JPS5744144A - Photosensitive resist - Google Patents

Photosensitive resist

Info

Publication number
JPS5744144A
JPS5744144A JP12017180A JP12017180A JPS5744144A JP S5744144 A JPS5744144 A JP S5744144A JP 12017180 A JP12017180 A JP 12017180A JP 12017180 A JP12017180 A JP 12017180A JP S5744144 A JPS5744144 A JP S5744144A
Authority
JP
Japan
Prior art keywords
resist
divinylbenzene
compound
solvent
photosensitive resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12017180A
Other languages
Japanese (ja)
Inventor
Yoshinobu Nakano
Toshio Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Priority to JP12017180A priority Critical patent/JPS5744144A/en
Publication of JPS5744144A publication Critical patent/JPS5744144A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To enhance the developing stability and resolution of a photosensitive resist and the shelf stability, etc. of an unexposed coated film by preparing the resist using a polyunsatd. compound obtd. by the proton transfer polymn. of divinylbenzene as an effective component. CONSTITUTION:A divinylbenzene monomer such as p-divinylbenzene or m-divinylbenzene is dissolved in a nonpolar solvent such as benzene or methylene dichloride and subjected to proton transfer polymn. at 50-80 deg.C in the presence of an oxyacid catalyst such as acetylene perchlorate or trifluoromethylsulfonic acid to obtain a polyunsatd. compound. This compound is dissolved in an org. solvent as a photosetting component. The resulting photosensitive resist is applied to a support by an ordinary means. After drying and exposure the resist can be developed with an org. solvent. This resist is applicable to photoengraving for printing, etc.
JP12017180A 1980-08-29 1980-08-29 Photosensitive resist Pending JPS5744144A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12017180A JPS5744144A (en) 1980-08-29 1980-08-29 Photosensitive resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12017180A JPS5744144A (en) 1980-08-29 1980-08-29 Photosensitive resist

Publications (1)

Publication Number Publication Date
JPS5744144A true JPS5744144A (en) 1982-03-12

Family

ID=14779678

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12017180A Pending JPS5744144A (en) 1980-08-29 1980-08-29 Photosensitive resist

Country Status (1)

Country Link
JP (1) JPS5744144A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228054A (en) * 1985-04-01 1986-10-11 Mitsui Toatsu Chem Inc Reactive polymer composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228054A (en) * 1985-04-01 1986-10-11 Mitsui Toatsu Chem Inc Reactive polymer composition

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