JPS58133366A - Electroless copper plating solution - Google Patents
Electroless copper plating solutionInfo
- Publication number
- JPS58133366A JPS58133366A JP1539882A JP1539882A JPS58133366A JP S58133366 A JPS58133366 A JP S58133366A JP 1539882 A JP1539882 A JP 1539882A JP 1539882 A JP1539882 A JP 1539882A JP S58133366 A JPS58133366 A JP S58133366A
- Authority
- JP
- Japan
- Prior art keywords
- pyrrolidone
- plating solution
- electroless
- silver
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
本発明0無亀解鋼めっき液、詳しくは、^い引wIkり
!lj[1%つめっき銅か得らnる無電解鋼めっ@液に
関する。[Detailed Description of the Invention] For more details about the present invention 0 no-melting steel plating solution, click here! Regarding electroless steel plating solution obtained from lj [1% plating copper].
無電解鋼めりl!猷から得らrしるめっ龜−の嶺械的籍
性を向上させる丸めのN鈍研究は、こn筐でにも盛んに
行なわれてきて2り、又極在でも盛んな理由の1つは、
この無電解鋼めっき技術t7’Jント配maの回路形成
に応用すると大きな効果が生1nるからであるofなわ
ち、プリント配線板の回路に年々′i11密腋化してお
り、違う次面の圓#6を導通石せるスルホール径に増々
小嘔くなってさている0仁のLつな傾向において、電気
めっき方法に較べて、Jf向部分とスルホール内壁面の
めっ龜犀さKidの生じにくい無電解鋼めっきか期待さ
nているわけである0ま次無電解鋼めっき、電気鋼めっ
1&t−おこない、回路以外のv14t−エツチング除
去する方法においては、エツチングによりアンダーカッ
ト(鋼の厚さ方向において1表面部分はエツチングレジ
ストの膜で寸法か保持さnるtのの、基板近傍でaエツ
チングか、ぶり進行する沈めに回路Tljr向が逆台形
になる・)が生じる几め細栂回路をつくるのに難しい@
CnK対して、無電解鋼めっきでは回路部分だけをめり
きで付与するのでアンダーカットの問題がなくVjJ路
の#I鱒化KJ利である0
しかし、これまでの多くの無電解鋼めっき液から侍らn
るめっき銅に一般にプリント配II!板の回路形成に用
いられているビロリン酸鋼電気めっ自から得らnる鋼に
比べ引張り1m[お↓び畿に4べる方法で調定した耐折
疲労強度に於て劣りている友めにグリント配III板に
部品搭軟後、中日あけに!!ff1Ilなどで一路が切
断し中すいなどの欠点が参る。Electroless steel milling! The research on N-blunt rounding to improve the mechanical properties of the r-symbols obtained from the pigeon has been actively carried out in recent times, and there are two reasons why it is so popular even in Japan. One is
This electroless steel plating technology has great effects when applied to the circuit formation of printed wiring boards. Compared to the electroplating method, it is less likely to cause hardness on the Jf facing part and the inner wall surface of the through hole, compared to the electroplating method. 0-order electroless steel plating, electric steel plating 1&t-etching, which is expected to occur with electrolytic steel plating, and removing etching from areas other than circuits, undercuts (in the thickness direction of the steel) are removed by etching. In the first surface part, the dimension is maintained by the etching resist film, but as the etching progresses near the substrate, the circuit Tljr direction becomes an inverted trapezoid as the etching progresses. Difficult to make @
In contrast to CnK, in electroless steel plating, only the circuit parts are plated, so there is no undercut problem and the VjJ path is #I trout KJ advantage. samurai et al.
Generally printed on plated copper II! Birophosphate steel, which is used to form circuits on plates, is inferior to steel obtained from electromechanical steel in terms of tensile strength of 1 m [↓ and bending fatigue strength measured by the 4-beam method]. After installing the parts on the Glint distribution board for my friend, I'm going to open Chunichi! ! With ff1Il, etc., there are disadvantages such as one line being cut off and the middle being empty.
