JPS5814325A - Production for magnetic recording medium - Google Patents
Production for magnetic recording mediumInfo
- Publication number
- JPS5814325A JPS5814325A JP11184381A JP11184381A JPS5814325A JP S5814325 A JPS5814325 A JP S5814325A JP 11184381 A JP11184381 A JP 11184381A JP 11184381 A JP11184381 A JP 11184381A JP S5814325 A JPS5814325 A JP S5814325A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- soft magnetic
- rotary
- magnetic layer
- evaporation source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は磁気記録媒体の製造方法に関する。[Detailed description of the invention] The present invention relates to a method of manufacturing a magnetic recording medium.
短波長記録特性の優れた磁気記録方式として近年注目さ
れている垂直記録方式では、媒体の製造技術の開発が重
大になってきている。In the perpendicular recording method, which has recently attracted attention as a magnetic recording method with excellent short wavelength recording characteristics, the development of media manufacturing technology has become important.
現在実験室規模で用いられている垂直記録媒体は、プラ
スチックフィルム等の非磁性基板上に、パーマロイ等の
軟磁性薄膜を形成し、その上に、主にCo 、!: O
rを主成分とする垂直方向に磁化容易軸を有するいわゆ
る垂直記録層をスパッタリング法にて形成したもので、
両面にかかる構成を持つディスクも試作され、記録再生
特性の向上をめざした研究が鋭意なされている。しかし
ながら工業規模で製造しうる技術はまだ確立していない
。The perpendicular recording media currently used on a laboratory scale consists of forming a soft magnetic thin film such as permalloy on a non-magnetic substrate such as a plastic film, and depositing mainly Co,! : O
A so-called perpendicular recording layer containing r as a main component and having an axis of easy magnetization in the perpendicular direction is formed by a sputtering method.
A prototype disc with a double-sided configuration has also been produced, and intensive research is being conducted to improve its recording and reproducing characteristics. However, the technology for producing it on an industrial scale has not yet been established.
本発明はかかる点に鑑み、両面に垂直記録層を有する媒
体を連続して大量に得ることの出来る方法を提供するも
ので、以下に図面を用いその実施例を説明する。In view of this point, the present invention provides a method by which a large quantity of media having perpendicular recording layers on both sides can be continuously obtained.Examples thereof will be described below with reference to the drawings.
第1図は本発明の一実施例で、軟磁性層と垂直記録層の
それぞれの形成用として、互いに独立した蒸発源を配し
た場合を示し、第2図は、軟磁性層の蒸発源を1つでま
かなうとともに、回転キャンも2つですみ、後述するす
ぐれた特長を有する3、・−7
場合を示し、この両者に共通するのは、両面の記録層を
真空を破壊することなく、連続して形成する点である。FIG. 1 shows an embodiment of the present invention in which independent evaporation sources are provided for forming the soft magnetic layer and the perpendicular recording layer, and FIG. 2 shows the evaporation sources for the soft magnetic layer. Cases 3 and -7 are shown below, which have the excellent features described below. It is a point formed continuously.
第1図に示すように、プラスチック等の可撓性基板1は
送り出し軸18から第1の回転キャン14、第2の回転
キャン15に沿って移動する。As shown in FIG. 1, a flexible substrate 1 made of plastic or the like moves from a delivery shaft 18 along a first rotary can 14 and a second rotary can 15. As shown in FIG.
第1の回転キャン14に熱を逃がしながら、入射角を制
限するマスク24の第1の開孔部20で、パーマロイ等
の軟磁性層を形成する。蒸発源として容器10.蒸発材
料2.電子源6とで模式的に示した電子ビーム加熱式蒸
発源を示したが、これにこだわらず、スパッタリングに
よる薄膜形成等、公知の薄膜形成のいずれの手段によっ
てもよい。A soft magnetic layer, such as permalloy, is formed in the first opening 20 of the mask 24 that limits the incident angle while allowing heat to escape to the first rotating can 14 . Container 10. as evaporation source. Evaporation material 2. Although the electron beam heating type evaporation source is schematically shown as the electron source 6, the present invention is not limited to this, and any known thin film formation method such as thin film formation by sputtering may be used.
次に第2の回転キャン16に沿って移動する時、蒸発材
3.容器11.電子源7からなる、例えばCo −Cr
蒸発源で、開孔部21で、垂直記録層を形成する。次に
、基板1の反対側の面に、第3の回転キャン16に沿っ
て開孔部22で軟磁性層を形成し、その上に第4の回転
キャン7に沿って移′ 動しながら、開孔部23で
垂直記録層を形成する。Next, when moving along the second rotating can 16, the evaporative material 3. Container 11. consisting of an electron source 7, e.g. Co-Cr
A perpendicular recording layer is formed in the apertures 21 using the evaporation source. Next, a soft magnetic layer is formed on the opposite surface of the substrate 1 with the openings 22 along the third rotary can 16, and while moving along the fourth rotary can 7, , a perpendicular recording layer is formed in the openings 23.
