JPS57192261A - Vacuum apparatus for coating with fine particle - Google Patents

Vacuum apparatus for coating with fine particle

Info

Publication number
JPS57192261A
JPS57192261A JP7488981A JP7488981A JPS57192261A JP S57192261 A JPS57192261 A JP S57192261A JP 7488981 A JP7488981 A JP 7488981A JP 7488981 A JP7488981 A JP 7488981A JP S57192261 A JPS57192261 A JP S57192261A
Authority
JP
Japan
Prior art keywords
shutter
base plate
fan shape
expanded
fine particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7488981A
Other languages
Japanese (ja)
Inventor
Sukeyoshi Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Broadcasting Corp
Original Assignee
Nippon Hoso Kyokai NHK
Japan Broadcasting Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Hoso Kyokai NHK, Japan Broadcasting Corp filed Critical Nippon Hoso Kyokai NHK
Priority to JP7488981A priority Critical patent/JPS57192261A/en
Publication of JPS57192261A publication Critical patent/JPS57192261A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To make possible to open enough the flying passage for discharged particles in the titled apparatus without making a vacuum vessel large or complicated, by providing a shutter whose area can be varied between a fine particle discharge source and a base plate. CONSTITUTION:The area-variable shutter 2 capable of expanding to a fan shape is positined between the fine particle discharge source 17 and the target base plate 4 in the vacuum vessel 1. The single shutter 3 shown in dotted line is a conventional shutter. The particular shutter 2 involves a plurality of stacked shutter pieces 2' which have enough dimensions to cover the base plate 4 when they are expanded to a fan shape because one ends of the shutter pieces are pivotally supported by an expansion shaft 9 such that they can be expanded to a fan shape. By driving the shaft 9 through a suitable driving mechanism to allow the shutter pieces 2' to engage one another, they can be expanded to a fan shape or gathered to become a rectangle so that the amount of fine particles to be deposited on the base plate 4 can be effectively and arbitrarily controlled.
JP7488981A 1981-05-20 1981-05-20 Vacuum apparatus for coating with fine particle Pending JPS57192261A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7488981A JPS57192261A (en) 1981-05-20 1981-05-20 Vacuum apparatus for coating with fine particle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7488981A JPS57192261A (en) 1981-05-20 1981-05-20 Vacuum apparatus for coating with fine particle

Publications (1)

Publication Number Publication Date
JPS57192261A true JPS57192261A (en) 1982-11-26

Family

ID=13560382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7488981A Pending JPS57192261A (en) 1981-05-20 1981-05-20 Vacuum apparatus for coating with fine particle

Country Status (1)

Country Link
JP (1) JPS57192261A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61105072U (en) * 1984-12-17 1986-07-03
WO2018011614A1 (en) * 2016-07-13 2018-01-18 Essilor International (Compagnie Générale d'Optique) Shutters and methods using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61105072U (en) * 1984-12-17 1986-07-03
JPS6241660Y2 (en) * 1984-12-17 1987-10-24
WO2018011614A1 (en) * 2016-07-13 2018-01-18 Essilor International (Compagnie Générale d'Optique) Shutters and methods using the same
CN109689924A (en) * 2016-07-13 2019-04-26 依视路国际公司 Shield and its application method

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