JPS58153378A - Optical bistable device - Google Patents

Optical bistable device

Info

Publication number
JPS58153378A
JPS58153378A JP57034796A JP3479682A JPS58153378A JP S58153378 A JPS58153378 A JP S58153378A JP 57034796 A JP57034796 A JP 57034796A JP 3479682 A JP3479682 A JP 3479682A JP S58153378 A JPS58153378 A JP S58153378A
Authority
JP
Japan
Prior art keywords
light
layer
type
type gaas
bistable device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57034796A
Other languages
Japanese (ja)
Inventor
Katsuhiko Oimura
老邑 克彦
Haruo Misumi
三隅 春雄
Yuji Ogawa
小川 裕士
Naotake Nagao
長尾 尚武
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omron Corp
Original Assignee
Tateisi Electronics Co
Omron Tateisi Electronics Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tateisi Electronics Co, Omron Tateisi Electronics Co filed Critical Tateisi Electronics Co
Priority to JP57034796A priority Critical patent/JPS58153378A/en
Priority to US06/472,243 priority patent/US4675518A/en
Publication of JPS58153378A publication Critical patent/JPS58153378A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K3/00Circuits for generating electric pulses; Monostable, bistable or multistable circuits
    • H03K3/02Generators characterised by the type of circuit or by the means used for producing pulses
    • H03K3/42Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of opto-electronic devices, i.e. light-emitting and photoelectric devices electrically- or optically-coupled
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F3/00Optical logic elements; Optical bistable devices
    • G02F3/02Optical bistable devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)

Abstract

PURPOSE:To obtain the optical bistabilizing device with which input-output characteristics can be electrically changed optionally and continuously by a method wherein a photo waveguide path, consisting of a light modulating element having electrically variable light transmittance, is provided between a light-receiving element and a light-emitting element. CONSTITUTION:A p type GaAs layer 12, an n type GaAS layer 13, an n type GaAlAs layer 15 are formed by lamination in an n<+> type GaAs substrate 1, these layers are insulation-isolated in an island form using SiO2 films 10 and 11 which are penetrating to the layer 12, and the above is used as a light modulating element PM. Also, an n<+> type GaAs layer 4, a p<+> type GaAlAs layer 5, and a p type GaAS layer are formed by lamination in the substrate 1 between the films 10 and 11 and used as a photo diode PD and a laser diode LD, and terminals 8 and 9 are attached to the avove diodes respectively. Then, the surface of the element PM is covered by an SiO2 film 18, an aperture is provided, and electrodes 16 and 17 are formed on the exposed surface of the layer 13 which is extending to the center part and the surface of the substrate 1. Through these procedures, the DC voltage to be applied to the electrodes 16 and 17 can be changed and the output is brought to a variable state.

Description

【発明の詳細な説明】 この発明は光集積回路の一種である光双安定装置に関し
、特に、入出力特性を電気的に連続的に変化させること
ができるようにしたものに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an optical bistable device, which is a type of optical integrated circuit, and particularly relates to an optical bistable device whose input/output characteristics can be changed electrically and continuously.

第1A図は従来の光双安定装置の代表的な構造を示し、
第1B図はその等価回路を示している。
Figure 1A shows a typical structure of a conventional optical bistable device,
FIG. 1B shows the equivalent circuit.

この光双安定装置は、1つの半導体基板1上に通常のダ
ブルへテロ構造のフォトダイオードPDとレーザダイオ
ードLDとを?II2を介して対向するように集積形成
したものである。フォトダイオードPDおよびレーザダ
イオードLDの半導体構成層の組成は例えば次のように
なっている。
This optical bistable device has a normal double heterostructure photodiode PD and laser diode LD on one semiconductor substrate 1. They are integrally formed so as to face each other via II2. For example, the compositions of the semiconductor constituent layers of the photodiode PD and the laser diode LD are as follows.