蒸発源はそれぞれ容器12 、13.蒸発材料4,6゜
電子源81.eにより模式的に示されている。かくして
両面に垂直記録層を形成した基板は捲き取り軸1eによ
り、捲きあげられる。The evaporation sources are containers 12 and 13, respectively. Evaporation material 4,6° electron source 81. It is schematically shown by e. The substrate having perpendicular recording layers formed on both sides is thus rolled up by the winding shaft 1e.
真空の雰囲気、薄膜形成法は、適宜選択できるし、垂直
記録層の上に、必要に応じて保護層を形成することもで
きる。The vacuum atmosphere and thin film formation method can be selected as appropriate, and a protective layer can be formed on the perpendicular recording layer as necessary.
26はフリーローラーであり、エキスパンダロールダン
サーロ・−ル等の捲き取シ系の要素は必要に応じ配設さ
れる。26 is a free roller, and winding system elements such as an expander roll dancer roll are arranged as necessary.
又、前処理、後処理を必要とする場合、グロー処理機構
を具備する装置を準備するのは当然である0
第2図は本発明の他の実施例を示し、この場合、前記実
施例の場合よりも簡素化されている。図に示すように、
第1の回転キャン36と第2の回転キャン37を隣接し
て配設し、第1の回転キャン36と第2の回転キャン3
7は、相反する回転方向にほぼ等速で回転する(なおキ
ャン径が異なれば、回転数はそれに応じ異方る)よう構
成する。Furthermore, when pre-treatment and post-treatment are required, it is natural to prepare an apparatus equipped with a glow treatment mechanism. FIG. 2 shows another embodiment of the present invention; It is simpler than the case. As shown in the figure,
The first rotary can 36 and the second rotary can 37 are arranged adjacently, and the first rotary can 36 and the second rotary can 3
7 is configured to rotate at substantially constant speed in opposite rotational directions (if the can diameter differs, the number of rotations will vary accordingly).
6、、−1
第1.第2の回転キャン36,37のほぼ中間に位置す
るよう軟磁性層形成のための蒸発源を配設する。これは
容器30.蒸発材27.電子源33で模式的に示しであ
るが、スパッタを用いることもできるのは前記実施例の
場合と同じである。しかし、膜厚制御の容易さ、特に基
板26の両面に(マスク42,41.43で作られる開
孔部46゜46を対称的かつ同面積とすることで)同一
膜厚を確実に得ることができることから、スパッタによ
るよりも蒸発源として電子ビーム加熱式蒸発源を用いる
方が好ましい。6,,-1 1st. An evaporation source for forming the soft magnetic layer is disposed approximately midway between the second rotary cans 36 and 37. This is container 30. Evaporation material 27. Although the electron source 33 is schematically shown, sputtering can also be used as in the previous embodiment. However, it is easy to control the film thickness, especially to ensure that the same film thickness is obtained on both sides of the substrate 26 (by making the openings 46° 46 formed by the masks 42, 41, 43 symmetrical and of the same area). Therefore, it is preferable to use an electron beam heating type evaporation source as the evaporation source rather than using sputtering.
以上のようにして両面に軟磁性層が1つの蒸発源で形成
された基板26は回転キャン36でマスク41.40よ
り表る開孔部47で入射角を制限された蒸気流で垂直記
録層が形成される。しかる後もう一方の軟磁性層上に同
様にマスク43.44よりなる開孔部48で第2の垂直
記録層を形成する。蒸発材28.29は多くの場合Co
−Orで、容器31,32.電子源34.35で模式
的に示される電子ビーム加熱式蒸発源が用いられる〇こ
れは、スパッタリングによることも勿論可能である。送
り出し軸38.捲き取り軸39.フリーローラ4.9.
エキスパンダローラ(図示せス)等の捲き取り要素は、
前処理、後処理等の機構との関係で配設関係が最適化さ
れるべきである。The substrate 26, on which soft magnetic layers are formed on both sides using one evaporation source as described above, is transferred to a perpendicular recording layer using a vapor flow whose incident angle is limited by apertures 47 exposed from masks 41 and 40 in a rotating can 36. is formed. Thereafter, a second perpendicular recording layer is formed on the other soft magnetic layer using the openings 48 formed by masks 43 and 44 in the same manner. The evaporator 28.29 is often Co
-Or, containers 31, 32. An electron beam heated evaporation source schematically shown as an electron source 34 and 35 is used. Of course, this can also be done by sputtering. Delivery shaft 38. Winding shaft 39. Free roller 4.9.
