JPS58124534A - Endothermic reaction apparatus - Google Patents

Endothermic reaction apparatus

Info

Publication number
JPS58124534A
JPS58124534A JP747682A JP747682A JPS58124534A JP S58124534 A JPS58124534 A JP S58124534A JP 747682 A JP747682 A JP 747682A JP 747682 A JP747682 A JP 747682A JP S58124534 A JPS58124534 A JP S58124534A
Authority
JP
Japan
Prior art keywords
reaction
tube
chamber
gas
tubes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP747682A
Other languages
Japanese (ja)
Inventor
Shinzou Takarada
宝田 進造
Tetsuo Kimura
哲夫 木村
Kiyokata Chimasa
千正 清方
Akira Arai
新井 章
Akira Hosonuma
細沼 明
Goro Oguchi
小口 梧郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP747682A priority Critical patent/JPS58124534A/en
Publication of JPS58124534A publication Critical patent/JPS58124534A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0285Heating or cooling the reactor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0242Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly vertical
    • B01J8/025Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly vertical in a cylindrical shaped bed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • B01J8/062Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes being installed in a furnace
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00106Controlling the temperature by indirect heat exchange
    • B01J2208/00115Controlling the temperature by indirect heat exchange with heat exchange elements inside the bed of solid particles
    • B01J2208/00132Tubes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008Controlling the process
    • B01J2208/00017Controlling the temperature
    • B01J2208/00106Controlling the temperature by indirect heat exchange
    • B01J2208/00168Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00194Tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Hydrogen, Water And Hydrids (AREA)

Abstract

PURPOSE:To make it possible to miniaturize an apparatus itself, by constracting the lower part of a reaction apparatus of a tube plate structure to permit to contain a dense arranement of fine reaction tubes in a narrow space. CONSTITUTION:Plural reaction tubes 21 are parallelly and vertically arranged at a small pitch in a reaction vessel 2 and each reaction tube 21 comprises conventrically arranged double tubular bodies having different diameters. To the outside of each reaction tube 21, a combustion gas passage 12 is formed in a state divided into an upper and a lower parts and, in the lower side partitioned part 13, a heat conductive packing 14 for attaining to enhance heat conduction is supported by a supprot member 15. In each reaction tube 21, the lower part 27 of the outer surface of the outer pipe 22 of the reaction tube 21 and the orifice part 25 formed to the first tube plate 24 are fixedly joined while the lower part 27 of the outer surface of the inner pipe 26 of the reaction tube 21 and the orifice part 29 formed to the second tube plate 28 are fixedly connected to protrude the inner tube 26 from the outer tube 22 in a downward direction.

Description

【発明の詳細な説明】 本発明は、吸熱反応によって供給原料ガスから反応生成
ガスを得るための吸熱反応装置の改良に閤する。
DETAILED DESCRIPTION OF THE INVENTION The present invention is directed to an improvement in an endothermic reactor for obtaining a reaction product gas from a feed gas by an endothermic reaction.

吸熱反応を促進せしめる@謀を用−て、炭化水素を含む
jI料ガスを水素ガスの如き工業上利用価値の高いガス
に転換する吸熱反応装置灯、当技術分野においてよく知
られてφる0例えに供給原料ガスから水素ガスを生成す
る最も一般的な技術は、燃−炉内に、触媒によって満た
された円筒状あるいは環状の反応i1を配置し、この反
応室内に炭化水素を含む原料ガスを通過させることKよ
り、スチームリフオーミングすることである。
An endothermic reactor lamp that converts a feed gas containing hydrocarbons into a gas of high industrial utility value such as hydrogen gas by using a mechanism that promotes an endothermic reaction, and is well known in the art. For example, the most common technique for producing hydrogen gas from feedstock gas is to place a cylindrical or annular reactor i1 filled with a catalyst in a combustion furnace, and to create a gas containing hydrocarbons in the reaction chamber. Rather than passing through K, it is steam re-forming.

この種の従来技術としては、特開昭53−78983号
、同53−78992号、同53−79766号、同5
3−79768号の各公報等に記載のスチームリ7オー
ミング装置が知られている。
This type of prior art includes Japanese Patent Application Laid-open Nos. 53-78983, 53-78992, 53-79766, and 5
The Steam Re 7 ohming device described in various publications such as No. 3-79768 is known.

