JPS58152855A - Preparation of lower alkoxybenzonitrile - Google Patents
Preparation of lower alkoxybenzonitrileInfo
- Publication number
- JPS58152855A JPS58152855A JP3515582A JP3515582A JPS58152855A JP S58152855 A JPS58152855 A JP S58152855A JP 3515582 A JP3515582 A JP 3515582A JP 3515582 A JP3515582 A JP 3515582A JP S58152855 A JPS58152855 A JP S58152855A
- Authority
- JP
- Japan
- Prior art keywords
- alkali
- sulfate
- reaction
- lower alkyl
- hydroxybenzonitrile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は低級アルコキシベンゾニトリルの製法の赦良に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in the process for producing lower alkoxybenzonitrile.
低級アルコキシベンゾニトリルは香料、液晶などに用い
られ、またオキサゾール類の合成原料としても有用であ
る。この化合物の合成法としては、低級アルコキシベン
ゼン誘導体からの合成法が知られているのみである。近
時オキシ安息香酸又はそのエステル類からオキシペンゾ
ニ) IJシル類容易に得られるようになったので、本
発明者らはその低級アルコキシル化を検討した。一般に
ベンジエ) IJシル類強酸又は強塩基に鋭敏なため、
そのヒドロキシル基を低級アルキル化することには困難
が予想される。しかし本発明者らは研究の結果、ジ低級
アルキル硫酸とアルカリとの適当な組み合せにより、予
測された困難を克服して本発明を成すに至った。Lower alkoxybenzonitrile is used in perfumes, liquid crystals, etc., and is also useful as a raw material for the synthesis of oxazoles. The only known method for synthesizing this compound is from a lower alkoxybenzene derivative. Recently, it has become possible to easily obtain oxybenzoic acid (oxypenzoni)IJ sils from oxybenzoic acid or its esters, so the present inventors investigated the lower alkoxylation thereof. Generally, benzene) IJ sils are sensitive to strong acids or bases, so
Difficulties are expected in lower alkylating the hydroxyl group. However, as a result of research, the present inventors overcame the anticipated difficulties and achieved the present invention by appropriately combining di-lower alkyl sulfuric acid and an alkali.
本発明は、ベンゼン核上に他の置換基を有していてもよ
いオキシベンゾニトリルを、アルカリの存在下にジ低級
アルキル硫酸と反応させることを特徴とする、低級アル
コキシベンゾニトリルの製法である。The present invention is a method for producing lower alkoxybenzonitrile, which is characterized by reacting oxybenzonitrile, which may have other substituents on the benzene nucleus, with di-lower alkyl sulfuric acid in the presence of an alkali. .
オキシベンゾニトリルのベンゼン核上に存在してもよい
置換基としては、ハロゲン原子、低級アルキル基、低級
アルコキシ基、ニトロ基たとがあげられる。−ジ低級ア
ルキル硫酸としてはジメチル硫酸、ジエチル硫酸、ジプ
ロピル硫酸、シアミル硫酸などが用いられる。アルカリ
としては水酸化アルカリ、炭酸アルカリ、炭酸水素アル
カリ、燐酸アルカリなどが好ましい。Examples of substituents that may be present on the benzene nucleus of oxybenzonitrile include a halogen atom, a lower alkyl group, a lower alkoxy group, and a nitro group. - As the di-lower alkyl sulfuric acid, dimethyl sulfate, diethyl sulfate, dipropyl sulfate, cyamyl sulfate, etc. are used. Preferred examples of the alkali include alkali hydroxide, alkali carbonate, alkali hydrogen carbonate, and alkali phosphate.
本発明を実施するに際しては、前記のオキシベンゾニト
リルとジ低級アルキル硫酸を、アルカリの存在下に溶剤
中で反応させることが有利である。溶剤としては水のほ
か普通の不活性溶剤、例えばキシレン。トルエン、ベン
ゼン°などる。In carrying out the invention, it is advantageous to react the oxybenzonitrile and di-lower alkyl sulfuric acid in a solvent in the presence of an alkali. In addition to water, solvents include common inert solvents such as xylene. Toluene, benzene, etc.
本発明の好ましい実施態様においては、オキシベンゾニ
トリルを水酸化アルカリ水溶液に低温で溶解しておき、
これにジアルキル硫酸を滴下し、次いで加熱還流を行う
。あるいは、オキシベンゾニトリルと炭酸アルカリを、
例えばキシレンなどの不活性溶剤中で加熱還流し、ジ低
級アルキル硫酸を滴下して反応させてもよい。In a preferred embodiment of the present invention, oxybenzonitrile is dissolved in an aqueous alkali hydroxide solution at a low temperature,
Dialkyl sulfuric acid is added dropwise to this, and then heated under reflux. Alternatively, oxybenzonitrile and alkali carbonate,
For example, the mixture may be heated under reflux in an inert solvent such as xylene, and di-lower alkyl sulfuric acid may be added dropwise to react.
