JPS57188576A - S-triazine compound and stabilizer for synthetic resin consisting of the same - Google Patents

S-triazine compound and stabilizer for synthetic resin consisting of the same

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Publication number
JPS57188576A
JPS57188576A JP7343381A JP7343381A JPS57188576A JP S57188576 A JPS57188576 A JP S57188576A JP 7343381 A JP7343381 A JP 7343381A JP 7343381 A JP7343381 A JP 7343381A JP S57188576 A JPS57188576 A JP S57188576A
Authority
JP
Japan
Prior art keywords
stabilizer
formula
compound
same
synthetic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7343381A
Other languages
Japanese (ja)
Inventor
Akihiko Yoshizato
Tomio Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Priority to JP7343381A priority Critical patent/JPS57188576A/en
Publication of JPS57188576A publication Critical patent/JPS57188576A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

NEW MATERIAL:A compound of formulaI[n is 1 or 2; X1 and X2 are formula II (R1 and R2 are 1W4C alkyl or 5W6C cycloalkyl which may have CH3; R3 is CH2 or 2W12C alkylidene); Y is ≤6C alkyl or formula III or IV (Q is 1W4C alkyl or halogen; x is an integer 0W3; y is 0 or 1) when n is 1, and 2W4C alkylidene, phenylene, xylylene or formula V or VI].
EXAMPLE: 2-Methoxy-4,6-bis-[2-(2-hydroxy-3,5-dimethyl-α-isopropylbenzyl)-4,6- dimethylphenoxy]-s-triazine.
USE: A stabilizer for synthetic resins, e.g. polyurethane, polyolefin or polyamide.
PROCESS: Cyanuric chloride is reacted with a compound of the formula Y(OH)n, and the resultant reaction product is then reacted with a 2,2'-alkylidene-bis-(4,6- disubstituted phenol) to afford the compound of formulaI.
COPYRIGHT: (C)1982,JPO&Japio
JP7343381A 1981-05-18 1981-05-18 S-triazine compound and stabilizer for synthetic resin consisting of the same Pending JPS57188576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7343381A JPS57188576A (en) 1981-05-18 1981-05-18 S-triazine compound and stabilizer for synthetic resin consisting of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7343381A JPS57188576A (en) 1981-05-18 1981-05-18 S-triazine compound and stabilizer for synthetic resin consisting of the same

Publications (1)

Publication Number Publication Date
JPS57188576A true JPS57188576A (en) 1982-11-19

Family

ID=13518100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7343381A Pending JPS57188576A (en) 1981-05-18 1981-05-18 S-triazine compound and stabilizer for synthetic resin consisting of the same

Country Status (1)

Country Link
JP (1) JPS57188576A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001335569A (en) * 2000-05-31 2001-12-04 Dainippon Ink & Chem Inc Polyhydroxyl compound, method for producing the same, epoxy resin composition and its cured product
JP2002012588A (en) * 2000-06-29 2002-01-15 Dainippon Ink & Chem Inc Polyhydric hydroxy compound, method for producing the same, epoxy resin composition and its cured material
JP2009298793A (en) * 2009-07-31 2009-12-24 Nippon Soda Co Ltd Host compound for clathrate compound
WO2018235549A1 (en) * 2017-06-20 2018-12-27 富士フイルム株式会社 Composition, film, lens, solid state image sensor, and compound

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001335569A (en) * 2000-05-31 2001-12-04 Dainippon Ink & Chem Inc Polyhydroxyl compound, method for producing the same, epoxy resin composition and its cured product
JP2002012588A (en) * 2000-06-29 2002-01-15 Dainippon Ink & Chem Inc Polyhydric hydroxy compound, method for producing the same, epoxy resin composition and its cured material
JP2009298793A (en) * 2009-07-31 2009-12-24 Nippon Soda Co Ltd Host compound for clathrate compound
WO2018235549A1 (en) * 2017-06-20 2018-12-27 富士フイルム株式会社 Composition, film, lens, solid state image sensor, and compound
JPWO2018235549A1 (en) * 2017-06-20 2020-04-09 富士フイルム株式会社 Composition, film, lens, solid-state imaging device, compound

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