JPS575766A - Coating compound for preventing dazzle - Google Patents

Coating compound for preventing dazzle

Info

Publication number
JPS575766A
JPS575766A JP8045480A JP8045480A JPS575766A JP S575766 A JPS575766 A JP S575766A JP 8045480 A JP8045480 A JP 8045480A JP 8045480 A JP8045480 A JP 8045480A JP S575766 A JPS575766 A JP S575766A
Authority
JP
Japan
Prior art keywords
base material
urethane resin
meth
component
coating compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8045480A
Other languages
Japanese (ja)
Inventor
Masanori Naito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP8045480A priority Critical patent/JPS575766A/en
Publication of JPS575766A publication Critical patent/JPS575766A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE: The titled composition suppressing the reduction in the light transmittance of transparent base material, preventing light reflection on the surface of the base material, having improved adhesiveness to the base material, surface hardness, etc., comprising a specific acrylic type resin and a urethane resin.
CONSTITUTION: The desired composition comprising (A) 100pts.wt. acrylic type resin consisting of (i) 70W100wt% methyl methacrylate and/or (meth)acrylonitrile and (b) 30W0wt% vinyl monomer [preferably (meth)acrylic acid and/or methacrylic ester (other than methyl methacylate)] copolymerizable with the component i, and (B) 2W40pts.wt. urethane resin. The component B is preferably a urethane resin consisting of a (poly)alkylene glycol having a molecular weight ≤2,000 and an aliphatic or alicyclic diisocyanate.
COPYRIGHT: (C)1982,JPO&Japio
JP8045480A 1980-06-13 1980-06-13 Coating compound for preventing dazzle Pending JPS575766A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8045480A JPS575766A (en) 1980-06-13 1980-06-13 Coating compound for preventing dazzle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8045480A JPS575766A (en) 1980-06-13 1980-06-13 Coating compound for preventing dazzle

Publications (1)

Publication Number Publication Date
JPS575766A true JPS575766A (en) 1982-01-12

Family

ID=13718698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8045480A Pending JPS575766A (en) 1980-06-13 1980-06-13 Coating compound for preventing dazzle

Country Status (1)

Country Link
JP (1) JPS575766A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62270670A (en) * 1986-03-24 1987-11-25 デイジ−　シエルタ−　プロダクツ Molded product coating composition and method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4992142A (en) * 1972-10-11 1974-09-03

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4992142A (en) * 1972-10-11 1974-09-03

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62270670A (en) * 1986-03-24 1987-11-25 デイジ−　シエルタ−　プロダクツ Molded product coating composition and method

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