JPS576573B2 - - Google Patents
Info
- Publication number
- JPS576573B2 JPS576573B2 JP11039974A JP11039974A JPS576573B2 JP S576573 B2 JPS576573 B2 JP S576573B2 JP 11039974 A JP11039974 A JP 11039974A JP 11039974 A JP11039974 A JP 11039974A JP S576573 B2 JPS576573 B2 JP S576573B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41293073A | 1973-11-05 | 1973-11-05 | |
| US41293373A | 1973-11-05 | 1973-11-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5073705A JPS5073705A (de) | 1975-06-18 |
| JPS576573B2 true JPS576573B2 (de) | 1982-02-05 |
Family
ID=27021973
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11039974A Expired JPS576573B2 (de) | 1973-11-05 | 1974-09-25 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS576573B2 (de) |
| DE (1) | DE2446930A1 (de) |
| FR (1) | FR2250139B1 (de) |
| GB (1) | GB1487936A (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4171417A (en) * | 1978-10-30 | 1979-10-16 | Calgon Corporation | Polymers with improved solvent holdout in electroconductive paper |
| NL7906932A (nl) * | 1979-09-18 | 1981-03-20 | Philips Nv | Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag. |
| EP0240726A3 (de) * | 1986-03-05 | 1987-12-09 | Daikin Industries, Limited | Photolackmaterial |
| US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| IL141803A0 (en) | 1998-09-23 | 2002-03-10 | Du Pont | Photoresists, polymers and processes for microlithography |
| CA2381128A1 (en) | 2002-04-09 | 2003-10-09 | Quantiscript Inc. | Plasma polymerized electron beam resist |
-
1974
- 1974-09-25 JP JP11039974A patent/JPS576573B2/ja not_active Expired
- 1974-10-01 DE DE19742446930 patent/DE2446930A1/de not_active Withdrawn
- 1974-10-30 FR FR7436260A patent/FR2250139B1/fr not_active Expired
- 1974-11-04 GB GB4765274A patent/GB1487936A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5073705A (de) | 1975-06-18 |
| FR2250139A1 (de) | 1975-05-30 |
| DE2446930A1 (de) | 1975-05-07 |
| GB1487936A (en) | 1977-10-05 |
| FR2250139B1 (de) | 1980-06-27 |