JPS5745785B2 - - Google Patents
Info
- Publication number
- JPS5745785B2 JPS5745785B2 JP47045867A JP4586772A JPS5745785B2 JP S5745785 B2 JPS5745785 B2 JP S5745785B2 JP 47045867 A JP47045867 A JP 47045867A JP 4586772 A JP4586772 A JP 4586772A JP S5745785 B2 JPS5745785 B2 JP S5745785B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Macromonomer-Based Addition Polymer (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymerisation Methods In General (AREA)
- Polyesters Or Polycarbonates (AREA)
- Paints Or Removers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47045867A JPS5745785B2 (de) | 1972-05-11 | 1972-05-11 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP47045867A JPS5745785B2 (de) | 1972-05-11 | 1972-05-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS495923A JPS495923A (de) | 1974-01-19 |
JPS5745785B2 true JPS5745785B2 (de) | 1982-09-29 |
Family
ID=12731141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP47045867A Expired JPS5745785B2 (de) | 1972-05-11 | 1972-05-11 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5745785B2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57137364A (en) * | 1981-02-20 | 1982-08-24 | Mitsui Toatsu Chem Inc | Chipping-resistant coating resin composition |
DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
DE3719844A1 (de) * | 1987-06-13 | 1988-12-29 | Basf Ag | Durch photopolymersisation vernetzbares gemisch |
DE3719871A1 (de) * | 1987-06-13 | 1988-12-29 | Basf Ag | Durch photopolymerisation vernetzbare heisspraegeplatten |
JP3771705B2 (ja) | 1998-03-12 | 2006-04-26 | 互応化学工業株式会社 | 感光性樹脂組成物及びプリント配線板製造用フォトレジストインク |
JP3771714B2 (ja) | 1998-05-12 | 2006-04-26 | 互応化学工業株式会社 | 感光性樹脂組成物及びプリント配線板製造用フォトソルダーレジストインク |
JP5348446B2 (ja) * | 2000-04-27 | 2013-11-20 | Dic株式会社 | 活性エネルギー線硬化性水性塗料組成物 |
JP6597164B2 (ja) * | 2015-10-19 | 2019-10-30 | Dic株式会社 | 光硬化型アルカリ現像性樹脂組成物とその硬化物 |
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1972
- 1972-05-11 JP JP47045867A patent/JPS5745785B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS495923A (de) | 1974-01-19 |