ビロリン酸銅電気めつ哀から得らnる鋼の引g&9債度
に一般に50〜60kg/m、オ九耐折欽労!IIII
Lは1500〜2100回でめゐ・これに対し、工業的
なレベルで使用さnている無電解鋼めっきから得らn、
;b*の引張り強度に約50kg/m、t7を耐折疲
労!!1lKU800〜1100回でめる・
配IIi&glIIIIか高密度な配線嶺でに1同時に
^いI[I絖償顧性が要求さnるので、無電解鋼めり自
に、*紀し7tjl由で配線のIIII密度化には有利
であってtはとんと使用名nていないのが現状でめる。Generally, the tensile strength of the steel obtained from birophosphate copper electrolyte is 50 to 60 kg/m, and the nine-hour reduction is required! III
L is 1,500 to 2,100 times.In contrast, L is obtained from electroless steel plating, which is used at an industrial level.
;b* tensile strength of approximately 50kg/m, t7 bending fatigue resistance! ! It can be completed in 800 to 1100 times for 1 KU. Since high-density wiring or high-density wiring is required, it is necessary to use electroless steel at the same time. It is advantageous for increasing the density of wiring, and at present, t is not commonly used.
不発1jQtzこのLうな点に鎌みてなさrtたもので
、銅塩、錯化刑、還元剤s1−↓びPH調整剤を含む無
電解めっき液k、金属銀、ヨク化嫁おLび金属鉛の少な
くとも一檀と、ピロリドン類、a−ビペリドンおLび脂
肪族ア(〕&の少なくとも−ate添加したことtq#
愼とするtので6る0金属銀、ヨク化銀又に金属鉛に、
ピロ替トン@%a−ピペリド/又に盾肪族アイノ鐵と併
用して#加する場合に、ピロリドン類、α−ピペリドン
又は脂肪族アミノ歳だけt添加するII曾に較べてめっ
哀調の引張強1Kを向上させることかでき、又同時に^
い耐折疲労強IILか得らnる・こnらの金属銀、曹つ
化銀又は金属鉛のam菫は1mg/Jあれば充分である
が、これ工p多くてもめりき液か不安定になり分解する
ということはない・こt′Lは、金属−1冒り化銀又に
金属鉛の溶解度が極めて小さい次めである。水に対して
金属鋼は25℃の場合に2,8 X 10−’ g/I
、曹つ化銀に20℃の1曾K Z、5 X 10−’
g/4 %金属鉛に24℃の1曾に五1xlO−’g/
jである。*m*、曹り化銀又は金Jlll鉛の溶解度
に上記し7を工うに惚めて小さいが、め−)1!銅の引
張p彊度の向上とlW1時に高い耐折疲労強度を得るた
めには充分な負度である。Unexploded 1j Qtz This L was not found in the point, and it contained copper salt, complexing agent, electroless plating solution containing reducing agent s1-↓ and PH adjuster, metallic silver, yokuwagyome and metallic lead. and at least -ate of pyrrolidones, a-biperidone and aliphatic a()&tq#.
I'm afraid of metal silver, silver iodine, or metal lead,
When added in combination with pyrrolidones, α-piperidone, or aliphatic amino acids, the effect is much worse than in II, where only pyrrolidones, α-piperidone, or aliphatic amino acids are added. It is possible to improve tensile strength 1K, and at the same time ^
1 mg/J of am violet of metallic silver, silver sulfide, or metallic lead is sufficient to obtain high bending fatigue strength IIL. It becomes stable and does not decompose.This is because the solubility of metal-1, silver oxide, or metal lead is extremely low. Metallic steel in water at 25°C is 2,8 x 10-' g/I
, silver carbonate at 20°C 1 K Z, 5 x 10-'
g/4% metallic lead at 24°C 51xlO-'g/
It is j. *m*, I fell in love with the solubility of silver sulfide or gold Jlll lead mentioned above, and it is small, but me-) 1! This is a sufficient negative degree to improve the tensile strength of copper and to obtain high bending fatigue strength at 1W1.
