JPS58116707A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JPS58116707A
JPS58116707A JP56211503A JP21150381A JPS58116707A JP S58116707 A JPS58116707 A JP S58116707A JP 56211503 A JP56211503 A JP 56211503A JP 21150381 A JP21150381 A JP 21150381A JP S58116707 A JPS58116707 A JP S58116707A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
weight
sputtering
magnetic layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56211503A
Other languages
Japanese (ja)
Other versions
JPS6059729B2 (en
Inventor
Osamu Kawamoto
修 河本
Takahiro Yamamoto
隆洋 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP56211503A priority Critical patent/JPS6059729B2/en
Publication of JPS58116707A publication Critical patent/JPS58116707A/en
Publication of JPS6059729B2 publication Critical patent/JPS6059729B2/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/64Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/656Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Co

Landscapes

  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To reduce aging effect of magnetic characteristic under high temperature and humidity ambient by providing a sputtering thin film of Co-P or Co-Ni-P containing phosphorus of 6-8wt% on a non-magnetic support material. CONSTITUTION:A sputtering thin film having composition of T100-yPY (T is Co or Co and Ni, y is 6wt% or more, 8wt% or less) on a non-magnetic support material. When content of P exceeds 6wt%, magnetic characteristic, particularly coercive force is lowered than that of 6wt%, but when P is 6-8wt%, magnetic characteristic is sufficient for the practical use. When content of P exceeds 6wt%, storing capability under high temperature and high humidity ambient become good and thereby film strength and bonding strength are improved.

Description

【発明の詳細な説明】 I IA嘴の背景 技術公費 本発明は磁気記鍮媒体に関する。 更に詳しくは、Co
−PまたはCo −Ni −P系の磁性薄膜を磁性層と
する連続薄膜形の磁気記鎌媒体Kllする。
DETAILED DESCRIPTION OF THE INVENTION IIA BEAK BACKGROUND TECHNICAL FIELD This invention relates to magnetic recording media. For more details, see Co.
-P or Co-Ni-P magnetic thin film is used as a magnetic layer to form a continuous thin film type magnetic recording medium.

先行技術とその問題点 近年、金属磁性薄膜を磁性層とする連続薄膜形の磁気記
鍮媒体が注目を集めている。
Prior art and its problems In recent years, continuous thin film type magnetic recording media in which the magnetic layer is a metal magnetic thin film have been attracting attention.

このような連続薄膜形の磁気記鍮媒体の磁性層薄膜の1
つとして、Co−PまたはCo −Ni−P基金属薄膜
が、良好な保磁力と角形比とを示すものとして知られて
いる。
One of the magnetic layer thin films of such a continuous thin film type magnetic recording medium.
As one example, Co--P or Co--Ni--P based metal thin films are known to exhibit good coercive force and squareness.

従来、磁気記f&媒体のCo −PないしCo −Ni
−P系の磁性層薄膜は、通常、電気鍍金、化学鍍金など
の鍍金法によって作製されている。
Conventionally, Co-P or Co-Ni of magnetic recording media
-P-based magnetic layer thin films are usually produced by plating methods such as electroplating and chemical plating.

しかし、これら鍍金法によるときには1種々の欠点があ
る。先ず、薄膜の基板に対する接着性と、膜の機械的強
度とが低く、磁気ヘッドとの摺IIKより、薄膜の摩耗
、剥−が生じ、出力峙性が減少してくる等の硫気畳性の
経時変化を生じるという欠点がある。 この・ため、通
常は磁性層薄膜上1層に保緩層を被覆して使用すること
になるが、保■層設層厚をあるam厚くしなければなら
ず、そのとき。
However, these plating methods have various drawbacks. First, the adhesion of the thin film to the substrate and the mechanical strength of the film are low, and due to sliding with the magnetic head, the thin film may wear and peel, resulting in a decrease in output resistance. It has the disadvantage that it causes changes over time. For this reason, one layer on the thin magnetic layer is usually coated with a buffer layer, but the thickness of the buffer layer must be increased by a certain amount.

磁気ヘッドとの実効すきまが増え、空隙損か増大し、記
録再生出力は低下してしまう。
The effective clearance with the magnetic head increases, the air gap loss increases, and the recording/reproducing output decreases.

K2には、磁性層薄膜の表面性が悪く、特に高域での出
力が低下するという欠点もある。
K2 also has the disadvantage that the surface properties of the thin magnetic layer are poor, resulting in a drop in output, especially in high frequencies.

