JPS5813587A - Oxazole derivative - Google Patents

Oxazole derivative

Info

Publication number
JPS5813587A
JPS5813587A JP56111458A JP11145881A JPS5813587A JP S5813587 A JPS5813587 A JP S5813587A JP 56111458 A JP56111458 A JP 56111458A JP 11145881 A JP11145881 A JP 11145881A JP S5813587 A JPS5813587 A JP S5813587A
Authority
JP
Japan
Prior art keywords
group
formula
compound
phenyl
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56111458A
Other languages
Japanese (ja)
Other versions
JPS6146476B2 (en
Inventor
Yoshiaki Tsuda
津田 嘉章
Tadahiro Doi
土肥 忠博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Pharmaceutical Co Ltd
Original Assignee
Otsuka Pharmaceutical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Pharmaceutical Co Ltd filed Critical Otsuka Pharmaceutical Co Ltd
Priority to JP56111458A priority Critical patent/JPS5813587A/en
Publication of JPS5813587A publication Critical patent/JPS5813587A/en
Publication of JPS6146476B2 publication Critical patent/JPS6146476B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)

Abstract

NEW MATERIAL:A compound of formula 1 (R is lower alkyl, phenyl, naphthyl or phenyl bearing 1-3 substituents selected from lower alkyl, halogenated lower alkyl, lower alkoxy, nitro and cyano groups; Y is O, S; n is 2, 3) and its salt. EXAMPLE:2,3,5,6-Tetrahydro-2-(4-methylphenoxymethyl)imidazo[2,1-b]oxaz ole. USE:Local anesthetic. Or its used as a preventive or remedy for thrombosis. PREPARATION:A halide of formula 2 (X is halogen) or epoxy compound of formula 3 is made to react with a diamine of formula 4 to give a compound of formula 5. Then, the product is made to react with carbon disulfide to form a compound of formula 6. Further, an alkyl halide of formula 7 (R' is halogen) is made to act on the product to give a compound of formula 8, on which a base is made to act to give the compound of formula 1.

Description

【発明の詳細な説明】 誘発−は新規なオキ苧ゾール誘導体に関する。[Detailed description of the invention] Induction- relates to novel oxazole derivatives.

本発明のオキ苧ゾール誘導体は文献未載の新規化金物で
あり、下記一般式(1)で表わされる。
The oxazole derivative of the present invention is a novel metal material that has not been described in any literature, and is represented by the following general formula (1).

〔式中翼は低級γルキル基、フェニル基、ナフチル基、
又は置換基として低級アル奉ル基、へ〇低級アル奉ル基
、低級テ#コキシ基、低級ア#キルチオ基、1F1基、
シアノ基、ハロゲン原子及びフエJLA/基から成る群
から選ばれた基を1〜1個有することのあるフェニル基
を示す、Yは酸素原子叉は硫黄原子を示す、nは8又は
8を示す、〕上記一般式(1)で表わされる化合物は局
所麻酔作用、皇小ll1a集組止作用を書し、局所麻酔
薬、血検値の予防乃至治療薬等として音用である。
[The wing in the formula is a lower γ-alkyl group, phenyl group, naphthyl group,
Or as a substituent, a lower alkyl group, a lower alkyl group, a lower tekoxy group, a lower alkylthio group, a 1F1 group,
Represents a phenyl group that may have 1 to 1 group selected from the group consisting of a cyano group, a halogen atom, and a FeJLA/group, Y represents an oxygen atom or a sulfur atom, and n represents 8 or 8. ,] The compound represented by the above general formula (1) has a local anesthetic effect and an anti-inflammatory effect, and is used as a local anesthetic, a preventive or therapeutic drug for blood test values, etc.

上記一般式(1m K 都いて示される各基は具体的に
は以下の通りである。
Each group represented by the above general formula (1m K) is specifically as follows.

低級アルキル基−・−メチル、エチル、プ曹ビル、イン
ブーピル、ブチル% t@rt−ブチル、ペンチル、へ
専シル基等。
Lower alkyl groups - methyl, ethyl, bicarbonate, imbupyr, butyl% t@rt-butyl, pentyl, hexamethyl group, etc.

