JPS576101B2 - - Google Patents
Info
- Publication number
- JPS576101B2 JPS576101B2 JP1738976A JP1738976A JPS576101B2 JP S576101 B2 JPS576101 B2 JP S576101B2 JP 1738976 A JP1738976 A JP 1738976A JP 1738976 A JP1738976 A JP 1738976A JP S576101 B2 JPS576101 B2 JP S576101B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1738976A JPS52100235A (en) | 1976-02-19 | 1976-02-19 | Stripping solution of photosolubilizable light sensitive resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1738976A JPS52100235A (en) | 1976-02-19 | 1976-02-19 | Stripping solution of photosolubilizable light sensitive resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52100235A JPS52100235A (en) | 1977-08-23 |
| JPS576101B2 true JPS576101B2 (cg-RX-API-DMAC7.html) | 1982-02-03 |
Family
ID=11942631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1738976A Granted JPS52100235A (en) | 1976-02-19 | 1976-02-19 | Stripping solution of photosolubilizable light sensitive resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52100235A (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101016724B1 (ko) * | 2003-08-01 | 2011-02-25 | 주식회사 동진쎄미켐 | 감광성 수지 조성물을 제거하기 위한 씬너 조성물 |
-
1976
- 1976-02-19 JP JP1738976A patent/JPS52100235A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52100235A (en) | 1977-08-23 |