更に第3には、鍍金浴に存在するアルカリ金属イオン、
酸、塩基等が、薄膜中に混入し、この混入不純物により
、磁性層薄膜の磁気特性が鮭時変化し劣化してしまった
り、場合によっては、磁気ヘッドを腐食するなどの不都
合もある。
Furthermore, thirdly, alkali metal ions present in the plating bath,
Acids, bases, etc. are mixed into the thin film, and these mixed impurities can cause problems such as changing and deteriorating the magnetic properties of the magnetic layer thin film and, in some cases, corroding the magnetic head.

加えて、第4の欠点として、その原因は明白でないが1
%に、オーディオ用テープに適用するとき、333H!
における第3次&1111噴に対する歪が大きく、実用
上問題となっている。
In addition, there is a fourth drawback, although the cause is not clear.
%, when applied to audio tape, 333H!
The distortion for the tertiary &1111 injection is large, which poses a practical problem.

これに対し、本発明者らは、先に、P含有量6重量う以
下のCo−PまたはCo −Ni −P系合金からなる
磁性層を、スパッタリングにより形成した磁気記録媒体
について提案を行っている(41願@55−16489
9号)。
In response, the present inventors have previously proposed a magnetic recording medium in which a magnetic layer made of Co-P or Co-Ni-P alloy with a P content of 6 weight or less is formed by sputtering. There is (41 requests @ 55-16489
No. 9).

このように、スパッタリングにより形成したCo−Pま
たはCo −Ni −P系磁性層をもつ磁気記録媒体は
、鍍金法によるときと比較して、磁気特性が向上し、磁
性層薄膜の機械的強度と接着強度が格段と高く、又その
表面性も格段と良好であるとともに、更にこれらに加え
、高温高湿下での長期保存の際の磁気特性の経時変化も
きわめて小さく、又333 Hzにおける第3次高11
11tILK対する歪もきわめて小さい。
In this way, magnetic recording media with Co-P or Co-Ni-P magnetic layers formed by sputtering have improved magnetic properties and improved mechanical strength of the magnetic layer thin film compared to those formed by plating. The adhesive strength is extremely high, and the surface properties are also extremely good.In addition to these, the change in magnetic properties over time during long-term storage under high temperature and high humidity is also extremely small, and the third Next high school 11
The distortion for 11tILK is also extremely small.

しかし、このような媒体も、高温高湿下での長期保存の
際の磁気特性の劣化は未だ大きく、また、膜強度および
接着強度の点でも未だ十分でない。
However, even in such a medium, the deterioration of magnetic properties during long-term storage under high temperature and high humidity conditions is still large, and the film strength and adhesive strength are still insufficient.

■ 発明の目的 本発明は、このような実状に鑑みなされたものであって
、その主たる目的は、本発明者らが先に提案したCo−
PまたはCo −Ni −P系スパッタ薄膜磁性層を改
良して、保存性と膜強度および接着強度とを向上させる
ことKある。
■ Purpose of the Invention The present invention was made in view of the above circumstances, and its main purpose is to improve the Co-
It is possible to improve the P or Co-Ni-P based sputtered thin film magnetic layer to improve its storage stability, film strength, and adhesive strength.

本発明者らは、このような目的につき鋭意研究を行った
結果、Co−PまたはCo −Ni −P系スパッタ薄
膜磁性層のP量を先の提案におけるよりも増大させたと
き、保存性と強度とが増大し、しかも磁気特性は実用上
支障のないことを見出し、本発明をなすに至ったもので
ある。
As a result of intensive research for this purpose, the present inventors found that when the amount of P in a Co-P or Co-Ni-P sputtered thin film magnetic layer was increased from that in the previous proposal, the storage stability and The present inventors have discovered that the strength is increased and that the magnetic properties have no practical problems, leading to the present invention.

すなわち、本発明は、非磁性支持体上に、下記式で示さ
れる組成をもつスパッタ薄膜を有することを特徴とする
磁気記録媒体である。
That is, the present invention is a magnetic recording medium characterized by having a sputtered thin film having a composition represented by the following formula on a nonmagnetic support.

弐  Tよ。。−7P、     ゛ (下記式において、Tは、COlまたはCoおよびNi
を表わす。
2 T. . -7P, ゛(In the following formula, T is COl or Co and Ni
represents.