ナフチル基・−・d−ナフチル基、I−ナフチル基響。Naphthyl group - d-naphthyl group, I-naphthyl group.

ハロゲン原子・・・・−、弗素原子、塩素原子、臭素原
子、沃素原子等。
Halogen atoms...-, fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc.

へ會低級アル専ル基−−)曽フルオロメチル。(lower alkyl group --) so-fluoromethyl.

ト曽プW令メチル、ト豐タロロメチル、シ曽璽−ドメチ
ル、雪−フルオ■エチル、!、!−ジフル第第 四1チル、8.意、鵞−シリフルオロエチル基等。
Tosopu W-rei methyl, Tofyo talolomethyl, Shiso-do methyl, Yuki-Fluo ■ ethyl,! ,! - diflu quaternary 1 thyl, 8. meaning, silylfluoroethyl group, etc.

低級アルコキシ基−・・・メトキシ、エトキシ、プロポ
キシ、インプロポキシ、ブトキV% t@rt−ブトキ
シ、ペンチルオキシ、ヘキシルオ専ν基等。
Lower alkoxy groups - methoxy, ethoxy, propoxy, impropoxy, butoxy V% t@rt-butoxy, pentyloxy, hexyl group, etc.

低級アルキルチオ基・−一メチルチオ、エチルチオ、プ
■ビJ?苧オ、インプ1ビルチオ、ブチルチオ、tar
t−ブチルチオ、ムンチルチオ、へ牟シルチオ基等。
Lower alkylthio group --1methylthio, ethylthio, pbiJ? Ramio, imp 1 virthio, butylthio, tar
t-butylthio, munthylthio, hemucylthio groups, etc.

置換基として低級アルキル基、八−低級アルキル基、低
級アルコキシ基、低級アルキルチオ基、凰トー基、シア
ノ基、ハロゲン原子及びフェニル基から成る群か6II
ばれた基をト1個有することのあるフェニル基−Mh−
・フェニル、雪−メチルフェニル、8−メチルフェニル
、4−メチルフェニル、4−エチルフェニル、4−プロ
kPルフエエル。
As a substituent, a group consisting of a lower alkyl group, an 8-lower alkyl group, a lower alkoxy group, a lower alkylthio group, a cyano group, a halogen atom, and a phenyl group or 6II
Phenyl group -Mh- which may have one exposed group
- Phenyl, snow-methylphenyl, 8-methylphenyl, 4-methylphenyl, 4-ethylphenyl, 4-prokPrufeel.

4−イVプロピルフエ晶ル、1.4−ジメチルフエ1ル
、1.1.4− )曽メチルフェニル、茸、畠、暴−ト
曽メナルフエエル、fi、8.II−)讐メナルフェニ
ル。
4-V propyl phenol, 1.4-dimethyl phenol, 1.1.4-) so methyl phenyl, mushroom, hatake, butto so menal phenyl, fi, 8. II-) Menalphenyl.

鵞−ト讐フルオロメチルフェニル、l−シ響フルオロメ
ナルフエエル、4−トリフルオロメナルフエエル、I−
)響プロ令メナルフエエル、@−)曹夕WWメチルーブ
エエル、ロー)響曹−ドメチルフェニル、冨−メトキシ
フェニル%8−メトキシフェニル、4−メトキシフェニ
ル、4−メトキシフェニル、4−プロポ専ジフェニル、
4−4ツブ嘗ポキシフ工エj4/%4−ブトキシフ工具
ル、4−電・rt−ブト奉ジフェニル、雪−メチルチオ
フエ二N、S−メチルチオフェニル、4−メチルチオフ
ェニル、冨−ノナルー4−メチルチオフェニル。
Fluoromethylphenyl, l-trifluoromethanalphenyl, 4-trifluoromenalphenyl, I-
) Hibiki Pro Menal Huel, @-) Soyu WW Methyl Buel, Lo) Hibiki So Do Methylphenyl, Tomi-Methoxyphenyl% 8-methoxyphenyl, 4-methoxyphenyl, 4-methoxyphenyl, 4-propo diphenyl,
4-4 tsubupaku poxifu 4/% 4-butoxifutur, 4-electro-rt-butofondiphenyl, snow-methylthiophenyl, S-methylthiophenyl, 4-methylthiophenyl, 4-nonal-4-methylthio Phenyl.