これらの装置は、加熱炉内に配置された各反応管の内1
1K、濃状の反応室を設けると共に1この反応室の内部
に、その顕熱を前記反応室へ伝達させる環状の再生室を
設け、且つ各反応室の同曲に空−として設けられた燃焼
室の下半部に燃焼ガスの排出通路を設け、この#出通路
が、反応室内の原料ガス“の滝れとは逆の流れの燃焼ガ
スを、反応室の外1111に接して導出するように構成
された技術である。
These devices are installed in one of each reaction tube placed in the heating furnace.
1K, a dense reaction chamber is provided, and an annular regeneration chamber is provided inside this reaction chamber to transfer the sensible heat to the reaction chamber, and a combustion chamber is provided as an empty space in the same section of each reaction chamber. A combustion gas discharge passage is provided in the lower half of the chamber, and this outlet passage leads out the combustion gas in a flow opposite to the flow of the raw material gas inside the reaction chamber, in contact with the outside 1111 of the reaction chamber. It is a technology composed of

しかしながら、かかる従来技術には解決すべき問題点が
あることが判明した。すなわち、従来の前記反応装置で
は、比験的細い反応管を多数本狭い空間内に配置するこ
とが核装置の下部構造上不可能なため、反応管のサイズ
及び配列ピッチに制限がでる。このため、コンパクトな
触媒反応装置を提供する上で限界があった。
However, it has been found that such prior art has problems that need to be solved. That is, in the conventional reactor, it is impossible to arrange a large number of comparatively thin reaction tubes in a narrow space due to the lower structure of the nuclear device, so there are restrictions on the size and arrangement pitch of the reaction tubes. For this reason, there is a limit in providing a compact catalytic reaction device.

又、前記の反応装置においては、各反応管と原料ガス導
入用マニホールドとの導通部、及び各反応管と反応生成
ガス導出用マニホールドとの導通部は、細管によって形
成され、細管と前記各反応管及び前記マニホールドとの
間はガスが導通可能なようKj1m!されている。この
溶接部の数は、反応管の本数で大きく変わるが、例えば
、反応管が37本、4.BMW用のリフオーマ−の場合
、百歇十箇所にも及んでシシ、しかも反応容MIK反応
管を組み込むIIIIK該容器外で、前記溶接をンとな
うことは、構造上不可能であシ、反応管を反応容器中に
組み込み吊)下げ、こ九によって狭くなった容器内で溶
接作業を行なっているのが実情である。
Further, in the above-mentioned reaction apparatus, the conduction portion between each reaction tube and the manifold for introducing the raw material gas, and the conduction portion between each reaction tube and the manifold for deriving the reaction product gas are formed by thin tubes, and The distance between the pipe and the manifold is Kj1m so that gas can be conducted. has been done. The number of welds varies greatly depending on the number of reaction tubes, but for example, if there are 37 reaction tubes or 4. In the case of a reformer for BMW, it is structurally impossible to perform the above-mentioned welding outside the container where the reaction volume MIK reaction tube is installed. The reality is that the reaction tube is built into the reaction vessel and suspended, and welding work is carried out inside the vessel, which has been made narrower by this mechanism.

このことは、反応管の固定作業を困難にすると共に1十
分な溶接仕上げがおこなわれに〈<、又、検査も充分で
きないため安全性及び信頼性に欠けるという問題を生じ
る結果となる。
This makes it difficult to fix the reaction tube, and also causes problems such as insufficient welding and insufficient inspection, resulting in a lack of safety and reliability.

更に1従来の装置の場合、下部構造が複雑なために触媒
充填を行う際KFi、触媒充填後上部1体を溶接して密
封しなけれはならず、又、運転中、触媒が劣化した場合
には、触媒を交換しなければならないのだが、この時K
Fi、上部壷体の溶接部分を切断撤去し、たとえば、バ
キュームにより触媒を吸い出すとか、あるいは、反応容
器を逆立ちさせて@課を取り出さなければならない、そ
して、この後、新触媒を充填し、切断撤去した上部1体
を再IILj!接により取〕付けなければならない。
Furthermore, in the case of conventional equipment, the lower structure is complicated, so when filling the catalyst, the KFi and the upper part must be welded and sealed after the catalyst is filled, and if the catalyst deteriorates during operation, The catalyst must be replaced, but at this time K
Fi, the welded part of the upper pot body must be cut and removed, and the catalyst must be sucked out using a vacuum, or the reaction vessel must be turned upside down to take out the @ section, and after this, a new catalyst is filled and cut. Re-IILj of the removed upper body! It must be attached by connecting.

