を有し、ガスが順次
に流過するように直列に接続された数個のガス洗浄槽よ
シなり、洗浄槽の下方には排水管が上方から開口する洗
浄液槽が配置され、洗浄槽は上部に洗浄液を霧化するた
めのスプレー装置を有し、このされ、供給管の他端は洗
浄液槽内の上澄液層中に突入してお如、除洗浄液は硫酸
第一鉄とデオライト、パーライトを水に懸濁させた懸濁
液に、例えば2本のステンレス管中にニクHAIle絶
縁して挿入しその両ニクロム線を流れる電流の方向が異
なるようにした電熱器によシ加熱すると同時に磁界を作
用させ、液の温度を約40〜45分75〜85℃とし、
沈降剤として硫酸アル1ニウムを添加して取出した上澄
液に例えば多孔の塩化ビニル筒の中に同軸にり四人線を
配置し、塩化ビニル筒とクロム線との間に活性炭粒を充
填して成る電極間に電圧5〜15万一ルトで0.5〜0
.7オリアンペアの電流を流して得た溶液であることを
特徴とする。
The present invention relates to a gas purification device for purifying gas, particularly gas having a certain degree of bad odor, which is emitted from chemical plants, garbage processing plants, slaughterhouses, food processing plants, etc. It has a drain pipe at the bottom and several gas cleaning tanks connected in series so that the gas flows sequentially, and the drain pipe opens from above at the bottom of the cleaning tank. The cleaning tank has a spray device at the top to atomize the cleaning liquid, and the other end of the supply pipe plunges into the supernatant liquid layer in the cleaning liquid tank. For example, a suspension of ferrous sulfate, deolite, and pearlite in water was inserted into two stainless steel tubes with Nichrome wire insulated so that the current flowing through the two wires was in different directions. Heat the liquid with an electric heater and apply a magnetic field at the same time to bring the temperature of the liquid to 75-85°C for about 40-45 minutes.
Aluminum sulfate is added as a precipitant, and the supernatant liquid is taken out. For example, a four-person wire is placed coaxially in a porous vinyl chloride tube, and activated carbon particles are filled between the vinyl chloride tube and the chrome wire. The voltage between the electrodes is 0.5-0 at 5-150,000 rt.
.. It is characterized by being a solution obtained by passing a current of 70 amperes.

第1図には、3個の洗浄槽を直列に接続してなる本発明
による装置の実施例を示す。第一洗浄装置は図で左上部
にガス人口6、底部に洗浄液排出蓄養を備える洗浄槽1
よシなる。第一洗浄装置に管7により連結された第二洗
浄装置は、洗浄槽2と3とを互いに結合したユニット装
置として構成され、洗浄槽2と3とはガス通路によシ互
いに連絡している。もちろん、洗浄槽2と3は独立の洗
浄槽であってもよい。洗浄槽2および3は底部に排水管
◆′および4′を備え、これら排水蓄養e 4’ * 
4’は逼轟なマニホルドにょシ捕集管6に集まシ、捕集
管6が洗浄液槽1゜上に開口している。第一および第二
洗浄装置は上部に多数のノズル孔を備える管からなる共
通の洗浄液スプレー装置8を備えている。
FIG. 1 shows an embodiment of the apparatus according to the invention, which comprises three cleaning tanks connected in series. The first cleaning device is a cleaning tank 1 with a gas tank 6 at the top left and a cleaning liquid discharge storage at the bottom.
It's okay. The second cleaning device connected to the first cleaning device by a pipe 7 is configured as a unit device in which cleaning tanks 2 and 3 are connected to each other, and the cleaning tanks 2 and 3 are in communication with each other through a gas passage. . Of course, the cleaning tanks 2 and 3 may be independent cleaning tanks. The cleaning tanks 2 and 3 are equipped with drain pipes ◆' and 4' at the bottom, and these wastewater storage e 4' *
Reference numeral 4' indicates a noisy manifold which collects in a collecting pipe 6, and the collecting pipe 6 opens 1° above the cleaning liquid tank. The first and second cleaning devices are equipped with a common cleaning liquid spray device 8 consisting of a tube with a number of nozzle holes in its upper part.

スプレー装置8には、lンプPを備える供給管9が接続
されていて、供給管9の他端は洗浄液槽10の液面下に
突入している。
A supply pipe 9 having a pump P is connected to the spray device 8 , and the other end of the supply pipe 9 projects below the liquid level of the cleaning liquid tank 10 .