3−メチル−4−メチルチオフェニル、重−エトロフエ
JLk、IB−二トロフェニル、4’ = Jl−、)
ロフエエル、!−シテノフエ凰ル、3−シテノフエ1ル
、4−シTノフェニル、1−タIIロフエエル。
3-Methyl-4-methylthiophenyl, deuterophene JLk, IB-nitrophenyl, 4' = Jl-,)
Lofuel,! -cytenophenyl, 3-cytenophenyl, 4-cyTnophenyl, 1-taII lophel.

8−フルオロフェニル、4−ブロムフェニル、鴛。8-fluorophenyl, 4-bromphenyl, raccoon.

8−シタuvxフェニル、2.4−シタwwフエ二k。8-cyta uvx phenyl, 2.4-cyta ww phenyl.

露、4−ジフルオロフェニル、冨、4−ジプロ毫フェニ
ル、冨−フエJLJa/フェニル、8−フェニルフェニ
ル、4−フェニルフェニル基部。
4-difluorophenyl, 4-diprophenyl, 4-diprophenyl, 4-phenyl, 8-phenylphenyl, 4-phenylphenyl.

本発明の化合物は種々の方1mよりIl!jll廖れ尋
が、その#Fましい一例を挙げれば以下に示す方法によ
り製造される。
The compounds of the present invention can be obtained from various types of Il! One example of the most preferred example is the method shown below.

(1)                 (至))1
−Y−cImQICH*−MH(CHs )IINI1
0H(6、 〔式中Xはハロゲン原子、Wはハロゲン原子を示す。翼
及びYは前記に同じ、〕 即ち本発明化合物は、一般式0で麦わ富れる公知のハロ
ゲン化金物又は一般式(3)で表わされる公知のエポキ
シ化合物と一般式(4)で麦わ富れる公知のシア電ンと
を反応させ、次いで得もれる一般式(I)で表わ書れる
化合物に二硫化炭素を反6m昔、更に得られる一般式(
6)て表わされる化合物に一般式(n″′e表わされる
ハロゲン化アルキルを反応さぜ、最後に得られる一般式
(1)で表わされる化金物に塩基を作用審昔ることによ
り製造される。
(1) (to))1
-Y-cImQICH*-MH(CHs)IINI1
0H (6, [In the formula, X represents a halogen atom, W represents a halogen atom, and the wings and Y are the same as above.] That is, the compound of the present invention is a well-known metal halide having the general formula 0 or having the general formula A known epoxy compound represented by (3) is reacted with a known cyanide rich in general formula (4), and then a compound represented by general formula (I) obtained is reacted with carbon disulfide. A long time ago, we obtained the general formula (
6) It is produced by reacting the compound represented by the formula (n'''e) with an alkyl halide represented by the general formula (n'''e), and finally reacting the resulting metal compound represented by the general formula (1) with a base. .

一般式(り又は(3)の化合物と一般式(4)の化合−
との反応は遥常連@−・溶媒中にて行なわれる。溶媒′
1::。
Compound of general formula (ri or (3) and compound of general formula (4) -
The reaction with is carried out in a regular solvent. solvent'
1::.

