JPS5719372A - Surface coated superhard alloy - Google Patents

Surface coated superhard alloy

Info

Publication number
JPS5719372A
JPS5719372A JP9348080A JP9348080A JPS5719372A JP S5719372 A JPS5719372 A JP S5719372A JP 9348080 A JP9348080 A JP 9348080A JP 9348080 A JP9348080 A JP 9348080A JP S5719372 A JPS5719372 A JP S5719372A
Authority
JP
Japan
Prior art keywords
compound
superhard alloy
iodide
coating layer
alloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9348080A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0120227B2 (ko
Inventor
Moriaki Fuyama
Komei Yatsuno
Mitsuru Ura
Haruhiko Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP9348080A priority Critical patent/JPS5719372A/ja
Publication of JPS5719372A publication Critical patent/JPS5719372A/ja
Publication of JPH0120227B2 publication Critical patent/JPH0120227B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Chemical Vapour Deposition (AREA)
JP9348080A 1980-07-09 1980-07-09 Surface coated superhard alloy Granted JPS5719372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9348080A JPS5719372A (en) 1980-07-09 1980-07-09 Surface coated superhard alloy

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9348080A JPS5719372A (en) 1980-07-09 1980-07-09 Surface coated superhard alloy

Publications (2)

Publication Number Publication Date
JPS5719372A true JPS5719372A (en) 1982-02-01
JPH0120227B2 JPH0120227B2 (ko) 1989-04-14

Family

ID=14083500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9348080A Granted JPS5719372A (en) 1980-07-09 1980-07-09 Surface coated superhard alloy

Country Status (1)

Country Link
JP (1) JPS5719372A (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297677A (ja) * 1988-06-13 1990-04-10 Sandvik Ab 被覆工程で脱炭可能な基体の被覆体
WO2002061168A3 (en) * 2000-10-24 2003-03-13 Honeywell Int Inc Methods of forming sputtering targets

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155080A (en) * 1980-04-30 1981-12-01 Sumitomo Electric Industries Coated cutting tool

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155080A (en) * 1980-04-30 1981-12-01 Sumitomo Electric Industries Coated cutting tool

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297677A (ja) * 1988-06-13 1990-04-10 Sandvik Ab 被覆工程で脱炭可能な基体の被覆体
WO2002061168A3 (en) * 2000-10-24 2003-03-13 Honeywell Int Inc Methods of forming sputtering targets
US6833058B1 (en) 2000-10-24 2004-12-21 Honeywell International Inc. Titanium-based and zirconium-based mixed materials and sputtering targets

Also Published As

Publication number Publication date
JPH0120227B2 (ko) 1989-04-14

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