JPS58105910U - シ−ト屋根の開閉装置 - Google Patents
シ−ト屋根の開閉装置Info
- Publication number
- JPS58105910U JPS58105910U JP187482U JP187482U JPS58105910U JP S58105910 U JPS58105910 U JP S58105910U JP 187482 U JP187482 U JP 187482U JP 187482 U JP187482 U JP 187482U JP S58105910 U JPS58105910 U JP S58105910U
- Authority
- JP
- Japan
- Prior art keywords
- rope
- car
- wheel
- drive
- take
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Building Awnings And Sunshades (AREA)
- Tents Or Canopies (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP187482U JPS58105910U (ja) | 1982-01-11 | 1982-01-11 | シ−ト屋根の開閉装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP187482U JPS58105910U (ja) | 1982-01-11 | 1982-01-11 | シ−ト屋根の開閉装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58105910U true JPS58105910U (ja) | 1983-07-19 |
JPS637631Y2 JPS637631Y2 (enrdf_load_stackoverflow) | 1988-03-04 |
Family
ID=30014871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP187482U Granted JPS58105910U (ja) | 1982-01-11 | 1982-01-11 | シ−ト屋根の開閉装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58105910U (enrdf_load_stackoverflow) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9341936B2 (en) | 2008-09-01 | 2016-05-17 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US8039176B2 (en) | 2009-08-26 | 2011-10-18 | D2S, Inc. | Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography |
US20120219886A1 (en) | 2011-02-28 | 2012-08-30 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithography with variable pattern dosage |
US9323140B2 (en) | 2008-09-01 | 2016-04-26 | D2S, Inc. | Method and system for forming a pattern on a reticle using charged particle beam lithography |
US7901850B2 (en) | 2008-09-01 | 2011-03-08 | D2S, Inc. | Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
US8057970B2 (en) | 2008-09-01 | 2011-11-15 | D2S, Inc. | Method and system for forming circular patterns on a surface |
US9164372B2 (en) | 2009-08-26 | 2015-10-20 | D2S, Inc. | Method and system for forming non-manhattan patterns using variable shaped beam lithography |
US9448473B2 (en) | 2009-08-26 | 2016-09-20 | D2S, Inc. | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
WO2013158573A1 (en) | 2012-04-18 | 2013-10-24 | D2S, Inc. | Method and system for forming patterns using charged particle beam lithograph |
-
1982
- 1982-01-11 JP JP187482U patent/JPS58105910U/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS637631Y2 (enrdf_load_stackoverflow) | 1988-03-04 |
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