:11 としては反応に悪影響を及ぼさないものであれば各種の
有機溶媒を成(使用で命、例えばメタノール、エタノー
ル、インプロパツール勢の低級アルコール類、ジエチル
エーテル、テトラ−ドロフラン、ジオキ量ν等のエーテ
ル類、ベンゼン、トルエン、キシレン等の芳香族炭化水
**、酢酸エナル等を挙げ墨ことがで會墨、一般式奪)
又は0)の化金物と一般式k)の化金物との使用開会と
して韓特に限51!されず広い範囲内て適宜選択し得る
が、通常前者に対して後者を少なくとも等4ル量程度、
好ましくは6〜7倍4J&/量用いるの′#よい、該反
応牌富温及び加温下のいずれでも行ない得るが。
:11 Various organic solvents can be used as long as they do not adversely affect the reaction. Ethers, aromatic hydrocarbons such as benzene, toluene, xylene, etc., enal acetate, etc. can be mentioned (in Japanese)
Or use of the chemical compound of 0) and the chemical compound of general formula k) in Korea, especially limited to 51! Although it can be selected as appropriate within a wide range, usually the latter is at least an equal amount to the former.
It is preferable to use 6 to 7 times the amount of 4J, although the reaction can be carried out either at high temperature or under heating.

筒部の沸点付ff1E′C[応は好適に進行し、一般に
1〜1・時1iaii度にて反応は終了する。
The boiling point of the cylinder part ff1E'C [The reaction proceeds suitably and generally ends at 1 to 1.h1iaii degrees.

−1式藝)の化金物と二硫化炭素との!IL応は、無嬉
媒又は適当な溶媒中にて行なわれる。溶媒としてはIL
応に悪影響を及ぼ寝ない限り各種の有機溶媒を広く使用
て会、具体的には前記低級アルコール類、前記エーテル
類、前記芳香族炭化水素類等を例示で會る。これらのw
lP躯のうちでも低級アルコール類が特に:tI7F達
である。一般式CIの化金物と二硫化炭素との使m割舎
としては待に隈定かなく広い範−内で適宜選択すればよ
いが、通常前者に対して後者を少なくとも等峰ル量一度
、好ましくは等モル〜嵩倍脅ル量程度層いるのがよい0
反応温度とじては特に限定がなく水冷下、室温下及び加
温下のいずれでも行ない得るが、通常は室温付近で1〜
B時間程度反応させた後、溶媒を論来し、次いで跣置物
を160〜1sO″1o11度家て加温するのがよい、
所(して一般式(6)の化金物が生成する・ 、 一般式(・)の化合物と一般式(7)の化金物との
反応は−歓に有機溶媒中にて行なわれる。有機簿媒とし
ては反応に悪影響を及ぼさないものを広(使用て会、具
体的にはメタノール、エタノール等の低級アルコ−5p
as−塩化炭素、塩化メチレン、り四■傘ル五等のハロ
ゲン化炭化水素類、T七゛トン、テトラkpmフラン等
を例示で会る。一般式(6)の化合物と一般式(ガの化
合物との使用開会としては特に@jl書れず広いIIW
内で適宜選択することがで会るが、通常前者に対して後
者を等令ル〜10倍4#量程度、#會しくは1. i 
−s倍峰ル量程度用いるのがよい、請反応は冷却下、室
温下及び加温下のいずれKmいても進行するが、好まし
くは室温付置にで行なわれる。jKお時間は通常1〜1
・時111111Ev&i。
-1 formula) metal compound and carbon disulfide! The IL reaction is carried out without a solvent or in a suitable solvent. IL as a solvent
A wide variety of organic solvents may be used as long as they do not cause any adverse effects.Specifically, the lower alcohols, ethers, aromatic hydrocarbons, etc. are exemplified. These w
Among the 1P compounds, the lower alcohols are especially: tI7F. The combination of the metal compound of the general formula CI and carbon disulfide may be appropriately selected within a wide range, but it is usually preferable to mix the latter in at least an equimodal amount with respect to the former. It is better to have a layer of equimolar to bulk threatening amount 0
The reaction temperature is not particularly limited and can be carried out under water cooling, at room temperature, or under heating, but usually at around room temperature
After reacting for about B hours, add the solvent, and then heat the pot at home at 160~1sO''1o11 degrees.
The reaction between the compound of general formula (-) and the metal compound of general formula (7) is generally carried out in an organic solvent. As a medium, use a wide range of solvents that do not have a negative effect on the reaction (specifically lower alcohols such as methanol and ethanol).
Examples include halogenated hydrocarbons such as carbon chloride, methylene chloride, chloride, T7ton, and tetrakpm furan. The use of the compound of general formula (6) and the compound of general formula
You can choose the appropriate amount within the range, but usually the latter is about 10 times the amount of the former, and the amount of the latter is about 1. i
It is preferable to use an amount as high as -s.The reaction proceeds whether under cooling, at room temperature, or under heating, but is preferably carried out at room temperature. jK time is usually 1-1
・Time 111111Ev&i.

