JPS58102526A - Pallet jig for sputtering - Google Patents

Pallet jig for sputtering

Info

Publication number
JPS58102526A
JPS58102526A JP20105881A JP20105881A JPS58102526A JP S58102526 A JPS58102526 A JP S58102526A JP 20105881 A JP20105881 A JP 20105881A JP 20105881 A JP20105881 A JP 20105881A JP S58102526 A JPS58102526 A JP S58102526A
Authority
JP
Japan
Prior art keywords
pallet
silicon wafer
sputtering
silicon
jig
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20105881A
Other languages
Japanese (ja)
Inventor
Yasuhiko Suzuki
泰彦 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP20105881A priority Critical patent/JPS58102526A/en
Publication of JPS58102526A publication Critical patent/JPS58102526A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders

Abstract

PURPOSE:To improve operationability and efficiently mount or remove silicon wafers by setting a sputter pallet to a jig support and simultaneously pushing upward the plurality of rivets holding silicon wafer with the rivet pushing pins implanted on the jig support in view of forming clearance. CONSTITUTION:A silicon wafer 2 can be removed from the pallet 1 by the following steps. A sputter pallet 1 mounting a silicon wafer 2 is set to a jig support 10 through the support of blocks 13, 13, a silicon wafer 2 is released by simultaneously pushing upward the rivets 5 holding a silicon wafer 2 with the rivet pushing pins 14, the sputter pallet 1 is pulled out of the blocks 13, 13 in the same way after removing the silicon wafer 2 from the pallet 1, thus completing removal of silicon wafer 2.

Description

【発明の詳細な説明】 本発明は、スパッタ用パレットにシリコン・クエ・・−
を取り付は又は取り外すために用いるスパッタ用パレッ
ト治具に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a sputtering pallet with silicone quench...
This relates to sputtering pallet jigs used for attaching or removing sputtering pallets.

スパッタ用パレットとして、パレットのシリコン・ウェ
ハー支持面に鋲の頭部でシリコン・ウニ・・−を抑えて
、その裏面をパレットのシリコン・ウェハー支持面に密
着させ、シリコン・ウニ・・−をパレットに鉛直姿勢に
支持するように構成したスパッタ用パレットが開発され
ている。その構成を第1図(a)、 (b)、第2図に
示す。すなわち、パレット1の縦方向のシリコン・ウエ
ノ・−支持面1aに、核部に支持される複数枚のシリコ
ン・ウェノ・−2の底部にそれぞ−れ対応させて該シリ
コン・ウェハー2の位置決めをする2本の位置決めピン
3,3が取付けられている。また、シリコン・ウェノ・
−支持面1aに、該而に支持される複数枚のシリコン・
ウェハー2の側部にそれぞれ対応させてこれを垂直方向
に貫通した複数個の貫通孔4が開口され、該各貫通孔4
内に、シリコン・ウェハー支持面1a側に頭部5bを備
えた鋲5の軸部5aがそれぞれ摺動自在に設けられてい
る。シリコン・ウェハー支持面1aと反対側の面には各
貫通孔4の囲りに座ぐり6が形成され、該6座ぐり6内
に配置されたバネ押え7が6鋲5の軸部5aにそれぞれ
固定され、パレット1と各バネ押え7との間にそれぞれ
コイルバネ8が介装され、該各コイルバネ8で各シリコ
ン・ウェノ1−を抑える鋲5の頭部5bをシリコン・ウ
ニノー−支持面側に附勢している。また、9はピンセッ
ト、差込用の座ぐりである。
As a sputtering pallet, use the head of a stud to hold down the silicone, sea urchin, etc. on the silicon wafer support surface of the pallet, and then press the back side of the silicone sea urchin to the silicon wafer support surface of the pallet. A sputtering pallet configured to be supported in a vertical position has been developed. Its configuration is shown in FIGS. 1(a), (b) and 2. That is, the silicon wafers 2 are positioned on the vertical silicon wafer support surface 1a of the pallet 1 in correspondence with the bottoms of the plurality of silicon wafers 2 supported by the core. Two positioning pins 3, 3 are attached to do this. In addition, silicon weno
- A plurality of silicone sheets supported on the support surface 1a
A plurality of through holes 4 are opened vertically through the sides of the wafer 2 in correspondence with each other, and each of the through holes 4
Shaft portions 5a of studs 5 each having a head 5b on the silicon wafer support surface 1a side are slidably provided therein. A counterbore 6 is formed around each through hole 4 on the surface opposite to the silicon wafer support surface 1a, and a spring presser 7 disposed within the counterbore 6 is attached to the shaft portion 5a of the stud 5. A coil spring 8 is interposed between the pallet 1 and each spring holder 7, and each coil spring 8 holds the head 5b of the stud 5 against the silicone weno 1- on the support surface side of the silicone weno. is affiliated with. Further, 9 is a counterbore for tweezers and insertion.