反応終了後、析出した目的物をr取し又は溶剤を留去す
ることにより目的物を分離する。必要に応じ再結晶、蒸
留などにより目的物を精製することができる。After the reaction is completed, the precipitated target product is collected or the solvent is distilled off to separate the target product. If necessary, the target product can be purified by recrystallization, distillation, etc.
本発明の方法によれば、低級アルコキシベンゾニ) I
Jルな簡便な方法で、高収率かつ高純度で得ることがで
きるので、その工業的利用価値はきわめて太きい。According to the method of the invention, lower alkoxybenzoni) I
Since it can be obtained in high yield and purity using a simple and simple method, its industrial value is extremely high.
実施例1
バラオキシベンゾニトリル595gを水酸化ナトリウム
20gと水200 mlの溶液に攪拌溶解し、10℃以
下に冷却する。次いで冷却下にジメチル硫酸75.6
gを滴下し、6時間加・熱還流する。反応終了後、冷却
して析出した結晶をP取すると、バラアニンニトリ/l
158.59(収率88.0%)が得られる。Example 1 595 g of roseoxybenzonitrile is stirred and dissolved in a solution of 20 g of sodium hydroxide and 200 ml of water, and the solution is cooled to below 10°C. Then under cooling dimethyl sulfate 75.6
g was added dropwise and heated under reflux for 6 hours. After the reaction is completed, the precipitated crystals are cooled and P is removed.
158.59 (yield 88.0%) is obtained.
実施例2
バラオキシベンゾニトリル595gと炭酸力IJ ラム
100Iをキシレン600g中に加え、攪拌下に加熱還
流する。次いでジメチル硫酸79.8.9を1時間で滴
下し、6時間還流下に加熱攪拌する。反応終了後、冷却
してキシレン溶液が中性になるまでよく本読する。次い
で減圧下にキシレンを留去すると、バラアニソニトリル
64.1g(収率96.4%)が得られる。Example 2 595 g of roseoxybenzonitrile and 100 I of carbonic acid are added to 600 g of xylene, and the mixture is heated to reflux while stirring. Next, 79.8.9 mm of dimethyl sulfate was added dropwise over 1 hour, and the mixture was heated and stirred under reflux for 6 hours. After the reaction is complete, cool and read carefully until the xylene solution becomes neutral. Next, xylene is distilled off under reduced pressure to obtain 64.1 g (yield 96.4%) of rose anisonitrile.
実施例6
実施例2においてバラオキシベンゾニトリルの代りにサ
リテロニトリ# 59.5 gを、そしてジメチル硫酸
の代りにジエチル硫酸97.59を用い、以下実施例2
と同様に操作すると、2−エトキシベンゾニトリル69
.89 (収率95.0%)が得られる。Example 6 In Example 2, 59.5 g of saliteronitrile # was used instead of roseoxybenzonitrile, and 97.59 g of diethyl sulfate was used instead of dimethyl sulfate, and the following Example 2 was carried out.
By operating in the same manner as above, 2-ethoxybenzonitrile 69
.. 89 (yield 95.0%) is obtained.
出願人 株式会社上野製薬応用研究所 代理人 弁理士 小 林 正 雄Applicant: Ueno Pharmaceutical Application Research Institute Co., Ltd. Agent: Patent Attorney Masao Kobayashi
Claims (1)
ンゾニトリルを、アルカリの存在下にジ低級アルキル硫
酸と反応させることを特徴とする、低級アルコキシベン
ゾニトリルの製法。A method for producing lower alkoxybenzonitrile, which comprises reacting oxybenzonitrile which may have other substituents on the benzene nucleus with di-lower alkyl sulfuric acid in the presence of an alkali.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3515582A JPS58152855A (en) | 1982-03-08 | 1982-03-08 | Preparation of lower alkoxybenzonitrile |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3515582A JPS58152855A (en) | 1982-03-08 | 1982-03-08 | Preparation of lower alkoxybenzonitrile |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58152855A true JPS58152855A (en) | 1983-09-10 |
Family
ID=12433994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3515582A Pending JPS58152855A (en) | 1982-03-08 | 1982-03-08 | Preparation of lower alkoxybenzonitrile |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58152855A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009126784A (en) * | 2007-11-19 | 2009-06-11 | Mitsubishi Gas Chem Co Inc | Method for producing 2-iodo-3,4-dimethoxybenzonitrile |
-
1982
- 1982-03-08 JP JP3515582A patent/JPS58152855A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009126784A (en) * | 2007-11-19 | 2009-06-11 | Mitsubishi Gas Chem Co Inc | Method for producing 2-iodo-3,4-dimethoxybenzonitrile |
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