一般式(至))の化合物Km基を作用させるに際しては
1反応に悪影響を与えない有機溶媒中1例えばメタノー
ル、エタノール、インプロパツール等の低級γk :i
 −J@/ [、ア七トン、テトラkFロフラン等の溶
媒中又は水中にて行なうのがよい、#1基としては従来
公知のものを広く便用で命、例えばアン令エア、ト讐エ
チルアミン等の有機塩基類、炭酸す)リウム、炭酸カリ
ウム、重炭酸・すトリウム等の無機塩基を挙げるξとが
で会墨、 !Ifrtp番塩基の使用量としては特に限
定されないが、通常−毅式<111の化合物に対して等
44/〜墨・倍4IIII量、好ましくは等そル〜6倍
モル量用いられる。該反応は冷却下、室温下及び加温下
のいずれでも°行ない得るが、室温=:う、(10℃程
度にて好適に進行する。またIL応時間は通常1〜go
時間程度である。
When reacting with the compound Km group of the general formula (to)), use lower γk such as methanol, ethanol, and impropatol in an organic solvent that does not adversely affect the reaction.
-J@/[, ethylamine, tetrakF, etc., or in water. As the #1 group, conventionally known ones are widely used. List organic bases such as sodium carbonate, inorganic bases such as potassium carbonate, strium bicarbonate, etc. The amount of Ifrtp base to be used is not particularly limited, but it is usually used in an amount of 44/- to 4-fold molar amount, preferably in an amount of 4- to 6-fold molar amount, relative to the compound of formula <111. The reaction can be carried out under cooling, at room temperature, or under heating, but it proceeds suitably at room temperature = about 10°C.The IL reaction time is usually 1 to 10°C.
It takes about an hour.

断(して本発明の化合物が製I11される。The compound of the present invention is prepared by cleavage.

所(して得られる本発明の化合物は、慣用の分一手段1
例えば溶媒抽出、再結晶、力予ムり■マシダラフイー等
により[応混合物から容易に単一精製される。
The compound of the present invention obtained by
For example, it is easily purified in a single form from a reaction mixture by solvent extraction, recrystallization, force extraction, etc.

本発明化合物は1通常の薬理的に許容し得る酸と容易に
塩を形威し得る。斯かる酸としては、例えば硫酸、硝酸
、II1酸、臭化水素酸等の無機酸、lk酸* p−ト
ルエンスルホン酸、エタンスルホン酸、シェラ駿、マレ
イン酸、コハタ酸、安息香酸等の有機酸が拳げ修れ番。
The compounds of the present invention can easily form salts with common pharmacologically acceptable acids. Such acids include, for example, inorganic acids such as sulfuric acid, nitric acid, II1 acid, and hydrobromic acid; It's time to fix the acid.

次に本発明の化合物について参考例及び実施例を挙げI
Iらに異体的に示すが、本発明化合物はζ゛れらE1m
電害れるものでi象ない。
Next, reference examples and examples of the compounds of the present invention are listed.
The compound of the present invention is shown as a variant in I et al.
I don't think there is anything that could cause electrical damage.