ガスは図で左方からガス人口6にょシ洗浄槽lに入ル、
ここで霧化されて雨下する洗浄液と接触して浄化される
。次いでガスは管7にょシ第二洗浄装置に入シ、同様に
霧化されて雨下する洗浄液と接触してさらに浄化される
。浄化されたガスは洗浄槽3の頂部から排気塔に導出さ
れて大気中へ放出される。ガスと接触した洗浄液は排水
蓄養e 4’ e 4’および捕集t5を経て洗浄液槽
10にたまハことで不純物の沈降分離が行なわれる。上
澄液は洗浄液41I11oからIンゾPで供給管9によ
シスプレー装置8に供給され、ガス浄化のため循環して
使用される。
Gas is input from the left side in the figure to the cleaning tank L with a gas population of 6.
Here, it is atomized and comes into contact with the raining cleaning solution to be purified. The gas then enters the second cleaning device through the pipe 7 and is further purified by coming into contact with the cleaning liquid which is also atomized and rains down. The purified gas is led out from the top of the cleaning tank 3 to the exhaust tower and released into the atmosphere. The cleaning liquid that has come into contact with the gas is transferred to the cleaning liquid tank 10 through wastewater storage e4'e4' and collection t5, where impurities are sedimented and separated. The supernatant liquid is supplied from the cleaning liquid 41I11o to the syspray device 8 through the supply pipe 9 as InzoP, and is circulated and used for gas purification.

必要に応じ、第1図に示した洗浄装置にさらに数個の洗
浄装置ユニットを接続することができ、第2図はこのよ
うな実施例を示す。第2図における第一・第二洗浄装置
は第1図におけると同じであり、相当する部分は同じ符
号で示されている。しかし、第二洗浄装置には管16に
よシ第三洗浄装置が接続されておシ、この第三洗浄装置
は2つの洗浄槽12.13を互いに結合してカるユニッ
ト装置である。該ユニット装置の上部には第1図と同様
の多数のノズル孔を備える管からなるスプレー装fit
18が連通していて、該管18Fi、ポンプP′を備え
、他端で洗浄液槽15中へ浸漬している供給管19と接
続されている。
If desired, several further cleaning device units can be connected to the cleaning device shown in FIG. 1, and FIG. 2 shows such an embodiment. The first and second cleaning devices in FIG. 2 are the same as in FIG. 1, and corresponding parts are designated by the same reference numerals. However, a third cleaning device is connected to the second cleaning device through the pipe 16, and this third cleaning device is a unit device in which two cleaning tanks 12, 13 are connected to each other. The upper part of the unit device is fitted with a spray device consisting of a tube with a large number of nozzle holes similar to that shown in FIG.
18 are in communication and are provided with a pipe 18Fi, a pump P', and are connected at the other end to a supply pipe 19 immersed in the cleaning liquid tank 15.

ガスは第一洗浄装置のガス人口6から入シ、第二洗浄装
置(2,3)を通シ、管16により引続き第三洗浄装置
(12,13)に入り、ここで雨下する霧化洗浄液と接
触してさらに浄化され、洗浄槽13の頂部から排気塔1
7に排出される。第三洗浄装置において、スプレー装置
18によって、霧化された洗浄液は、洗浄槽13.14
中で通過するガスと接触した後、排水管14 、14’
によシ排出され、捕集管15を経て洗浄液槽20に入る
。洗浄液槽20中で得られる上澄液はポンプP′により
供給管19によってスプレー装置16に供給され、同様
に洗浄液の循環路が形成する。
The gas enters from the gas port 6 of the first cleaning device, passes through the second cleaning device (2, 3), continues through the pipe 16 and enters the third cleaning device (12, 13), where it is atomized. It is further purified by contact with the cleaning liquid, and is then discharged from the top of the cleaning tank 13 to the exhaust tower 1.
It is discharged at 7. In the third cleaning device, the cleaning liquid atomized by the spray device 18 is transferred to the cleaning tank 13.14.
After coming into contact with the gas passing therein, the drain pipes 14, 14'
The liquid is then discharged and enters the cleaning liquid tank 20 through the collection pipe 15. The supernatant liquid obtained in the cleaning liquid tank 20 is supplied to the spray device 16 by a pump P' via a supply pipe 19, likewise forming a circulation path for the cleaning liquid.

