JPS5794923A - Polishing method for thin-film ceramic head - Google Patents

Polishing method for thin-film ceramic head

Info

Publication number
JPS5794923A
JPS5794923A JP17098580A JP17098580A JPS5794923A JP S5794923 A JPS5794923 A JP S5794923A JP 17098580 A JP17098580 A JP 17098580A JP 17098580 A JP17098580 A JP 17098580A JP S5794923 A JPS5794923 A JP S5794923A
Authority
JP
Japan
Prior art keywords
polishing
detection
electrodes
polished surface
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17098580A
Other languages
Japanese (ja)
Inventor
Nobuhiro Tokuyado
Katsuyuki Tanaka
Isao Oshima
Masakatsu Saito
Masamichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17098580A priority Critical patent/JPS5794923A/en
Publication of JPS5794923A publication Critical patent/JPS5794923A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To improve the precision of position detection by providing polishing detection parts in parallel to a polished surface and thus forming the electrode structure which has the parallel circuit of the detection parts by two lead-out electrodes extending from both ends of each detection part to the polished surface vertically. CONSTITUTION:Polishing electrodes 3 and 3 provided at both sides of thin-film elements 2, 2' and 2'' are constituted by forming polishing detection parts 31a, 31b, 31c, and 31d in parallel to a polished surface 11 and at adequate intervals, and also forming lead-out electrodes 32 and 33 extending vertically to the polished surface 11 at both ends of the polishing detection parts 31. The polishing electrodes vary in resistance stepwise rapidly. A polishing position is detected by the rapid variation in the resistance value of the polishing electrodes 3, so the detection is facilitated.
JP17098580A 1980-12-05 1980-12-05 Polishing method for thin-film ceramic head Pending JPS5794923A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17098580A JPS5794923A (en) 1980-12-05 1980-12-05 Polishing method for thin-film ceramic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17098580A JPS5794923A (en) 1980-12-05 1980-12-05 Polishing method for thin-film ceramic head

Publications (1)

Publication Number Publication Date
JPS5794923A true JPS5794923A (en) 1982-06-12

Family

ID=15914985

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17098580A Pending JPS5794923A (en) 1980-12-05 1980-12-05 Polishing method for thin-film ceramic head

Country Status (1)

Country Link
JP (1) JPS5794923A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911516A (en) * 1982-07-09 1984-01-21 Fujitsu Ltd Magnetic head
FR2534053A1 (en) * 1982-09-30 1984-04-06 Magnetic Peripherals Inc PRISM FACTORY, PROCESS FOR MANUFACTURING THE SAME, MACHINING GUIDE AND METHOD FOR CALIBRATING MACHINING SENSORS
JPS59223919A (en) * 1983-06-03 1984-12-15 Sanyo Electric Co Ltd Production for thin film magnetic head
JPS62502527A (en) * 1985-09-03 1987-10-01 ザ・チヤ−ルス・スタ−ク・ドラツパ−・ラボラトリ−・インコ−ポレ−テツド Grinding guide and method to control automatic grinding of objects
JPH01500982A (en) * 1986-12-29 1989-04-06 ザ・チヤールス・スターク・ドラツパー・ラボラトリイ・インコーポレーテツド Double-sided through-hole grinding guide for precision grinding of object surfaces
JPH07121505B2 (en) * 1985-09-03 1995-12-25 ザ・チヤ−ルス・スタ−ク・ドラツパ−・ラボラトリ−・インコ−ポレ−テツド Automatic grinder

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911516A (en) * 1982-07-09 1984-01-21 Fujitsu Ltd Magnetic head
FR2534053A1 (en) * 1982-09-30 1984-04-06 Magnetic Peripherals Inc PRISM FACTORY, PROCESS FOR MANUFACTURING THE SAME, MACHINING GUIDE AND METHOD FOR CALIBRATING MACHINING SENSORS
JPS59223919A (en) * 1983-06-03 1984-12-15 Sanyo Electric Co Ltd Production for thin film magnetic head
JPH059841B2 (en) * 1983-06-03 1993-02-08 Sanyo Electric Co
JPS62502527A (en) * 1985-09-03 1987-10-01 ザ・チヤ−ルス・スタ−ク・ドラツパ−・ラボラトリ−・インコ−ポレ−テツド Grinding guide and method to control automatic grinding of objects
JPH07121505B2 (en) * 1985-09-03 1995-12-25 ザ・チヤ−ルス・スタ−ク・ドラツパ−・ラボラトリ−・インコ−ポレ−テツド Automatic grinder
JPH01500982A (en) * 1986-12-29 1989-04-06 ザ・チヤールス・スターク・ドラツパー・ラボラトリイ・インコーポレーテツド Double-sided through-hole grinding guide for precision grinding of object surfaces

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