1 ・N横型Qa As基板 3−N十型Ga A、eAs層 4−P十型Ga AS II 5−= P十型Ga AJAs II 6 ・r’十型Ga AS II そして、基板1の裏面に共通カソード電極7が形成され
、フォトダイオードPDおよびレーザダイオードLDの
それぞれの最上部層にアノード電極8および9が形成さ
れている。レーザダイオードLDからはその共振器の両
端面より出力光POが発生するが、一方の面から出射す
る出力光POは上記溝2を介してフォトダイオードPD
に受光されるようになつ、でいる。
1 ・N horizontal Qa As substrate 3 - N 10-type Ga A, eAs layer 4 - P 10-type Ga AS II 5-= P 10-type Ga AJAs II 6 ・r' 10-type Ga AS II And on the back side of the substrate 1 A common cathode electrode 7 is formed, and anode electrodes 8 and 9 are formed on the top layer of each of the photodiode PD and laser diode LD. The laser diode LD generates output light PO from both end faces of its resonator, but the output light PO emitted from one face passes through the groove 2 to the photodiode PD.
The light will begin to be received.

以上の構成において、適宜な直流電源の正極をレーザダ
イオードLDのアノード電極9に、また負極をフォトダ
イオードPDのアノード電極8に接続するとともに、共
通カソード電極7側に適宜なバイアス回路を接続する。
In the above configuration, the positive electrode of an appropriate DC power supply is connected to the anode electrode 9 of the laser diode LD, the negative electrode is connected to the anode electrode 8 of the photodiode PD, and an appropriate bias circuit is connected to the common cathode electrode 7 side.

その状態でフォトダイオードPDに外部からの入力光P
1が与えられルト、フォトダイオードPDに逆方向の光
電流が流れ、その電流がレーザダイオードLDの順方向
の駆動電流となり、レーザダイオードLDから出力光P
oが発生する。この出力光poの一部は上述したように
、フォトダイオードPDに与えられ、フォトダイオード
PDの光電流を更に増加させるように作用する。この電
流の増加は出力光poを更に強めるように作用する。つ
まり、出力光P。
In this state, input light P from the outside enters the photodiode PD.
1, a reverse photocurrent flows through the photodiode PD, this current becomes a forward driving current of the laser diode LD, and the output light P from the laser diode LD is
o occurs. As described above, a part of this output light po is given to the photodiode PD and acts to further increase the photocurrent of the photodiode PD. This increase in current acts to further strengthen the output light po. In other words, the output light P.

の一部がフォトダイオードPDに受光されることにより
上述の回路に正帰還がかかる。この正帰還作用により、
出力光poのレベルがほぼ一定値に安定する。
When a portion of the light is received by the photodiode PD, positive feedback is applied to the above-mentioned circuit. Due to this positive feedback effect,
The level of the output light po is stabilized at a substantially constant value.

第2図は上述の光双安定装置の入出力特性を示している
。同図から明らかなように、上記光の正帰還作用により
、入力光Piのレベルがある値aより大きくなると、出
力光poのレベルが急増し、ある値Cにほぼ安定する。
FIG. 2 shows the input/output characteristics of the above-mentioned optical bistable device. As is clear from the figure, due to the positive feedback effect of the light, when the level of the input light Pi becomes greater than a certain value a, the level of the output light po rapidly increases and becomes approximately stable at a certain value C.

また入力光Piのレベルがある値b(b<a)より小さ
くなると、出力光POのレベルが急激に減少してほぼ0
に近くなる。このようにヒステリシスをもったコンパレ
ータのごとき入出力特性となる。この特性を利用し、レ
ベルがアナログ的に変化する入力光Piをあるしきい値
で2値化したり、あるいは光信号の波形成形に利用した
り、更には上記ヒステリシスを利用して光信号の記憶に
応用したりすることが行なわれる。
Furthermore, when the level of the input light Pi becomes smaller than a certain value b (b<a), the level of the output light PO rapidly decreases to almost 0.
It becomes close to. In this way, the input/output characteristics are similar to that of a comparator with hysteresis. This characteristic can be used to binarize the input light Pi whose level changes in an analog manner at a certain threshold, or to use it for waveform shaping of optical signals, or even to store optical signals by utilizing the hysteresis mentioned above. Applications are being made to