また、前記した上部量体戦付は溶接部は、伝熱管全体の
うちとシわけ厳しい高温にさらされるため、溶接施工法
及び検査方法に蝶高度の技術を要するのだが、従来の装
置の場合Kri、この問題が解決てきず信頼度及び作業
の繁雑性に大きな問題があった。
In addition, in the above-mentioned upper mass welding, the welded part is exposed to severe high temperatures compared to the entire heat exchanger tube, so the welding method and inspection method require advanced technology, but with conventional equipment, Kri, this problem has not been resolved and there have been major problems in terms of reliability and complexity of work.

eK又、反応管ごとの反応ガスのIIIfIlを予防す
るためには、反応管ごとの触媒充填量を均等にする外、
反応管ごとの差圧を均等にしなければならないのだが、
従来の装置の場合には、この検定さえもできない構造と
なってした。
eKAlso, in order to prevent IIIflIl of the reaction gas in each reaction tube, in addition to equalizing the amount of catalyst packed in each reaction tube,
It is necessary to equalize the differential pressure in each reaction tube.
In the case of conventional equipment, the structure was such that even this verification was not possible.

本発明に、−紀した問題点を解決すべくなされたもので
あって、本発明の第1の目的とするところは、コンパク
トな吸熱反応装置を提供することにあり、又本発明の第
2の目的とするところは、安全性、信頼性にすぐれた吸
熱反応装置を提供することKToシ、更に本発明の第3
の目的とするところは、触媒充填及び必11!に応じて
の触媒交換を容AKでき、かつ党填後の検定作業を可能
にする吸熱反応装置を提供することにあシ、更に又、本
発明の114の目的は、従来の反応管固定作業を簡略化
させた吸熱反応装置を提供することにある。
The present invention has been made to solve the problems encountered in the present invention, and the first object of the present invention is to provide a compact endothermic reaction device. The purpose of the present invention is to provide an endothermic reaction device with excellent safety and reliability.
The purpose of this is to fill the catalyst and make sure that 11! It is therefore an object of the present invention to provide an endothermic reaction apparatus which can carry out catalyst exchange according to the conditions and which enables inspection work after filling. An object of the present invention is to provide an endothermic reaction device that simplifies the process.

本発明の上記目的は、−喝儒にjI料ガスG1の入口を
有すると共に他端側に反応生成ガスG2の出Oを有し、
かつ吸熱反応に用いられる触s50によって満たされた
反応1120と、該反応室20で生成した反応生成ガス
G2t−導出させながら、その顕熱を前記反応室2Gへ
伝達させる再生室40と、燃焼1i11と會有する吸熱
反応装置1において、該反応装置1は、反応容器2内に
複数個の反応管21を並設してなシ、紋反応管21のそ
れぞれが前記再生室40及び前記反応室20を有してお
)、かつ該反応管21のそれぞれが相互に離れて配置さ
れた2つ以上の管板(例えば第1管板24及び第2管板
28によって支持されていることを特徴とする吸熱反応
装置IKよって達成される。
The above object of the present invention is to - have an inlet for the feed gas G1 at one end and an outlet for the reaction product gas G2 at the other end;
and a reaction 1120 filled with a catalyst s50 used for an endothermic reaction, a regeneration chamber 40 that transfers the sensible heat to the reaction chamber 2G while deriving the reaction product gas G2t generated in the reaction chamber 20, and a combustion 1i11. In the endothermic reaction apparatus 1, the reaction apparatus 1 has a plurality of reaction tubes 21 arranged in parallel in the reaction container 2, and each of the reaction tubes 21 is connected to the regeneration chamber 40 and the reaction chamber 20. ), and each of the reaction tubes 21 is supported by two or more tube sheets (for example, a first tube sheet 24 and a second tube sheet 28) arranged apart from each other. This is achieved by the endothermic reactor IK.

以下に、II付の第1図〜第3図に基いて本発明の第1
の実施例について説明する。
Below, the first aspect of the present invention will be explained based on FIGS. 1 to 3 with II.
An example will be described.

第1図に例示されている反応装置1Fi、炭化水素tI
IL料としてスチームリ7オーミングによって水嵩を生
成するためのものである。断熱層9管内設する反応容器
2の内部Kti、複数個の反応管21が、!I2図に示
す如く、平行に、かつ小ピツチに配列され、立設されて
いる。該反応管21の各々は、同心に配置され、かつ径
を異処する二つの管体からな〕、いわゆる二重管構造を
なしている。
Reactor 1Fi illustrated in FIG. 1, hydrocarbon tI
It is used to generate water volume by steam recirculation as an IL material. The interior Kti of the reaction vessel 2 with the heat insulating layer 9 installed inside the tube, the plurality of reaction tubes 21,! As shown in Figure I2, they are arranged in parallel and in small pitches and stand upright. Each of the reaction tubes 21 has a so-called double tube structure, consisting of two tube bodies arranged concentrically and having different diameters.