また、yは61童%より大で、8重量%以下である。) なお、従来、上記のようにP含量の嵩いCo−Pまたは
Co −Ni−“P薄膜は、気相被着によると、鍍金法
によるとKかかわらず、知ら−れていない。
Furthermore, y is greater than 61% by weight and less than 8% by weight. Note that, as mentioned above, a Co--P or Co--Ni--P thin film with a high P content has not been known so far, regardless of whether it is produced by vapor phase deposition or by plating.

厘 発明の具体的構成 以下1本発明の具体的構成について詳細に説明する。Concrete structure of the invention Hereinafter, a specific configuration of the present invention will be explained in detail.

本発明におけるスパッタ薄膜磁性層の組成な費わす上記
式において、yすなわちP含量は、6重量%より大で、
しかも8重量%以下である。
In the above formula for the composition of the sputtered thin film magnetic layer in the present invention, y, that is, the P content is greater than 6% by weight,
Moreover, it is 8% by weight or less.

この場合、P含量が、6重量%をこえると、磁気特性、
特に保磁力は6重量%以下のものより低下する傾向にあ
るが、P含11〜6重量%と6〜8重量%とではほぼ同
等の保磁力を示し、実用上支障のない磁気特性をもつ。
In this case, when the P content exceeds 6% by weight, the magnetic properties
In particular, the coercive force tends to be lower than those containing 6% by weight or less, but 11-6% by weight and 6-8% by weight of P show almost the same coercive force, and have magnetic properties that do not pose any practical problems. .

反面、6重量%をこえると、高温高湿下での保存性はき
わめて良好となる。 また、6重量%をこえると、膜強
度と接着強度とが向上し、ヘッドの長期間摺接に伴う剥
離や摩耗も減少する。
On the other hand, when it exceeds 6% by weight, the storage stability under high temperature and high humidity becomes extremely good. Furthermore, when the content exceeds 6% by weight, the film strength and adhesive strength are improved, and peeling and wear associated with long-term sliding contact of the head are also reduced.

ただ、P含量が8重量%をこえると、保磁力は低下して
しまう。
However, when the P content exceeds 8% by weight, the coercive force decreases.

このため、P含量は6重量%より大で、8重量シ以下で
ある必要があり、このとき、磁気特性、保存性、強度等
の点から、總合的にみてきわめてすぐれた媒体が実現す
る。
For this reason, the P content must be greater than 6% by weight and less than 8% by weight, and in this case, a medium that is collectively extremely excellent in terms of magnetic properties, storage stability, strength, etc. will be realized. .

そして、P含量が、qI#に%6.1〜8.0重量シで
あると、より好ましい結果を得る。
Further, more preferable results are obtained when the P content is 6.1 to 8.0% by weight relative to qI#.

一方、TはCoのみであっても、またCoとNiとの組
合せであってもよい。
On the other hand, T may be Co alone or a combination of Co and Ni.

TKおけるCo/(Co+Ni )重量比(X)は、0
または35重量う以下である。   ・上記Xが35重
重量上超えると、磁気特性、411K、保磁力が低下し
てしまうからである。
The Co/(Co+Ni) weight ratio (X) in TK is 0
or weighs less than 35 pounds. - If the above-mentioned X exceeds 35 weight, the magnetic properties, 411K, and coercive force will decrease.

この場合、保磁力の点で、上記Xが0または30重量う
以下、%KOまたは28重重量風下であれば、より好ま
しい結果を得る。
In this case, in terms of coercive force, more preferable results can be obtained if the above-mentioned X is 0 or less than 30% KO or 28% KO.

なお、本実@における磁性層薄膜は以上のような組成か
らなるものであるが、薄膜中には、更に第3ないし第4
成分として1例えばGo、Ni以外の他の遷移金属元素
等、例えばFt、Cr、kin、Moなどの111以上
が、全体のlO重量囁以下の範囲で含有されていてもこ
のような組成をもつ磁性層薄膜の厚さについては、特に
制限はなく、磁気記録媒体がアナログ記録を行うもので
・あるか、ディジタル記録を行うものであるか、あるい
はどのような用途に用いるか勢に応じ1種々の厚さと〜 すればよい。 ただ、通常は、500A〜数μ鶴11&
の厚さの連続薄膜として、非磁性支持体上く形成される
ものである。
Note that the magnetic layer thin film in this study@ has the above composition, but the thin film further contains third to fourth elements.
Even if 111 or more transition metal elements other than Go and Ni, such as Ft, Cr, kin, Mo, etc. are contained as a component in a range of less than a whisper of the total IO weight, it has such a composition. There is no particular limit to the thickness of the magnetic layer thin film, and it may vary depending on whether the magnetic recording medium is for analog recording or digital recording, or for what purpose it will be used. The thickness should be ~. However, normally 500A to several μTsuru11&
It is formed on a non-magnetic support as a continuous thin film with a thickness of .