ところで、上述した従来の光双安定装置においては、第
2図で示した入出力特性上の変化点の値aやbを任意に
変えるためには、共通カソード端子7側に接続するバイ
アス回路、すなわち端子7と8あるいは端子7と9間に
接続する抵抗器の抵抗値を変えなければならない。この
ため、一度特性を決定して回路に組込んでしまった場合
、その特性の変更やw4斃が極めて面倒であった。また
、上記入出力特性を様々に変化させて動作させるような
使い方ができなかった。
By the way, in the conventional optical bistable device described above, in order to arbitrarily change the values a and b of the changing points in the input/output characteristics shown in FIG. 2, a bias circuit connected to the common cathode terminal 7 side, That is, the resistance value of the resistor connected between terminals 7 and 8 or between terminals 7 and 9 must be changed. For this reason, once the characteristics have been determined and incorporated into a circuit, it is extremely troublesome to change the characteristics or change the characteristics. In addition, it was not possible to use the device in such a way that the input/output characteristics were varied in various ways.

この発明は上述した従来の問題点に鑑みなされたもので
あり、その目的は、1チツプの半導体に集積された光双
安定装置で、しかも外部からの電圧信号によって上記入
出力特性を連続的に変化させることができるようにした
光双安定装置を提供することにある。
This invention was made in view of the above-mentioned conventional problems, and its purpose is to provide an optical bistable device integrated into a single semiconductor chip, in which the above-mentioned input/output characteristics are continuously controlled by an external voltage signal. An object of the present invention is to provide an optical bistable device that can be changed.

上記の目的を達成するために、この発明の光双安定装置
は、発光素子と受光素子との間に、発光素子から発生す
る光の一部を受光素子に導く半導体による先導波路を形
成し、かつ該光導波路の光透過率が電気的に可変される
光変調素子を一体的に集積形成したことを特徴とする。
In order to achieve the above object, the optical bistable device of the present invention forms a leading wavepath made of a semiconductor between a light emitting element and a light receiving element to guide a part of light generated from the light emitting element to the light receiving element, Further, the optical waveguide is characterized in that a light modulation element whose light transmittance can be electrically varied is integrally formed.

以下、この発明の実施例を図面に基づいて詳細に説明す
る。
Hereinafter, embodiments of the present invention will be described in detail based on the drawings.

第3A図はこの発明の一実施例による光双安定′装置の
構造を示し、第38図にはその等価回路を示している。
FIG. 3A shows the structure of an optical bistable device according to an embodiment of the present invention, and FIG. 38 shows its equivalent circuit.

この光双安定装置は、第1A図に示した従来の光双安定
装置における上記溝2の部分に光変調素子PMを形成し
たものである。フォトダイオードPDおよびレーザダイ
オードLDの構成は第1A図のものと同様で、各構成!
13,4゜5.6は先に説明した通りである。
This optical bistable device has a light modulation element PM formed in the groove 2 of the conventional optical bistable device shown in FIG. 1A. The configurations of the photodiode PD and laser diode LD are the same as those in FIG. 1A, and each configuration!
13.4°5.6 is as explained above.

