JPS5741810B2 - - Google Patents
Info
- Publication number
- JPS5741810B2 JPS5741810B2 JP54067675A JP6767579A JPS5741810B2 JP S5741810 B2 JPS5741810 B2 JP S5741810B2 JP 54067675 A JP54067675 A JP 54067675A JP 6767579 A JP6767579 A JP 6767579A JP S5741810 B2 JPS5741810 B2 JP S5741810B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6767579A JPS55160428A (en) | 1979-05-31 | 1979-05-31 | Position detecting method for exposed material in electron beam exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6767579A JPS55160428A (en) | 1979-05-31 | 1979-05-31 | Position detecting method for exposed material in electron beam exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55160428A JPS55160428A (en) | 1980-12-13 |
| JPS5741810B2 true JPS5741810B2 (id) | 1982-09-04 |
Family
ID=13351801
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6767579A Granted JPS55160428A (en) | 1979-05-31 | 1979-05-31 | Position detecting method for exposed material in electron beam exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55160428A (id) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55162229A (en) * | 1979-06-04 | 1980-12-17 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Detection of electron beam exposure position |
| JP2024075811A (ja) * | 2021-03-31 | 2024-06-05 | 株式会社ニューフレアテクノロジー | マルチ荷電粒子ビーム描画装置およびマルチ荷電粒子ビームの測定方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53117463A (en) * | 1977-03-23 | 1978-10-13 | Fujitsu Ltd | Position detection method |
-
1979
- 1979-05-31 JP JP6767579A patent/JPS55160428A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53117463A (en) * | 1977-03-23 | 1978-10-13 | Fujitsu Ltd | Position detection method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55160428A (en) | 1980-12-13 |