JPS5766638A - Plasma etching device - Google Patents

Plasma etching device

Info

Publication number
JPS5766638A
JPS5766638A JP14148380A JP14148380A JPS5766638A JP S5766638 A JPS5766638 A JP S5766638A JP 14148380 A JP14148380 A JP 14148380A JP 14148380 A JP14148380 A JP 14148380A JP S5766638 A JPS5766638 A JP S5766638A
Authority
JP
Japan
Prior art keywords
cylinder
piston
lower electrode
gas
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14148380A
Other languages
Japanese (ja)
Inventor
Koichi Nagasawa
Kazuo Mizuguchi
Isao Shibayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14148380A priority Critical patent/JPS5766638A/en
Publication of JPS5766638A publication Critical patent/JPS5766638A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To cool samples up to a predetermined temperature with good controllability by providing a lower electrode working as a sample stand with compression and expansion means consisting of a cylinder and a piston, and gas in the cylinder chamber is repeatedly compressed and expanded. CONSTITUTION:A cylinder 9 is formed in a lower electrode 3 to be a sample stand and a piston 10 is engaged with the cylinder 9 to permit operation from outside.Gas such as ammonia, alcohol is sealed in the chamber of the cylinder 9 and a thermocouple 11 for temperature detection is arranged in the vicinity of the surface of the lower electrode 3. The temperature of the lower electrode 3 and that of the sample 8 in can be decreased by repeatedly compressing and expanding the sealed gas by the reciprocating operation of the piston 10 and the samples 8 are maintained at a predetermined temperature by controlling the reciprocating operation of the piston 10 by using the detection output of the thermcouple 11.
JP14148380A 1980-10-09 1980-10-09 Plasma etching device Pending JPS5766638A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14148380A JPS5766638A (en) 1980-10-09 1980-10-09 Plasma etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14148380A JPS5766638A (en) 1980-10-09 1980-10-09 Plasma etching device

Publications (1)

Publication Number Publication Date
JPS5766638A true JPS5766638A (en) 1982-04-22

Family

ID=15292946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14148380A Pending JPS5766638A (en) 1980-10-09 1980-10-09 Plasma etching device

Country Status (1)

Country Link
JP (1) JPS5766638A (en)

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