JPS5790858A - Charged particle beam system - Google Patents

Charged particle beam system

Info

Publication number
JPS5790858A
JPS5790858A JP16751580A JP16751580A JPS5790858A JP S5790858 A JPS5790858 A JP S5790858A JP 16751580 A JP16751580 A JP 16751580A JP 16751580 A JP16751580 A JP 16751580A JP S5790858 A JPS5790858 A JP S5790858A
Authority
JP
Japan
Prior art keywords
deflection
signal
charged particle
particle beam
deflectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16751580A
Other languages
Japanese (ja)
Inventor
Akio Ito
Seigo Igaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16751580A priority Critical patent/JPS5790858A/en
Publication of JPS5790858A publication Critical patent/JPS5790858A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To provide a charged particle beam deflection system with the characteristics which suit the spectra of a deflection signal by providing a means of filtering the deflection signal into a number of frequency bands and the amplifiers/deflectors which correspond to each band. CONSTITUTION:When a desired pattern is plotted using a charged particle beam such an electron beam, a deflection signal on the basis of pattern data is applied to a system 27. Then the signal is selectively filtered by high and low pass filters 21 and 22, amplified by amplifiers 23 and 24, respectively, and issued to deflectors 25 and 26. An electron beam 28 is deflected by the high and low frequency components of said deflection signal current. As a result, by assigning small amplitude deflection and large amplitude deflection to deflectors 25 and 26 respectively, the characteristics which suit the spectra of the deflection signal can be obtained. Besides, by removing the restrictions on the amplitude of the deflection, high speed and large amplitude deflection can be achieved.
JP16751580A 1980-11-28 1980-11-28 Charged particle beam system Pending JPS5790858A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16751580A JPS5790858A (en) 1980-11-28 1980-11-28 Charged particle beam system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16751580A JPS5790858A (en) 1980-11-28 1980-11-28 Charged particle beam system

Publications (1)

Publication Number Publication Date
JPS5790858A true JPS5790858A (en) 1982-06-05

Family

ID=15851108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16751580A Pending JPS5790858A (en) 1980-11-28 1980-11-28 Charged particle beam system

Country Status (1)

Country Link
JP (1) JPS5790858A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0166399A2 (en) * 1984-06-29 1986-01-02 International Business Machines Corporation Electron beam control system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0166399A2 (en) * 1984-06-29 1986-01-02 International Business Machines Corporation Electron beam control system

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