JPS5766638A - Plasma etching device - Google Patents
Plasma etching deviceInfo
- Publication number
- JPS5766638A JPS5766638A JP14148380A JP14148380A JPS5766638A JP S5766638 A JPS5766638 A JP S5766638A JP 14148380 A JP14148380 A JP 14148380A JP 14148380 A JP14148380 A JP 14148380A JP S5766638 A JPS5766638 A JP S5766638A
- Authority
- JP
- Japan
- Prior art keywords
- cylinder
- piston
- lower electrode
- gas
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To cool samples up to a predetermined temperature with good controllability by providing a lower electrode working as a sample stand with compression and expansion means consisting of a cylinder and a piston, and gas in the cylinder chamber is repeatedly compressed and expanded. CONSTITUTION:A cylinder 9 is formed in a lower electrode 3 to be a sample stand and a piston 10 is engaged with the cylinder 9 to permit operation from outside.Gas such as ammonia, alcohol is sealed in the chamber of the cylinder 9 and a thermocouple 11 for temperature detection is arranged in the vicinity of the surface of the lower electrode 3. The temperature of the lower electrode 3 and that of the sample 8 in can be decreased by repeatedly compressing and expanding the sealed gas by the reciprocating operation of the piston 10 and the samples 8 are maintained at a predetermined temperature by controlling the reciprocating operation of the piston 10 by using the detection output of the thermcouple 11.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14148380A JPS5766638A (en) | 1980-10-09 | 1980-10-09 | Plasma etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14148380A JPS5766638A (en) | 1980-10-09 | 1980-10-09 | Plasma etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5766638A true JPS5766638A (en) | 1982-04-22 |
Family
ID=15292946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14148380A Pending JPS5766638A (en) | 1980-10-09 | 1980-10-09 | Plasma etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5766638A (en) |
-
1980
- 1980-10-09 JP JP14148380A patent/JPS5766638A/en active Pending
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