金属銀1Mり化銀又に金属鉛に、15〜5mの紋状慣粒
状又は初末状のものが使用される・ピロリドン類、α−
ピペリドンおよび脂肪族アイノ駿の少なくと%tilt
−添加しなかつ7を1曾。Metallic silver 1M silver chloride or metallic lead is used in the form of 15 to 5m grains or primary powders.・Pyrrolidones, α-
At least %tilt of piperidone and aliphatic ainoshu
- 1 hour of 7 without addition.
丁なわち、*X*、ヨク化銀お工び金属鉛の少な(と%
1樵だけftg&加し7を1曾におこり易いめりamの
分解を抑制することかでIゐ・ピロリドン@には水浴性
高分子であるポリビニルピロリドンをにじめ2−ピロリ
ドン、5−ビロリドン、N−メチル−2−ピロリドン、
4−メチル−2−ピロリドン、5−メチル−2−ピay
トン、N−エチル−2−ピロリド/、N−イソノロビル
−2−ピロリドン、N−ブチル−2−ピロリドン%N−
アイルー2−ピロリドン、N−7セテルー2−ピロリド
ン、1−7s=ルー2−ピロリドン% 4−7 sニル
−2−ピロリドン、 5−フェニル−2−ピロリドン
、N−7セチルー4−2エニルー2−ピロリドン、1−
フェニル−3−ビルリドン−2−カルポン+L1−フエ
ニル−5−ビルリドン−2−カルボン酸エテルエステル
@5−7xニル−5−ピロリドン−2−カルボ;/11
. 1−7.ニル−2−ピロリドン−5−カルボン緻s
1 フェニル−5−ピロリドン−3−カルボン酸
、2−ピロリドン−5−カルボン酸、1−7オノー2−
ピロリジノン等がある。いずtのピロリドン類も効果に
あるが、なかでも2−ピロリドン、メチル−2−ピロリ
ドン、エチル−2−ピロリドン、ビニル−2−ピロリド
/お↓びフェニル−2−ビロリドンか良い◎
α−ピペリドンに2−ピロリドンに近似の構造でめpl
2−ピロリドンが5員環であるのに対して、α−ピペ
リドンは六員環でめる・Sa肪肪族アノ域としては出N
(CH諺)ncOOHで機わされるもので、fiが1
〜5が通轟で、カえばnx2のものとしてβ−アラニン
11−3のものとしてγ−7ミノ#Ae1.m n
=4のものとしてホキピペリジン酸がある。こnらのビ
ルリドン類、α−ピペリドンお工び脂肪族ア建ノ酸の龜
澗童はα02tt/J以上、好筐しくに[LO5〜10
11/I、最4flL<は、1〜51/1である◎添加
量が102g/j未満の#h甘はめり龜液の安定性が低
下する0添加重が多くても悪影響は与えないが、一般に
10 g/4 t−超える#&2Xlは不必賛である〇
本発明においてベースとなる無電解鋼めっき液はとくに
骨殊な配付のものでにない。銅塩。In other words, *X*, the amount of metal lead produced by silver
In order to suppress the decomposition of imeriam, which is easy to cause by adding 7 to 1, pyrrolidone contains polyvinylpyrrolidone, a water bathing polymer, as well as 2-pyrrolidone and 5-pyrrolidone. , N-methyl-2-pyrrolidone,
4-methyl-2-pyrrolidone, 5-methyl-2-py
%N-ethyl-2-pyrrolidone, N-isonorovir-2-pyrrolidone, N-butyl-2-pyrrolidone%N-
Airu 2-pyrrolidone, N-7 cetyl-2-pyrrolidone, 1-7s = 2-pyrrolidone% 4-7s nyl-2-pyrrolidone, 5-phenyl-2-pyrrolidone, N-7 cetyl-4-2 enyl-2- pyrrolidone, 1-
Phenyl-3-pyrrolidone-2-carpone + L1-phenyl-5-pyrrolidone-2-carboxylic acid ether ester @5-7x nyl-5-pyrrolidone-2-carbo; /11
.. 1-7. Nyl-2-pyrrolidone-5-carboxylic acid
1 Phenyl-5-pyrrolidone-3-carboxylic acid, 2-pyrrolidone-5-carboxylic acid, 1-7ono2-
Examples include pyrrolidinone. All pyrrolidones are also effective, but 2-pyrrolidone, methyl-2-pyrrolidone, ethyl-2-pyrrolidone, vinyl-2-pyrrolidone/↓ and phenyl-2-pyrrolidone are particularly good ◎ α-piperidone With a structure similar to 2-pyrrolidone,
While 2-pyrrolidone has a 5-membered ring, α-piperidone has a 6-membered ring.
