JPS57208134A - Resist developing apparatus - Google Patents
Resist developing apparatusInfo
- Publication number
- JPS57208134A JPS57208134A JP9428881A JP9428881A JPS57208134A JP S57208134 A JPS57208134 A JP S57208134A JP 9428881 A JP9428881 A JP 9428881A JP 9428881 A JP9428881 A JP 9428881A JP S57208134 A JPS57208134 A JP S57208134A
- Authority
- JP
- Japan
- Prior art keywords
- developer
- substrate
- supply device
- maintaining
- developer supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9428881A JPS57208134A (en) | 1981-06-18 | 1981-06-18 | Resist developing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9428881A JPS57208134A (en) | 1981-06-18 | 1981-06-18 | Resist developing apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57208134A true JPS57208134A (en) | 1982-12-21 |
JPH0143452B2 JPH0143452B2 (de) | 1989-09-20 |
Family
ID=14106067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9428881A Granted JPS57208134A (en) | 1981-06-18 | 1981-06-18 | Resist developing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57208134A (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132620A (ja) * | 1983-01-20 | 1984-07-30 | Seiko Instr & Electronics Ltd | 半導体ウエハ現像装置 |
US6265323B1 (en) | 1998-02-23 | 2001-07-24 | Kabushiki Kaisha Toshiba | Substrate processing method and apparatus |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10506398B2 (en) | 2013-10-23 | 2019-12-10 | Sprint Communications Company Lp. | Implementation of remotely hosted branding content and customizations |
US9743271B2 (en) | 2013-10-23 | 2017-08-22 | Sprint Communications Company L.P. | Delivery of branding content and customizations to a mobile communication device |
-
1981
- 1981-06-18 JP JP9428881A patent/JPS57208134A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59132620A (ja) * | 1983-01-20 | 1984-07-30 | Seiko Instr & Electronics Ltd | 半導体ウエハ現像装置 |
US6265323B1 (en) | 1998-02-23 | 2001-07-24 | Kabushiki Kaisha Toshiba | Substrate processing method and apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH0143452B2 (de) | 1989-09-20 |
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