この発明の光双安定1iiiでは、フォトダイオードP
Dの内側側面にS i oJ 1 ’Oが形成され、ま
たレーザダイオードLDの内側側面に5iOzW!A1
1が形成され、更に上記溝2の底面に当たる部分にP型
Ga AS層が形成されており、これら躾10および1
1と112によって光変調素子PMが絶縁分離されてい
る。先安lll素子PMはN十型GaAs1113とN
型Ga Ai!、As [114と、P+型Ga A、
eAs層15とからなり、P横型GaA、gAs 1i
i15の中央部分に電極16が形成されているとともに
、N横型Qa As層13の両端部分は上方に露出され
、そこに電極16.17が形成されている。なお、電極
16.17の形成領域以外には3 i 0z@ 1 B
によって絶縁被覆されてる。
In the optical bistable 1iii of this invention, the photodiode P
S ioJ 1 'O is formed on the inner side surface of D, and 5iOzW! is formed on the inner side surface of laser diode LD. A1
1 is formed, and a P-type Ga AS layer is further formed on the bottom surface of the groove 2, and these layers 10 and 1 are formed.
The optical modulation element PM is insulated and separated by 1 and 112. Senyasu lll element PM is made of N0 type GaAs1113 and N
Type Ga Ai! , As [114 and P+ type Ga A,
It consists of an eAs layer 15, P lateral GaA, gAs 1i
An electrode 16 is formed at the center of i15, and both end portions of the N horizontal Qa As layer 13 are exposed upward, and electrodes 16 and 17 are formed there. Note that 3 i 0z @ 1 B is present in areas other than the area where the electrodes 16 and 17 are formed.
is insulated by.

第4図には上記光変調素子PMのみの基本的な構造を示
してお役、第3A図の各構成1113,14.15およ
び電極16.17については両図を対応させて示してい
る。この光変調素子PMは、第4図の7方向に光を一端
面から他端面へ透過させるとき、その光透過量を電極1
6.17間に印加する直流電圧によって制御できるもの
である。
FIG. 4 shows the basic structure of only the light modulation element PM, and each structure 1113, 14.15 and electrode 16.17 in FIG. 3A are shown in correspondence with each other in both figures. When this light modulation element PM transmits light from one end surface to the other end surface in the seven directions shown in FIG.
It can be controlled by a DC voltage applied between 6.17 and 17.

この光変調素子はP十型Ga /’/!AS層15とN
+型GaAs1113およびN型Ga AlAs 11
14のPN接合構造からなっているが、Z軸方向に入射
された光は、Y方向のキャリア濃度差による屈折率差で
NlGa A、eAs Ill 4に閉じ込められるが
、X方向にはより屈折率の高いN横型GaAs層13方
向に発散する。しかし、N横型GaASI113とP十
型Ga A、gAs層15との間に逆バイアス電圧をか
けると、電界は空乏層に集中し、Nl!Ga A4As
 1111F)上部ト下部ニ不均一電界EXが生じる。
This light modulation element is a P-type Ga /'/! AS layer 15 and N
+ type GaAs1113 and N type GaAlAs 11
The light incident in the Z-axis direction is confined in NlGa A, eAs Ill 4 due to the refractive index difference due to the carrier concentration difference in the Y direction, but the refractive index is higher in the X direction. It diverges in the direction of the high N lateral GaAs layer 13. However, when a reverse bias voltage is applied between the N lateral GaASI 113 and the P 10 type GaA, gAs layer 15, the electric field is concentrated in the depletion layer and Nl! Ga A4As
1111F) A non-uniform electric field EX is generated between the upper and lower parts.

この不均一電界E×による屈折率変化Δnが、 Δ−−(R−n3・EX)/2 で表されることはよく知られている。ここで、RはGa
 A、eAsの電気光学定数、nはGa A、eASの
屈折率である。この屈折率変化は、電極16゜17@に
加える逆バイアス電圧の大きさによって変化し、その結
果N型Ga AfAs層14の呈するX方向への光閉じ
込め作用は、上記逆バイアス電圧が大きい程大きくなる
It is well known that the refractive index change Δn due to the nonuniform electric field Ex is expressed as Δ−(R−n3·EX)/2. Here, R is Ga
A, the electro-optical constant of eAs, and n, Ga A, the refractive index of eAs. This refractive index change changes depending on the magnitude of the reverse bias voltage applied to the electrodes 16° and 17@, and as a result, the optical confinement effect in the X direction exhibited by the N-type Ga AfAs layer 14 increases as the reverse bias voltage increases. Become.

