JPS5746648B2 - - Google Patents

Info

Publication number
JPS5746648B2
JPS5746648B2 JP51028829A JP2882976A JPS5746648B2 JP S5746648 B2 JPS5746648 B2 JP S5746648B2 JP 51028829 A JP51028829 A JP 51028829A JP 2882976 A JP2882976 A JP 2882976A JP S5746648 B2 JPS5746648 B2 JP S5746648B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51028829A
Other languages
Japanese (ja)
Other versions
JPS52112280A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2882976A priority Critical patent/JPS52112280A/ja
Publication of JPS52112280A publication Critical patent/JPS52112280A/ja
Publication of JPS5746648B2 publication Critical patent/JPS5746648B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2882976A 1976-03-17 1976-03-17 X-ray exposure mask Granted JPS52112280A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2882976A JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2882976A JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Publications (2)

Publication Number Publication Date
JPS52112280A JPS52112280A (en) 1977-09-20
JPS5746648B2 true JPS5746648B2 (enrdf_load_stackoverflow) 1982-10-05

Family

ID=12259267

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2882976A Granted JPS52112280A (en) 1976-03-17 1976-03-17 X-ray exposure mask

Country Status (1)

Country Link
JP (1) JPS52112280A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5743420A (en) * 1980-08-29 1982-03-11 Hitachi Ltd Mask alignment method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
JPS51147264A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd High-precision positioning system
JPS5278375A (en) * 1975-12-25 1977-07-01 Fujitsu Ltd Aligning method

Also Published As

Publication number Publication date
JPS52112280A (en) 1977-09-20

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