JPS58106743A - Target for x-ray tube - Google Patents

Target for x-ray tube

Info

Publication number
JPS58106743A
JPS58106743A JP56204515A JP20451581A JPS58106743A JP S58106743 A JPS58106743 A JP S58106743A JP 56204515 A JP56204515 A JP 56204515A JP 20451581 A JP20451581 A JP 20451581A JP S58106743 A JPS58106743 A JP S58106743A
Authority
JP
Japan
Prior art keywords
layer
blackened
region
target
subjecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56204515A
Other languages
Japanese (ja)
Other versions
JPH0427663B2 (en
Inventor
「峰」岸 知弘
Tomohiro Minegishi
Keiichi Terajima
慶一 寺島
Atsushi Hitai
比田井 厚志
Yasuhiro Kato
泰弘 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Tungsten Co Ltd
Original Assignee
Tokyo Tungsten Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Tungsten Co Ltd filed Critical Tokyo Tungsten Co Ltd
Priority to JP56204515A priority Critical patent/JPS58106743A/en
Publication of JPS58106743A publication Critical patent/JPS58106743A/en
Publication of JPH0427663B2 publication Critical patent/JPH0427663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes

Abstract

PURPOSE:To easily form a blackened layer having the uniform thickness and adhesion property thereof by forming the first electrodeposited layer on the second region except the first region irradiated by electron rays, and forming the second electrodeposited layer comprising blackened Cr on said first electrodeposited layer. CONSTITUTION:A Cr layer having the thickness of, e.g., 1-3mum is formed by subjecting a graphite substrate serving as a target substrate to electrolytic polishing, masking the electron ray irradiation orbital portion of said substrate, and subjecting a region except said orbital portion to Cr plating. A 1-2mum thick blackened Cr plated layer is formed by subjecting said Cr plated layer to a degassing treatment after forming said Cr plated layer, and then subjecting said Cr plated layer to blackened Cr plating so as to cover said Cr plated layer. Hereby, it is possible to easily form a blackened material layer having the good adhesion property using an aqueous solution and uniform thickness thereof.

Description

【発明の詳細な説明】 本発明は電子線の照射によってX線を発生させるための
X線管用ターゲットに関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an X-ray tube target for generating X-rays by irradiation with electron beams.

従来、この種のX線管用夕2、−グツトには、X線によ
って照射される部分を含む領域以外を黒色材料層で覆い
、真空雰囲気で使用されるターゲットの熱放射率を上昇
させる形式のものがある。上述した黒色材料層は通常、
二酸化チタンとその他の少くとも一種類の難溶融性酸化
物の添加物とを含む混合物とによ多形成されている。
Conventionally, this type of X-ray tube has a type that covers the area other than the area irradiated with X-rays with a black material layer to increase the thermal emissivity of the target used in a vacuum atmosphere. There is something. The black material layer mentioned above is usually
It is formed of a mixture containing titanium dioxide and at least one other type of refractory oxide additive.

しかしながら、これら黒色材料層を形成する混合物はい
ずれも1500〜1600℃程度の高温で熱処理しなけ
れば、ターゲット基体との十分な密着性が得られない。
However, the mixtures forming these black material layers cannot achieve sufficient adhesion to the target substrate unless they are heat-treated at a high temperature of about 1500 to 1600°C.

また、プラズマガン等を用いて吹付けたのでは、均一な
厚さの黒色材料層が得難いという欠点がある。更に、と
れら黒色材料層を有するターゲットはいずれも黒色材料
層の剥離に対する対策が立てられていない。
Furthermore, spraying using a plasma gun or the like has the disadvantage that it is difficult to obtain a black material layer with a uniform thickness. Furthermore, none of these targets having a black material layer has any measures against peeling of the black material layer.

本発明の目的は低温で被着でき、且つ、十分な密着性を
示す均一な厚さを有する黒色材料層を備えたX線管用タ
ーゲットを提供することである。
It is an object of the present invention to provide a target for an X-ray tube with a layer of black material that can be deposited at low temperatures and has a uniform thickness showing sufficient adhesion.

本発明の他の目的は黒色材料層の剥離を防止できるX線
管用ターケゝットを提供することである。
Another object of the present invention is to provide an X-ray tube target that can prevent the black material layer from peeling off.

本発明によシ他の目的は二酸化チタンを含まない黒色材
料層を備えたX線管用ターゲットを提供することである
Another object of the present invention is to provide an x-ray tube target with a layer of black material that does not contain titanium dioxide.

本発明によれば、電子線によって照射される部分を含む
第1の領域と、この第1の領域を除く第2の領域とを有
するX線管用ターゲットにおいて。
According to the present invention, an X-ray tube target has a first region including a portion irradiated with an electron beam and a second region excluding the first region.

第2の領域上に形成された第1の電着層と、第1の電着
層上に形成された黒色化クロムからなる第2の電着層と
を有するX線管用ターゲットが得られる。
An X-ray tube target is obtained having a first electrodeposited layer formed on the second region and a second electrodeposited layer made of blackened chromium formed on the first electrodeposited layer.

