JPS58138081A - Amorphous silicon solar cell - Google Patents

Amorphous silicon solar cell

Info

Publication number
JPS58138081A
JPS58138081A JP57020361A JP2036182A JPS58138081A JP S58138081 A JPS58138081 A JP S58138081A JP 57020361 A JP57020361 A JP 57020361A JP 2036182 A JP2036182 A JP 2036182A JP S58138081 A JPS58138081 A JP S58138081A
Authority
JP
Japan
Prior art keywords
electrodes
electrode
spaces
amorphous silicon
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57020361A
Other languages
Japanese (ja)
Inventor
Tetsuyoshi Takeshita
竹下 哲義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP57020361A priority Critical patent/JPS58138081A/en
Publication of JPS58138081A publication Critical patent/JPS58138081A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To use even an a-Si layer between a transparent electrode on a glass substrate and a rear electrode on an amorphous silicon layer effectively, and to improve apparent conversion efficiency ina light irradiation region by making the shape of the transparent electrode larger than the rear electrode. CONSTITUTION:Spaces among the rear delectrodes 15 cannot be made to be 500mum or less by reason of the difficulty of mask alignment in case of evaporation, but spaces among the transparent electrodes 14 for which tin oxide, indium oxide, indium oxide.tin, etc. are used can be made to be 100mum or less because the electrodes 14 are processed through photoetching, and sufficient insulating property is maintained in the electrodes 14. On the other hand, the effectively utilizable region of the a-Si film can exist up to the outsides of the rear electrodes by at least 200mum in the light irradiation region. With the shape of the electroeles, the adjacent spaces of the rear electrodes are made to be 500mum- 1,000mum and the spaces of the transparent electrodes to be 50-100mum, and the transparent electrodes are protruded from the rear electrodes by at least 200mum.

Description

【発明の詳細な説明】 本発明はアモルファスシリコン太陽電池の電番形状に閤
するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention applies to the shape of an amorphous silicon solar cell.

アモルファスシリコン(17下ト11と略す)を用いた
典磨的な太−電池の構造は第111に示すように、可視
光を透過するガラス基板10上に逓鳴電112、硼素を
添加し九jllla−ai層3、不純物無添加e(@a
−aj層4、燐を添加した5lla−s4j15と堆積
し6としてオー4ツクコンタクト電響(後電榔)を付け
るもので光はガラス基1[1側から入射する。この21
%−太陽電池の光起電圧は0.6〜a9Vであり高電圧
を得るには該太陽電池を1列に有限段数つなげて用−る
The structure of a conventional thick battery using amorphous silicon (abbreviated as 17 and 11) is as shown in No. 111, in which a transmitter 112 is placed on a glass substrate 10 that transmits visible light, and boron is added. jlla-ai layer 3, impurity-free e(@a
-aj layer 4 is deposited with 5lla-s4j15 doped with phosphorus, and an oak contact electric wave (rear electric wave) is attached as 6, and light enters from the glass substrate 1 [1 side. This 21
The photovoltaic voltage of a %-solar cell is 0.6 to a9V, and to obtain a high voltage, a finite number of solar cells are connected in one row.

従来よ一用一られている直列線銃方法0All的な例と
して直列5股OM太陽電池の平1li11′1及び断面
図を111211biび(51に示す、・−−イ層10
を挾んで透明電極8と蕾電蓼9が5段並んでいて、9の
螢電極によりて隣の透明電1i8に*続され模に並んだ
5段が直列につながれている。ま−*12に二点鎖線に
示しえ領械に光が照射される。一般に螢電19はアルJ
ニウム、タロムなどの蒸着膜が用いられ電*aと9は同
一110形状10重ね合わされ19の後電極蒸着時t)
qスタ合わせ01111さによ抄隣警電響関隔は8,9
ともに少なくとも50071111は離さなければなL
なかつえ、しかし。
As an example of the conventionally used series line gun method, the flat 1li11'1 and cross-sectional view of a series 5-pronged OM solar cell are shown in 111211bi (51).
Transparent electrodes 8 and bud electrodes 9 are lined up in five rows with the electrode 9 in between, and are connected to the adjacent transparent electrode 1i8 by the electrode 9, so that the five rows arranged in a pattern are connected in series. Light is irradiated onto the area shown by the two-dot chain line in *12. Generally, Keiden 19 is Al J
A vapor-deposited film of Ni, Talom, etc. is used, and the electrodes *a and 9 are overlapped with the same 110 shape 10, and when the electrode is vapor-deposited after 19.
q star combination 01111 Sayyoshou next police telephonic barrier is 8,9
Both must be separated by at least 50071111 L
Nakatsue, but.

この方法では隣接電極幅500μ常は意味をなさず太陽
電池の齋換効率を低下させるの^であっ良、  ・本発
明は上r事実を鑑みて為された庵ので、その目的は該J
ll電電極間有効利用にある。
In this method, an adjacent electrode width of 500μ usually makes no sense and reduces the conversion efficiency of the solar cell. -The present invention was made in view of the above facts, and its purpose is to
This is due to the effective use of the space between the electrodes.