(CH proverb) Something that is triggered by ncOOH, fi is 1
~5 is a common name, for example, nx2 and β-alanine 11-3 are γ-7 mino #Ae1. m n
=4 is hokipiperidic acid. These bilridones, α-piperidone, and aliphatic amino acids have α02tt/J or more, and are well suited [LO5~10
11/I, maximum 4flL< is 1 to 51/1 ◎ Added amount is less than 102 g/j #h Stability of sweet hameri soup decreases 0 Even if there is a large amount of added weight, there is no adverse effect Generally, #&2Xl exceeding 10 g/4 t is not recommended. The electroless steel plating solution that is the base of the present invention is not particularly suitable. Copper salt.
錯化剤、還元剤およびF4′1wI4整剤とから成る一
般の無電解、鋼めりき液が用いられる。銅塩としては、
硫績銅、ハロゲン化鋼、硝酸鋼、酢酸鋼等が、錯化剤と
しては、エチレンジ7ξン四酢毅、aツシメル塩等か、
還元剤としてはホルマリン、パラホルムアルデヒド等が
、田調整剤としてa水酸化ナトリウム等が使用されるQ
代衆的な無電解めっき液としては、硫111m3〜20
g / j sエチレンジ7ン四酢毅、銅塩wI!嵐の
1.2〜5倍モルm[il、37%のホルマリン水#?
%[2〜25 mj/J s F” 11.5〜110
のも(/Jか好ましい・fIAJtに90℃以下で竹う
のが良い。A common electroless steel plating solution consisting of a complexing agent, a reducing agent and a F4'1wI4 conditioner is used. As a copper salt,
Sulfurized copper, halogenated steel, nitrate steel, acetate steel, etc. are used as complexing agents, such as ethylenediaminetetraacetic acid, a-tsucimel salt, etc.
Formalin, paraformaldehyde, etc. are used as reducing agents, and sodium hydroxide, etc. are used as field conditioners.Q
A typical electroless plating solution is 111 m3 to 20 m3 of sulfur.
g/j s ethylenedi7ine, copper salt wI! Storm 1.2-5 times molar m[il, 37% formalin water #?
%[2~25 mj/Js F'' 11.5~110
Nomo(/J is preferable.) It is best to store the bamboo at a temperature below 90℃.
尚5本発明の無電解@めつき猷にrJ mポリエチレン
グリコールsPLびそのアルキル(好ましく u C+
〜Cm) x−チルo少すくト%111k(L 02g
/4以上、好ましくは(L05〜IQtt/C最を好1
しくに1〜5g/J絵謀するCとt山荒るO
以上U明しkLうに本発明の無電解鋼めっき献K J
9て侍らnためつき鋼は愼械的物性の同上、%に引@V
強度がビロリン酸電気めっきから得らa7)銅に匹敵す
るもの′Cある@実施机1〜6
硫酸鋼a04モル/4.エチレンジアミン四酢[[LO
5モル/a、ホルムアルデヒド4103モル/Jb F
lll 1.812)溶液に、次表の麟mat添加して
無電解−めっ龜液を作成し次。5 In the electroless @metsukii of the present invention, rJ m polyethylene glycol sPL and its alkyl (preferably u C+
~Cm)
/4 or more, preferably (L05~IQtt/C most preferably 1
In particular, 1 to 5 g/J is planned by C and t Yamararu O.
9 Samurai n Tametsuki steel has mechanical properties same as above, reduced to % @V
The strength obtained from birophosphate electroplating is comparable to that of copper. Ethylenediaminetetravinegar [[LO
5 mol/a, formaldehyde 4103 mol/Jb F
1.812) To the solution, add the rinmat shown in the table below to create an electroless plating solution.
cnらのめっき顔に活性化丸環し友ステンレス4kを浸
漬して70℃で無電解めりきをおこない、めっI膜厚2
5〜55μmの@箔を得た。Electroless plating was performed at 70°C by immersing activated round stainless steel 4K on the plating face of cn et al., and plating I film thickness 2.
