JPS5759660B2 - - Google Patents

Info

Publication number
JPS5759660B2
JPS5759660B2 JP10790579A JP10790579A JPS5759660B2 JP S5759660 B2 JPS5759660 B2 JP S5759660B2 JP 10790579 A JP10790579 A JP 10790579A JP 10790579 A JP10790579 A JP 10790579A JP S5759660 B2 JPS5759660 B2 JP S5759660B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10790579A
Other languages
Japanese (ja)
Other versions
JPS5632726A (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Nobuo Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENSHI KK
RIKEN Institute of Physical and Chemical Research
Original Assignee
NIPPON DENSHI KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENSHI KK, RIKEN Institute of Physical and Chemical Research filed Critical NIPPON DENSHI KK
Priority to JP10790579A priority Critical patent/JPS5632726A/en
Publication of JPS5632726A publication Critical patent/JPS5632726A/en
Publication of JPS5759660B2 publication Critical patent/JPS5759660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP10790579A 1979-08-24 1979-08-24 Method for electron beam lithography Granted JPS5632726A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10790579A JPS5632726A (en) 1979-08-24 1979-08-24 Method for electron beam lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10790579A JPS5632726A (en) 1979-08-24 1979-08-24 Method for electron beam lithography

Publications (2)

Publication Number Publication Date
JPS5632726A JPS5632726A (en) 1981-04-02
JPS5759660B2 true JPS5759660B2 (en) 1982-12-15

Family

ID=14471030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10790579A Granted JPS5632726A (en) 1979-08-24 1979-08-24 Method for electron beam lithography

Country Status (1)

Country Link
JP (1) JPS5632726A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012224537A1 (en) 2012-12-31 2014-07-03 Technische Universität Ilmenau Lithographic process and lithographic device for components and circuits with micro and nano structure dimensions

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2625219B2 (en) * 1989-10-23 1997-07-02 株式会社日立製作所 Electron beam drawing equipment
JP2007043078A (en) 2005-07-04 2007-02-15 Nuflare Technology Inc Writing apparatus and writing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012224537A1 (en) 2012-12-31 2014-07-03 Technische Universität Ilmenau Lithographic process and lithographic device for components and circuits with micro and nano structure dimensions
WO2014102187A2 (en) 2012-12-31 2014-07-03 Technische Universität Ilmenau Lithography method and lithography device for components and circuits having microscale and nanoscale structural dimensions

Also Published As

Publication number Publication date
JPS5632726A (en) 1981-04-02

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