図面では、1枚のシリコン・ウェハーを支持するように
記載しているが、パレットには複数枚のシリコン・ウェ
ノ・−が同様な構成により支持される。
Although the drawing shows one silicon wafer being supported, a plurality of silicon wafers can be supported on the pallet with a similar configuration.

前記構成によるスパッタ用パレットにシリコン・ウェハ
ーを取り付けるには、まず、バネ押え7をコイルバネ8
を圧縮して押し出し、鋲5の頭部5bをシリコン・ウェ
ノ\−支持面1aから離し、両者間にシリコン・ウェノ
・−2が通過できる隙間を形成する。この状態で、シリ
コン・ウェノ・−2を鉛直に立ててこれを鋲50頭部5
bの上方から両者間の隙間を通過させてその底部を2本
の位置決めピン5,3にあて、シリコン・ウェノ、−2
の位置決めを行なう。シリコノ′・ウニ・・−2の位置
決め後、コイルバネ8に与えた外力を取り除いてこのバ
ネ力で鋲5の頭部5bをシリコン・ウェノ・−支持面側
に附勢してシリコン・ウニ・・−2をシリコン・ウェノ
1−支持面1aに密着させ、シリコン・ウェハー2を鉛
直姿勢に支持する。
To attach a silicon wafer to the sputtering pallet having the above configuration, first, attach the spring holder 7 to the coil spring 8.
is compressed and extruded, and the head 5b of the stud 5 is separated from the silicon weno \- support surface 1a, forming a gap between the two through which the silicon weno 2 can pass. In this state, stand the Silicon Weno-2 vertically and attach it with 50 studs and 5 heads.
Pass through the gap between the two from above b and place the bottom part on the two positioning pins 5 and 3.
Perform positioning. After positioning the silicon sea urchin 2, remove the external force applied to the coil spring 8 and use this spring force to urge the head 5b of the rivet 5 toward the silicon weno support surface side, so that the silicon sea urchin... -2 is brought into close contact with the silicon wafer 1-supporting surface 1a, and the silicon wafer 2 is supported in a vertical position.

一方、シリコン・ウェー・−2をパレット1から取り外
す際にも同様に鋲5の頭部5bをシリコン・ウェハー2
から離して鋲5によるシリコン・ウェハー2の保持を解
放し、シリコン・ウェノ\−2を取シ外す。
On the other hand, when removing the silicon wafer 2 from the pallet 1, the head 5b of the stud 5 is attached to the silicon wafer 2 in the same way.
The silicon wafer 2 is released from being held by the studs 5, and the silicon wafer 2 is removed.