以下実施例に基づいて本発明の詳細な説明する。The present invention will be described in detail below based on Examples.

m5Nh1’Bびの)は本発明の電極形状を含むG−x
i太陽電池の平mI!ll及びlllI面図であ抄、1
5はガラス基板、14は透明電極、15は後電響、16
はa−aS膜、18は光照射領域である。螢電1i15
間は蒸着時のマスク合わせの困難さよs SOO声愼以
下にはできないか酸化錫、酸化インジウム、酸化インジ
ウムe錫などが用いられる透明電極14はフォトエツチ
ングによ抄加工されるので電極間隔は1001111以
下とでき、かつ十分な絶縁性が保てる。一方、光照射領
域内でa−aigの有効利用領域は後電舎に対して少な
くとも20OIII集外儒にまで存在し得る0本発明に
よる電極形状は、螢電極O隣緩関隔は500声淋〜H)
OO11欝、逓―電蓼聞陶は50〜1100jとし、透
明/11E極は後電響に対して少なくとも200s惰食
入dるよらにしである。
m5Nh1'Bbino) is G-x containing the electrode shape of the present invention
iSolar cell flat mI! Excerpt from ll and lll side views, 1
5 is a glass substrate, 14 is a transparent electrode, 15 is a back-electronic device, 16
is an a-aS film, and 18 is a light irradiation area. Keiden 1i15
The difference is the difficulty of mask alignment during vapor deposition.Is it possible to make it less than SOO?The transparent electrode 14, which uses tin oxide, indium oxide, indium e-tin oxide, etc., is processed by photoetching, so the electrode spacing is 1001111. The following can be achieved, and sufficient insulation can be maintained. On the other hand, the effective use area of a-aig within the light irradiation area can exist up to at least 20 OIII outside the area. ~H)
OO11, the transmitter should be 50 to 1100J, and the transparent/11E pole should be at least 200s inert to the after-electrophonic sound.

本発明は以上のよつな構造のため電響間(’)a −#
i層をも有効に使先、光照射領域内でhかけ上の賢換効
率は向上する。以下に従来例との比較として警光灯20
01sz下での蜜換効率を第1表に掲ける。
The present invention has the above-mentioned structure, so that the electrophonic interval (')a-#
The i-layer can also be used effectively, and the conversion efficiency over h can be improved within the light irradiation area. Below is a warning light 20 as a comparison with a conventional example.
Table 1 shows the honey exchange efficiency under 01sz.

第  1!I 第111!の普は1 (m X 1 ffiの竜ル3段
での値で。
Number 1! I 111th! The normal value is 1 (m x 1 ffi's value at 3rd stage of Ryuru.

透明電極間隔をBOs愼とした鳩舎、螢電極を750μ
惰位とするのが効率が一書よい。
Pigeon house with transparent electrode spacing as BOs, firefly electrode 750μ
It is much more efficient to coast.

t  l1slf)If単な説明 第1mIda−ai太陽電池の典−例、第211klは
第1@t)a−at太陽電池を盲列5段Kmんだものの
平1−で第21116)はその−面図、第51が本発明
による改皇例で−)は千−図、Φ)け−■−である。
t l1slf) If simple explanation of the 1st mIda-ai solar cell example, the 211kl is the 1st @t) a-at solar cell with 5 blind rows Km, and the 21116) is the - The 51st side view is the Imperial Revised Example according to the present invention.

1.7.1!S ・・・・・・ガラス基板2.8.14
・・・・・・透明電極 !、 4.5.10.14  ・・・・・・a−aシ層
4.9.15 ・・・・・・螢電極 以  上 出願人 株式会社 −訪精工會 代理人 弁理士 最上 陣
1.7.1! S...Glass substrate 2.8.14
...Transparent electrode! , 4.5.10.14 ・・・・・・a-a layer 4.9.15 ・・・・・・Firefly electrode and above Applicant: Hosei Kokai Co., Ltd. Agent Patent attorney: Jin Mogami

Claims (2)

【特許請求の範囲】[Claims] (1)  単一基板上に並列1愛されえ多段直列−アモ
ルファスシリコン太陽電i11にお−て、ガラス基板上
逓明電mを7七ル7アスシリコン層上の螢電響に対して
形状が大であるζ七を411徴とするアモルファスシリ
コン太陽電池。
(1) In parallel and series multi-stage amorphous silicon solar cells on a single substrate, the shape of the solar cells on a glass substrate is compared to that of 77 layers on a silicon layer. An amorphous silicon solar cell with 411 characters of ζ7, which is the largest.
(2)隣接透明電極間隔力!50stn〜100js、
隣II俵電極間隔が50011191L 〜10100
Oであり、かつ後電極に対して透明電極が少なくとも2
00j惰外儒に出ている特許請求の範11項記載のアモ
ルファスシリコン太陽電池。
(2) Neighboring transparent electrode spacing force! 50stn~100js,
Adjacent II bale electrode spacing is 50011191L ~ 10100
O, and the transparent electrode is at least 2 times the back electrode.
The amorphous silicon solar cell according to claim 11 appearing in 00j.
JP57020361A 1982-02-10 1982-02-10 Amorphous silicon solar cell Pending JPS58138081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57020361A JPS58138081A (en) 1982-02-10 1982-02-10 Amorphous silicon solar cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57020361A JPS58138081A (en) 1982-02-10 1982-02-10 Amorphous silicon solar cell

Publications (1)

Publication Number Publication Date
JPS58138081A true JPS58138081A (en) 1983-08-16

Family

ID=12024947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57020361A Pending JPS58138081A (en) 1982-02-10 1982-02-10 Amorphous silicon solar cell

Country Status (1)

Country Link
JP (1) JPS58138081A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107276A (en) * 1979-02-09 1980-08-16 Sanyo Electric Co Ltd Photoelectromotive force device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55107276A (en) * 1979-02-09 1980-08-16 Sanyo Electric Co Ltd Photoelectromotive force device

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