JPS5719571B2 - - Google Patents

Info

Publication number
JPS5719571B2
JPS5719571B2 JP14516079A JP14516079A JPS5719571B2 JP S5719571 B2 JPS5719571 B2 JP S5719571B2 JP 14516079 A JP14516079 A JP 14516079A JP 14516079 A JP14516079 A JP 14516079A JP S5719571 B2 JPS5719571 B2 JP S5719571B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14516079A
Other languages
Japanese (ja)
Other versions
JPS5669833A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14516079A priority Critical patent/JPS5669833A/ja
Publication of JPS5669833A publication Critical patent/JPS5669833A/ja
Publication of JPS5719571B2 publication Critical patent/JPS5719571B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP14516079A 1979-11-09 1979-11-09 Fine processing method of thin film Granted JPS5669833A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14516079A JPS5669833A (en) 1979-11-09 1979-11-09 Fine processing method of thin film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14516079A JPS5669833A (en) 1979-11-09 1979-11-09 Fine processing method of thin film

Publications (2)

Publication Number Publication Date
JPS5669833A JPS5669833A (en) 1981-06-11
JPS5719571B2 true JPS5719571B2 (US20030204162A1-20031030-M00001.png) 1982-04-23

Family

ID=15378807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14516079A Granted JPS5669833A (en) 1979-11-09 1979-11-09 Fine processing method of thin film

Country Status (1)

Country Link
JP (1) JPS5669833A (US20030204162A1-20031030-M00001.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211241U (US20030204162A1-20031030-M00001.png) * 1985-07-02 1987-01-23

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5893343A (ja) * 1981-11-30 1983-06-03 Toshiba Corp 半導体集積回路の分離領域形成方法
JPS5952848A (ja) * 1982-09-20 1984-03-27 Mitsubishi Electric Corp 半導体装置の製造方法
JPS5978542A (ja) * 1982-10-27 1984-05-07 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211241U (US20030204162A1-20031030-M00001.png) * 1985-07-02 1987-01-23

Also Published As

Publication number Publication date
JPS5669833A (en) 1981-06-11

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