以上の説明から明らかなように、パレット1にシリコン
・ウェノ・−2を取り付は又は取り外す際には、コイル
バネ8を圧縮させて各シリコン・ウェハー2を抑える鋲
5の頭部5bをシリコン・ウェ・・−支持面1aから離
し、その両者間にシリコン・ウェハー2が通過できる隙
間を形成する必要がある。
As is clear from the above explanation, when attaching or removing silicone wafers 2 from the pallet 1, the coil springs 8 are compressed and the heads 5b of the rivets 5 that hold each silicone wafer 2 are attached to the silicone wafers. It is necessary to separate the wafer from the supporting surface 1a and form a gap between them through which the silicon wafer 2 can pass.

そこで、本発明は治具台にスパッタ用パレットをセット
して治具台に植立した鋲押上げ用ピンで、各シリコン・
ウェハーを抑える複数本の鋲を同時に押上げて前記隙間
を形成しようとするものであって、シリコン・ウェハー
を取シ付は又は取シ外す際の操作性を向上し1作業を能
率よく行なうようKしたことを特徴とするものである。
Therefore, in the present invention, a sputtering pallet is set on a jig stand, and pins for pushing up rivets are installed on the jig stand.
This method attempts to form the gap by simultaneously pushing up multiple studs that hold down the wafer, and improves the operability when attaching or removing the silicon wafer and makes one task more efficient. It is characterized by having K.

以下、本発明の一実施例を図面によって説明する。本発
明の構成を第5図に示す。すなわち、治具台10の上面
はその前縁が画工りになった勾配面10aとして構成し
、該勾配面10aの前縁に取付けた軸受11.1’1間
にi転軸12を勾配面10aの前縁と平行に支持し、該
回転軸12の両端に、スパッタ用パレット下縁の角部分
が差込まれその両者の開口を結ぶ線が勾配面10aの前
縁と平行になる溝15aを備えたブロック13をそれぞ
れ取付け、両プpツク1!S、13の溝15a、13a
にスパッタ用パレット1の下縁の角部分を差込んでにれ
を勾配11i10aの前縁と平行に位置決めし、ブロッ
ク13゜15を回転させてパレット1を治具台10側に
倒してスパッタ用パレット1を鋲5のバネ押え7を下1
1iKシて勾配面10aにセットするものである。
An embodiment of the present invention will be described below with reference to the drawings. The configuration of the present invention is shown in FIG. That is, the upper surface of the jig table 10 is configured as a sloped surface 10a with a painted front edge, and the i-rolling shaft 12 is arranged on the sloped surface between the bearings 11.1'1 attached to the front edge of the sloped surface 10a. A groove 15a is supported parallel to the front edge of the sloping surface 10a, and a corner portion of the lower edge of the sputtering pallet is inserted into both ends of the rotating shaft 12, and a line connecting the openings of the two is parallel to the front edge of the sloped surface 10a. Attach each block 13 with a S, 13 grooves 15a, 13a
Insert the corner part of the lower edge of the pallet 1 for sputtering to position it parallel to the front edge of the slope 11i10a, rotate the block 13° 15, and tilt the pallet 1 to the jig stand 10 side for sputtering. Place pallet 1 on rivet 5 and spring presser 7 on bottom 1.
1iK and set it on the slope surface 10a.

一方、治具台10の勾配面10a上には、核部にセット
されるスパッタ用パレット1の6鋲5に対応させて鋲押
上げ用ピン14を植立し、その後縁には、スパッタ用パ
レット1の上縁を押え付けるパレット抑え爪15を取付
ける。
On the other hand, on the sloped surface 10a of the jig stand 10, pins 14 for pushing up rivets are set up corresponding to the 6 rivets 5 of the pallet 1 for sputtering set in the core part, and on the rear edge, pins 14 for pushing up the sputtering A pallet holding claw 15 that presses down the upper edge of the pallet 1 is attached.