以下1本発明の実施例について説明する。An embodiment of the present invention will be described below.

実施例1 まず、ターゲット基板として、グラファイト基板を用意
し、このグラファイト基板を電解研摩した。電解研摩後
、基板の電子線照射軌道部をマスクし、マスクされた軌
道部を除いた領域に、クロムメッキを施し、1〜3ミク
ロンの厚さを有するクロムメッキ層を形成した。クロム
メッキはクロム酸の電解液を用いて行なわれた。クロム
メッキ層を形成後、脱ガス処理を行ない、続いて、この
クロムメッキ層を覆うように、黒色化クロムメッキを施
し、1〜2ミクロンの黒色化クロムメッキ層を形成した
。この黒色化クロムメッキに用いられた電解液はクロム
酸300,17.、弗化すl−IJウム7F、硝酸トリ
ウム10g、炭酸バリウム0.6gを水lt中に溶解し
たものを用いた。このメッキの際、陽極材料としては、
5%Pb −Sn合金を用いて、溶液温度20℃で、5
0アンペア/dm3の電流を5分間通電した。このよう
にして得られた黒色化クロムメッキ層の黒色度は日本塗
料工業規格色見本J11035.J11037に相当し
ていた。
Example 1 First, a graphite substrate was prepared as a target substrate, and this graphite substrate was electrolytically polished. After electrolytic polishing, the electron beam irradiation trajectory portion of the substrate was masked, and the area other than the masked trajectory portion was plated with chrome to form a chromium plating layer having a thickness of 1 to 3 microns. Chrome plating was performed using a chromic acid electrolyte. After forming the chromium plating layer, a degassing treatment was performed, and then blackened chromium plating was applied to cover the chromium plating layer to form a blackened chromium plating layer of 1 to 2 microns. The electrolyte used for this blackened chromium plating was chromic acid 300.17. , l-IJium fluoride 7F, thorium nitrate 10 g, and barium carbonate 0.6 g dissolved in water lt were used. During this plating, the anode material is
Using a 5% Pb-Sn alloy, the solution temperature was 20°C.
A current of 0 amperes/dm3 was applied for 5 minutes. The degree of blackness of the blackened chromium plating layer thus obtained is as per the Japanese Paint Industry Standard color sample J11035. It corresponded to J11037.

黒色化クロム層を形成後、マスクを剥離し、電子i照射
軌道部にレニウム−タングステン合金層を通常の方法で
被着し、X線管用クーケ゛ットを製作した。
After forming the blackened chromium layer, the mask was peeled off, and a rhenium-tungsten alloy layer was deposited on the electron i irradiation trajectory by a conventional method to produce a coupe for an X-ray tube.

このようにして得られたターゲットは低温で被着された
にも拘らず、700〜1300℃の温度範囲で熱サイク
ル加熱を真空中で繰シ返し行なっても、黒色化クロム層
の剥離は認められず、且つ。
Although the target thus obtained was deposited at a low temperature, no peeling of the blackened chromium layer was observed even after repeated thermal cycle heating in a vacuum in the temperature range of 700 to 1300°C. And.

その黒色度も損なわれなかった。尚、黒色化クロム層の
熱輻射率及び吸収率はそれぞれ0.18及び0.97で
あった。このように、黒色化クロム層とグラファイト基
板との間に、グラファイト及び黒色化クロムと密着性の
よいクロム層が下地として被着することによシ、密着性
の点でも、高温条件下の使用に耐え得る黒色材料層をメ
ッキによシ形成できた。
Its blackness was also not impaired. The thermal emissivity and absorption rate of the blackened chromium layer were 0.18 and 0.97, respectively. In this way, the chromium layer, which has good adhesion to graphite and blackened chromium, is deposited as a base between the blackened chromium layer and the graphite substrate. By plating, we were able to form a black material layer that could withstand high temperatures.

実施例2 この実施例2では、実施例1で得られた黒色化クロム層
上に、更に、透明なガラス層を施し、黒色化クロム層の
色調の変化を防止する。具体的に言えば、まず、実施例
1で得られたターゲットと。
Example 2 In this Example 2, a transparent glass layer is further applied on the blackened chromium layer obtained in Example 1 to prevent a change in the color tone of the blackened chromium layer. Specifically, first, the target obtained in Example 1.

重量で、StO□75チt At2057 ’16 #
 B2O59チ。
By weight, StO□75 cm At2057 '16 #
B2O59chi.

N≦2066 % 、及びBaO3%を含む急冷ガラス
(以下、単に、フリットと呼ぶ)とを用意した。次に。
A rapidly cooled glass containing N≦2066% and 3% BaO (hereinafter simply referred to as frit) was prepared. next.

このフリットを325メツシユまで粉砕し、粉砕された
フリットに水、ベントナイトを加えると共にz Al2
O5m Mgo z及びZ r O2から選ばれた少な
くとも一種類の°酸化物をフリットの重量に対して。
This frit was crushed to 325 mesh, water and bentonite were added to the crushed frit, and zAl2
At least one ° oxide selected from O5m Mgo z and Z r O2 based on the weight of the frit.

