JPS5719372A - Surface coated superhard alloy - Google Patents
Surface coated superhard alloyInfo
- Publication number
- JPS5719372A JPS5719372A JP9348080A JP9348080A JPS5719372A JP S5719372 A JPS5719372 A JP S5719372A JP 9348080 A JP9348080 A JP 9348080A JP 9348080 A JP9348080 A JP 9348080A JP S5719372 A JPS5719372 A JP S5719372A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- superhard alloy
- iodide
- coating layer
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To improve the machinability and abrasion resistance of a titled alloy by forming a coated layer of a solid solution oxy compound of an Hf compound and a Ti compound on the surface of base metal consisting of a superhard alloy, and forming an oxide coating layer thereon. CONSTITUTION:An Hf iodide, a Ti iodide and a suitable reacting gas are introduced into the surface of base metal consisting of a superhard alloy such as superhard alloy or cermet. Thereby, a coating layer consisting of a solid solution oxy compound of Hf and Ti, for example (Hf.Ti)C.O, (Hf.Ti)N.O or (Hf.Ti)C.N.O is formed on the surface of the base material. Thence, an iodide or chloride of Al or Zr and a reacting gas (CO2+H2) are introduced to cause thermal decomposition of Al or Zr compound, whereby an oxide coating layer consisting of Al2O3 or ZrO2 is formed thereon.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9348080A JPS5719372A (en) | 1980-07-09 | 1980-07-09 | Surface coated superhard alloy |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9348080A JPS5719372A (en) | 1980-07-09 | 1980-07-09 | Surface coated superhard alloy |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5719372A true JPS5719372A (en) | 1982-02-01 |
JPH0120227B2 JPH0120227B2 (en) | 1989-04-14 |
Family
ID=14083500
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9348080A Granted JPS5719372A (en) | 1980-07-09 | 1980-07-09 | Surface coated superhard alloy |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5719372A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0297677A (en) * | 1988-06-13 | 1990-04-10 | Sandvik Ab | Cover body of substrate capable of being decarburized in coating method |
WO2002061168A3 (en) * | 2000-10-24 | 2003-03-13 | Honeywell Int Inc | Methods of forming sputtering targets |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56155080A (en) * | 1980-04-30 | 1981-12-01 | Sumitomo Electric Industries | Coated cutting tool |
-
1980
- 1980-07-09 JP JP9348080A patent/JPS5719372A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56155080A (en) * | 1980-04-30 | 1981-12-01 | Sumitomo Electric Industries | Coated cutting tool |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0297677A (en) * | 1988-06-13 | 1990-04-10 | Sandvik Ab | Cover body of substrate capable of being decarburized in coating method |
WO2002061168A3 (en) * | 2000-10-24 | 2003-03-13 | Honeywell Int Inc | Methods of forming sputtering targets |
US6833058B1 (en) | 2000-10-24 | 2004-12-21 | Honeywell International Inc. | Titanium-based and zirconium-based mixed materials and sputtering targets |
Also Published As
Publication number | Publication date |
---|---|
JPH0120227B2 (en) | 1989-04-14 |
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