JPS58121599A - X-ray generating device - Google Patents

Abstract

PURPOSE:To lessen an X-rays' emanative disposition causing a half X-raying blur, to the smallest possible extent, by making up this device to form a groove interconnecting both main surfaces of an insulator and simultaneously to lay electrodes on said surfaces respectively, while connecting a condenser and a high voltage power source together in a space between these electrodes. CONSTITUTION:When the charge in a condenser 25 is discharged by a trigger electrode, plasma is produced inside a groove 22 and X-rays 27 are radiated out of the groove 22. At this time, since the plasma is concentrated at the bottom of the groove 22 in particular, the X-rays are mainly radiated out of the bottom of the groove 22. Therefore, it means that the upper part of the groove 22 prevents the X-rays 27 from emanating in an x direction. In addition, as the groove is curved in form, emanation of the X-rays in a y direction is also obviated. In this way, such X-rays as being small in an emanative disposition in two directions can be secured. Likewise, electrodes 23 and 24 are so formed as to cover only the bottom of the groove 22 so that concentration of the plasma at the bottom of the groove 22 can be ever intensified whereby the emanative disposition of the X-rays 27 can be lessened yet smaller.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to an xfj! The present invention relates to an X-ray generator, and particularly relates to an X-ray generator that generates non-divergent X-rays.

Technical background of the invention and its problems Recently, in order to manufacture higher performance semiconductor integrated circuits,
(2) There is an increasing demand for forming fine patterns having dimensions of [μm] or smaller on semiconductor substrates. The X-ray exposure method, which is a pattern transfer technology that uses X-rays (mainly soft X-rays of 4 to 13 It is considered to be a powerful technique, especially in the formation of Zabumicron and arm turns.

FIG. 1 is a schematic diagram showing the principle of X-ray exposure.

In the figure, 1 is an X-ray exposure mask, and this mask 1 includes a thin film substrate 2 made of a material with high transmittance to X-rays, and the substrate 2
A mask/flat turn 3 made of an X-ray absorbing member is attached to the lower surface of the mask.

9- A sample 5 coated with a resist 4 is placed below the mask 1, and an X-ray source (X-ray generator) 6 is placed above the mask 1. Then, from the X-ray source 6 to the mask 1,
By irradiating the resist line 7, the X-rays transmitted through the mask 1 are irradiated onto the resist 4 on the sample 5, and the resist 4 is exposed in a desired pattern.

Incidentally, as the X-ray source 6, an impact-type X-ray source is usually used, which mainly emits characteristic X-rays from the metal targut by bombarding the metal targut with a high-speed electron beam. Such an X-ray source has the following two drawbacks.

(], Because the CX-ray output is small, the processing speed of X-ray exposure (
The number of sheets that can be exposed per unit time is low.

(2) Since the X-ray source is not a point source but a spread out divergent X-ray source, penumbra blur 8 occurs in the transferred pattern, resulting in a decrease in resolution.

As a solution to these drawbacks, a discharge plasma X-ray source (Journal of the Optic X-ray source) has recently been developed.
al 5ociety of America, Vo
158, No. 2-P. 203, 1968; Proceedings of the 42nd Academic Conference of the Japan Society of Applied Physics, 1981.

358 pages 9P-G-1, 9P-G-2) were developed.

This discharge plasma X-ray source, as shown in FIG.
3. Through hole 16 provided in insulator 15 by discharging between
X-rays 17 are generated by inducing plasma within the body.

Note that 18 in the figure indicates an electrode for starting the discharge between the electrodes Z3 and 14.

Such a discharge plasma X-ray source has extremely high X-ray generation efficiency compared to an impact type X-ray source, and can obtain high-power X-rays. However, a discharge plasma X-ray source is a divergent X-ray source with a spread similar to an impact type X-ray source.
For this reason, it has not been possible to solve the aforementioned problem of reduced resolution caused by penumbral blur.

OBJECTS OF THE INVENTION An object of the present invention is to provide an X-ray generator that can extremely reduce the divergence of X-rays that causes penumbra blur, and that can contribute to improving processing speed and resolution in X-ray exposure. It's about doing.

Summary of the Invention The present invention is constructed by providing a groove that communicates between both main surfaces of an insulator, attaching electrodes to both main surfaces of the insulator, and connecting a capacitor and a high voltage power source between these electrodes. In this case, X-rays are emitted above the groove.