5〜8倍量加え、スリラグ状にした。このように。5 to 8 times the amount was added to form a slurry. in this way.

フリットに対して、上述した酸化物を加えるのは。Adding the above-mentioned oxides to the frit.

焼成温度を上げるためと、焼成物の透明感を出すためで
ある。
This is to raise the firing temperature and to give the fired product a transparent feel.

次に、フリットと酸化物とのスリップ状混合物を吹き付
け、浸漬着け、あるいは筆塗シ等により。
Next, a slip-like mixture of frit and oxide is applied by spraying, dipping, or brush painting.

黒色化クロム層上に塗布し、120℃の温度で乾燥させ
る。続いて1.電気炉を用いて、 l Q  +mHg
程度の真空雰囲気で、1500℃の温度で15分間焼成
し10ミクロンのガラス被膜を形成した。
It is applied onto the blackened chromium layer and dried at a temperature of 120°C. Next is 1. Using an electric furnace, l Q +mHg
This was baked at a temperature of 1500° C. for 15 minutes in a vacuum atmosphere of about 100 mL to form a glass coating of 10 microns.

この結果、黒色化クロム層上に、透明度が高く且っ15
001::程度の温度−では、軟化しないガラス被膜が
形成された。このガラス被膜は黒色化クロム層と密着性
がよいため、ガラス被膜自身、黒色化クロム層から剥離
するおそれは全くない。また。
As a result, the blackened chromium layer has high transparency and 15
At temperatures of about 0.001::, a glass coating was formed that did not soften. Since this glass coating has good adhesion to the blackened chromium layer, there is no fear that the glass coating itself will peel off from the blackened chromium layer. Also.

ガラス被膜は透明度が高いため、熱輻射率の低下には何
等悪影響を及ぼすことはなく、黒色化クロム層の退色を
防止することができる。
Since the glass coating has high transparency, it does not have any adverse effect on reducing the thermal emissivity and can prevent the blackened chromium layer from fading.

以上述べた通シ2本発明によれば、水溶液を用いて簡単
に密着性のよい黒色化材料層を形成できる。また2本発
明によって得られた黒色化材料層は従来の方法によって
得られたものに比べて、均一性の点でも優れていること
が確認された。
According to the present invention as described above, a blackening material layer with good adhesion can be easily formed using an aqueous solution. It was also confirmed that the blackening material layer obtained by the present invention is superior in uniformity to that obtained by the conventional method.

213−213-

Claims (1)

【特許請求の範囲】 1、 電子線によって照射される部分を含む第1の領域
と、該第1の領域を除く第2の領域とを有するX線管用
ターケ゛ットにおいて、前記第2の領域上に形成された
第1の電着層と、該第1の電着層上に形成された黒色化
クロムからなる第2の電着層とを有することを特徴とす
るX線管用ターグツ  ト 0 2、電子線によって照射される部分を含む第1の領域と
、該第1の領域を除く第2の領域とを有するX線管用タ
ーゲットにおいて、前記第2の領域上に形成された第1
の電着層と、該第1の電着層上に形成された黒色化クロ
ムの第2の電着層と。 該第2の電着層上に被着された透明ガラス層とを有する
ことを特徴4するX#管用ターゲット。
[Claims] 1. In an X-ray tube target having a first region including a portion irradiated with an electron beam and a second region excluding the first region, A tag for an X-ray tube characterized by having a first electrodeposited layer formed on the electrodeposited layer and a second electrodeposited layer made of blackened chromium formed on the first electrodeposited layer. In an X-ray tube target having a first region including a portion irradiated with an electron beam and a second region excluding the first region, a first region formed on the second region
and a second electrodeposited layer of blackened chromium formed on the first electrodeposit layer. 4. A target for an X# tube, comprising a transparent glass layer deposited on the second electrodeposition layer.
JP56204515A 1981-12-19 1981-12-19 Target for x-ray tube Granted JPS58106743A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56204515A JPS58106743A (en) 1981-12-19 1981-12-19 Target for x-ray tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56204515A JPS58106743A (en) 1981-12-19 1981-12-19 Target for x-ray tube

Publications (2)

Publication Number Publication Date
JPS58106743A true JPS58106743A (en) 1983-06-25
JPH0427663B2 JPH0427663B2 (en) 1992-05-12

Family

ID=16491803

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56204515A Granted JPS58106743A (en) 1981-12-19 1981-12-19 Target for x-ray tube

Country Status (1)

Country Link
JP (1) JPS58106743A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6188422A (en) * 1984-08-24 1986-05-06 ゼネラル・エレクトリツク・カンパニイ Heat dispersing film on alloy-made x ray tube target

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52115684A (en) * 1976-10-05 1977-09-28 Toshiba Corp X-ray tube

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52115684A (en) * 1976-10-05 1977-09-28 Toshiba Corp X-ray tube

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6188422A (en) * 1984-08-24 1986-05-06 ゼネラル・エレクトリツク・カンパニイ Heat dispersing film on alloy-made x ray tube target

Also Published As

Publication number Publication date
JPH0427663B2 (en) 1992-05-12

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