この構造自体は、本発明の要旨とするところではな鱒の
で、この二重管に限定されるものではなく、例えば各反
応管が4層濃状断面を有するもの(昭和59年 1月2
2日出願の特許願(A3%尭明の名称;吸熱反応装置、
参照、)、その他公知のものでも良φ。
Since this structure itself is not the gist of the present invention, it is not limited to this double tube. For example, each reaction tube has a four-layer thick section (January 2, 1982
Patent application filed on the 2nd (name of A3% Yamei; endothermic reaction device,
), other known ones are also acceptable.

前記二重管の内側管状部分は、再生室4oであシ、その
外側の環状部分は、反応室20である。
The inner tubular part of the double tube is the regeneration chamber 4o, and the outer annular part is the reaction chamber 20.

皺反応管21の上部に形成される容器2内の空間には、
バーナー10を具有する燃焼室11が配設されている。
In the space inside the container 2 formed at the upper part of the wrinkled reaction tube 21,
A combustion chamber 11 with a burner 10 is arranged.

各反応管21の上端は燃焼室11を形成する空間に向っ
て配設されている。
The upper end of each reaction tube 21 is disposed toward the space forming the combustion chamber 11.

各反応管21の外側には、燃焼ガス通路12が形成され
ておシ、皺燃焼ガス通路12は、上下に区画され、下儒
区一部分13IC扛、伝熱効率向上をはかるための伝熱
バッキング14が支持部材15上に支持されている。
A combustion gas passage 12 is formed on the outside of each reaction tube 21. The wrinkled combustion gas passage 12 is divided into upper and lower parts, and a lower part 13 IC is used, and a heat transfer backing 14 is used to improve heat transfer efficiency. is supported on the support member 15.

各反応管21t!、皺反応管21の外管22の外面下部
23と第1管板24に形成された孔部25とが固着され
、かつ鋏反応管21の円管2@の外面下部21と第2管
板2@に形成された孔部2sとが固着されることKよっ
て、すなわち、前記2箇所で固着されることによって、
立設可能に固定されている。上記の如く固定することか
ら外管22′。
Each reaction tube is 21 tons! , the lower outer surface 23 of the outer tube 22 of the wrinkled reaction tube 21 and the hole 25 formed in the first tube sheet 24 are fixed, and the lower outer surface 21 of the circular tube 2@ of the scissors reaction tube 21 and the second tube sheet 2@ is fixed to the hole 2s, that is, fixed at the two locations,
Fixed so that it can be erected. The outer tube 22' is fixed as described above.

よ〕内管2@の方が、下部方向に突出するよう形成され
、かつ@1管板24は@2管板28の上部に位置するよ
うに形成されることになる。
] The inner tube 2@ is formed to protrude downward, and the @1 tube plate 24 is formed to be located above the @2 tube plate 28.

なお、本実施例においては、反応管21が2重管状をな
す奄のであるため、上記の如く、第1管板24及び@2
管板211によって固定しているが、前述の4層環状断
面を有する反応管21の場合、その他公知のものにも、
同様に本発明の実施すなわち反応管21を固定すること
が可能である。各反応管21内の下部には、外管22と
内管2Gの位置規制をするために、位置親制御i30が
設けられている。前記第1管板24は、全反応管21、
第2管板28などを支持可能な強[を有する板状体でめ
シ、全反応管21の外管22t−挿入可能な数、配列、
径を1する多数の孔部25を具有し、反応容器胴体2a
K盲7ランジを形成する如く、且つ各反応管21と厘交
する方向に配置されて容器側壁に固着されている。
In this embodiment, since the reaction tube 21 has a double tube shape, the first tube plate 24 and @2
Although it is fixed by the tube plate 211, in the case of the reaction tube 21 having the above-mentioned four-layer annular cross section, other known ones may also be used.
It is likewise possible to carry out the invention, i.e. to fix the reaction tube 21. A position control i30 is provided at the lower part of each reaction tube 21 to regulate the positions of the outer tube 22 and the inner tube 2G. The first tube sheet 24 includes all reaction tubes 21,
The outer tubes 22t of all the reaction tubes 21 - the number and arrangement that can be inserted into the outer tubes 22t of all the reaction tubes 21.
It has a large number of holes 25 with a diameter of 1, and the reaction vessel body 2a
They are arranged in a direction perpendicular to each reaction tube 21 and fixed to the side wall of the container so as to form a K-blind 7 flange.