支持体としては、非磁性のものを用いればよく、その材
質、形状にはl111限はない、 このため、磁気記録
媒体の用途(応じ、種々変更可能である。 本発明によ
れば、公知のいずれの材質、形状の支持体に対しても、
すぐれた機械的強度、接着性と、良好なIIIIi性を
もつ磁性層薄膜を得ることができるからである。
As the support, it is sufficient to use a non-magnetic material, and there is no limit to its material and shape. Therefore, various changes can be made depending on the application of the magnetic recording medium. For supports of any material or shape,
This is because it is possible to obtain a magnetic thin film having excellent mechanical strength, adhesiveness, and good IIIi properties.

なお、支持体には各種下地層を形成し、この下地層上に
磁性層を形成することもできる。
Note that it is also possible to form various underlayers on the support and form a magnetic layer on this underlayer.

このような本発明におけ、る磁性層薄膜は。In the present invention, the magnetic layer thin film is as follows.

上記の支持体上に、スパッタリングによって被着形成さ
れる。
It is deposited on the above support by sputtering.

この場合、スパッタリングとしては、衡撃イオンにより
、ターゲットをスパッタし1通常、数eV〜約100 
eV 8度の運動エネルギーにてターゲット物質を蒸散
させる公知のスパッタリングはいずれも使用可能である
In this case, the sputtering is performed by sputtering the target using equilibrated ions, usually at a voltage of several eV to about 100
Any known sputtering method that evaporates the target material with a kinetic energy of 8 degrees eV can be used.

従って、Ar等の不活性ガス専門気中で、異常グロー放
電によるAr等のイオンによって、ターゲットをスパッ
タするプラズマ法を用いても、ターゲットにAr等のイ
オンビームを照射して行うイオンビーム法を用いてもよ
い。
Therefore, even if a plasma method is used in which the target is sputtered with ions such as Ar caused by an abnormal glow discharge in an inert gas atmosphere such as Ar, an ion beam method in which the target is irradiated with an ion beam such as Ar is not possible. May be used.

プラズマ法によるときには、いわゆるRFスパッタであ
っても、また、いわゆるL)Cスパッタであってもよく
、その装置構成も2極、4極等いずれであってもよい。
When using a plasma method, it may be so-called RF sputtering or so-called L)C sputtering, and the device configuration may be either two-pole, four-pole, etc.

  さらには、いわゆるマグネトロンスパッタを用いて
もよい。 また場合によっては、P等を流しながら行う
、いわゆる反応性スパッタによることもできる。 さら
に、イオンビーム法とじては、種々の方式に従うことが
できる。
Furthermore, so-called magnetron sputtering may be used. In some cases, so-called reactive sputtering, which is performed while flowing P or the like, may also be used. Furthermore, various methods can be used as the ion beam method.

用いるターゲットとしては、通常の場合は、上記組成の
Co−PないしCo −Ni −Pの焼結体等を用いれ
ばよい。
In normal cases, a sintered body of Co--P or Co--Ni--P having the above composition may be used as the target.

一方、衝撃イオンのイオン源としては、通常、Ar、K
r%Xe等の不活性ガスなどを用いればよい。 そして
、これらの不活性ガス等は、動作時において、2XlO
”Tart以上の圧力Km持することが好ましい。 こ
のような圧力未満では、得られる磁性層薄膜の磁気特性
、’ftK保磁力が低下してしまうからである。 一方
、動作時の圧力を上げれば、スパッタレートは低下して
しまう。 このため。
On the other hand, as an ion source for impact ions, Ar, K
An inert gas such as r%Xe may be used. During operation, these inert gases, etc.
It is preferable to maintain a pressure Km higher than Tart. If the pressure is less than this, the magnetic properties of the obtained magnetic layer thin film, ftK coercive force, will decrease. On the other hand, if the pressure during operation is increased, , the sputtering rate will decrease.For this reason.

動作時の圧力は、−ffK5X10 ” 〜2X10 
’Torr@&とすることが好ましい。
Pressure during operation is -ffK5X10'' ~2X10
'Torr@& is preferable.