本実施例の治具を用いてスパッタ用パレットにシリコン
・ウェハーを取り付けるには、バレント1の下縁角部分
を、鋲5のバネ押え7を治具台10の勾配面10aに対
面させてブロック13の溝13a内に差込んでパレット
1を勾配面10aの前縁と平行に位置決めし、2つのブ
ロック13.15間に支持させたパレット1を治具台1
0の勾配面10a側に押し倒してその上縁を爪15で抑
え、パレット1を鋲5のバネ押え7を下面にして治具台
10の勾配面10a上にセットする。パレット1を治具
台10にセットすると、勾配面10aに植立した鋲押上
げ用ピン14で6鋲5のバネ押え7が押上げられ、各シ
リコン・ウェハー2を抑える鋲5の頭部5bが同時にパ
レット1のシリコン・ウェノ・−支持面1aを離れてそ
の両者間にシリコン・ウェノ・−2が通過できる隙間が
形成される。治具台10の勾配面10aは前下りである
ので、シリコン・ウェハー2は前記隙間を通ってパレッ
ト1上を滑り、2本の位置決めピン3,3で受は止めら
れて位置決めされる。シリコン・ウェハー2のセットが
終了すると、爪15を外し、スパッタ用パレット1を手
前側に起すと、6鋲5を附勢するコイルバネ8により各
シリコン・ウェハー2を抑える鋲5の頭部5bが同時に
シリコン・ウェハー支持面1a側に引き寄せられ、6鋲
5によシ各シリコン・ウェハー2がシリコン・ウェハー
支持面1aに密着されてパレットに鉛直姿勢に支持され
る。スパッタ用パレット1を2つのブロック13.15
から引き抜くことKよシシリコン・ウェハー2の取付け
は完了する。
To attach a silicon wafer to a sputtering pallet using the jig of this embodiment, block the lower edge corner of the balent 1 with the spring retainer 7 of the stud 5 facing the sloped surface 10a of the jig stand 10. 13, the pallet 1 is positioned parallel to the front edge of the slope surface 10a, and the pallet 1 supported between the two blocks 13 and 15 is placed on the jig stand 1.
0 to the inclined surface 10a side and hold its upper edge with a claw 15, and set the pallet 1 on the inclined surface 10a of the jig table 10 with the spring pressers 7 of the studs 5 facing downward. When the pallet 1 is set on the jig stand 10, the spring retainers 7 of the six studs 5 are pushed up by the stud push-up pins 14 set on the sloped surface 10a, and the heads 5b of the studs 5 holding down each silicon wafer 2 are pushed up. At the same time, the silicon weno 2 leaves the silicon weno support surface 1a of the pallet 1, and a gap is formed between them through which the silicon weno 2 can pass. Since the sloped surface 10a of the jig table 10 is downward in the front, the silicon wafer 2 slides on the pallet 1 through the gap, and is positioned by being stopped by the two positioning pins 3. When the setting of the silicon wafers 2 is completed, the claws 15 are removed and the sputtering pallet 1 is raised to the front side, and the heads 5b of the studs 5 that hold each silicon wafer 2 are held down by the coil springs 8 that energize the six studs 5. At the same time, each silicon wafer 2 is drawn toward the silicon wafer support surface 1a side, and each silicon wafer 2 is brought into close contact with the silicon wafer support surface 1a by the six studs 5, and supported in a vertical position on the pallet. Sputtering pallet 1 into two blocks 13.15
The attachment of the silicon wafer 2 is now complete.

また、パレット1からシリコン・ウェハー2を取り外す
Kは、シリコン・ウェハー2を取付けたスパッタ用パレ
ット1をブロック13.13に同様に支持して治具台1
0にセットし、鋲押上げピン14で各シリコン・ウェハ
ー2を抑えている鋲5を同時に押上げてシリコン・ウニ
・・−2の保持を解放し、各シリコン・ウェハー2をパ
レット1から取り除いてからスパッタ用パレット1をブ
ロック15.13から同様にして引き抜くことによりシ
リコン・ウェハー2の取外しは完了する。
In addition, when K removes the silicon wafer 2 from the pallet 1, the sputtering pallet 1 with the silicon wafer 2 attached thereto is similarly supported on the block 13.
0, and simultaneously push up the rivets 5 holding down each silicon wafer 2 with the rivet push-up pins 14 to release the holding of the silicon urchins 2 and remove each silicon wafer 2 from the pallet 1. After that, the sputtering pallet 1 is similarly pulled out from the block 15.13, thereby completing the removal of the silicon wafer 2.

