JPS5750433B2 - - Google Patents

Info

Publication number
JPS5750433B2
JPS5750433B2 JP51117830A JP11783076A JPS5750433B2 JP S5750433 B2 JPS5750433 B2 JP S5750433B2 JP 51117830 A JP51117830 A JP 51117830A JP 11783076 A JP11783076 A JP 11783076A JP S5750433 B2 JPS5750433 B2 JP S5750433B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51117830A
Other languages
Japanese (ja)
Other versions
JPS5342563A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11783076A priority Critical patent/JPS5342563A/ja
Publication of JPS5342563A publication Critical patent/JPS5342563A/ja
Publication of JPS5750433B2 publication Critical patent/JPS5750433B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11783076A 1976-09-29 1976-09-29 Rotary stage Granted JPS5342563A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11783076A JPS5342563A (en) 1976-09-29 1976-09-29 Rotary stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11783076A JPS5342563A (en) 1976-09-29 1976-09-29 Rotary stage

Publications (2)

Publication Number Publication Date
JPS5342563A JPS5342563A (en) 1978-04-18
JPS5750433B2 true JPS5750433B2 (bg) 1982-10-27

Family

ID=14721294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11783076A Granted JPS5342563A (en) 1976-09-29 1976-09-29 Rotary stage

Country Status (1)

Country Link
JP (1) JPS5342563A (bg)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5387683A (en) * 1977-01-12 1978-08-02 Nippon Telegr & Teleph Corp <Ntt> Assembling method of electrostrictive element
JPS55131284A (en) * 1979-03-28 1980-10-11 Chiyou Lsi Gijutsu Kenkyu Kumiai Position controller
JPS58159895U (ja) * 1982-04-17 1983-10-25 株式会社トーキン 圧電型微少回転変位素子
JPS62220893A (ja) * 1986-03-24 1987-09-29 株式会社東芝 微小回転装置

Also Published As

Publication number Publication date
JPS5342563A (en) 1978-04-18

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