JPS57192261A - Vacuum apparatus for coating with fine particle - Google Patents
Vacuum apparatus for coating with fine particleInfo
- Publication number
- JPS57192261A JPS57192261A JP7488981A JP7488981A JPS57192261A JP S57192261 A JPS57192261 A JP S57192261A JP 7488981 A JP7488981 A JP 7488981A JP 7488981 A JP7488981 A JP 7488981A JP S57192261 A JPS57192261 A JP S57192261A
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- base plate
- fan shape
- expanded
- fine particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To make possible to open enough the flying passage for discharged particles in the titled apparatus without making a vacuum vessel large or complicated, by providing a shutter whose area can be varied between a fine particle discharge source and a base plate. CONSTITUTION:The area-variable shutter 2 capable of expanding to a fan shape is positined between the fine particle discharge source 17 and the target base plate 4 in the vacuum vessel 1. The single shutter 3 shown in dotted line is a conventional shutter. The particular shutter 2 involves a plurality of stacked shutter pieces 2' which have enough dimensions to cover the base plate 4 when they are expanded to a fan shape because one ends of the shutter pieces are pivotally supported by an expansion shaft 9 such that they can be expanded to a fan shape. By driving the shaft 9 through a suitable driving mechanism to allow the shutter pieces 2' to engage one another, they can be expanded to a fan shape or gathered to become a rectangle so that the amount of fine particles to be deposited on the base plate 4 can be effectively and arbitrarily controlled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7488981A JPS57192261A (en) | 1981-05-20 | 1981-05-20 | Vacuum apparatus for coating with fine particle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7488981A JPS57192261A (en) | 1981-05-20 | 1981-05-20 | Vacuum apparatus for coating with fine particle |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57192261A true JPS57192261A (en) | 1982-11-26 |
Family
ID=13560382
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7488981A Pending JPS57192261A (en) | 1981-05-20 | 1981-05-20 | Vacuum apparatus for coating with fine particle |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57192261A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61105072U (en) * | 1984-12-17 | 1986-07-03 | ||
WO2018011614A1 (en) * | 2016-07-13 | 2018-01-18 | Essilor International (Compagnie Générale d'Optique) | Shutters and methods using the same |
-
1981
- 1981-05-20 JP JP7488981A patent/JPS57192261A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61105072U (en) * | 1984-12-17 | 1986-07-03 | ||
JPS6241660Y2 (en) * | 1984-12-17 | 1987-10-24 | ||
WO2018011614A1 (en) * | 2016-07-13 | 2018-01-18 | Essilor International (Compagnie Générale d'Optique) | Shutters and methods using the same |
CN109689924A (en) * | 2016-07-13 | 2019-04-26 | 依视路国际公司 | Shield and its application method |
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