JPS5811842A - High-speed x-ray mapping device - Google Patents
High-speed x-ray mapping deviceInfo
- Publication number
- JPS5811842A JPS5811842A JP56110400A JP11040081A JPS5811842A JP S5811842 A JPS5811842 A JP S5811842A JP 56110400 A JP56110400 A JP 56110400A JP 11040081 A JP11040081 A JP 11040081A JP S5811842 A JPS5811842 A JP S5811842A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- output
- cpu
- detector
- comparator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
【発明の詳細な説明】
この発明は高速X勝マツピング装躯−に関し、特に、試
料に存在する割n又は穴等七他の部分と異なる表示にす
るための新規な改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a high-speed X-shaped mapping system, and more particularly to a novel improvement for displaying parts such as holes or holes in a sample that are different from other parts.
従来、用いら′!″していたこの種の装置では試、11
の輪郭iよび割lしの検出は行1t)nでおらず、試料
の全面について同一の検出および走fk行なっていた0
ところが、このような従来の11I成においては、全て
走*を行なう罠めに、測定時間が長くなると共に、削れ
や穴の状態會懺示面に表示することが′T:@なかった
。Conventionally, it is not used! ``This type of device was tested, 11
Detection of the contour i and division of 1 is not done in rows 1t)n, but the same detection and scanning fk are performed on the entire surface of the sample.However, in such conventional 11I configuration, there is a trap of performing all scanning * Therefore, the measurement time became longer and the state of the scrapes and holes was not displayed on the display screen.
〇の発明は以上の欠点をう与やかに除云テるための極め
て効果的な手段(+1−提供することila的とするも
ので、付に、試料の割n又は大全検出し、割几又は穴の
部分は飛び越し走査して足前時間をm 稲すると共に、
割n又は穴の部分は他の部分と異なる鉄水状態にする佛
奴に関するものである。The invention of 〇 provides an extremely effective means (+1-) for easily eliminating the above-mentioned drawbacks. In addition to interlacing scanning of the hole or hole part and calculating the previous time,
The part with a hole or hole is related to the Buddha's nuc, which makes it different from the other parts.
以下、図面と共にこの発明による高之X線マンピング装
置の好適な実施仇について詳細に説明する0
図面において符号1で示さ扛るものは電子線全発射する
ための電子銃であり、この電子銃1から発射さ1また亀
子、際は′面子レンズ2およびビーノー走査コイル3に
よって制御さ才した後に試料4に照射さγしている。Hereinafter, preferred embodiments of the Takayuki X-ray manpping device according to the present invention will be explained in detail with reference to the drawings. In the drawings, the reference numeral 1 indicates an electron gun for emitting all electron beams. The beam 1 is emitted from the beam 1, and after being controlled by the lens 2 and scanning coil 3, it is irradiated onto the sample 4.
この−85月4に照射σI′L7こ゛電子線による反射
電子は反射電子検出器5i/c−jp検出′ざ1シ、反
射電子検出器5の出力は増幅器6を紅で比較器7の一方
の入力に接続さnている0父、試料4ズノ・らの放射線
は放射線検出器Bで検出さし、渡鳥弁別器9を経てカウ
ンタ10に入力ざf(、ている。この比較器7の他方の
入力端子にはスレッシコル腹足値ケ設足するための可変
抵抗器11の一端子が般絖8nている。ちら(fC,比
較器ンとカラン、p1[1の各出力はCPU12に入力
′C!、t−シ、C王1U12の出力はD/A変換器1
3を介してビーム走置;1イル5に人力されている。妊
らに、O)’U12からの出力(はグラフインクディス
プレイ都14として0)OF+ ’[’に接続さnてい
る。The backscattered electrons from the electron beam were detected by the backscattered electron detector 5i/c-jp. The radiation of sample 4, which is connected to the input of One terminal of a variable resistor 11 for adding a threshold value is connected to the other input terminal of the general wire 8n. The output of input 'C!, t-shi, C king 1U12 is D/A converter 1
Beam travel via 3; manually powered by 1 and 5. In addition, the output from O)'U12 (0) is connected to OF+'[' as the graph ink display capital 14.
