JPS58120510A - 熱分解炭素を析出させる方法 - Google Patents

熱分解炭素を析出させる方法

Info

Publication number
JPS58120510A
JPS58120510A JP57003759A JP375982A JPS58120510A JP S58120510 A JPS58120510 A JP S58120510A JP 57003759 A JP57003759 A JP 57003759A JP 375982 A JP375982 A JP 375982A JP S58120510 A JPS58120510 A JP S58120510A
Authority
JP
Japan
Prior art keywords
raw material
carbon
base material
gas
pyrolytic carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57003759A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0417887B2 (enExample
Inventor
Takane Miyazaki
宮崎　高嶺
Shigeru Tatsuno
辰野　茂
Kazushi Matsuura
松浦　一志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Toyo Carbon Co Ltd
Original Assignee
Toyo Carbon Co Ltd
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Carbon Co Ltd, Mitsubishi Chemical Industries Ltd filed Critical Toyo Carbon Co Ltd
Priority to JP57003759A priority Critical patent/JPS58120510A/ja
Publication of JPS58120510A publication Critical patent/JPS58120510A/ja
Publication of JPH0417887B2 publication Critical patent/JPH0417887B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Carbon And Carbon Compounds (AREA)
JP57003759A 1982-01-13 1982-01-13 熱分解炭素を析出させる方法 Granted JPS58120510A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57003759A JPS58120510A (ja) 1982-01-13 1982-01-13 熱分解炭素を析出させる方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57003759A JPS58120510A (ja) 1982-01-13 1982-01-13 熱分解炭素を析出させる方法

Publications (2)

Publication Number Publication Date
JPS58120510A true JPS58120510A (ja) 1983-07-18
JPH0417887B2 JPH0417887B2 (enExample) 1992-03-26

Family

ID=11566098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57003759A Granted JPS58120510A (ja) 1982-01-13 1982-01-13 熱分解炭素を析出させる方法

Country Status (1)

Country Link
JP (1) JPS58120510A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090191717A1 (en) * 2008-01-24 2009-07-30 Ki-Hyun Kim Atomic layer deposition apparatus
US7585483B2 (en) 2003-11-21 2009-09-08 Statoil Asa Method for the production of particulate carbon products
WO2011100722A3 (en) * 2010-02-13 2011-12-29 Roy Eward Mcalister Induction for thermochemical processes, and associated systems and methods
US8318269B2 (en) 2009-02-17 2012-11-27 Mcalister Technologies, Llc Induction for thermochemical processes, and associated systems and methods
US9617983B2 (en) 2011-08-12 2017-04-11 Mcalister Technologies, Llc Systems and methods for providing supplemental aqueous thermal energy

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5113754A (en) * 1974-07-09 1976-02-03 Toyama Chemical Co Ltd Shinkinaganma *44*3** okisoshikurohekishiru * fueniru ** ganma ketopuchirusan oyobi sonoenruinoseiho
JPS5143038A (en) * 1974-10-09 1976-04-13 Canon Kk Karaaterebijonkamera

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5113754A (en) * 1974-07-09 1976-02-03 Toyama Chemical Co Ltd Shinkinaganma *44*3** okisoshikurohekishiru * fueniru ** ganma ketopuchirusan oyobi sonoenruinoseiho
JPS5143038A (en) * 1974-10-09 1976-04-13 Canon Kk Karaaterebijonkamera

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7585483B2 (en) 2003-11-21 2009-09-08 Statoil Asa Method for the production of particulate carbon products
US20090191717A1 (en) * 2008-01-24 2009-07-30 Ki-Hyun Kim Atomic layer deposition apparatus
US8394201B2 (en) * 2008-01-24 2013-03-12 Samsung Electronics Co., Ltd. Atomic layer deposition apparatus
US8546270B2 (en) * 2008-01-24 2013-10-01 Samsung Electronics Co., Ltd. Atomic layer deposition apparatus
US8318269B2 (en) 2009-02-17 2012-11-27 Mcalister Technologies, Llc Induction for thermochemical processes, and associated systems and methods
WO2011100722A3 (en) * 2010-02-13 2011-12-29 Roy Eward Mcalister Induction for thermochemical processes, and associated systems and methods
US9617983B2 (en) 2011-08-12 2017-04-11 Mcalister Technologies, Llc Systems and methods for providing supplemental aqueous thermal energy

Also Published As

Publication number Publication date
JPH0417887B2 (enExample) 1992-03-26

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