A 5-55 μm@foil was obtained.
hb−x番11[にいすnも安定であり得らn次鯛陥の
引張り!1ife、耐折敷労強度は次表のとうりでめる
。hb-x No. 11 [N is also stable and the tension of the nth sea bream! 1life, the folding resistance strength is given in the table below.
尚、引張り強度は、10鴎×70鴎の試験片【用い東洋
掬鰺振のテンシ關ン形万能試験機を用い、つかみ間隔1
5auoJj1彊り速度1麺/分で一麓した・
又、耐折IIIL労強度の細建にJIS P8115
に準じた耐折疲労試験器でおこなった・!fr9曲は点
の一率は#p&21Iaのtのt使用し九〇この試験−
に↓nば耐折疲労強嵐が試料破断1での折9曲げ1畝で
示される@
(注)
金属銀:和光#1県工業−劇、I1粒状金属鉛ニー車化
宇1糺粒状
璽り化鋸和光J111J[工桑−剃、化学用試薬Φ−
手続補正書(自発)
特許庁長官殿
4代 理 人
5補正の対象
明細書の発明の評IImな聰明の−0The tensile strength was measured using a test piece of 10 x 70 pieces (using a tensile type universal testing machine made by Toyo Kikunibaji), with a grip interval of 1.
5auoJj 1 turning speed 1 noodle/min.
The test was carried out using a folding fatigue tester conforming to ! For fr9 songs, the percentage of points is #p &21Ia's t is used for 90 this exam-
If ↓n, the bending fatigue resistance is shown by 9 bends and 1 ridge at sample break 1. Rikano Wako J111J [Kakuwa - Shaved, chemical reagent Φ - Procedural amendment (spontaneous) Commissioner of the Japan Patent Office 4 Representative Review of the invention of the specification subject to the 5 amendment IIm's -0
Claims (1)
解端めっ!T液4c、金属銀、Bp化銀お工び金属鉛の
少なくとも一撫と、ピロリドン−1a−ビペリドンン↓
び脂肪族アミノ酸の少lくとt−禎をm加し′fc無電
解餉めっき1[。 26 ピロリドン*、 α−ピペリドンおLび脂肪族
アンノ#tの少なくとも1樵を102g/j以上龜加す
るq#lFF縛求の範囲第1積記教の無電解め−)ミ液
。[Claims] t Electroless end plate rich in salt, -copper chloride, R base agent, ν-Kobita-additives! T solution 4c, metallic silver, Bp silver oxide, at least one stroke of metallic lead, and pyrrolidone-1a-biperidone↓
A small amount of aliphatic amino acid and t-dioxide were added for electroless plating 1. 26 Electroless solution of the first article in which 102 g/j or more of pyrrolidone*, α-piperidone L, and aliphatic anno#t are added.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1539882A JPS58133366A (en) | 1982-02-01 | 1982-02-01 | Electroless copper plating solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1539882A JPS58133366A (en) | 1982-02-01 | 1982-02-01 | Electroless copper plating solution |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58133366A true JPS58133366A (en) | 1983-08-09 |
JPS613394B2 JPS613394B2 (en) | 1986-01-31 |
Family
ID=11887620
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1539882A Granted JPS58133366A (en) | 1982-02-01 | 1982-02-01 | Electroless copper plating solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58133366A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008174796A (en) * | 2007-01-18 | 2008-07-31 | Mitsubishi Chemicals Corp | Gold plating liquid and gold plating method |
-
1982
- 1982-02-01 JP JP1539882A patent/JPS58133366A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008174796A (en) * | 2007-01-18 | 2008-07-31 | Mitsubishi Chemicals Corp | Gold plating liquid and gold plating method |
Also Published As
Publication number | Publication date |
---|---|
JPS613394B2 (en) | 1986-01-31 |
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