なお、グレート電圧、7レートー流、極間間隙等には特
別の制限はなく、これらは1条件に応じ、任意の値に設
定することかできる。
Note that there are no particular restrictions on the grate voltage, the seven-rate current, the inter-electrode gap, etc., and these can be set to arbitrary values depending on one condition.

このよう処して形成される磁性層薄膜は。The magnetic layer thin film formed by this process is as follows.

最高6000eに及ぶ保磁力と、0.7&Cも及ぶ角形
比をもち、きわめてすぐれた磁気特性をもつ。 又、磁
性層薄膜に方向性はなく、斜め蒸着による場合のように
、磁気ディスク尋には使えないというような、媒体とし
ての用途が制限されることはない。
It has extremely excellent magnetic properties, with a coercive force of up to 6000e and a squareness ratio of 0.7&C. Furthermore, since the magnetic thin film has no directionality, it is not limited in its use as a medium, such as in the case of oblique deposition, which makes it impossible to use it for magnetic disks.

なお、このよう忙して形成される磁性層薄膜は、その接
着強度および膜強度がきわめて高いので、上層にあえて
保護層を設層しなくてよいという利点があるが、もし必
要であるならば、保嚢層を複機してもよいことは勿論で
ある。
Incidentally, since the magnetic layer thin film that is formed in this way has extremely high adhesive strength and film strength, it has the advantage that there is no need to intentionally provide a protective layer on the upper layer, but if it is necessary, It goes without saying that multiple protective layers may be used.

このような磁気記録媒体は、必li!に応じ、所定の形
状加工等を施し、製造される。
Such magnetic recording media are a must! It is manufactured by performing predetermined shape processing, etc. according to the requirements.

■ 発明の具体的作用効果 このような本発明における磁気記録媒体は、アナログな
いしディジタルの磁気記録を行う、各種磁気テープ、磁
気ディスク、磁気ドラム、磁気シート、磁気カード、磁
気スケール等として、有用である。
■Specific effects of the invention The magnetic recording medium of the present invention is useful as various magnetic tapes, magnetic disks, magnetic drums, magnetic sheets, magnetic cards, magnetic scales, etc. that perform analog or digital magnetic recording. be.

本発明の磁気記録媒体は、長期間、高温高温下や化学的
に劣悪な雰囲気下で保存したような場合でも、磁気特性
等の経時変化はきわめて少ない。 この場合、経時変化
は、同じくスパッタリングを用いて形成したP含量6重
量%以下のものと比較して格段と小さくなる。 また、
不純物含有量の多い鍍金法による場合と比較して格段と
小さいものであると同時に、蒸着法によるときと比較し
たときも、きわめて小さいものである。
Even when the magnetic recording medium of the present invention is stored for a long period of time under high temperature conditions or under a chemically poor atmosphere, the magnetic properties and the like show very little change over time. In this case, the change over time is much smaller than that of a material with a P content of 6% by weight or less, which is also formed using sputtering. Also,
It is much smaller than when using the plating method, which contains a large amount of impurities, and at the same time, it is also extremely small when compared to when using the vapor deposition method.

又、磁性層薄膜の膜強度および接着強度がきわめて高く
、ヘッド摺接による剥離、摩耗はきわめて少ない。 こ
れもP含量6重量う以下のものと比較して、また他の方
法によるときと比較して、きわめて少ない。
Furthermore, the film strength and adhesive strength of the thin magnetic layer are extremely high, and peeling and abrasion due to head sliding contact are extremely low. This is also extremely low compared to the P content of 6 weight or less, and compared to other methods.

さらに本発明の媒体の磁性層薄膜の保磁力Hcおよび角
形比等の磁気特性は、P含量6重量う以下のときと同勢
であり、実用上十分高い値をもつ。
Furthermore, the magnetic properties such as coercive force Hc and squareness ratio of the magnetic layer thin film of the medium of the present invention are on the same level as when the P content is 6 weight or less, and have values that are sufficiently high for practical use.

又、磁性層薄膜表面の表面性は、他の製造方法によると
きと比較して、格段と嵐好であり、特に1高周波領域な
いし短波長記録での、出力低下が格段と少ない。
Furthermore, the surface properties of the magnetic layer thin film are much better than those obtained by other manufacturing methods, and there is much less decrease in output, especially in one high frequency region or short wavelength recording.

