JPS57188678A - Continuous vacuum deposition device - Google Patents

Continuous vacuum deposition device

Info

Publication number
JPS57188678A
JPS57188678A JP7305181A JP7305181A JPS57188678A JP S57188678 A JPS57188678 A JP S57188678A JP 7305181 A JP7305181 A JP 7305181A JP 7305181 A JP7305181 A JP 7305181A JP S57188678 A JPS57188678 A JP S57188678A
Authority
JP
Japan
Prior art keywords
chamber
substrates
vapor deposition
gate
vacuum deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7305181A
Other languages
Japanese (ja)
Inventor
Takayuki Fujita
Yoshitaka Kuroda
Kenichiro Hori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7305181A priority Critical patent/JPS57188678A/en
Publication of JPS57188678A publication Critical patent/JPS57188678A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To reduce a vapor deposition time and electric power by disposing a preheating chamber, a vapor deposition chamber and a cooling chamber which are separated by gate values in vertical directions and making the transfer of substrates by gravity possible. CONSTITUTION:A gate valve 2 between a preheating chamber 2 and a vapor depositing chamber 8 is opened to allow the heated substrates in the chamber 5 to fall into a net gate 10 in the chamber 8. Upon completion of the vapor deposition of the substrates, a gate valve 3 between the chamber 5 and the chamber 13 is opened to allow the substrates completed of the vapor deposition to fall into a cooling chamber 13 where the substrates are cooled. The vapor deposition time and electric power are reduced by the above-mentioned device.
JP7305181A 1981-05-14 1981-05-14 Continuous vacuum deposition device Pending JPS57188678A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7305181A JPS57188678A (en) 1981-05-14 1981-05-14 Continuous vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7305181A JPS57188678A (en) 1981-05-14 1981-05-14 Continuous vacuum deposition device

Publications (1)

Publication Number Publication Date
JPS57188678A true JPS57188678A (en) 1982-11-19

Family

ID=13507175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7305181A Pending JPS57188678A (en) 1981-05-14 1981-05-14 Continuous vacuum deposition device

Country Status (1)

Country Link
JP (1) JPS57188678A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2727132A1 (en) * 1994-11-18 1996-05-24 Surface Engineering APPARATUS FOR VACUUM DEPOSITION OF MATERIAL ON BULK PARTS
CN100376717C (en) * 2006-02-27 2008-03-26 浙江大学 Scale-viewing temperature area temperature stabilizing method in chemical gaseous phase deposition course

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52107241A (en) * 1976-03-05 1977-09-08 Taisei Denshi Kk Article supplying device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52107241A (en) * 1976-03-05 1977-09-08 Taisei Denshi Kk Article supplying device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2727132A1 (en) * 1994-11-18 1996-05-24 Surface Engineering APPARATUS FOR VACUUM DEPOSITION OF MATERIAL ON BULK PARTS
WO1996016198A1 (en) * 1994-11-18 1996-05-30 Surface Engineering Apparatus for the relative vacuum deposition of a material on bulk parts
US6038999A (en) * 1994-11-18 2000-03-21 Metatherm Device for the relative vacuum deposition of a material on parts in a loose state
CN100376717C (en) * 2006-02-27 2008-03-26 浙江大学 Scale-viewing temperature area temperature stabilizing method in chemical gaseous phase deposition course

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