参考例1 エチレンシア電ンS4炉をメタノール866m/に加え
、60〜テO℃に加温しつつ%t、s−エポキシプロビ
ル(4−メチル7エエル)エーテル$・tのメタノール
溶液lO@−を1時間にわたって滴下する0滴下終了後
、意時間還流し、次いで溶媒及び31#Jのエチレンジ
ytνを減圧下に留資す番と、残渣として1−(鵞−ア
電ツェナ〃ア電))−1−(4−メチルフェノキシ)−
意−プロパツールが得られる。
Reference Example 1 Add 866 m/m of methanol to an ethylene-cyaden S4 furnace and heat to 60 - 0°C while preparing a methanol solution of %t, s-epoxyprobyl (4-methyl 7 ether) ether $/t. - was added dropwise over 1 hour. After the completion of the 0 dropwise addition, the solvent was refluxed for an hour, and then the solvent and 31 #J of ethylene diytν were retained under reduced pressure, leaving a residue of 1- -1-(4-methylphenoxy)-
Meaning - Proper tools are available.

上記で得られる1−(1−Ttノエチルテ電))−It
−(4−メチルフェノキシ)−露一プaパノールを単一
することなく、この残渣をエタノール160−に溶解し
、二硫化炭素霊@ mJFを−えると沈殿物を生成す墨
、1時間放置した後、デカンテーシ■ンで沈殿物を分取
し、油浴上にて徐々に1寓・℃まで加温し、更にl雪O
℃で1時間加温を続ける。この反応生成物に熱時、イン
プロパノール雪・Om/を加え墨、冷後析出する結晶を
f取し、インプロパノ−ルーメタノールより再結晶して
融点141〜14!℃のl−〔2−ヒドロキシ−畠−(
4−メチルフェノキシ)プロピルツー2−イ電ダシリジ
ンチオン819を得る。
1-(1-Ttnoethylteelectron))-It obtained above
- (4-Methylphenoxy) - Dissolve this residue in ethanol 160- without separating the panol and add carbon disulfide spirit @ mJF to form a precipitate. Leave it for 1 hour. After that, the precipitate was collected using a decantation machine, heated gradually to 1°C on an oil bath, and further heated to 1°C.
Continue heating at ℃ for 1 hour. Add impropanol snow/Om/ to this reaction product while it is hot, collect the precipitated crystals after cooling, and recrystallize from impropanol/methanol to obtain a melting point of 141-14. l-[2-hydroxy-Hatake-(
4-Methylphenoxy)propyl2-idendasyridinethione 819 is obtained.

実施例1 2、s、墨、@−テトラヒドロー2−(4−メチルフェ
ノ率ジメチル)イミダゾ(Ll −b )オキサゾール
の製造 1−(怠−ハイFOキシ−8−(4−メチルフェノキシ
)プロピルツー意−イ電ダシリジンチオン轟f、II−
化メチルsmlを1412100wl中に加え、室温下
1時間撹拌する。析出した結晶をろ取し、この結晶を、
炭酸力969を溶解した水100−と酢酸エチルエステ
ル100rrd!の滉合液中に加え10分間撹拌する。
Example 1 Preparation of 2,s, black, @-tetrahydro-2-(4-methylphenol dimethyl)imidazo(Ll-b)oxazole 1-(lazy-highFOxy-8-(4-methylphenoxy)propyl2) -Idenda syridine thione Todoroki f, II-
Add sml of methyl chloride into 1,412,100 wl and stir at room temperature for 1 hour. The precipitated crystals are collected by filtration, and these crystals are
Water with 969 carbonic acid dissolved in it and 100 rrd of acetic acid ethyl ester! Add to the mixture and stir for 10 minutes.

有機層を分取し、乾燥(MgSOn)、l)縮して得ら
れる油状物質にインプロピルアルコール100 ml!
を加えて8時間還流する0反応液を濃縮して得られる結
晶を酢酸エチルエステル−イソプロビルエーテルより再
結晶して!!、ml、5.@−テトラヒドロ−鵞−(4
−メチルフェノ4Pvメチル)イミダゾ(1,1−b 
)オキ苧ゾールを得る。
Separate the organic layer, dry (MgSOn), and add 100 ml of inpropyl alcohol to the oily substance obtained by condensation.
was added and refluxed for 8 hours. The resulting crystals were recrystallized from ethyl acetate-isopropyl ether! ! , ml, 5. @-tetrahydro-goose-(4
-Methylpheno4Pvmethyl)imidazo(1,1-b
) Obtain oxamizol.