また、前記第2管板2Iは、皿形状徐状体であり、内管
2@を挿入可能な数、配列、l!を有する多数の孔s2
1及び原料ガス導入031を具有し、前記III管板2
4との関に、原料ガスマニホールド1を形成するように
、該第1管板24Kfl外し可能なように固定されてい
る。なお、図中、32FiII2管4120固定用のボ
ルト、33t!第1管板24と容器上部量体2cを固定
するボルト、ナツトを示す。
Further, the second tube plate 2I is a plate-shaped gradual body, and the number and arrangement of the inner tubes 2@ can be inserted into the second tube plate 2I! A large number of holes s2 with
1 and raw material gas introduction 031, said III tube sheet 2
4, the first tube plate 24Kfl is removably fixed to form the source gas manifold 1. In addition, in the figure, the bolt for fixing 32FiIII2 pipe 4120 is 33t! The bolts and nuts that fix the first tube plate 24 and the container upper body 2c are shown.

前記原料ガス導入[131には、原料ガス入口ノズル3
に導通する原料ガス導通管6が連結されてめる。第2管
板2I下備の容器2内空間には、反応生成ガスマニホー
ルド8が設けられ、反応生成ガX Q Zを導入する再
生富山0部42及び反応生成ガスG2を装置1外に嘲り
出す反応生成ガス出Oノズル4と導通している。
The source gas introduction [131 includes the source gas inlet nozzle 3
A raw material gas conduit 6 is connected to the source gas conduit 6. A reaction product gas manifold 8 is provided in the inner space of the container 2 under the second tube plate 2I, and a regeneration Toyama 0 section 42 into which the reaction product gas It is in communication with the reaction product gas output O nozzle 4.

反応m2・内には、スチームリ7オーミング触@Saが
充填されており、反応室20人OK設置された触媒支持
板51によって支持されている。
The reaction m2 is filled with a steam reactor containing 7 Ohming catalysts and is supported by a catalyst support plate 51 installed in a reaction chamber suitable for 20 people.

該支持板51は、反応1120木口部に相当する部分に
、 lj料ガスG里の通過可能な細孔を具有し、III
管板24に着脱自在に固定されている。52は、支持板
51固定用のボルトを示す、触媒充填層の上端すなわち
反応室2oの出DKは、触媒流出防止板53が設けられ
ている0反応室20の出口上部には、耐熱性キャップ3
4を被覆した球面状の管1135によって密封されて、
空間36が形成されている。なお、3T#i、容器上部
量体2bと容器胴体2aとを固定するボルト、ナツトを
示す。
The support plate 51 has pores in a portion corresponding to the end of the reaction 1120 through which the lj feed gas G can pass, and
It is detachably fixed to the tube plate 24. Reference numeral 52 indicates a bolt for fixing the support plate 51. The upper end of the catalyst packed bed, that is, the outlet DK of the reaction chamber 2o is provided with a catalyst outflow prevention plate 53. A heat-resistant cap is installed at the upper part of the outlet of the reaction chamber 20. 3
4 is sealed by a spherical tube 1135 coated with
A space 36 is formed. Note that 3T#i indicates bolts and nuts for fixing the container upper body 2b and the container body 2a.

本発明に係る装置1#i、製作作業の容易性及び確実性
を得るために、例えば容器2fr逆立ちさせた状態で製
作することが望ましい。この製作の途中において反応室
20へ触amsoを充填するには、#Il管板24に各
反応管21 el&付けた後であって、支持板51を傘
付ける−に反応室2oの入口から入れれば良い。
In order to obtain ease and reliability of the manufacturing operation of the apparatus 1#i according to the present invention, it is desirable to manufacture the apparatus 1#i with the container 2fr in an upright position, for example. In order to fill the reaction chamber 20 with amso during this manufacturing process, after each reaction tube 21 el& is attached to the #Il tube plate 24, insert the support plate 51 into the inlet of the reaction chamber 2o. Good.

触msoの交換は、例えば次のように行なうことが可能
である。すなわち、ボルドーナツト33、ボルト32お
よび52を順次と壜)はすし、容器下部量体2C%第2
管板2Sおよび支詩板51をそれぞれ順次とNlシはず
して、触媒50を下部23から*b出す。次いで、反応
室200Å口が上方に来るように装置1を逆立ちさせ、
該反応室20の入ロコ9@蝿50を充填させて交換する
。そののち前記支持1151をボルト52で一足した後
、装置1を元の位置にもどし、纂2管1121、容器下
in体2Cをそれぞれ固定すればよい。
The contact mso can be replaced, for example, as follows. That is, the bolt donut 33, the bolts 32 and 52 are sequentially removed, and the lower part of the container is 2C% second.
The tube plate 2S and the branch plate 51 are each removed one after another, and the catalyst 50 is taken out from the lower part 23. Next, the apparatus 1 was turned upside down so that the 200 Å opening of the reaction chamber was facing upward.
The reaction chamber 20 is filled with filler 9@flies 50 and replaced. Thereafter, after fixing the support 1151 with the bolt 52, the apparatus 1 is returned to its original position, and the second tube 1121 and the lower container body 2C are fixed respectively.

