JPS5782238A - Large-capacity electron-ray storage medium - Google Patents

Large-capacity electron-ray storage medium

Info

Publication number
JPS5782238A
JPS5782238A JP15698980A JP15698980A JPS5782238A JP S5782238 A JPS5782238 A JP S5782238A JP 15698980 A JP15698980 A JP 15698980A JP 15698980 A JP15698980 A JP 15698980A JP S5782238 A JPS5782238 A JP S5782238A
Authority
JP
Japan
Prior art keywords
electron
electron rays
information
storage medium
ray storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15698980A
Other languages
Japanese (ja)
Inventor
Toshiaki Tamamura
Yoshihiro Asano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP15698980A priority Critical patent/JPS5782238A/en
Publication of JPS5782238A publication Critical patent/JPS5782238A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To make the tracking of information free, by irradiating electron rays on an electron ray resist and reproducing the developed information with electron rays. CONSTITUTION:The information is recorded on electron-ray resist material by irradiating electron rays to and develope it, and this is transfered to a material having higher contrast than that of the resist material to the electron rays and this is reproduced with the electron rays. As a material having higher contrast than that of the resist material, a material which can cause a change such as melting, evaporation, and sublimation due to heat by radiation of the electron rays is used and the information is tracked by causing this change with the electron rays.
JP15698980A 1980-11-10 1980-11-10 Large-capacity electron-ray storage medium Pending JPS5782238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15698980A JPS5782238A (en) 1980-11-10 1980-11-10 Large-capacity electron-ray storage medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15698980A JPS5782238A (en) 1980-11-10 1980-11-10 Large-capacity electron-ray storage medium

Publications (1)

Publication Number Publication Date
JPS5782238A true JPS5782238A (en) 1982-05-22

Family

ID=15639737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15698980A Pending JPS5782238A (en) 1980-11-10 1980-11-10 Large-capacity electron-ray storage medium

Country Status (1)

Country Link
JP (1) JPS5782238A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017033943A1 (en) * 2015-08-24 2017-03-02 学校法人関西大学 Lithography material and manufacturing method therefor, lithography composition, pattern forming method, compound, resin, and refining method for compound and resin

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017033943A1 (en) * 2015-08-24 2017-03-02 学校法人関西大学 Lithography material and manufacturing method therefor, lithography composition, pattern forming method, compound, resin, and refining method for compound and resin
JPWO2017033943A1 (en) * 2015-08-24 2018-06-07 学校法人 関西大学 Lithographic material and production method thereof, lithographic composition, pattern forming method, compound, resin, and purification method thereof
US11852970B2 (en) 2015-08-24 2023-12-26 Mitsubishi Gas Chemical Company, Inc. Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin

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