ポンプPおよびP′は水中ポンプに代えることもできる
。洗浄液槽10.20には、図示されてない洗浄液製造
装置から、適当表制御装置によシ調節されて、洗浄液が
装入ないしは補給される。
Pumps P and P' can also be replaced by submersible pumps. The cleaning liquid tank 10.20 is charged or replenished with cleaning liquid from a cleaning liquid production device (not shown), regulated by a suitable control device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は3個O洗浄槽を用いる本発明による装置の実施
例を示す系統図であシ、第2図は6個の洗浄槽を用いる
他の実施例による装置の系統図である。 1.2.3・・・洗浄槽、養@ 4’ @ 4’・・・
排水管、5・・・捕集管、6・・・ガス入口、7・・・
連結管、8・・・スプレー装置、9・・・供給管、1o
・・・洗浄液槽、11・・・排気塔、12.13・・・
洗浄槽、14.14’・・・排水管、15・・・捕集管
、16・・・連結管、17・・・排気塔、16・・・ス
プレー装置、19・・・供給管、20・・・洗浄液槽
FIG. 1 is a system diagram showing an embodiment of the apparatus according to the present invention using three O cleaning tanks, and FIG. 2 is a system diagram showing another embodiment of the apparatus using six cleaning tanks. 1.2.3...Cleaning tank, feeding @ 4' @ 4'...
Drain pipe, 5... Collection pipe, 6... Gas inlet, 7...
Connecting pipe, 8... Spray device, 9... Supply pipe, 1o
...Cleaning liquid tank, 11...Exhaust tower, 12.13...
Cleaning tank, 14.14'... Drain pipe, 15... Collection pipe, 16... Connecting pipe, 17... Exhaust tower, 16... Spray device, 19... Supply pipe, 20 ...Washing liquid tank

Claims (1)

【特許請求の範囲】[Claims] ガスの入口と出口を有し、底部に排水管を有し、ガスが
順次に流過するように直列に接続された数個のガス洗浄
槽よシなシ、洗浄槽の下方には排水管が上方から開口す
る洗浄液槽が配置され、洗浄槽は上部に洗浄液を霧化す
るためのスプレー装置を有し、スプレー装置にはポンプ
を備える供給管が接続され、供給管の他端は洗浄液槽内
の上澄液層中に突入しておシ、洗浄液が硫酸第一鉄とデ
オライト、パーライトを水に懸濁させた懸濁液に、電熱
器によシ加熱すると同時に電熱器の加熱線を流れる電流
によって生ずる磁界を作用させ、液の温度を約40〜4
5分75〜86℃とし、沈降剤として硫酸アルミニウム
を溢加して取出し九上溌液に電圧5〜15万一ルトで0
.5〜0.7tlJアンペアの電流を流して得た溶液で
わることを特徴とするガス浄化装置。
A gas cleaning tank with a gas inlet and outlet, a drain pipe at the bottom, and several gas cleaning tanks connected in series so that the gas flows sequentially, with a drain pipe below the cleaning tank. A cleaning liquid tank that opens from above is arranged, the cleaning tank has a spray device on the top for atomizing the cleaning liquid, a supply pipe equipped with a pump is connected to the spray device, and the other end of the supply pipe is connected to the cleaning liquid tank. The washing liquid enters the supernatant liquid layer inside the tank, and at the same time heats the suspension of ferrous sulfate, deolite, and perlite in water with an electric heater, and simultaneously connects the heating wire of the electric heater. A magnetic field generated by a flowing current is applied to lower the temperature of the liquid to approximately 40 to 40
The temperature was heated to 75 to 86°C for 5 minutes, aluminum sulfate was added as a precipitant, and the liquid was taken out and the voltage was 5 to 150,000 rut.
.. A gas purification device characterized in that it is purified by a solution obtained by passing a current of 5 to 0.7 tlJ ampere.
JP57051891A 1982-03-30 1982-03-30 Gas pufirication apparatus Pending JPS58170520A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57051891A JPS58170520A (en) 1982-03-30 1982-03-30 Gas pufirication apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57051891A JPS58170520A (en) 1982-03-30 1982-03-30 Gas pufirication apparatus

Publications (1)

Publication Number Publication Date
JPS58170520A true JPS58170520A (en) 1983-10-07

Family

ID=12899501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57051891A Pending JPS58170520A (en) 1982-03-30 1982-03-30 Gas pufirication apparatus

Country Status (1)

Country Link
JP (1) JPS58170520A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115003403A (en) * 2020-08-24 2022-09-02 富士电机株式会社 Exhaust gas purification device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115003403A (en) * 2020-08-24 2022-09-02 富士电机株式会社 Exhaust gas purification device

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