本発明の纂lの実施例の作用は次の通如である。The operation of the embodiment of the present invention is as follows.

鳳科ガス入ロノズル3より反応装置1内に導入された炭
化水素及びスチームを含む原料ガスGlは、原料ガス導
通管6を経て、原料ガス導入口31から、Ii、科ガス
マニホールド1に入υ、反応室200ÅOから各反応室
20に人や、触alsoの作用および下記吸熱反応によ
って、水素を含む生成ガスG2となって反応室20の出
Oより反応管内上IB!11@31Nlc扱ffai、
 111紀空関31 内t)反E生成ガスG2Fi、該
仝関36内に入041を有する再生1!40を通シ、再
生富山O部42から反応生成ガスマニホールドIIK送
られ、反応生成ガス出Oノズル4より、装置1外へな)
出される6本触媒反応は、吸熱反応であることから、反
応室20へ熱を供給しなければならないわけであるが、
その熱源となるものは、燃焼ガスgから供給される熱と
再生室4Gからの顕熱である。前記燃焼ガスgは、バー
ナー10において発生し、燃暁室11に送られ、燃焼ガ
ス通路12を、反応管の上部から下部方向に向って流れ
、伝熱バッキング14部分を通り、反応室20に所望の
伝熱を行なった後に、燃焼ガス出口ノズル5から、装置
1外へ畷り出される。なお、燃焼ガスgの流れ方向は、
反応m20内の反応ガスの流れとは逆方向の流れとして
いるが、特にこれに隈足されな9゜ 次に、添付の図ffi第4図に基いて、本発明の第2の
実施例につiて説明する。
The raw material gas Gl containing hydrocarbons and steam introduced into the reactor 1 from the gas-filled nozzle 3 passes through the raw material gas conduit 6 and enters the raw gas manifold 1 through the raw material gas inlet 31. , from the reaction chamber 200A to each reaction chamber 20, by the action of a human or catalytic agent and the following endothermic reaction, a hydrogen-containing generated gas G2 is formed and flows from the outlet of the reaction chamber 20 to the upper part of the reaction tube IB! 11@31Nlc handling ffai,
111th period air barrier 31 t) Reaction product gas G2Fi enters the connection 36, passes through the regeneration 1!40 with 041, is sent from the regeneration Toyama O part 42 to the reaction product gas manifold IIK, and the reaction product gas is output. Out of the device 1 from O nozzle 4)
Since the six-catalyst reaction produced is an endothermic reaction, heat must be supplied to the reaction chamber 20.
The heat sources are heat supplied from the combustion gas g and sensible heat from the regeneration chamber 4G. The combustion gas g is generated in the burner 10, sent to the combustion chamber 11, flows through the combustion gas passage 12 from the top to the bottom of the reaction tube, passes through the heat transfer backing 14, and enters the reaction chamber 20. After the desired heat transfer is performed, the combustion gas is discharged to the outside of the apparatus 1 from the combustion gas outlet nozzle 5. Note that the flow direction of the combustion gas g is
The flow is in the opposite direction to the flow of the reaction gas in the reaction m20, but this is not particularly limited. Let me explain.

本実施例は、複数の管板が凹面鏡状に形成されているこ
とを特徴とする吸熱反応装置を示しており、第4図にお
φて亀1図〜第3図に示す符号と同一の符号を示した部
品は、上記第1図〜第3図の説明で述べた部品と同一の
部品を示している。
This example shows an endothermic reaction device characterized in that a plurality of tube plates are formed in a concave mirror shape. Parts indicated by reference numerals are the same parts as those described in the explanation of FIGS. 1 to 3 above.

本実施例における管板の凹面形状は、各反応管の上端が
、バーナーを基準和して熱力学的に略々均一加熱になる
ように配置されることによって形成される凹面形状によ
って、主に決定されるものである。上記均一加熱を可能
にした畝熱反応装置については昭和57年 1月zz日
出願の特許履、発明の名称:吸熱反応装置の明細書に詳
細に述ぺられてめる。
The concave shape of the tube sheet in this example is mainly due to the concave shape formed by arranging the upper ends of each reaction tube so that heating is thermodynamically uniform based on the reference sum of the burners. It is to be determined. The ridge thermal reaction device that enables the above-mentioned uniform heating is described in detail in the patent application filed on January zz, 1981, title of the invention: Endothermic reaction device.