以上のように本発明はスパッタ用パレットをセットする
治具台に、パレットの鋲に対応させて鋲押上げ用ピンを
植立し、セットされたパレットの鋲を鋲押上げ用ピンで
押上げて鋲によるシリコン・ウェハーの保持を解放する
ようにしたので、パレットに設けた鋲の全てを同時に押
上げて6鋲によるシリコン・ウェハーの保持を同時に解
放でき。
As described above, according to the present invention, pins for pushing up rivets are set up on a jig stand for setting pallets for sputtering in correspondence with the rivets of the pallet, and the rivets of the set pallet are pushed up by the pins for pushing up rivets. Since the silicon wafer is released from being held by the rivets, it is possible to simultaneously push up all the rivets provided on the pallet and release the silicon wafer from being held by the six rivets at the same time.

シリコン・ウェハーを取付は又は取外す際の操作性を向
上でき1作業を能率よく行なうことができる。また、鋲
によるシリコン・ウェハーの保持を解放した後、シリコ
ン・ウェハーを取付け、取外すので、シリコン・ウェハ
ーの損傷を防止できる。
The operability when attaching or detaching silicon wafers can be improved and one operation can be carried out efficiently. Further, since the silicon wafer is attached and removed after the silicon wafer is released from being held by the rivets, damage to the silicon wafer can be prevented.

本発明によれば、シリコン・ウェハーの取付け、   
′取外し作業を機械化し、その作業の自動化を促進する
ことができる効果を有するものである。
According to the invention, silicon wafer attachment;
'It has the effect of mechanizing the removal work and promoting automation of the work.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)はスパッタ用パレットを示す平面図、第1
図(b)は側面図、第2図は第1図(blの部分Aの詳
細を示す断面図、第5図は本発明の一実施例を示す斜視
図である。 1・・・スパッタ用パレット 2・・・シリコン・九)
1−3・・・位置決めピン    5・・・鋲5b・・
・鋲の頭部     10・・・治具台15・・・ブロ
ック     14・・・鋲押上げ用ピン15・・・パ
レット抑え爪 特許出願人  日本電気株式会社
Figure 1(a) is a plan view showing the sputtering pallet;
Figure (b) is a side view, Figure 2 is a sectional view showing details of part A of Figure 1 (bl), and Figure 5 is a perspective view showing one embodiment of the present invention. 1... For sputtering Palette 2... Silicone 9)
1-3...Positioning pin 5...Rack 5b...
・Tack head 10...Jig stand 15...Block 14...Tack pushing pin 15...Pallet holding claw Patent applicant NEC Corporation

Claims (1)

