JPS571891B2 - - Google Patents
Info
- Publication number
- JPS571891B2 JPS571891B2 JP10699380A JP10699380A JPS571891B2 JP S571891 B2 JPS571891 B2 JP S571891B2 JP 10699380 A JP10699380 A JP 10699380A JP 10699380 A JP10699380 A JP 10699380A JP S571891 B2 JPS571891 B2 JP S571891B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10699380A JPS5635423A (en) | 1980-08-04 | 1980-08-04 | Method of correcting photomask by polishing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10699380A JPS5635423A (en) | 1980-08-04 | 1980-08-04 | Method of correcting photomask by polishing |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5635423A JPS5635423A (en) | 1981-04-08 |
| JPS571891B2 true JPS571891B2 (en) | 1982-01-13 |
Family
ID=14447752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10699380A Granted JPS5635423A (en) | 1980-08-04 | 1980-08-04 | Method of correcting photomask by polishing |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5635423A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02307933A (en) * | 1989-05-18 | 1990-12-21 | Nishi Nenshi Kk | Apparatus for producing fancy yarn |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4727044A (en) * | 1984-05-18 | 1988-02-23 | Semiconductor Energy Laboratory Co., Ltd. | Method of making a thin film transistor with laser recrystallized source and drain |
| KR101022600B1 (en) * | 2004-06-22 | 2011-03-16 | 호야 가부시키가이샤 | Gray tone mask blank, gray tone mask and production method therefor |
| JP5161419B2 (en) * | 2004-06-22 | 2013-03-13 | Ｈｏｙａ株式会社 | Gray tone mask blank and method of manufacturing gray tone mask |
-
1980
- 1980-08-04 JP JP10699380A patent/JPS5635423A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02307933A (en) * | 1989-05-18 | 1990-12-21 | Nishi Nenshi Kk | Apparatus for producing fancy yarn |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5635423A (en) | 1981-04-08 |