JPS57192946A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS57192946A
JPS57192946A JP7115181A JP7115181A JPS57192946A JP S57192946 A JPS57192946 A JP S57192946A JP 7115181 A JP7115181 A JP 7115181A JP 7115181 A JP7115181 A JP 7115181A JP S57192946 A JPS57192946 A JP S57192946A
Authority
JP
Japan
Prior art keywords
alkyl
resin composition
photosensitive resin
derivative
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7115181A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0113089B2 (enExample
Inventor
Takashi Yamadera
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7115181A priority Critical patent/JPS57192946A/ja
Publication of JPS57192946A publication Critical patent/JPS57192946A/ja
Publication of JPH0113089B2 publication Critical patent/JPH0113089B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
JP7115181A 1981-05-11 1981-05-11 Photosensitive resin composition Granted JPS57192946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7115181A JPS57192946A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7115181A JPS57192946A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS57192946A true JPS57192946A (en) 1982-11-27
JPH0113089B2 JPH0113089B2 (enExample) 1989-03-03

Family

ID=13452313

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7115181A Granted JPS57192946A (en) 1981-05-11 1981-05-11 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS57192946A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107344A (ja) * 1982-12-13 1984-06-21 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH0235454A (ja) * 1988-07-25 1990-02-06 Sekisui Chem Co Ltd 感光性樹脂組成物
JPH0351853A (ja) * 1989-07-19 1991-03-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性積層体
JP2010176077A (ja) * 2009-02-02 2010-08-12 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107344A (ja) * 1982-12-13 1984-06-21 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH0235454A (ja) * 1988-07-25 1990-02-06 Sekisui Chem Co Ltd 感光性樹脂組成物
JPH0351853A (ja) * 1989-07-19 1991-03-06 Hitachi Chem Co Ltd 感光性樹脂組成物及び感光性積層体
JP2010176077A (ja) * 2009-02-02 2010-08-12 Fujifilm Corp 染料含有ネガ型硬化性組成物、カラーフィルタ及びその製造方法

Also Published As

Publication number Publication date
JPH0113089B2 (enExample) 1989-03-03

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