Rolling elements such as expander rollers (not shown) are
The arrangement should be optimized in relation to mechanisms such as pre-processing and post-processing.
第2図に示した装置で、80%Ni−20’%F・の合
金を10kv16菌の電子ビームで加熱蒸発させ、ポリ
アミド基板(8μ−)上に1゜6μのパーマロイ層を形
成しその上に、入射角を±10″100領域で、0os
a%0r1e%f)合金を10kV。Using the apparatus shown in Fig. 2, an alloy of 80% Ni-20'% F was heated and evaporated with an electron beam of 10 kv16 microorganisms to form a permalloy layer of 1°6μ on a polyamide substrate (8μ−). , the incident angle is ±10″ in the 100 area, 0os
a%0r1e%f) alloy at 10kV.
3.3 wI(これは耐火ルツボで熱効率を高めている
ため、低いパワーで蒸着可能である。)で、0.4μの
Co Cr層を形成する。この時のキャン温度は80°
Cである。また基板の捲き取り速度1j5B/l1in
である。At 3.3 wI (this is a refractory crucible with high thermal efficiency, it can be deposited with low power) to form a 0.4 μ Co Cr layer. The can temperature at this time is 80°
It is C. Also, the board winding speed is 1j5B/l1in.
It is.
以上のように両面に1.6μのパ゛−マロイ層、0.4
μのCo Cr層(垂直方向に磁化容易軸を有し、保磁
力y s o Oeである。)を#l盛した基板は特別
熱処理をしなくても応力関係がバランスしているため、
例えばW幅にスリットしてもカールすること7、、、。As mentioned above, there is a 1.6μ pmalloy layer on both sides, a 0.4μ
Since the stress relationship is balanced even without special heat treatment, the stress relationship of the substrate with #l of μ CoCr layers (having an axis of easy magnetization in the perpendicular direction and a coercive force of y s o Oe) is balanced.
For example, even if you slit it to W width, it will curl 7.
なく、安定に記録再生できる。recording and playback can be performed stably.
Go −Cr層の形成は、高速スパッタリング法。The Go-Cr layer is formed using a high-speed sputtering method.
イオンブレーティング法、電界蒸着法について確認した
が、C0−Crのスパッタリングと、パーマロイの電子
ビーム蒸着を併用するには、最適動作真空度がそれぞれ
、8 X 10 Torr 、 I X18TOrr以
下と異なるため、差圧がとれるように装置の改造を必要
とした。We have confirmed the ion brating method and the electric field deposition method, but in order to use CO-Cr sputtering and permalloy electron beam evaporation together, the optimum operating vacuum degree is different from 8 X 10 Torr and I X 18 Torr or less, respectively. The equipment needed to be modified to accommodate the differential pressure.
いずれにしても、従来のように個別に、反転して両方の
面に蒸着する場合は、大気中に一度取りだすため、ゴミ
の混入によるドロップアウトの増加や、強いカールのた
め搬送中シワに々りやすく、媒体として短波長記録時の
欠陥となる問題があったのに対し、特に第2図に示した
実施例ではパーマロイの膜厚が長手方向に同一であれば
、カールを完吟に防止できるメリットを有している。In any case, when depositing on both sides individually as in the past, it is taken out into the atmosphere once, so there is an increase in dropouts due to contamination of dust, and strong curling causes wrinkles during transportation. However, in the embodiment shown in Figure 2, if the permalloy film thickness is the same in the longitudinal direction, curling can be completely prevented. It has the advantage of being able to
以上のように本発明によると、両面に垂直記録層を有す
る完全平坦な磁気記録媒体を工業的規模で容易に得られ
るものでその工業的価値は大である。As described above, according to the present invention, a completely flat magnetic recording medium having perpendicular recording layers on both sides can be easily obtained on an industrial scale, and therefore has great industrial value.
第1図は本発明の一実施例で、また第2図は本発明の他
の実施例で、いずれも磁気記録媒体を製造する様子を示
す図である。
1.26・・・・・・基板、2.3,4,5,27,2
8゜29・・・・・・蒸発材、14,15,16,17
,36.37・・・・・・回転キャン、24,40,4
1,42,43.44・・・・・・マスク。FIG. 1 shows one embodiment of the present invention, and FIG. 2 shows another embodiment of the present invention, both of which are diagrams showing how a magnetic recording medium is manufactured. 1.26...Substrate, 2.3, 4, 5, 27, 2
8゜29... Evaporation material, 14, 15, 16, 17
,36.37... Rotating can, 24,40,4
1,42,43.44...Mask.
Claims (2)
する工程が、同一真空系内で連続して行われることを特
徴とする磁気記録媒体の製造方法。(1) A method for manufacturing a magnetic recording medium, characterized in that the step of forming perpendicular recording layers on both sides of a plastic substrate is performed continuously in the same vacuum system.
