JPS5764931A - Automatic aligning method - Google Patents
Automatic aligning methodInfo
- Publication number
- JPS5764931A JPS5764931A JP55140612A JP14061280A JPS5764931A JP S5764931 A JPS5764931 A JP S5764931A JP 55140612 A JP55140612 A JP 55140612A JP 14061280 A JP14061280 A JP 14061280A JP S5764931 A JPS5764931 A JP S5764931A
- Authority
- JP
- Japan
- Prior art keywords
- parallel lines
- interval
- lines
- wafer
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000001514 detection method Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To shorten the time of an automatic aligning method by providing a positioning target made of a plurality of parallel lines at a mask and a wafer and setting the interval of the parallel lines for the mask and the wafer to non-integer times, thereby enabling the detection of the relative position by one time optical scanning. CONSTITUTION:A target for a mask is, for example, formed of parallel lines 1, 2 perpendicularly crossed with parallel lines 1', 2' at an interval A, and a target for a wafer is formed of parallel lines 4, 5 perpendicularly crossed with parallel lines 4', 5' at an interval E. To align with both targets superposed, a light is scanned perpendicularly, for example, to the four parallel lines 1, 2, 4, 5, and photoelectric signals 1a-5a corresponding to the respective line positions are detected. The interval E is, for example, set to 2.5times the A, where there is a relationship of A<Enot equal to 2A or E<Anot equal to 2E. The relative position can be detected by one scanning even when two lines are superposed or three lines are arranged at the same interval, thereby eliminating the rescanning.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140612A JPS5764931A (en) | 1980-10-09 | 1980-10-09 | Automatic aligning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140612A JPS5764931A (en) | 1980-10-09 | 1980-10-09 | Automatic aligning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5764931A true JPS5764931A (en) | 1982-04-20 |
Family
ID=15272749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55140612A Pending JPS5764931A (en) | 1980-10-09 | 1980-10-09 | Automatic aligning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5764931A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02301121A (en) * | 1989-05-16 | 1990-12-13 | Oki Electric Ind Co Ltd | Alignment mark |
-
1980
- 1980-10-09 JP JP55140612A patent/JPS5764931A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02301121A (en) * | 1989-05-16 | 1990-12-13 | Oki Electric Ind Co Ltd | Alignment mark |
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