JPS5768831A - Heat developable photosensitive material - Google Patents
Heat developable photosensitive materialInfo
- Publication number
- JPS5768831A JPS5768831A JP55145344A JP14534480A JPS5768831A JP S5768831 A JPS5768831 A JP S5768831A JP 55145344 A JP55145344 A JP 55145344A JP 14534480 A JP14534480 A JP 14534480A JP S5768831 A JPS5768831 A JP S5768831A
- Authority
- JP
- Japan
- Prior art keywords
- antihalation layer
- hue
- photosensitive material
- photodecomposition
- dye
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 238000006303 photolysis reaction Methods 0.000 abstract 2
- UQFRPVXWZVWGFY-UHFFFAOYSA-N 2,6-dibutyl-4-nitrophenol Chemical compound CCCCC1=CC([N+]([O-])=O)=CC(CCCC)=C1O UQFRPVXWZVWGFY-UHFFFAOYSA-N 0.000 abstract 1
- VHHJGQZCYXJANB-UHFFFAOYSA-N 6-methyl-2,4-bis(tribromomethyl)-1h-triazine Chemical compound CC1=CC(C(Br)(Br)Br)=NN(C(Br)(Br)Br)N1 VHHJGQZCYXJANB-UHFFFAOYSA-N 0.000 abstract 1
- 159000000000 sodium salts Chemical class 0.000 abstract 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55145344A JPS5768831A (en) | 1980-10-17 | 1980-10-17 | Heat developable photosensitive material |
| DE19813141221 DE3141221A1 (de) | 1980-10-17 | 1981-10-16 | In der waerme entwickelbares photoempfindliches material |
| GB8131328A GB2085609B (en) | 1980-10-17 | 1981-10-16 | Heat-developable photosensitive material |
| US06/313,705 US4376162A (en) | 1980-10-17 | 1981-10-19 | Heat-developable photosensitive material with antihalation layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55145344A JPS5768831A (en) | 1980-10-17 | 1980-10-17 | Heat developable photosensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5768831A true JPS5768831A (en) | 1982-04-27 |
| JPS6335964B2 JPS6335964B2 (OSRAM) | 1988-07-18 |
Family
ID=15383004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55145344A Granted JPS5768831A (en) | 1980-10-17 | 1980-10-17 | Heat developable photosensitive material |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4376162A (OSRAM) |
| JP (1) | JPS5768831A (OSRAM) |
| DE (1) | DE3141221A1 (OSRAM) |
| GB (1) | GB2085609B (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016514705A (ja) * | 2013-03-15 | 2016-05-23 | アジエリス ファーマシューティカル テクノロジーズ コンパニー リミテッド | ニトロキソリンの塩基付加塩及びその使用 |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4459350A (en) * | 1982-09-29 | 1984-07-10 | Eastman Kodak Company | Photothermographic material and processing comprising a substituted triazine |
| US4822718A (en) * | 1982-09-30 | 1989-04-18 | Brewer Science, Inc. | Light absorbing coating |
| US4910122A (en) * | 1982-09-30 | 1990-03-20 | Brewer Science, Inc. | Anti-reflective coating |
| JPH0612452B2 (ja) * | 1982-09-30 | 1994-02-16 | ブリュ−ワ−・サイエンス・インコ−ポレイテッド | 集積回路素子の製造方法 |
| EP0264650B1 (en) * | 1982-09-30 | 1992-08-26 | Brewer Science, Inc. | Anti-reflective coating |
| GB8307022D0 (en) * | 1983-03-15 | 1983-04-20 | Minnesota Mining & Mfg | Photothermographic element |
| US4477562A (en) * | 1983-05-24 | 1984-10-16 | Minnesota Mining And Manufacturing Company | Dry strip antihalation layer for photothermographic film |
| US4510236A (en) * | 1983-12-20 | 1985-04-09 | Minnesota Mining And Manufacturing Company | Thermally generated toning agent system for photothermographic imaging compositions |
| US5334481A (en) * | 1985-05-02 | 1994-08-02 | Ciba-Geigy Corporation | Positive diazo quinone photoresist compositions containing antihalation compound |
| DE3515693A1 (de) * | 1985-05-02 | 1986-11-06 | Merck Patent Gmbh, 6100 Darmstadt | Positiv-fotoresist-zusammensetzungen |
| US4752559A (en) * | 1987-03-24 | 1988-06-21 | Helland Randall H | Primer/antihalation coating for photothermographic constructions |
| JPH0789209B2 (ja) * | 1987-12-07 | 1995-09-27 | 富士写真フイルム株式会社 | ハロゲン化銀感光材料 |
| GB9121795D0 (en) * | 1991-10-14 | 1991-11-27 | Minnesota Mining & Mfg | Positive-acting photothermographic materials |
| DE4142956C2 (de) * | 1991-12-24 | 1996-08-14 | Du Pont Deutschland | Bleichbares Lichthofschutzsystem für photographische Aufzeichnungsmaterialien |
| US20060057512A1 (en) * | 2004-09-14 | 2006-03-16 | Fuji Photo Film Co., Ltd. | Photothermographic material |
| CN114324320B (zh) * | 2021-12-30 | 2024-08-13 | 浙江正信石油科技有限公司 | 一种高效且可循环利用的pH试纸及其制备方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4931127A (OSRAM) * | 1972-07-19 | 1974-03-20 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3988154A (en) * | 1974-02-19 | 1976-10-26 | Eastman Kodak Company | Photographic supports and elements utilizing photobleachable omicron-nitroarylidene dyes |
| US4081278A (en) * | 1977-05-23 | 1978-03-28 | Eastman Kodak Company | Heat sensitive dye layers comprising a benzopinacol |
| US4201590A (en) * | 1977-09-19 | 1980-05-06 | Eastman Kodak Company | Heat sensitive reactive products of hexaarylbiimidazole and antihalation dyes |
| US4272106A (en) * | 1979-10-10 | 1981-06-09 | Minnesota Mining And Manufacturing Company | Copy sheet |
-
1980
- 1980-10-17 JP JP55145344A patent/JPS5768831A/ja active Granted
-
1981
- 1981-10-16 DE DE19813141221 patent/DE3141221A1/de not_active Withdrawn
- 1981-10-16 GB GB8131328A patent/GB2085609B/en not_active Expired
- 1981-10-19 US US06/313,705 patent/US4376162A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4931127A (OSRAM) * | 1972-07-19 | 1974-03-20 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016514705A (ja) * | 2013-03-15 | 2016-05-23 | アジエリス ファーマシューティカル テクノロジーズ コンパニー リミテッド | ニトロキソリンの塩基付加塩及びその使用 |
| US9758484B2 (en) | 2013-03-15 | 2017-09-12 | Asieris Pharmaceutical Technologies Co., Ltd. | Base addition salts of nitroxoline and uses thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2085609B (en) | 1984-04-18 |
| DE3141221A1 (de) | 1982-06-09 |
| JPS6335964B2 (OSRAM) | 1988-07-18 |
| US4376162A (en) | 1983-03-08 |
| GB2085609A (en) | 1982-04-28 |
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