JPS5783563A - Liquid resin composition - Google Patents

Liquid resin composition

Info

Publication number
JPS5783563A
JPS5783563A JP15811480A JP15811480A JPS5783563A JP S5783563 A JPS5783563 A JP S5783563A JP 15811480 A JP15811480 A JP 15811480A JP 15811480 A JP15811480 A JP 15811480A JP S5783563 A JPS5783563 A JP S5783563A
Authority
JP
Japan
Prior art keywords
acetate
mixture
resin
resin composition
liquid resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15811480A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6118945B2 (enrdf_load_stackoverflow
Inventor
Shiro Takeda
Minoru Nakajima
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15811480A priority Critical patent/JPS5783563A/ja
Publication of JPS5783563A publication Critical patent/JPS5783563A/ja
Publication of JPS6118945B2 publication Critical patent/JPS6118945B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP15811480A 1980-11-12 1980-11-12 Liquid resin composition Granted JPS5783563A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15811480A JPS5783563A (en) 1980-11-12 1980-11-12 Liquid resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15811480A JPS5783563A (en) 1980-11-12 1980-11-12 Liquid resin composition

Publications (2)

Publication Number Publication Date
JPS5783563A true JPS5783563A (en) 1982-05-25
JPS6118945B2 JPS6118945B2 (enrdf_load_stackoverflow) 1986-05-15

Family

ID=15664604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15811480A Granted JPS5783563A (en) 1980-11-12 1980-11-12 Liquid resin composition

Country Status (1)

Country Link
JP (1) JPS5783563A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59109565A (ja) * 1982-12-16 1984-06-25 Fujitsu Ltd コ−テイング樹脂溶液およびその製造方法
JPS60199056A (ja) * 1984-03-23 1985-10-08 Dainippon Ink & Chem Inc 高耐熱性樹脂組成物
US7163778B2 (en) 2003-03-24 2007-01-16 Shin-Etsu Chemical Co., Ltd. Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
US7202013B2 (en) 2003-06-03 2007-04-10 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
US7303785B2 (en) 2003-06-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017212909A1 (de) * 2017-07-27 2019-01-31 Robert Bosch Gmbh Verfahren zur Steuerung und/oder Regelung der Abgasnachbehandlung in einem Kraftfahrzeug und Steuereinrichtung

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59109565A (ja) * 1982-12-16 1984-06-25 Fujitsu Ltd コ−テイング樹脂溶液およびその製造方法
JPS60199056A (ja) * 1984-03-23 1985-10-08 Dainippon Ink & Chem Inc 高耐熱性樹脂組成物
US7163778B2 (en) 2003-03-24 2007-01-16 Shin-Etsu Chemical Co., Ltd. Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern
US7202013B2 (en) 2003-06-03 2007-04-10 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
US7303785B2 (en) 2003-06-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Also Published As

Publication number Publication date
JPS6118945B2 (enrdf_load_stackoverflow) 1986-05-15

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