回転キャンに沿って 移動するプラスチック基板の一方
の面に、第1の蒸発源からの蒸気流により軟磁性層を形
成した後その上に第2の蒸発源からの蒸気流により垂直
記録層を形成し、続いて、上記基板のもう一方の面に上
記第1の蒸発源からの蒸気流により軟磁性層を形成した
後その上に第3の蒸発源からの蒸気流により垂直記録層
を形成することを特徴とする特許請求の範囲第18項記
載の磁気記録媒体の製造方法。(2) In the same vacuum system, a soft magnetic layer is formed on one surface of a plastic substrate that moves along two rotating cans with different rotational directions by the vapor flow from the first evaporation source, and then a soft magnetic layer is formed on it. A perpendicular recording layer is formed by the vapor flow from the second evaporation source, and then a soft magnetic layer is formed on the other surface of the substrate by the vapor flow from the first evaporation source, and then a soft magnetic layer is formed on the other surface of the substrate by the vapor flow from the first evaporation source. 19. The method of manufacturing a magnetic recording medium according to claim 18, wherein the perpendicular recording layer is formed by the vapor flow from the evaporation source of step 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11184381A JPS5814325A (en) | 1981-07-16 | 1981-07-16 | Production for magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11184381A JPS5814325A (en) | 1981-07-16 | 1981-07-16 | Production for magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5814325A true JPS5814325A (en) | 1983-01-27 |
JPH0319617B2 JPH0319617B2 (en) | 1991-03-15 |
Family
ID=14571555
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11184381A Granted JPS5814325A (en) | 1981-07-16 | 1981-07-16 | Production for magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5814325A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59172165A (en) * | 1983-03-18 | 1984-09-28 | Hitachi Maxell Ltd | Method and device for producing magnetic recording medium |
JPS59175032A (en) * | 1983-03-24 | 1984-10-03 | Matsushita Electric Ind Co Ltd | Method and device for producing magnetic recording medium |
JPS616421U (en) * | 1984-06-18 | 1986-01-16 | トヨタ車体株式会社 | Guide rail structure of vehicle sliding door |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5423507A (en) * | 1977-07-22 | 1979-02-22 | Matsushita Electric Ind Co Ltd | Producing apparatus of magnetic recording media |
-
1981
- 1981-07-16 JP JP11184381A patent/JPS5814325A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5423507A (en) * | 1977-07-22 | 1979-02-22 | Matsushita Electric Ind Co Ltd | Producing apparatus of magnetic recording media |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59172165A (en) * | 1983-03-18 | 1984-09-28 | Hitachi Maxell Ltd | Method and device for producing magnetic recording medium |
JPS59175032A (en) * | 1983-03-24 | 1984-10-03 | Matsushita Electric Ind Co Ltd | Method and device for producing magnetic recording medium |
JPH056739B2 (en) * | 1983-03-24 | 1993-01-27 | Matsushita Electric Ind Co Ltd | |
JPS616421U (en) * | 1984-06-18 | 1986-01-16 | トヨタ車体株式会社 | Guide rail structure of vehicle sliding door |
Also Published As
Publication number | Publication date |
---|---|
JPH0319617B2 (en) | 1991-03-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4454836A (en) | Vacuum evaporating apparatus utilizing multiple rotatable cans | |
JPS5814325A (en) | Production for magnetic recording medium | |
JPH0916960A (en) | Manufacturing device for information recording medium | |
JPH09320031A (en) | Magnetic recording medium | |
JPH04155623A (en) | Method and apparatus for manufacturing magnetic recording medium | |
JPH0319622B2 (en) | ||
JP2668953B2 (en) | Manufacturing method of magnetic recording medium | |
JPS5850628A (en) | Production of magnetic recording medium | |
JPS6246971B2 (en) | ||
JPS61273738A (en) | Production of magnetic recording medium | |
JPS6043916B2 (en) | vacuum evaporation method | |
JPH0370290B2 (en) | ||
JPS608305B2 (en) | Vacuum deposition method | |
JPH0121534B2 (en) | ||
JPH01303623A (en) | Magnetic recording medium | |
JPS60164930A (en) | Production of magnetic recording medium | |
JPS58199440A (en) | Manufacture of magnetic recording medium | |
JPS6126941A (en) | Production of magnetic recording medium | |
JPH01319119A (en) | Magnetic recording medium | |
JPS63214915A (en) | Production of magnetic recording medium | |
JPS5880134A (en) | Manufacture of magnetic recording medium | |
JPH0416854B2 (en) | ||
JPH03280219A (en) | Production of magnetic recording medium | |
JPS5942635A (en) | Manufacture of magnetic recording medium | |
JPH0226293B2 (en) |