JPS57202536A - Positive type resist composition - Google Patents

Positive type resist composition

Info

Publication number
JPS57202536A
JPS57202536A JP8757081A JP8757081A JPS57202536A JP S57202536 A JPS57202536 A JP S57202536A JP 8757081 A JP8757081 A JP 8757081A JP 8757081 A JP8757081 A JP 8757081A JP S57202536 A JPS57202536 A JP S57202536A
Authority
JP
Japan
Prior art keywords
compound
positive type
binder
hydroxy
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8757081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360895B2 (enrdf_load_stackoverflow
Inventor
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8757081A priority Critical patent/JPS57202536A/ja
Publication of JPS57202536A publication Critical patent/JPS57202536A/ja
Publication of JPS6360895B2 publication Critical patent/JPS6360895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8757081A 1981-06-09 1981-06-09 Positive type resist composition Granted JPS57202536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8757081A JPS57202536A (en) 1981-06-09 1981-06-09 Positive type resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8757081A JPS57202536A (en) 1981-06-09 1981-06-09 Positive type resist composition

Publications (2)

Publication Number Publication Date
JPS57202536A true JPS57202536A (en) 1982-12-11
JPS6360895B2 JPS6360895B2 (enrdf_load_stackoverflow) 1988-11-25

Family

ID=13918651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8757081A Granted JPS57202536A (en) 1981-06-09 1981-06-09 Positive type resist composition

Country Status (1)

Country Link
JP (1) JPS57202536A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002526794A (ja) * 1998-10-01 2002-08-20 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 新規な感光性樹脂組成物
JP2003529099A (ja) * 2000-03-24 2003-09-30 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 新規な感光性樹脂組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002526794A (ja) * 1998-10-01 2002-08-20 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 新規な感光性樹脂組成物
JP2003529099A (ja) * 2000-03-24 2003-09-30 アーチ・スペシャルティ・ケミカルズ・インコーポレイテッド 新規な感光性樹脂組成物

Also Published As

Publication number Publication date
JPS6360895B2 (enrdf_load_stackoverflow) 1988-11-25

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