JPS576573B2 - - Google Patents

Info

Publication number
JPS576573B2
JPS576573B2 JP11039974A JP11039974A JPS576573B2 JP S576573 B2 JPS576573 B2 JP S576573B2 JP 11039974 A JP11039974 A JP 11039974A JP 11039974 A JP11039974 A JP 11039974A JP S576573 B2 JPS576573 B2 JP S576573B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11039974A
Other languages
Japanese (ja)
Other versions
JPS5073705A (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5073705A publication Critical patent/JPS5073705A/ja
Publication of JPS576573B2 publication Critical patent/JPS576573B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Electron Beam Exposure (AREA)
JP11039974A 1973-11-05 1974-09-25 Expired JPS576573B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US41293073A 1973-11-05 1973-11-05
US41293373A 1973-11-05 1973-11-05

Publications (2)

Publication Number Publication Date
JPS5073705A JPS5073705A (enrdf_load_stackoverflow) 1975-06-18
JPS576573B2 true JPS576573B2 (enrdf_load_stackoverflow) 1982-02-05

Family

ID=27021973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11039974A Expired JPS576573B2 (enrdf_load_stackoverflow) 1973-11-05 1974-09-25

Country Status (4)

Country Link
JP (1) JPS576573B2 (enrdf_load_stackoverflow)
DE (1) DE2446930A1 (enrdf_load_stackoverflow)
FR (1) FR2250139B1 (enrdf_load_stackoverflow)
GB (1) GB1487936A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171417A (en) * 1978-10-30 1979-10-16 Calgon Corporation Polymers with improved solvent holdout in electroconductive paper
NL7906932A (nl) * 1979-09-18 1981-03-20 Philips Nv Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.
EP0240726A3 (en) * 1986-03-05 1987-12-09 Daikin Industries, Limited Resist material
EP1131677B1 (en) 1998-09-23 2005-08-03 E.I. Dupont De Nemours And Company Photoresists, polymers and processes for microlithography
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
CA2381128A1 (en) * 2002-04-09 2003-10-09 Quantiscript Inc. Plasma polymerized electron beam resist

Also Published As

Publication number Publication date
GB1487936A (en) 1977-10-05
JPS5073705A (enrdf_load_stackoverflow) 1975-06-18
DE2446930A1 (de) 1975-05-07
FR2250139B1 (enrdf_load_stackoverflow) 1980-06-27
FR2250139A1 (enrdf_load_stackoverflow) 1975-05-30

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