本実施例におけるガス生成の過程や燃焼ガスの流れなど
の不発明0作用については、前記I11の実施例の説明
と同様でおるので省略する。
The non-inventive functions such as the process of gas generation and the flow of combustion gas in this embodiment are the same as those described in the embodiment I11 above, so a description thereof will be omitted.

以上、不発明の代表的な2つの実施例に基づき本発明に
つ−て説明したが、本発明によれば、反応装置の下部構
造を管板構造にしているので、すなわち相互に1れて配
置された2以上の1叡によって各反応管を支持する構造
としているため、比験的細い反応管を狭vh空聞に稠密
に配列でき、従来の装置のように反応管のす1ズ及び配
列ピッチに制限されないことから装置自体を極めて小型
・コンパクトにすることが可能であり、また、装置の下
部構造を簡略化させたことから、#I接箇所も従来の場
合に比較して少なく、且つ反応管ごとのa滝を予防する
ために、管ごとの差圧測足を行な鱒、各々の差圧を一足
にするように、例えば触媒の充填量を変えて一隻するこ
とによって安全性、信頼性を確保することが可能となっ
たし、さらに反応管固定作業も容易であシ、シかも上記
の如き管板構造とし念ことから触媒充填及び必要に応じ
ての触媒交換を容易になると共に、充填後の諸検定作業
も容易である。
The present invention has been explained above based on two representative embodiments, but according to the present invention, the lower structure of the reactor is a tube plate structure, that is, the lower structure of the reactor is made into a tube plate structure. Since each reaction tube is supported by two or more arranged tubes, comparatively thin reaction tubes can be arranged densely in a narrow VH space, and unlike conventional devices, the reaction tubes can be Since it is not limited by the arrangement pitch, it is possible to make the device itself extremely small and compact.Also, since the lower structure of the device is simplified, there are fewer #I contact points compared to the conventional case. In addition, in order to prevent a fall in each reaction tube, measure the differential pressure in each tube, and make it safer by changing the amount of catalyst charged, for example, so that the differential pressure in each tube is one foot. It has become possible to ensure performance and reliability, and it is also easy to fix the reaction tube.The tube plate structure as described above makes it easy to charge the catalyst and replace the catalyst as necessary. In addition to this, various inspection work after filling is also easy.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る吸熱反応装置の第1の実施例を示
す吃ので、182図の1−I線による部分縦断面図であ
る。第2図は同上図のl−1f線による横断rIjJ@
である。第3図は同上の反応管部分の拡大11F−図で
ある。第4図線本発明の第2の実施例を示す装置の概略
を示す部分縦断面図である。 1・・・反応装置、2−・・反応容器、21・・・容器
胴体、2b・・・容器上部量体、2C・・・容器下部1
体、3・・・FjL′1iIIガス入Oノズル、4・・
・反応生成ガス出Oノズル、5・・・燃焼ガス出Oノズ
ル、6・・・原料ガス導通管、?−ffilfi)ガス
マニホールド、@−・・反応生成ガスマニホールド、S
−・・断熱層、1G・・・バーナー、11・・・燃焼室
、12・・・燃焼ガス通路、1 m −・・下側区m部
分、14・・・伝熱バッキング、15−・・支持部材、
20−・・反応室、21・・・反応管、22・・・外管
、2k・・・外面下部、24・・・第1管板、25・・
・孔部、2 @−・・内管、2 T−・・内面下部、2
B・・・II2管板、2L−・孔部、30−・・位置規
制板、’41−j[NカX導入口、34・・・キャップ
、35・・・1量、36・・・空間、40−・・再生室
、41・・・再生家人0142・・・再生案出O%SO
・・・触媒、51・・・支持板、53・・・流出防止板
、G1・・・原料ガス%G2・・・反応生成ガス、g・
・・燃焼ガス。 特許出願人  三井東圧化学株式会社 代理人弁理士  坂 O信 昭 (ほか1名) 第1図 、 2 図 第3図 s4図 32   GI    G2
FIG. 1 is a partial longitudinal sectional view taken along line 1-I in FIG. 182, showing a first embodiment of the endothermic reaction apparatus according to the present invention. Figure 2 shows the cross section rIjJ@ along the l-1f line in the same figure as above.
It is. FIG. 3 is an enlarged view 11F of the reaction tube portion same as above. FIG. 4 is a partial vertical sectional view schematically showing an apparatus according to a second embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Reactor, 2-... Reaction container, 21... Container body, 2b... Container upper body, 2C... Container lower part 1
Body, 3...FjL'1iII gas-filled O nozzle, 4...
・Reaction product gas output O nozzle, 5... Combustion gas output O nozzle, 6... Raw material gas communication pipe, ? -ffilfi) gas manifold, @-...reaction product gas manifold, S
- Heat insulation layer, 1G... Burner, 11... Combustion chamber, 12... Combustion gas passage, 1 m -... Lower section m section, 14... Heat transfer backing, 15-... support member,
20--Reaction chamber, 21--Reaction tube, 22--Outer tube, 2k--Outer surface lower part, 24--First tube sheet, 25--
・Hole, 2 @--Inner pipe, 2 T--Inner lower part, 2
B...II2 tube plate, 2L--hole, 30--position regulation plate, '41-j [N force X inlet, 34...cap, 35...1 amount, 36... Space, 40-...Reproduction room, 41...Regeneration person 0142...Regeneration idea O%SO
... Catalyst, 51 ... Support plate, 53 ... Outflow prevention plate, G1 ... Raw material gas % G2 ... Reaction product gas, g.
... Combustion gas. Patent Applicant Mitsui Toatsu Chemical Co., Ltd. Representative Patent Attorney Nobuaki Saka (and 1 other person) Figure 1, 2 Figure 3 s4 Figure 32 GI G2

