JPS575322A - Recovering and pretreating method for semiconductor - Google Patents
Recovering and pretreating method for semiconductorInfo
- Publication number
- JPS575322A JPS575322A JP7904480A JP7904480A JPS575322A JP S575322 A JPS575322 A JP S575322A JP 7904480 A JP7904480 A JP 7904480A JP 7904480 A JP7904480 A JP 7904480A JP S575322 A JPS575322 A JP S575322A
- Authority
- JP
- Japan
- Prior art keywords
- chips
- semiconductor
- recovered
- recovering
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processing Of Solid Wastes (AREA)
Abstract
PURPOSE:To effectively utilize recovered chips of Si, lithium tantalate or lithium niobate by treating with supersonic wave the chips in a solution capable of dissolving the chips, removing the impurities, and recovering as semiconductor chips being less contaminated. CONSTITUTION:Since impurities 1 of contamination source and scar or crack 3 are concentrated on the surface 2 when powder chips produced in cutting and polishing Si, lithium tantalate, or lithium niobate are recovered, the recovered chips are treated with supersonic wave having 10-60kHz in a solution capable of dissolving the chips, e.g., hydrofluoric acid or a mixture solution of hydrofluoric acid and other strong acid. Thus, the quantity of semiconductor loss is reduced to effectively recover the semiconductor chips.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7904480A JPS575322A (en) | 1980-06-13 | 1980-06-13 | Recovering and pretreating method for semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7904480A JPS575322A (en) | 1980-06-13 | 1980-06-13 | Recovering and pretreating method for semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS575322A true JPS575322A (en) | 1982-01-12 |
Family
ID=13678900
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7904480A Pending JPS575322A (en) | 1980-06-13 | 1980-06-13 | Recovering and pretreating method for semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS575322A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5188906A (en) * | 1988-11-10 | 1993-02-23 | Martin Marietta Energy Systems, Inc. | Substrates suitable for deposition of superconducting thin films |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4911793A (en) * | 1972-05-10 | 1974-02-01 | ||
JPS5030578A (en) * | 1972-06-08 | 1975-03-26 |
-
1980
- 1980-06-13 JP JP7904480A patent/JPS575322A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4911793A (en) * | 1972-05-10 | 1974-02-01 | ||
JPS5030578A (en) * | 1972-06-08 | 1975-03-26 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5188906A (en) * | 1988-11-10 | 1993-02-23 | Martin Marietta Energy Systems, Inc. | Substrates suitable for deposition of superconducting thin films |
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