融点 111s−117℃ ′、′。Melting point: 111s-117℃ ′、′.

実施例1と同様にして下記第1表に記載の実施例2〜8
の化合物を得る。
Examples 2 to 8 described in Table 1 below in the same manner as Example 1
The compound is obtained.

第1表 実施例9 意、3.・、チーテトラヒドロ−!−7エエルチオメチ
ルーlll−オキ豐ゾロ(11,1−1)ビWtジン・
沃化水素酸塩の製造 1−(鵞−へイドロキシー畠−フエエルチオプロビル)
パーヒドロビ9tジンー鵞−ナオン畠炉及び沃化メナル
畠m/をアセトン1@(IgmjK加え、室温下1時間
撹拌する。析出する結晶をデ取し、この結晶をエタノー
ル166 m/及び18鳴アン令工ア水10m/の滉合
鍍中に加え、8時間撹拌する。IILtPfItを濃縮
して得られる結晶を酢酸エチルエステル−エタノールよ
り再結晶して訂も・。
Table 1 Example 9 3.・、Cheetetrahydro! -7Elthiomethyl-lll-Okifyo Zoro(11,1-1)BiWt Jin・
Production of hydroiodide salt 1-(Hydroxy Hatake-Fuelthioprobil)
Perhydrobin 9t Gin-Naon Hatakero and iodide Menal Hatake m/ are added with acetone 1@(IgmjK) and stirred at room temperature for 1 hour. The precipitated crystals are collected, and the crystals are mixed with ethanol 166 m/ and 18 Mei-an Rei. The mixture was added to a boiler containing 10 m/ml of industrial water and stirred for 8 hours.The crystals obtained by concentrating IILtPfIt were recrystallized from ethyl acetate-ethanol.

チーテトラヒドロ−意−フェニルチオメチルーSH−オ
キ号ゾロ〔載ト1〕ビvtsPン・沃化水素酸塩を得墨
、融点18マ〜1s11℃実施例・と同様にして下記第
意表に記載の実施例10〜14の化合物を得る。
Cheetetrahydro-phenylthiomethyl-SH-oxyzozoro[1]bivtsP-hydriodide was obtained, melting point 18 mm - 1s11℃, described in the following table in the same manner as in Example. The compounds of Examples 10 to 14 are obtained.

第意表 昭和57年5月27日 特許庁長官殿 1、事件の表示 昭和56年 特 許 願第 l1」58号3、補正をす
る者 事件との関係  特許出願人 棒弐金社 大框纒繭工場 4、代理人 大阪市東区平野町2の10平和ビル内電話06−203
−0941(代)(6521)弁理十三 枝、英 ニ ア° 補LE(7)対象 −纏書中発明0IIPjll
な説明am8、補正の内容 別紙添附の通り 補  正  の  内  容 1 明細書第19頁に記載の構造式を下記り遥)訂正す
る。
Announcement May 27, 1980 Mr. Commissioner of the Japan Patent Office 1, Indication of the case 1988 Patent Application No. 11'58 No. 3, Relationship with the person making the amendment Patent applicant Bo Nikinsha Okata Kinyu Factory 4, agent, Heiwa Building, 2-10 Hirano-cho, Higashi-ku, Osaka Phone: 06-203
-0941 (6521) Patent Attorney 13 Branch, English Near ° Supplementary LE (7) Subject - Invention in Book 0IIPjll
Am8, Contents of Amendment As shown in the attached sheet, Contents of Amendment 1: The structural formula described on page 19 of the specification is corrected as shown below.

c以 上)c and above)

Claims (1)