以上7)よつ4構成において、この発明による高速X線
マツピング袈置全作動爆ぜる場合について述べると、電
子線が試料4に照射さnると試料4からの反射電子は反
射電子検出器5に入射し、この反射電子検出器5カ・ら
の信号は増幅器6で増幅さn1電圧出力として比較器7
の一方の入力端子に入力芒、nる。この比観器7の他の
入力流1子には第2図で示されるスレンショルド値全収
定テるための町/X、′TA抗器11の電圧出力が入力
さn、この増曙藩6からの出力がスレッショルド値より
も低−い場合、丁なわち、第2図の特性図に2いてB詮
よびDの部分は試料4ilF11の割lf’c(B部分
〕分よび試料4外部(1)部分)に市、子殊が朋肘さ汎
−Cいるとt′ti別6n1、この状態をCPTT12
に入力する。In the above 7) Yotsu 4 configuration, when the high-speed X-ray mapping device according to the present invention is fully activated, when the electron beam is irradiated onto the sample 4, the backscattered electrons from the sample 4 are sent to the backscattered electron detector 5. The signal from the backscattered electron detector 5 is amplified by an amplifier 6 and sent to a comparator 7 as an n1 voltage output.
Input awn to one input terminal of n. The voltage output of the TA resistor 11 is input to the other input stream 1 of the resistor 7, which is used to obtain the Threnskjöld value as shown in FIG. If the output from 6 is lower than the threshold value, then the parts B and D in the characteristic diagram of FIG. In (1) part), if the city and child are friends, then t'ti is 6n1, and this state is CPTT12.
Enter.
このCP TJ ’+ 2は比較器7からの上1ヒのよ
うな信号の人力により、カウンタ10Ljノ!イマをス
タートさせず、つ1す、放射線の強度測定を省略しで、
D/A変換器13(7ζ次の測定点に対応するデータを
出力する0このD/A変換器15の出力はビーム走立コ
イル3に入力さ扛て電子ビームが偏向され、次の測定点
に電子線が照射さ九る0以上の動作盆繰り!丁ことにエ
リ、割nおよび穴さらには試料外部(試料端随J全極め
て簡単に検出でき、しXnも、ごのスレッショルド値以
下のレベルの場合には、走査pよびカウント會甲止して
直ちに7χの場所ケ照射フーる工うにするため、試料全
体の検出分析間、出〕が極端に短紅さJ″1.る。This CP TJ' + 2 is manually inputted from the comparator 7 by a signal such as the above 1hi, and the counter 10Lj'+2 is input to the counter 10Lj'! Without starting the machine and omitting the measurement of radiation intensity,
D/A converter 13 (outputs data corresponding to the 7ζth measurement point) The output of this D/A converter 15 is input to the beam launching coil 3, where the electron beam is deflected, and the data corresponding to the next measurement point is output. The electron beam is irradiated on the surface of the sample, which is extremely easy to detect, especially the edges, cracks and holes, and even the outside of the sample (all the edges of the sample are extremely easy to detect, and even if the Xn is below the threshold value of the sample). In the case of a level 7x, the scanning and counting system is stopped and the 7x area is immediately irradiated, so that during detection and analysis of the entire sample, the output is extremely short-red.
父、0PU127+)ら出力Inるスレッショルド値以
下のレベルの信号はスレツンフルド直以上のレベルの個
勺の表示色とは明確に異なる色又は状態で表示さn、
@:gt、および穴さらには試料外部等を容易に分析す
ることができ))(ンSignals with a level below the threshold value output from the output (0PU127+) are displayed in a color or state that is clearly different from the display color of the individual signal with a level above the threshold value.