つまり第3A図おいて、レーザダイオードLDの左側面
から出射する光(出力光POの一部)は光変調素子PM
を透過してフォトダイオードPDの右側面に達する訳で
あるが、このとき、光変調素子PMの電極16.17間
に加える逆バイアス電圧の大きさに応じて、レーザダイ
オードLD側からフォトダイオードPD側に至る光の拡
散性が変化して、フォトダイオードPDに受光される光
量が変化する。すなわち、上記逆バイアス電圧が大きけ
れば大きい程、N型Ga AffiAs■14の光閉じ
込め作用が強くなり、その場合光は拡散せずにフォトダ
イオードPDに受光されることとなる。
In other words, in FIG. 3A, the light emitted from the left side of the laser diode LD (part of the output light PO) is transmitted to the light modulation element PM.
At this time, depending on the magnitude of the reverse bias voltage applied between the electrodes 16 and 17 of the light modulation element PM, the light passes through the laser diode LD side and reaches the right side of the photodiode PD. The diffusivity of the light reaching the side changes, and the amount of light received by the photodiode PD changes. That is, the larger the reverse bias voltage is, the stronger the light confinement effect of the N-type Ga AffiAs 14 becomes, and in that case, the light is received by the photodiode PD without being diffused.

上記の説明で明らかなように、レーザダイオードLDか
ら生ずる出力光POの一部をフォトダイオードPDに導
いて正帰還をかけるように作用する光双安定装置におい
て、正帰還光の導波路となる光*講素子PMの光透過率
を電極16,171111に印加する電圧でもって制御
することができ、その結果正帰還ループのループゲイン
を任意にかつ連続的に電圧信号でもって制御することが
でき、第2図に示した入力光Piと出力光80間の入出
力特性における変化点aやbを、外部の接続素子を変更
することなしに印加電圧を変えることだ(tで任意に調
節設定できるし、またこれを変化させながら使用するこ
ともでき、この極光双安定装置の応用範囲が更に拡大さ
れる。
As is clear from the above explanation, in an optical bistable device that acts to guide a part of the output light PO generated from the laser diode LD to the photodiode PD and apply positive feedback, the light that becomes the waveguide for the positive feedback light is *The light transmittance of the optical element PM can be controlled by the voltage applied to the electrodes 16, 171111, and as a result, the loop gain of the positive feedback loop can be arbitrarily and continuously controlled by the voltage signal, Change points a and b in the input/output characteristics between the input light Pi and the output light 80 shown in Fig. 2 can be changed by changing the applied voltage without changing the external connection elements (you can adjust and set them arbitrarily with t). However, it can also be used while changing this, further expanding the range of applications of this polar light bistable device.

なお、上記の実施例においては、フォトダイオードを受
光素子とし、レーザダイオードを発光素子としているが
、この発明はこれに限定されるものではなく、フォトト
ランジスタ等の他の受光素子を用いたり、あるいは発光
ダイオード等の他の発光素子を用いることもできる。
Note that in the above embodiments, the photodiode is used as a light receiving element and the laser diode is used as a light emitting element, but the present invention is not limited to this, and other light receiving elements such as a phototransistor may be used, or Other light emitting elements such as light emitting diodes can also be used.

