JPS578048B2 - - Google Patents
Info
- Publication number
- JPS578048B2 JPS578048B2 JP10005278A JP10005278A JPS578048B2 JP S578048 B2 JPS578048 B2 JP S578048B2 JP 10005278 A JP10005278 A JP 10005278A JP 10005278 A JP10005278 A JP 10005278A JP S578048 B2 JPS578048 B2 JP S578048B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10005278A JPS5527854A (en) | 1978-08-18 | 1978-08-18 | Production of silicon dioxide thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10005278A JPS5527854A (en) | 1978-08-18 | 1978-08-18 | Production of silicon dioxide thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5527854A JPS5527854A (en) | 1980-02-28 |
JPS578048B2 true JPS578048B2 (zh) | 1982-02-15 |
Family
ID=14263711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10005278A Granted JPS5527854A (en) | 1978-08-18 | 1978-08-18 | Production of silicon dioxide thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527854A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110225890A (zh) * | 2015-12-04 | 2019-09-10 | 小林光 | 含氢溶液、含氢溶液的制造方法、含氢溶液的制造装置、及活体用氢生成材料 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100200397B1 (ko) * | 1990-07-23 | 1999-06-15 | 야스카와 히데아키 | 반도체장치 및 그 제조방법 |
US5281544A (en) * | 1990-07-23 | 1994-01-25 | Seiko Epson Corporation | Method of manufacturing planar type polar transistors and combination bipolar/MIS type transistors |
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1978
- 1978-08-18 JP JP10005278A patent/JPS5527854A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110225890A (zh) * | 2015-12-04 | 2019-09-10 | 小林光 | 含氢溶液、含氢溶液的制造方法、含氢溶液的制造装置、及活体用氢生成材料 |
Also Published As
Publication number | Publication date |
---|---|
JPS5527854A (en) | 1980-02-28 |