JPS5741081B2 - - Google Patents

Info

Publication number
JPS5741081B2
JPS5741081B2 JP54136428A JP13642879A JPS5741081B2 JP S5741081 B2 JPS5741081 B2 JP S5741081B2 JP 54136428 A JP54136428 A JP 54136428A JP 13642879 A JP13642879 A JP 13642879A JP S5741081 B2 JPS5741081 B2 JP S5741081B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54136428A
Other languages
Japanese (ja)
Other versions
JPS5661123A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13642879A priority Critical patent/JPS5661123A/ja
Publication of JPS5661123A publication Critical patent/JPS5661123A/ja
Publication of JPS5741081B2 publication Critical patent/JPS5741081B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/12Diffusion of dopants within, into or out of semiconductor bodies or layers between a solid phase and a gaseous phase
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P32/00Diffusion of dopants within, into or out of wafers, substrates or parts of devices
    • H10P32/10Diffusion of dopants within, into or out of semiconductor bodies or layers
    • H10P32/17Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
    • H10P32/171Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
JP13642879A 1979-10-24 1979-10-24 Diffusion of boron Granted JPS5661123A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13642879A JPS5661123A (en) 1979-10-24 1979-10-24 Diffusion of boron

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13642879A JPS5661123A (en) 1979-10-24 1979-10-24 Diffusion of boron

Publications (2)

Publication Number Publication Date
JPS5661123A JPS5661123A (en) 1981-05-26
JPS5741081B2 true JPS5741081B2 (enExample) 1982-09-01

Family

ID=15174908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13642879A Granted JPS5661123A (en) 1979-10-24 1979-10-24 Diffusion of boron

Country Status (1)

Country Link
JP (1) JPS5661123A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021265U (enExample) * 1988-12-07 1990-01-08

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56142632A (en) * 1980-04-07 1981-11-07 Toyo Electric Mfg Co Ltd Diffusing method for boron

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021265U (enExample) * 1988-12-07 1990-01-08

Also Published As

Publication number Publication date
JPS5661123A (en) 1981-05-26

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