JPS578048B2 - - Google Patents

Info

Publication number
JPS578048B2
JPS578048B2 JP10005278A JP10005278A JPS578048B2 JP S578048 B2 JPS578048 B2 JP S578048B2 JP 10005278 A JP10005278 A JP 10005278A JP 10005278 A JP10005278 A JP 10005278A JP S578048 B2 JPS578048 B2 JP S578048B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10005278A
Other languages
Japanese (ja)
Other versions
JPS5527854A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10005278A priority Critical patent/JPS5527854A/ja
Publication of JPS5527854A publication Critical patent/JPS5527854A/ja
Publication of JPS578048B2 publication Critical patent/JPS578048B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP10005278A 1978-08-18 1978-08-18 Production of silicon dioxide thin film Granted JPS5527854A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10005278A JPS5527854A (en) 1978-08-18 1978-08-18 Production of silicon dioxide thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10005278A JPS5527854A (en) 1978-08-18 1978-08-18 Production of silicon dioxide thin film

Publications (2)

Publication Number Publication Date
JPS5527854A JPS5527854A (en) 1980-02-28
JPS578048B2 true JPS578048B2 (zh) 1982-02-15

Family

ID=14263711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10005278A Granted JPS5527854A (en) 1978-08-18 1978-08-18 Production of silicon dioxide thin film

Country Status (1)

Country Link
JP (1) JPS5527854A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110225890A (zh) * 2015-12-04 2019-09-10 小林光 含氢溶液、含氢溶液的制造方法、含氢溶液的制造装置、及活体用氢生成材料

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100200397B1 (ko) * 1990-07-23 1999-06-15 야스카와 히데아키 반도체장치 및 그 제조방법
US5281544A (en) * 1990-07-23 1994-01-25 Seiko Epson Corporation Method of manufacturing planar type polar transistors and combination bipolar/MIS type transistors

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110225890A (zh) * 2015-12-04 2019-09-10 小林光 含氢溶液、含氢溶液的制造方法、含氢溶液的制造装置、及活体用氢生成材料

Also Published As

Publication number Publication date
JPS5527854A (en) 1980-02-28

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