JPS576266U - - Google Patents
Info
- Publication number
- JPS576266U JPS576266U JP8168380U JP8168380U JPS576266U JP S576266 U JPS576266 U JP S576266U JP 8168380 U JP8168380 U JP 8168380U JP 8168380 U JP8168380 U JP 8168380U JP S576266 U JPS576266 U JP S576266U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8168380U JPS576266U (en, 2012) | 1980-06-13 | 1980-06-13 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8168380U JPS576266U (en, 2012) | 1980-06-13 | 1980-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS576266U true JPS576266U (en, 2012) | 1982-01-13 |
Family
ID=29444067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8168380U Pending JPS576266U (en, 2012) | 1980-06-13 | 1980-06-13 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS576266U (en, 2012) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62104093A (ja) * | 1985-10-30 | 1987-05-14 | Sony Corp | 半導体レ−ザ |
| JPS646959U (en, 2012) * | 1987-07-03 | 1989-01-17 | ||
| JPH033385A (ja) * | 1989-05-31 | 1991-01-09 | Ricoh Co Ltd | マスク半導体レーザーの作製方法 |
| JP2012191107A (ja) * | 2011-03-14 | 2012-10-04 | Nichia Chem Ind Ltd | 窒化物半導体レーザ素子の製造方法 |
| JP2020129653A (ja) * | 2019-02-08 | 2020-08-27 | シャープ株式会社 | 発光素子及びその製造方法 |
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1980
- 1980-06-13 JP JP8168380U patent/JPS576266U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62104093A (ja) * | 1985-10-30 | 1987-05-14 | Sony Corp | 半導体レ−ザ |
| JPS646959U (en, 2012) * | 1987-07-03 | 1989-01-17 | ||
| JPH033385A (ja) * | 1989-05-31 | 1991-01-09 | Ricoh Co Ltd | マスク半導体レーザーの作製方法 |
| JP2012191107A (ja) * | 2011-03-14 | 2012-10-04 | Nichia Chem Ind Ltd | 窒化物半導体レーザ素子の製造方法 |
| JP2020129653A (ja) * | 2019-02-08 | 2020-08-27 | シャープ株式会社 | 発光素子及びその製造方法 |