【特許請求の範囲】[Claims] (1)縦方向のシリコン・ウェハー支持面に、該而に支
持されるシリコン・ウェハーに対応させて位置決めピン
を植立し、前記支持面に開口した孔内に、シリコン・ウ
ェハーを抑える頭部を備えた鋲をシリコン・ウェハー支
持面側に附勢して設けたスパッタ用パレットにシリコン
・ウエハーヲ取付け、取外すためのスパッタ用パレット
治具において、スパッタ用パレットをセットする治具台
に前記パレットを位置決めして治具台に対してこれを起
倒させるブロックを取付け、そのパレットセット面に、
前記パレットの鋲に対応させて鋲押上げ用ビンを植立す
ると共にパレット抑え爪を設けたことを特徴とするスパ
ッタ用パレット治具。
(1) Positioning pins are planted on the vertical silicon wafer support surface in correspondence with the silicon wafer supported thereon, and a head holding the silicon wafer is placed in a hole opened in the support surface. In a sputtering pallet jig for attaching and removing silicon wafers to and from a sputtering pallet, which is provided with studs biased toward the silicon wafer support surface, the pallet is placed on a jig stand on which the sputtering pallet is set. Attach a block to position and raise/lower it to the jig stand, and place it on the pallet set surface.
A pallet jig for sputtering, characterized in that bins for pushing up studs are erected in correspondence with the studs of the pallet, and pallet holding claws are provided.
JP20105881A 1981-12-14 1981-12-14 Pallet jig for sputtering Pending JPS58102526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20105881A JPS58102526A (en) 1981-12-14 1981-12-14 Pallet jig for sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20105881A JPS58102526A (en) 1981-12-14 1981-12-14 Pallet jig for sputtering

Publications (1)

Publication Number Publication Date
JPS58102526A true JPS58102526A (en) 1983-06-18

Family

ID=16434685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20105881A Pending JPS58102526A (en) 1981-12-14 1981-12-14 Pallet jig for sputtering

Country Status (1)

Country Link
JP (1) JPS58102526A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081820A (en) * 1983-10-11 1985-05-09 Rohm Co Ltd Wafer mounting device for molecular beam epitaxial equipment
CN113122815A (en) * 2020-01-14 2021-07-16 Ulvac韩国股份有限公司 Magnet clamp for tray

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081820A (en) * 1983-10-11 1985-05-09 Rohm Co Ltd Wafer mounting device for molecular beam epitaxial equipment
JPH0136978B2 (en) * 1983-10-11 1989-08-03 Rohm Kk
CN113122815A (en) * 2020-01-14 2021-07-16 Ulvac韩国股份有限公司 Magnet clamp for tray
CN113122815B (en) * 2020-01-14 2023-09-15 Ulvac韩国股份有限公司 Magnet clamp for tray

Similar Documents

Publication Publication Date Title
US4921564A (en) Method and apparatus for removing circuit chips from wafer handling tape
DE102016108788B4 (en) Method for handling aligned wafer pairs and method for transporting aligned wafers
US4664265A (en) Circuit board carrier
KR19990077855A (en) Nest for dicing, and Method and Apparatus for cutting Tapeless Substrate Using the Same
JPS58102526A (en) Pallet jig for sputtering
US5195862A (en) Apparatus for loading an unloading flat articles with respect to a storage cassette
US6419000B1 (en) Raw bar stripping off and cleaning jig and raw bar stripping off and cleaning method
US6691395B2 (en) Method of preparing a system of converting tools and presetting table for working the method as well as an assembly of components for preparing an upper stripping die
JP4157755B2 (en) Work alignment method
JPH0723152Y2 (en) Magnet chuck device in grinding machine
JP4106258B2 (en) Plating jig power supply pin switchgear and workpiece hooking / removing method
JPH07214440A (en) Chucking device for article of elasticity characteristic processing such as blade
JP3429943B2 (en) Method and apparatus for separating laminated chip components
CN111755363B (en) Bonding module of chip assembly, clamp and clamping method of chip assembly
CN110142709B (en) Clamp for machining mold and mold machining method
JP2920239B2 (en) Forced release of electrostatic chuck
CN220567680U (en) High-efficient material loading oven
JPH0992704A (en) Transfer system for semiconductor silicon wafer
CN212577521U (en) Frock is fixed with blind plate to lathe
JP2005142317A (en) Lid attaching and detaching apparatus for housing cassette, and method of attaching and detaching lid to housing cassette
JPS58202542A (en) Semiconductor substrate containing device
JP2636408B2 (en) Hook for saw blade
JPS604708Y2 (en) Work support device for printed circuit board drilling machine
JPH0347697Y2 (en)
JP2600064B2 (en) Work support equipment for electrodeposition coating