@:gt, holes, and the outside of the sample can be easily analyzed))
図面はこの発明による高速Xねマツピング装量を示すた
めのもσ)で、!、μm図は全体を示す構欣図第2図は
試料を電子線でjは射したFJm会の反射電子強度を示
す特性図である。
1は電子a、2はμ子Vンズ、6はビーム走査一 5−
コイル、4は試料、5は反射電子検出器、6は増幅器、
7は比較器、8は放射線検出器、9は波烏弁別器、10
はカウンタ、11は可変抵抗器、12はCPU、15は
D / A変換器、14にグラフィックディスプレイ地
である。
以 上
出願人 株式会社 第 二 稍 工 会代理人 弁理士
最 上 務
6−The drawings are also σ) to show the high speed X-nemapping loading according to the invention. , .mu.m diagram shows the overall structure. FIG. 2 is a characteristic diagram showing the reflected electron intensity of FJm when the sample is irradiated with an electron beam. 1 is an electron a, 2 is a μ-son V, 6 is a beam scanning coil, 4 is a sample, 5 is a backscattered electron detector, 6 is an amplifier,
7 is a comparator, 8 is a radiation detector, 9 is a Nagarasu discriminator, 10
is a counter, 11 is a variable resistor, 12 is a CPU, 15 is a D/A converter, and 14 is a graphic display area. Applicant: Dainiken Co., Ltd. Trade association agent Patent attorney Mogami Mutsu 6-
Claims (1)
から反射テる反射電子ヶ検出Tる7Cめの反射電子検出
器と、試料からの放射線全検出するための放射線検出器
と、電子線の走査を行なうためのビーム走査コイルと、
この反射電子検出器の出力を入力する7ζめの比較器と
、この放射線検出器からの出力述入力するための波^弁
別器と、前記比較器および波高弁別器70′−らの出カ
ケ入力するためのCPUと、このCPHの出力を表示す
るためのグラフ・インクディスプレイと、比較器の基準
値を腹足するための基準値設定器と、CPU炉らの走f
:信号?ビーム走査コイルに印加するための印刀口手段
と金備え、前記基準値以下の信号?ll″基準1■以上
の信号の表示とは異なる表示にしたことに%徴と1゛る
高速XffI!マンピング装置。A backscattered electron detector for detecting the backscattered electrons reflected from the sample, a radiation detector for detecting all the radiation from the sample, a beam scanning coil for scanning the electron beam;
The 7ζth comparator inputs the output of this backscattered electron detector, the wave discriminator inputs the output from this radiation detector, and the output inputs of the comparator and wave height discriminator 70'. a graph/ink display for displaying the output of this CPH, a reference value setter for setting the reference value of the comparator, and a CPU for running the CPU.
:signal? Is the signal below the above-mentioned reference value a stamping means and a gold provision for applying to the beam scanning coil? A high-speed XffI! manping device that is 1% remarkable in that it has a different display from the display of signals above the standard 1■.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56110400A JPS5811842A (en) | 1981-07-14 | 1981-07-14 | High-speed x-ray mapping device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56110400A JPS5811842A (en) | 1981-07-14 | 1981-07-14 | High-speed x-ray mapping device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5811842A true JPS5811842A (en) | 1983-01-22 |
JPH0332736B2 JPH0332736B2 (en) | 1991-05-14 |
Family
ID=14534838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56110400A Granted JPS5811842A (en) | 1981-07-14 | 1981-07-14 | High-speed x-ray mapping device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5811842A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013019900A (en) * | 2011-07-11 | 2013-01-31 | Fei Co | Clustering multi-modal data |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5192182A (en) * | 1975-02-10 | 1976-08-12 |
-
1981
- 1981-07-14 JP JP56110400A patent/JPS5811842A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5192182A (en) * | 1975-02-10 | 1976-08-12 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013019900A (en) * | 2011-07-11 | 2013-01-31 | Fei Co | Clustering multi-modal data |
Also Published As
Publication number | Publication date |
---|---|
JPH0332736B2 (en) | 1991-05-14 |
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