Effects of the Invention According to the present invention, the radiation direction of the X-rays is restricted within a plane parallel to the direction in which the grooves are formed, so that the divergence of the X-rays can be reduced. Furthermore, by forming the grooves in a curved manner, the radiation direction of the X-rays can be restricted to a direction perpendicular to the direction in which the grooves are formed, and the divergence of the X-rays can be made extremely small. Therefore, when applied to X-ray exposure, the occurrence of penumbra blur can be significantly reduced, and resolution can be improved. Moreover, since it has a higher output than the conventional impact type, it has the effect of increasing the processing speed by 5 times.

Embodiment of the Invention FIG. 3 is a schematic diagram showing an embodiment of the invention. In the figure, 21 is a rectangular parallelepiped (insulator) made of polyethylene with a length of 20 (wn), and the upper surface of this rectangular parallelepiped has a width of 1 [
A curved groove 22 of ml and depth 10 [m,] is provided. A capacitor 25 with a capacitance of 100 [μF] is connected between these electrodes 23 and 24 that intersect with the groove 22. This capacitor 25 is charged by a high voltage power supply 26 of 100 [kV].

In the X-ray generator configured as described above, when the charge in the capacitor 25 is discharged by a trigger electrode (not shown), plasma is generated in the groove 22 and X-rays 27 are emitted from the groove 22.
is emitted. Here, since the plasma is particularly concentrated at the bottom of the groove 22, the X-rays are mainly emitted from the bottom of the groove 22. Therefore, the upper part of the groove 22 prevents the X-rays 27 from spreading in the six directions of the X direction. Furthermore, since the groove 22 is curved, the divergence of X-rays in the X direction is also prevented. Thus, according to this apparatus, it is possible to obtain X-rays with small divergence in two directions. Also, electrodes 23.24
Since it is formed so as to cover only the bottom of the groove 22, the concentration of plasma on the bottom of the groove 22 can be strengthened, thereby making it possible to further reduce the divergence of the X-rays 27.

According to experiments by the inventors, 40 mm from the top surface of the rectangular parallelepiped 21
When the irradiation range of XM27 was examined at a position 0' (am) away, it was found to be an arc-shaped range with a width of 10 (+ nm), and it was confirmed that the divergence was extremely small. Furthermore, it was confirmed that a sufficiently large output could be obtained compared to conventional shock-type devices.

FIG. 4 is a schematic configuration diagram showing another embodiment.

Note that the same parts as in FIG. 3 are given the same reference numerals, and detailed explanation thereof will be omitted. This embodiment differs from the previously described embodiments in that a straight groove 28 is provided in place of the curved groove 22. Further, although shown in FIG. 4, electrodes 23, 24, a capacitor 25, a high voltage power supply 26, etc. are provided as in the previous embodiment.

With such a configuration, the X-rays emitted from the groove 28 have large divergence at all angles in the X direction;
Directional divergence is prevented. First, divergence of X-rays in one direction can be prevented.

Note that the present invention is not limited to the embodiments described above. For example, by making the bottom portion 22a of the groove 22 wider than the other portions as shown in Fig. M5, the wear rate of the inner wall of the groove 22 due to plasma generation can be reduced and the service life can be extended. Furthermore, the shape of the groove is curved groove 22.
The grooves are not limited to the straight grooves 28, but may be wavy grooves 29 as shown in FIG. 6, or other suitable changes. Further, the insulator is not limited to polyethylene, and its shape is, of course, not limited to a rectangular parallelepiped. Further, the capacitance of the capacitor, the voltage of the high voltage power supply, etc. may be determined as appropriate according to the specifications. In addition, various modifications can be made without departing from the gist of the present invention.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram showing the principle of the X-ray exposure method, FIG. 2 is a schematic diagram showing a conventional discharge plasma X-ray source, FIG. 3 is a schematic diagram showing an embodiment of the present invention, and FIG. The figure is a schematic configuration diagram showing another embodiment, and FIGS. 5 and 6 are schematic configuration diagrams showing modified examples, respectively. 21... Rectangular parallelepiped (insulator), 22.28.29... Groove, 23, 24... Electrode, 25... Capacitor, 26
...High voltage power supply, 27...X-ray. Applicant's agent Patent attorney Suzue Takehiko 9- Kan 1 Figure 3 Figure 4 Salt 5 Figure 6

Claims (4)

[Claims] (1) An insulator provided with a groove that communicates the amphibatic surfaces, a pair of electrodes each attached to the amphibatic surfaces of this insulator, a capacitor connected between these electrodes, and a device for charging this capacitor. An X-ray generator characterized by comprising a high voltage power source. (2) The X-ray generator according to claim 1, wherein the groove is provided to be curved. (3) The X-ray generator according to claim 1, wherein the groove has a bottom portion wider than other portions. (4) The X-ray generator according to claim 1, wherein the electrodes are attached to both sides of the insulator so as to cover only the bottom of the groove. . 1-