Claims (1)

【特許請求の範囲】[Claims] 一端11KM[料ガスの入Oを有すると共に弛端偶に反
応生成ガスの出0を有し、かつ吸熱反応に用いられる触
媒によって満たされた反応室と、該反応室で生成した反
応生成ガスを導出させながら、その顕熱を前記反応室へ
伝達させる再生室と、燃焼室とを有する吸熱反応装置に
おいて、該反応装置は、反応容器内に複数個の反応管を
並設してなプ、鍍反応管のそれぞれが前記再生室及び前
記反応室を有してsPシ、かつ該反応管のそれぞれが、
相互に離れて配置され−に2以上の管1[Kよって支持
されていることを特徴とする吸熱反応装置。
A reaction chamber with an inlet for raw gas and an outlet for reaction product gas at one end, and filled with a catalyst used in an endothermic reaction, and a reaction product gas generated in the reaction chamber. An endothermic reaction device comprising a combustion chamber and a regeneration chamber that transfers the sensible heat to the reaction chamber while being extracted, the reaction device having a plurality of reaction tubes arranged in parallel in the reaction vessel, Each of the plated reaction tubes has the regeneration chamber and the reaction chamber, and each of the reaction tubes has the following characteristics:
An endothermic reaction device characterized in that it is supported by two or more tubes 1 [K] arranged apart from each other.
JP747682A 1982-01-22 1982-01-22 Endothermic reaction apparatus Pending JPS58124534A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP747682A JPS58124534A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP747682A JPS58124534A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Publications (1)

Publication Number Publication Date
JPS58124534A true JPS58124534A (en) 1983-07-25

Family

ID=11666824

Family Applications (1)

Application Number Title Priority Date Filing Date
JP747682A Pending JPS58124534A (en) 1982-01-22 1982-01-22 Endothermic reaction apparatus

Country Status (1)

Country Link
JP (1) JPS58124534A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6111134A (en) * 1984-06-26 1986-01-18 Toshiba Corp Reforming device
JPS6183601A (en) * 1984-09-29 1986-04-28 Toshiba Corp Reforming apparatus
JP2007031249A (en) * 2005-07-29 2007-02-08 Idemitsu Kosan Co Ltd Reformer

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315034A (en) * 1976-07-27 1978-02-10 Mitsubishi Electric Corp Control memory device
JPS5379767A (en) * 1976-12-22 1978-07-14 United Technologies Corp Reaction apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5315034A (en) * 1976-07-27 1978-02-10 Mitsubishi Electric Corp Control memory device
JPS5379767A (en) * 1976-12-22 1978-07-14 United Technologies Corp Reaction apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6111134A (en) * 1984-06-26 1986-01-18 Toshiba Corp Reforming device
JPS6183601A (en) * 1984-09-29 1986-04-28 Toshiba Corp Reforming apparatus
JPH0647443B2 (en) * 1984-09-29 1994-06-22 株式会社東芝 Reformer
JP2007031249A (en) * 2005-07-29 2007-02-08 Idemitsu Kosan Co Ltd Reformer
JP4664767B2 (en) * 2005-07-29 2011-04-06 出光興産株式会社 Reformer

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