また、上記実施例では基板1と光変調素子PMのN十型
Ga As層13等を分離するのにP形GaAs層12
を形成したが、3i02等の絶縁体を用いてもよい。ま
た、光変調素子PMをレーザダイオードLDおよびフォ
トダイオードPDh\ら分離するために、Si 021
110.11を形成したが、これは単にエツチング等で
分離してもよ(1゜以上詳細に説明したように、この発
明によれtf 1電圧により入出力特性を任意にかつ連
続的に変えられる集積度の高い光双安定装置を提供する
ことができる。
Further, in the above embodiment, the P-type GaAs layer 12 is used to separate the substrate 1 and the N0-type GaAs layer 13 of the light modulation element PM.
, but an insulator such as 3i02 may also be used. In addition, in order to separate the optical modulation element PM from the laser diode LD and photodiode PDh\, Si 021
110.11 is formed, but this may be simply separated by etching etc. A highly integrated optical bistable device can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1A図は、従来の光双安定装置の構造を示す斜視図、
第1B図は第1A図の等価回路、第2図は光双安定装置
の入出力特性図、第3A図Gよこの発明の一実施例によ
る光双安定装置の断面図、第38IfAは第3A図の等
価回路図、第4図は光変調素子の基本構造図である。 1・・・・・・基板 PD・・・・・・フォトダイオード LD・・・・・・レーザダイオード PM・・・・・・光度m素子 特許出願人 立石電機株式会社 第1A図 第1A図 第2図 第4図
FIG. 1A is a perspective view showing the structure of a conventional optical bistable device;
FIG. 1B is an equivalent circuit of FIG. 1A, FIG. 2 is an input/output characteristic diagram of the optical bistable device, FIG. 3A is a sectional view of the optical bistable device according to an embodiment of the present invention, and FIG. The equivalent circuit diagram in the figure and FIG. 4 are basic structural diagrams of the light modulation element. 1...Substrate PD...Photodiode LD...Laser diode PM...Luminous intensity m element Patent applicant Tateishi Electric Co., Ltd. Figure 1A Figure 1A Figure 2 Figure 4

Claims (1)

【特許請求の範囲】[Claims] (1)入力光を受光する受光素子と、出力光を発生する
発光素子と、この発光素子から発生する光の一部を上記
受光素子に導く半導体による先導波路を形成し、かつ該
光導波路の光透過率が電気的に可変される光麦調素子と
が、1つの半導体チップに一体的に集積形成されてなる
光双安定装置。
(1) A light-receiving element that receives input light, a light-emitting element that generates output light, and a leading waveguide made of a semiconductor that guides a part of the light generated from the light-emitting element to the light-receiving element, and An optical bistable device in which an optical adjustment element whose light transmittance is electrically variable is integrally formed on one semiconductor chip.
JP57034796A 1982-03-05 1982-03-05 Optical bistable device Pending JPS58153378A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57034796A JPS58153378A (en) 1982-03-05 1982-03-05 Optical bistable device
US06/472,243 US4675518A (en) 1982-03-05 1983-03-04 Optical bistable device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57034796A JPS58153378A (en) 1982-03-05 1982-03-05 Optical bistable device

Publications (1)

Publication Number Publication Date
JPS58153378A true JPS58153378A (en) 1983-09-12

Family

ID=12424210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57034796A Pending JPS58153378A (en) 1982-03-05 1982-03-05 Optical bistable device

Country Status (1)

Country Link
JP (1) JPS58153378A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6245187A (en) * 1985-08-23 1987-02-27 Matsushita Electric Ind Co Ltd Image storage device
US4967241A (en) * 1985-03-26 1990-10-30 Kabushiki Kaisha Toshiba Semiconductor light emitting device
US5061974A (en) * 1988-12-28 1991-10-29 Ricoh Company, Ltd. Semiconductor light-emitting device of array type
US5101246A (en) * 1988-12-08 1992-03-31 Ricoh Company, Ltd. Photo-functional device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4967241A (en) * 1985-03-26 1990-10-30 Kabushiki Kaisha Toshiba Semiconductor light emitting device
JPS6245187A (en) * 1985-08-23 1987-02-27 Matsushita Electric Ind Co Ltd Image storage device
JPH0551194B2 (en) * 1985-08-23 1993-07-30 Matsushita Electric Ind Co Ltd
US5101246A (en) * 1988-12-08 1992-03-31 Ricoh Company, Ltd. Photo-functional device
US5061974A (en) * 1988-12-28 1991-10-29 Ricoh Company, Ltd. Semiconductor light-emitting device of array type

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