【特許請求の範囲】 ■ 一般式 〔式申鳳は低級アルキル基、フェ五ル基、ナフナル基、
又は置換基として低級アル◆′ル基、6審低級γに専ル
基、低級アルコキシ基、低級チルキルチオ基、1トロ基
、シアノ基、八−ゲン原子及びフェニル基から成る群か
ら還ばれた基をt−S個有することのあるフェニル基を
示す。 Yは酸素原子又は硫黄原子を示す、1Fは2又は8を示
す、〕 て麦わ書れ墨オキ豐ゾール誘導体及びその塩。
[Claims] ■ General formula [The formula Shenho is a lower alkyl group, a phegoryl group, a naphnal group,
Or, as a substituent, a group returned from the group consisting of a lower alkyl group, a 6th grade lower γ group, an exclusive group, a lower alkoxy group, a lower thylkylthio group, a 1tro group, a cyano group, an octagen atom, and a phenyl group. Indicates a phenyl group that may have t-S numbers of. Y represents an oxygen atom or a sulfur atom, and 1F represents 2 or 8.] Temuwaakire ink oxfyo sol derivatives and salts thereof.
JP56111458A 1981-07-15 1981-07-15 Oxazole derivative Granted JPS5813587A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56111458A JPS5813587A (en) 1981-07-15 1981-07-15 Oxazole derivative

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56111458A JPS5813587A (en) 1981-07-15 1981-07-15 Oxazole derivative

Publications (2)

Publication Number Publication Date
JPS5813587A true JPS5813587A (en) 1983-01-26
JPS6146476B2 JPS6146476B2 (en) 1986-10-14

Family

ID=14561737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56111458A Granted JPS5813587A (en) 1981-07-15 1981-07-15 Oxazole derivative

Country Status (1)

Country Link
JP (1) JPS5813587A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013062079A1 (en) * 2011-10-28 2013-05-02 大正製薬株式会社 Dihydroimidazooxazole derivative

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0189373U (en) * 1987-12-03 1989-06-13
JPH0530772U (en) * 1991-09-30 1993-04-23 横河電機株式会社 Frequency signal measuring device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013062079A1 (en) * 2011-10-28 2013-05-02 大正製薬株式会社 Dihydroimidazooxazole derivative

Also Published As

Publication number Publication date
JPS6146476B2 (en) 1986-10-14

Similar Documents

Publication Publication Date Title
JP2556722B2 (en) Novel sulfonamide compound
JPS5824585A (en) Novel theophylline derivative and manufacture
US1970656A (en) Thiazole compound and process of producing the same
JPS5813587A (en) Oxazole derivative
US2679500A (en) Substituted m-thiazane-x-ones
CA1157864A (en) Substituted triaryl thiazole compounds
US4287348A (en) Preparation of sulphoalkyl quaternary salts
Fry et al. 374. The formation and fission of quaternary salts of heterocyclic bases containing reactive alkylthio-groups
US1767423A (en) Arylaminoalcohol compound
JPS6225148B2 (en)
JPS5936627B2 (en) Production method of indazole derivatives
US2799675A (en) Amino propane derivatives and process
Youtz et al. Trimethyl-and trimethylethylthiophene
US1073380A (en) N-halogenalkyl-c c-dialkylbarbituric acids and preparation of the same.
JPS5821634B2 (en) Shinkyimidazo (1,2-A)S- Triazine Ruinoseizohouhou
US2945031A (en) Methylenedioxy substituted phenothiazines
JPS59130281A (en) Manufacture of thiazolidine derivative
US2784194A (en) Phenacylsulfonyl pyridine compounds
JPS623150B2 (en)
DE1914016C (en) Process for the preparation of 4,5 benz isothiazol 3 on 1 oxyden
JPS5931512B2 (en) Method for producing triazolobenzazepine derivatives
JPS591716B2 (en) Method for producing alkyl sulfonic acid esters of 1,3,2-oxaazaphosphere-cyclic compounds
US2905689A (en) Process for preparing rhodanines
US3074956A (en) Oxazoline compounds and method for producing same
US2833774A (en) Quaternized thiofuramide derivatives