加えて、333HzKおける第3次高調波に対する歪が
きわめて小さく、%にオーディオ用各種磁気テープとし
て用いるときKは、きわめてすぐれた特性を発揮する。
In addition, distortion to the third harmonic at 333 HzK is extremely small, and K exhibits extremely excellent characteristics when used as various magnetic tapes for audio.

 この場合、この歪値は、従来の鍍金法によるときの1
/311!度であり、又、通常の蒸着法、特に斜め蒸着
を用いたときの約17511itLであることが確認さ
れている。
In this case, this distortion value is 1 when using the conventional plating method.
/311! It has also been confirmed that it is about 17,511 itL when using normal vapor deposition methods, especially oblique vapor deposition.

マ 発明の具体的実施例 次に、本発明の実施例を示し、本発明を叉に詳細に説明
する。
Specific Examples of the Invention Next, examples of the present invention will be shown and the present invention will be explained in detail.

実施例1゜ (”100−X”! ) 100−yPyにて、下記#
IIK示される8種の組成の焼結体を作製し、ターゲッ
トとし、RFスパッタにより、長尺の15jIII11
厚ポリエチレンテレフタレートフイルム上に、C0−N
1−P系磁性層薄膜な被着した。
Example 1゜(“100-X”!) At 100-yPy, the following #
A sintered body having eight compositions shown in IIK was prepared, used as a target, and a long 15jIII11 was formed by RF sputtering.
C0-N on thick polyethylene terephthalate film
A thin film of 1-P magnetic layer was deposited.

この場合、ターゲット−フィルム間距離は60■とじ、
又プレート電圧およびプレート電流は、それぞれ2 K
V、1.50mA/−とシタ。
In this case, the target-film distance is 60cm,
Also, the plate voltage and plate current are each 2 K.
V, 1.50mA/- and Sita.

一方、不活性ガスとしてはアルゴンを用い、動作時のア
ルゴン圧は0.7 X 10  ”Torrじ維持した
On the other hand, argon was used as the inert gas, and the argon pressure during operation was maintained at 0.7 x 10'' Torr.

このよう和して、スパッタリングを行ったところ、被着
された磁性層薄膜は、長尺フィルムの全域に亘り、30
00Aの均一の厚さをもち、上記それぞれと対応する均
一な組成を有することが確認された。
When sputtering was performed in this manner, the deposited magnetic layer thin film was spread over the entire area of the long film.
It was confirmed that it had a uniform thickness of 00A and a uniform composition corresponding to each of the above.

これら8種のカセットテープにつき、保磁力Hcおよび
角形、Itlを測定した。  結果を下記表IK示す。
For these eight types of cassette tapes, the coercive force Hc, squareness, and Itl were measured. The results are shown in Table IK below.

これとは別に、経時変化を測定した。Separately, changes over time were measured.

すなわち、各テープを、60℃、95%相対湿度にて、
150日間保存し、その後の保磁力Hc 、残留磁束密
度Brおよび14KHz<おけるMOLを測定した。H
CおよびBrの変化率(%)と、保存後の14KHzM
OLの、保存前の各テープとの出力レベル差を、下記表
1に示す。
That is, each tape was heated at 60°C and 95% relative humidity.
After storage for 150 days, the coercive force Hc, residual magnetic flux density Br, and MOL at <14 KHz were measured. H
Change rate (%) of C and Br and 14KHzM after storage
The output level difference between the OL and each tape before storage is shown in Table 1 below.

更に、各テープにつき、いわゆる200パス試験を行い
剥離を評価した。 すなわち、各テープに記鍮を行った
後、40℃、80%相対湿度にて、テープ走行を200
回行い。
Furthermore, each tape was subjected to a so-called 200 pass test to evaluate peeling. That is, after marking each tape, the tape was run for 200 cycles at 40°C and 80% relative humidity.
Go twice.

その後再生し【、3dB以上のレベル低下か何回あるか
を測定した。
After that, it was played back and the number of times the level decreased by 3 dB or more was measured.

各テープにおける3dB以上のレベル低下回数を1分間
あたりに換算して、下記表IK示す。
The number of times the level drops by 3 dB or more on each tape is calculated per minute and is shown in Table IK below.

加えて、両テープの3338!に:おける第3次高調波
に対する歪を測定した。
In addition, 3338 of both tapes! The distortion to the third harmonic was measured.

なお、別途、PおよびCo−Niを蒸発源として、1配
ポリエチレンテレフタレートフィルム上に、蒸着角60
°にて斜め蒸着を行い、3000A厚で、x = l 
5wt%、y = 4.8wt%のCo −Ni −P
系磁性層薄膜を形成し、カセットチーブを作成し、この
場合の歪を評価したところ、5.0%であった。
Separately, P and Co-Ni were used as evaporation sources at a deposition angle of 60 on a single polyethylene terephthalate film.
Oblique evaporation at 3000A thickness, x = l
5 wt%, y = 4.8 wt% Co-Ni-P
A system magnetic layer thin film was formed, a cassette tube was prepared, and the strain in this case was evaluated and found to be 5.0%.

表IK示される結果から、本発明の組成に℃、保存性と
膜強度がきわめて向上し、しかも磁気特性は、P含量6
重量%以下と同等であることがわかる。
From the results shown in Table IK, it can be seen that the composition of the present invention has significantly improved storage stability and film strength at 60°C, and has excellent magnetic properties.
It can be seen that it is equivalent to less than % by weight.

実施例2゜ 実施例1Kおける!=15wt%、F=6.5wtシの
組成のターゲットを用いたRFスパッタの際の動作時ア
ルゴン圧を、下記!!!2のようにかえ、実施例1と同
様に磁性層薄膜の被着を行い、2種のカセットテープな
得た。
Example 2゜Example 1K works! The operating argon pressure during RF sputtering using a target with a composition of = 15wt% and F = 6.5wt is as follows! ! ! 2, a magnetic layer thin film was deposited in the same manner as in Example 1, and two types of cassette tapes were obtained.

各テープにつき、保磁力Hcおよび角形比を一定し、表
2に示される結果を得た。
For each tape, the coercive force Hc and squareness ratio were kept constant, and the results shown in Table 2 were obtained.

表    2 Ar 8EHe     角形比 (Torr)    (Oe) 2X10  ”    ぢ3o     0.6g7X
10  ”    600    063IXIO” 
   too     O,5!;l!l!1および表
2の結果から、スパッタリング動作圧が所定値となった
ときのすぐれた特性が明らかである。
Table 2 Ar 8EHe Squareness Ratio (Torr) (Oe) 2X10” ぢ3o 0.6g7X
10” 600 063IXIO”
Too O, 5! ;l! l! From the results shown in Table 1 and Table 2, it is clear that the sputtering operating pressure had excellent properties when the sputtering operating pressure reached a predetermined value.

代理人  弁理士  石 井 陽 − 一3(Agent: Patent Attorney: Yo Ishii - 13(

Claims (1)

【特許請求の範囲】 非晶質支持体上に、下記式で示される組成をもつスパッ
タ薄膜を有することを41黴とする磁気記鍮謀体。 弐Tよ。。−ア。 (上記式において、Tは、COlまたはCOおよびNi
を表わす。 また、yは、6重置きより大で、8重量多
以下である。)
[Scope of Claims] A magnetic recording material having a sputtered thin film having a composition represented by the following formula on an amorphous support. NiT. . -A. (In the above formula, T is COI or CO and Ni
represents. Further, y is greater than 6-fold and 8-fold or less. )
JP56211503A 1981-12-30 1981-12-30 Method for manufacturing magnetic recording media Expired JPS6059729B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56211503A JPS6059729B2 (en) 1981-12-30 1981-12-30 Method for manufacturing magnetic recording media

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56211503A JPS6059729B2 (en) 1981-12-30 1981-12-30 Method for manufacturing magnetic recording media

Publications (2)

Publication Number Publication Date
JPS58116707A true JPS58116707A (en) 1983-07-12
JPS6059729B2 JPS6059729B2 (en) 1985-12-26

Family

ID=16607012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56211503A Expired JPS6059729B2 (en) 1981-12-30 1981-12-30 Method for manufacturing magnetic recording media

Country Status (1)

Country Link
JP (1) JPS6059729B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986007651A1 (en) * 1985-06-21 1986-12-31 Sumitomo Metal Mining Co., Ltd. Magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1986007651A1 (en) * 1985-06-21 1986-12-31 Sumitomo Metal Mining Co., Ltd. Magnetic recording medium
US4769282A (en) * 1985-06-21 1988-09-06 Sumitomo Metal Mining Co., Ltd. Magnetic recording medium

Also Published As

Publication number Publication date
JPS6059729B2 (en) 1985-12-26

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